GB1180846A - Photopolymerisation of Ethylenically Unsaturated Organic Compounds - Google Patents

Photopolymerisation of Ethylenically Unsaturated Organic Compounds

Info

Publication number
GB1180846A
GB1180846A GB36394/67A GB3639467A GB1180846A GB 1180846 A GB1180846 A GB 1180846A GB 36394/67 A GB36394/67 A GB 36394/67A GB 3639467 A GB3639467 A GB 3639467A GB 1180846 A GB1180846 A GB 1180846A
Authority
GB
United Kingdom
Prior art keywords
ethylenically unsaturated
oxime ester
initiator
photopolymerization
ester groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB36394/67A
Other languages
English (en)
Inventor
Urbain Leopold Laridon
Gerard Albert Delzenne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Priority to GB36394/67A priority Critical patent/GB1180846A/en
Priority to US743948A priority patent/US3558309A/en
Priority to FR1576141D priority patent/FR1576141A/fr
Priority to BE719039D priority patent/BE719039A/xx
Priority to NL686811281A priority patent/NL154518B/xx
Priority to DE1795089A priority patent/DE1795089C3/de
Publication of GB1180846A publication Critical patent/GB1180846A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/6856—Dicarboxylic acids and dihydroxy compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
GB36394/67A 1967-08-08 1967-08-08 Photopolymerisation of Ethylenically Unsaturated Organic Compounds Expired GB1180846A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
GB36394/67A GB1180846A (en) 1967-08-08 1967-08-08 Photopolymerisation of Ethylenically Unsaturated Organic Compounds
US743948A US3558309A (en) 1967-08-08 1968-07-11 Photopolymerisation of ethylenically unsaturated organic compounds
FR1576141D FR1576141A (xx) 1967-08-08 1968-08-05
BE719039D BE719039A (xx) 1967-08-08 1968-08-05
NL686811281A NL154518B (nl) 1967-08-08 1968-08-08 Werkwijze voor het bereiden van een door uv-bestraling verhardbare samenstelling, alsmede fotografisch element dat een laag bevat, die uit een aldus bereide samenstelling is gevormd.
DE1795089A DE1795089C3 (de) 1967-08-08 1968-08-08 Photopolymerisierbares Material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB36394/67A GB1180846A (en) 1967-08-08 1967-08-08 Photopolymerisation of Ethylenically Unsaturated Organic Compounds

Publications (1)

Publication Number Publication Date
GB1180846A true GB1180846A (en) 1970-02-11

Family

ID=10387736

Family Applications (1)

Application Number Title Priority Date Filing Date
GB36394/67A Expired GB1180846A (en) 1967-08-08 1967-08-08 Photopolymerisation of Ethylenically Unsaturated Organic Compounds

Country Status (6)

Country Link
US (1) US3558309A (xx)
BE (1) BE719039A (xx)
DE (1) DE1795089C3 (xx)
FR (1) FR1576141A (xx)
GB (1) GB1180846A (xx)
NL (1) NL154518B (xx)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
JP2001235858A (ja) * 1999-12-15 2001-08-31 Ciba Specialty Chem Holding Inc 感光性樹脂組成物
WO2002004408A1 (en) * 2000-07-07 2002-01-17 3M Innovative Properties Company Degradable crosslinkers, compositions therefrom, and methods of their preparation and use

