GB1235281A - Improvements in or relating to lithographic printing plates - Google Patents
Improvements in or relating to lithographic printing platesInfo
- Publication number
- GB1235281A GB1235281A GB37135/66A GB3713566A GB1235281A GB 1235281 A GB1235281 A GB 1235281A GB 37135/66 A GB37135/66 A GB 37135/66A GB 3713566 A GB3713566 A GB 3713566A GB 1235281 A GB1235281 A GB 1235281A
- Authority
- GB
- United Kingdom
- Prior art keywords
- condensation product
- acid
- acrylamide
- photo
- methacrylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 azido compound Chemical class 0.000 abstract 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 2
- 239000007859 condensation product Substances 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- BJZPRWGJKQMNGE-UHFFFAOYSA-N 6-diazo-n-phenylcyclohexa-2,4-dien-1-amine;sulfuric acid Chemical compound OS(O)(=O)=O.[N-]=[N+]=C1C=CC=CC1NC1=CC=CC=C1 BJZPRWGJKQMNGE-UHFFFAOYSA-N 0.000 abstract 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 1
- MCTQNEBFZMBRSQ-GEEYTBSJSA-N Chrysoidine Chemical compound Cl.NC1=CC(N)=CC=C1\N=N\C1=CC=CC=C1 MCTQNEBFZMBRSQ-GEEYTBSJSA-N 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 abstract 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 abstract 1
- 229930040373 Paraformaldehyde Natural products 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 abstract 1
- 229920002866 paraformaldehyde Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- UJMBCXLDXJUMFB-GLCFPVLVSA-K tartrazine Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 UJMBCXLDXJUMFB-GLCFPVLVSA-K 0.000 abstract 1
- 229960000943 tartrazine Drugs 0.000 abstract 1
- 235000012756 tartrazine Nutrition 0.000 abstract 1
- 239000004149 tartrazine Substances 0.000 abstract 1
- 239000001043 yellow dye Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB37135/66A GB1235281A (en) | 1967-02-18 | 1967-02-18 | Improvements in or relating to lithographic printing plates |
| BE718055D BE718055A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-02-18 | 1968-07-12 | |
| NL6810074A NL6810074A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-02-18 | 1968-07-17 | |
| FR160290A FR1574534A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-02-18 | 1968-07-23 | |
| DE1772947A DE1772947C2 (de) | 1967-02-18 | 1968-07-25 | Vorsensibilisierte Flachdruckplatte |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB37135/66A GB1235281A (en) | 1967-02-18 | 1967-02-18 | Improvements in or relating to lithographic printing plates |
| BE718055 | 1968-07-12 | ||
| NL6810074A NL6810074A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-02-18 | 1968-07-17 | |
| FR160290 | 1968-07-23 | ||
| DE1772947A DE1772947C2 (de) | 1967-02-18 | 1968-07-25 | Vorsensibilisierte Flachdruckplatte |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1235281A true GB1235281A (en) | 1971-06-09 |
Family
ID=27507697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB37135/66A Expired GB1235281A (en) | 1967-02-18 | 1967-02-18 | Improvements in or relating to lithographic printing plates |
Country Status (5)
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4475460A (en) * | 1982-10-05 | 1984-10-09 | Fuji Photo Film Co., Ltd. | Process for desensitizing lithographic printing plates |
| EP0191400A3 (en) * | 1985-02-12 | 1988-01-13 | Hoechst Aktiengesellschaft | Light-sensitive composition and registration material prepared thereof |
| EP0316027A3 (en) * | 1987-11-12 | 1990-10-31 | Chisso Corporation | Photocurable resin composition |
| EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
| EP2042338A2 (en) | 2007-09-26 | 2009-04-01 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| EP2042339A2 (en) | 2007-09-26 | 2009-04-01 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
| EP2098377A2 (en) | 2008-03-07 | 2009-09-09 | FUJIFILM Corporation | Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
| EP2233311A1 (en) | 2009-03-25 | 2010-09-29 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
| EP2543518A2 (en) | 2011-07-05 | 2013-01-09 | Fujifilm Corporation | Fountain solution composition for lithographic printing |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2551372A1 (de) * | 1975-08-14 | 1977-02-24 | Alusuisse | Verfahren zur herstellung einer lichtempfindlichen masse |
| DE2652304C2 (de) * | 1976-11-17 | 1987-04-23 | Hoechst Ag, 6230 Frankfurt | Negativ arbeitendes lichtempfindliches Gemisch und damit hergestellte lichtempfindliche Flachdruckplatte |
| FR2382709A1 (fr) | 1977-03-04 | 1978-09-29 | Thomson Csf | Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL70798C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1948-10-15 | |||
| BE563723A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1957-01-04 |
-
1967
- 1967-02-18 GB GB37135/66A patent/GB1235281A/en not_active Expired
-
1968
- 1968-07-12 BE BE718055D patent/BE718055A/xx not_active IP Right Cessation
- 1968-07-17 NL NL6810074A patent/NL6810074A/xx not_active Application Discontinuation
- 1968-07-23 FR FR160290A patent/FR1574534A/fr not_active Expired
- 1968-07-25 DE DE1772947A patent/DE1772947C2/de not_active Expired
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4475460A (en) * | 1982-10-05 | 1984-10-09 | Fuji Photo Film Co., Ltd. | Process for desensitizing lithographic printing plates |
| EP0191400A3 (en) * | 1985-02-12 | 1988-01-13 | Hoechst Aktiengesellschaft | Light-sensitive composition and registration material prepared thereof |
| EP0316027A3 (en) * | 1987-11-12 | 1990-10-31 | Chisso Corporation | Photocurable resin composition |
| EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
| EP2042338A2 (en) | 2007-09-26 | 2009-04-01 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| EP2042339A2 (en) | 2007-09-26 | 2009-04-01 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
| EP2098377A2 (en) | 2008-03-07 | 2009-09-09 | FUJIFILM Corporation | Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
| EP2233311A1 (en) | 2009-03-25 | 2010-09-29 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
| EP2543518A2 (en) | 2011-07-05 | 2013-01-09 | Fujifilm Corporation | Fountain solution composition for lithographic printing |
Also Published As
| Publication number | Publication date |
|---|---|
| NL6810074A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1970-01-20 |
| DE1772947C2 (de) | 1982-03-25 |
| FR1574534A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1969-07-11 |
| DE1772947A1 (de) | 1971-07-08 |
| BE718055A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1969-01-13 |
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