FR1574534A - - Google Patents

Info

Publication number
FR1574534A
FR1574534A FR160290A FR1574534DA FR1574534A FR 1574534 A FR1574534 A FR 1574534A FR 160290 A FR160290 A FR 160290A FR 1574534D A FR1574534D A FR 1574534DA FR 1574534 A FR1574534 A FR 1574534A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR160290A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1574534A publication Critical patent/FR1574534A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR160290A 1967-02-18 1968-07-23 Expired FR1574534A (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB37135/66A GB1235281A (en) 1967-02-18 1967-02-18 Improvements in or relating to lithographic printing plates
BE718055 1968-07-12
NL6810074A NL6810074A (fr) 1967-02-18 1968-07-17
FR160290 1968-07-23
DE1772947A DE1772947C2 (de) 1967-02-18 1968-07-25 Vorsensibilisierte Flachdruckplatte

Publications (1)

Publication Number Publication Date
FR1574534A true FR1574534A (fr) 1969-07-11

Family

ID=27507697

Family Applications (1)

Application Number Title Priority Date Filing Date
FR160290A Expired FR1574534A (fr) 1967-02-18 1968-07-23

Country Status (5)

Country Link
BE (1) BE718055A (fr)
DE (1) DE1772947C2 (fr)
FR (1) FR1574534A (fr)
GB (1) GB1235281A (fr)
NL (1) NL6810074A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2321141A1 (fr) * 1975-08-14 1977-03-11 Alusuisse Procede de fabrication d'une composition photosensible
US4259162A (en) 1977-03-04 1981-03-31 Thomson-Csf Family of compounds crosslinkable by photon irradiation

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2652304A1 (de) * 1976-11-17 1978-05-18 Hoechst Ag Negativ arbeitende, lichtempfindliche kopiermasse und damit hergestelltes kopiermaterial
JPS5964396A (ja) * 1982-10-05 1984-04-12 Fuji Photo Film Co Ltd 平版印刷版用版面保護剤
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
JPH01128064A (ja) * 1987-11-12 1989-05-19 Chisso Corp 光硬化性樹脂組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US20090081592A1 (en) 2007-09-26 2009-03-26 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2042339B1 (fr) 2007-09-26 2013-05-22 FUJIFILM Corporation Composition de solution de mouillage pour impression lithographique et procédé d'impression en offset utilisant des encres thermoséchantes
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009234247A (ja) 2008-03-07 2009-10-15 Fujifilm Corp 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5288268B2 (ja) 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5281130B2 (ja) 2011-07-05 2013-09-04 富士フイルム株式会社 平版印刷用湿し水組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL70798C (fr) * 1948-10-15
BE563723A (fr) * 1957-01-04

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2321141A1 (fr) * 1975-08-14 1977-03-11 Alusuisse Procede de fabrication d'une composition photosensible
US4259162A (en) 1977-03-04 1981-03-31 Thomson-Csf Family of compounds crosslinkable by photon irradiation
US4285788A (en) 1977-03-04 1981-08-25 Thomson-Csf Family of compounds crosslinkable by photon irradiation

Also Published As

Publication number Publication date
DE1772947C2 (de) 1982-03-25
BE718055A (fr) 1969-01-13
GB1235281A (en) 1971-06-09
NL6810074A (fr) 1970-01-20
DE1772947A1 (de) 1971-07-08

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse