BE718055A - - Google Patents
Info
- Publication number
- BE718055A BE718055A BE718055DA BE718055A BE 718055 A BE718055 A BE 718055A BE 718055D A BE718055D A BE 718055DA BE 718055 A BE718055 A BE 718055A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB37135/66A GB1235281A (en) | 1967-02-18 | 1967-02-18 | Improvements in or relating to lithographic printing plates |
| BE718055 | 1968-07-12 | ||
| NL6810074A NL6810074A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-02-18 | 1968-07-17 | |
| FR160290 | 1968-07-23 | ||
| DE1772947A DE1772947C2 (de) | 1967-02-18 | 1968-07-25 | Vorsensibilisierte Flachdruckplatte |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE718055A true BE718055A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1969-01-13 |
Family
ID=27507697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE718055D BE718055A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-02-18 | 1968-07-12 |
Country Status (5)
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2551372A1 (de) * | 1975-08-14 | 1977-02-24 | Alusuisse | Verfahren zur herstellung einer lichtempfindlichen masse |
| DE2652304C2 (de) * | 1976-11-17 | 1987-04-23 | Hoechst Ag, 6230 Frankfurt | Negativ arbeitendes lichtempfindliches Gemisch und damit hergestellte lichtempfindliche Flachdruckplatte |
| FR2382709A1 (fr) | 1977-03-04 | 1978-09-29 | Thomson Csf | Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique |
| JPS5964396A (ja) * | 1982-10-05 | 1984-04-12 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
| DE3504658A1 (de) * | 1985-02-12 | 1986-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial |
| JPH01128064A (ja) * | 1987-11-12 | 1989-05-19 | Chisso Corp | 光硬化性樹脂組成物 |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| EP2042339B1 (en) | 2007-09-26 | 2013-05-22 | FUJIFILM Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| US20090081592A1 (en) | 2007-09-26 | 2009-03-26 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
| JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
| JP2009234247A (ja) | 2008-03-07 | 2009-10-15 | Fujifilm Corp | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5288268B2 (ja) | 2009-03-25 | 2013-09-11 | 富士フイルム株式会社 | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5281130B2 (ja) | 2011-07-05 | 2013-09-04 | 富士フイルム株式会社 | 平版印刷用湿し水組成物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL70798C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1948-10-15 | |||
| BE563723A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1957-01-04 |
-
1967
- 1967-02-18 GB GB37135/66A patent/GB1235281A/en not_active Expired
-
1968
- 1968-07-12 BE BE718055D patent/BE718055A/xx not_active IP Right Cessation
- 1968-07-17 NL NL6810074A patent/NL6810074A/xx not_active Application Discontinuation
- 1968-07-23 FR FR160290A patent/FR1574534A/fr not_active Expired
- 1968-07-25 DE DE1772947A patent/DE1772947C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR1574534A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1969-07-11 |
| NL6810074A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1970-01-20 |
| DE1772947C2 (de) | 1982-03-25 |
| GB1235281A (en) | 1971-06-09 |
| DE1772947A1 (de) | 1971-07-08 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RE | Patent lapsed |
Owner name: W.H. HOWSON LTD Effective date: 19840712 |