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US4202694A (en) * 1977-04-21 1980-05-13 Polaroid Corporation Pendant oxime polymers and photographic use thereof
FR2393345A1 (fr) * 1977-06-01 1978-12-29 Agfa Gevaert Nv Fabrication d'elements modifies sous forme d'images
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
NO150963C (no) * 1979-01-11 1985-01-16 Scott Bader Co Polyesterharpiksmateriale som er herdbart ved hjelp av synlig lys, og fremgangsmaate til herding av dette
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
JPS5695902A (en) * 1979-12-29 1981-08-03 Toyobo Co Ltd Uv-curable resin composition
HU196288B (en) * 1985-06-04 1988-11-28 Egyt Gyogyszervegyeszeti Gyar Fungicides containing as active substance new derivatives of fenantren and process for production of the active substance
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
JP2640470B2 (ja) * 1987-08-19 1997-08-13 旭化成工業株式会社 新しい感光性組成物
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
JP3498869B2 (ja) * 1995-01-30 2004-02-23 富士写真フイルム株式会社 光重合性組成物を有する画像形成材料
DE69703505T2 (de) 1996-02-26 2001-06-13 Agfa Gevaert Nv Bildaufzeichnungselement, das eine Zweiphasenbeschichtung mit einer dispergierten hydrophoben photopolymerisierbaren Phase enthält
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
EP1635220A2 (en) 1999-03-03 2006-03-15 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use thereof as photoinitiators
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
KR100417091B1 (ko) * 2001-05-15 2004-02-05 주식회사 엘지화학 기능성 옥심 에스테르계 화합물 및 이를 포함하는 감광성조성물
CA2446722A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
ATE420877T1 (de) * 2002-12-03 2009-01-15 Ciba Holding Inc Heteroaromatische gruppen enthaltende oximester als photointiatoren
CN101014569B (zh) * 2004-08-18 2013-01-02 西巴特殊化学品控股有限公司 肟酯光引发剂
JP3992725B2 (ja) * 2004-08-20 2007-10-17 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP4650211B2 (ja) * 2005-10-31 2011-03-16 東洋インキ製造株式会社 光重合性組成物
KR100814231B1 (ko) 2005-12-01 2008-03-17 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 투명한 감광성 조성물
ATE496027T1 (de) * 2005-12-01 2011-02-15 Basf Se Oximester-fotoinitiatoren
DE602006012366D1 (en) * 2005-12-20 2010-04-01 Basf Se Oximester-photoinitiatoren
US8026296B2 (en) * 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
TWI392966B (zh) * 2006-01-13 2013-04-11 Toyo Ink Mfg Co 二酮肟酯化合物及其用途
US8349548B2 (en) * 2007-05-11 2013-01-08 Basf Se Oxime ester photoinitiators
CN102702073B (zh) * 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
KR101526619B1 (ko) 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
JP5274132B2 (ja) * 2007-07-17 2013-08-28 富士フイルム株式会社 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法
US8728686B2 (en) * 2007-07-17 2014-05-20 Fujifilm Corporation Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
US8507725B2 (en) 2008-06-06 2013-08-13 Basf Se Oxime ester photoinitiators
JP4344400B1 (ja) * 2009-02-16 2009-10-14 株式会社日本化学工業所 オキシムエステル化合物及びこれらを用いた感光性樹脂組成物
CN101565472B (zh) 2009-05-19 2011-05-04 常州强力电子新材料有限公司 酮肟酯类光引发剂
CN102459171B (zh) 2009-06-17 2014-07-09 东洋油墨Sc控股株式会社 肟酯化合物、自由基聚合引发剂、聚合性组合物、负型抗蚀剂以及图像图案
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
RU2628076C2 (ru) 2011-05-25 2017-08-14 Америкэн Дай Сорс, Инк. Соединения с группами сложных эфиров оксима и/или ацильными группами
JP6328642B2 (ja) * 2013-09-02 2018-05-23 インサイト ハイ テクノロジー カンパニー リミテッドＩｎｓｉｇｈｔ Ｈｉｇｈ Ｔｅｃｈｎｏｌｏｇｙ Ｃｏ．， Ｌｔｄ． シクロペンタンジオンオキシムエステルとその応用
CN104910053B (zh) * 2014-06-09 2017-09-12 北京英力科技发展有限公司 不对称二肟酯化合物及其制造方法与应用
WO2016082304A1 (zh) * 2014-11-28 2016-06-02 北京英力科技发展有限公司 一种光固化阻焊油墨
US11041037B2 (en) 2018-10-01 2021-06-22 Solenis Technologies, L.P. Ultra violet assisted photo initiated free radical polymerization

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE465271A (xx) * 1941-12-31 1900-01-01
DE1099166B (de) * 1959-12-01 1961-02-09 Basf Ag Sensibilisatoren zur Photopolymerisation ungesaettigter organischer Verbindungen

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
JP2001235858A (ja) * 1999-12-15 2001-08-31 Ciba Specialty Chem Holding Inc 感光性樹脂組成物
JP4532726B2 (ja) * 1999-12-15 2010-08-25 チバ ホールディング インコーポレーテッド 感光性樹脂組成物
WO2002004408A1 (en) * 2000-07-07 2002-01-17 3M Innovative Properties Company Degradable crosslinkers, compositions therefrom, and methods of their preparation and use
US6652970B1 (en) * 2000-07-07 2003-11-25 3M Innovative Properties Company Degradable crosslinkers, compositions therefrom, and methods of their preparation and use
JP2004502837A (ja) * 2000-07-07 2004-01-29 スリーエム　イノベイティブ　プロパティズ　カンパニー 分解性架橋剤、それからできる組成物、ならびにその製造方法および使用方法

Also Published As

Publication number Publication date
DE1795089A1 (de) 1972-01-20
NL154518B (nl) 1977-09-15
DE1795089C3 (de) 1982-03-18
DE1795089B2 (de) 1981-05-21
BE719039A (xx) 1969-02-05
FR1576141A (xx) 1969-07-25
US3558309A (en) 1971-01-26
NL6811281A (xx) 1969-01-27

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