GB1103914A - Production of photographic images from letterpress - Google Patents

Production of photographic images from letterpress

Info

Publication number
GB1103914A
GB1103914A GB18737/65A GB1873765A GB1103914A GB 1103914 A GB1103914 A GB 1103914A GB 18737/65 A GB18737/65 A GB 18737/65A GB 1873765 A GB1873765 A GB 1873765A GB 1103914 A GB1103914 A GB 1103914A
Authority
GB
United Kingdom
Prior art keywords
layer
light
coated
photographic
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB18737/65A
Inventor
Thomas Irving Abbott
Hugo Fritz Huedepohl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of GB1103914A publication Critical patent/GB1103914A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/81—Photosensitive materials characterised by the base or auxiliary layers characterised by anticoiling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/95—Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

1,103,914. Photographic materials. EASTMAN KODAK CO. May 4, 1965 [May 4, 1964], No. 18737/65. Heading G2C. A photographic material comprises a lightsensitive layer coated with a layer of alkalipermeable alkyl acrylate /acrylic acid copolymer or cellulose ether phthalate or cellulose acetate phthalate containing a pigment such as silicia, barium sulphate, calcium carbonate, zinc oxide or zinc sulphide. The light-sensitive material may be a silver halide, diazonium salt, diazo resin, imino- or naphtho-quinone diazides, the light-sensitive materials of 846, 908, 838, 547, 723, 603 and 723, 602, diazo ketones and cinnamalmalonic acids. This material may be coated on a support, and the overcoated proofing layer printed in the desired image with greasy ink, the material is exposed and developed and then the proofing layer is removed to leave the image thereon. The material may contain an antihalation gelatine/carbon subbing layer.
GB18737/65A 1964-05-04 1965-05-04 Production of photographic images from letterpress Expired GB1103914A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36479964A 1964-05-04 1964-05-04

Publications (1)

Publication Number Publication Date
GB1103914A true GB1103914A (en) 1968-02-21

Family

ID=23436126

Family Applications (1)

Application Number Title Priority Date Filing Date
GB18737/65A Expired GB1103914A (en) 1964-05-04 1965-05-04 Production of photographic images from letterpress

Country Status (4)

Country Link
US (1) US3473926A (en)
BE (1) BE663380A (en)
DE (1) DE1266644B (en)
GB (1) GB1103914A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647454A (en) * 1970-02-09 1972-03-07 Eastman Kodak Co Title-backed photosensitive microfiche
US4539285A (en) * 1984-03-14 1985-09-03 American Hoechst Corporation Photosensitive negative diazo composition with two acrylic polymers for photolithography

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1302919A (en) * 1919-05-06 Process of producing printing-plates
US1124594A (en) * 1914-06-11 1915-01-12 James G Coffin Art of printing.
US1700262A (en) * 1927-05-06 1929-01-29 Heinecke William Method of making negatives
US1992965A (en) * 1932-09-19 1935-03-05 Multigraph Co Method of preserving colloid films
US2322037A (en) * 1939-07-07 1943-06-15 Eastman Kodak Co Photographic film
CH279321A (en) * 1949-01-13 1951-11-30 Kalle & Co Ag Process for the production of positive printing foils for planographic printing, in particular for offset printing.
NL87862C (en) * 1951-08-20
BE557236A (en) * 1952-06-19
US2734298A (en) * 1952-06-21 1956-02-14 Mechanical negative process and resist
US2798004A (en) * 1954-01-26 1957-07-02 Eastman Kodak Co Film lacquer
US2903964A (en) * 1955-01-24 1959-09-15 Eastman Kodak Co Photographic spirit duplicating process
US2927023A (en) * 1956-08-27 1960-03-01 Du Pont Photopolymerizable compositions
US3016823A (en) * 1958-06-11 1962-01-16 Fitchburg Paper Lithographic printing plate and method of making the same
BE620097A (en) * 1958-11-26
US3062674A (en) * 1959-01-12 1962-11-06 Eastman Kodak Co Photographic product having layer containing bisepoxy ether crosslinked ethyl acrylate-acrylic acid copolymer
US3062648A (en) * 1960-02-09 1962-11-06 Eastman Kodak Co Photographically sensitive lithographic printing plate
NL276914A (en) * 1961-04-10
DE1251655B (en) * 1961-12-21

Also Published As

Publication number Publication date
DE1266644B (en) 1968-04-18
BE663380A (en)
US3473926A (en) 1969-10-21

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