FR2857030B1 - Procede de depot d'oxyde de titane par source plasma - Google Patents

Procede de depot d'oxyde de titane par source plasma

Info

Publication number
FR2857030B1
FR2857030B1 FR0307948A FR0307948A FR2857030B1 FR 2857030 B1 FR2857030 B1 FR 2857030B1 FR 0307948 A FR0307948 A FR 0307948A FR 0307948 A FR0307948 A FR 0307948A FR 2857030 B1 FR2857030 B1 FR 2857030B1
Authority
FR
France
Prior art keywords
titanium oxide
plasma source
oxide deposition
deposition
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0307948A
Other languages
English (en)
French (fr)
Other versions
FR2857030A1 (fr
Inventor
Anne Durandeau
Maxime Duran
Corinne Victor
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0307948A priority Critical patent/FR2857030B1/fr
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to US10/562,868 priority patent/US7976909B2/en
Priority to PCT/FR2004/001673 priority patent/WO2005012593A1/fr
Priority to EP04767517A priority patent/EP1644554A1/fr
Priority to KR1020057025270A priority patent/KR20060121660A/ko
Priority to JP2006518268A priority patent/JP2007516343A/ja
Priority to CN200480019034XA priority patent/CN1816645B/zh
Publication of FR2857030A1 publication Critical patent/FR2857030A1/fr
Application granted granted Critical
Publication of FR2857030B1 publication Critical patent/FR2857030B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Catalysts (AREA)
  • Surface Treatment Of Glass (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Vapour Deposition (AREA)
FR0307948A 2003-07-01 2003-07-01 Procede de depot d'oxyde de titane par source plasma Expired - Fee Related FR2857030B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR0307948A FR2857030B1 (fr) 2003-07-01 2003-07-01 Procede de depot d'oxyde de titane par source plasma
PCT/FR2004/001673 WO2005012593A1 (fr) 2003-07-01 2004-06-30 Procede de depot d’oxyde de titane par source plasma
EP04767517A EP1644554A1 (fr) 2003-07-01 2004-06-30 PROCEDE DE DEPOT D’OXYDE DE TITANE PAR SOURCE PLASMA
KR1020057025270A KR20060121660A (ko) 2003-07-01 2004-06-30 플라즈마 소스에 의한 티타늄 산화물의 증착 방법
US10/562,868 US7976909B2 (en) 2003-07-01 2004-06-30 Method for deposition of titanium oxide by a plasma source
JP2006518268A JP2007516343A (ja) 2003-07-01 2004-06-30 プラズマ源を用いて酸化チタンを付着する方法
CN200480019034XA CN1816645B (zh) 2003-07-01 2004-06-30 采用等离子体源沉积二氧化钛的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0307948A FR2857030B1 (fr) 2003-07-01 2003-07-01 Procede de depot d'oxyde de titane par source plasma

Publications (2)

Publication Number Publication Date
FR2857030A1 FR2857030A1 (fr) 2005-01-07
FR2857030B1 true FR2857030B1 (fr) 2006-10-27

Family

ID=33522639

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0307948A Expired - Fee Related FR2857030B1 (fr) 2003-07-01 2003-07-01 Procede de depot d'oxyde de titane par source plasma

Country Status (7)

Country Link
US (1) US7976909B2 (ja)
EP (1) EP1644554A1 (ja)
JP (1) JP2007516343A (ja)
KR (1) KR20060121660A (ja)
CN (1) CN1816645B (ja)
FR (1) FR2857030B1 (ja)
WO (1) WO2005012593A1 (ja)

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US20070212486A1 (en) * 2005-05-20 2007-09-13 Dinega Dmitry P Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
WO2007121211A2 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
WO2007124291A2 (en) 2006-04-19 2007-11-01 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US20080115444A1 (en) 2006-09-01 2008-05-22 Kalkanoglu Husnu M Roofing shingles with enhanced granule adhesion and method for producing same
FR2908137A1 (fr) 2006-11-02 2008-05-09 Lapeyre Sa Procede de depot de couche mince et produit obtenu
US8349435B2 (en) 2007-04-04 2013-01-08 Certainteed Corporation Mineral surfaced asphalt-based roofing products with encapsulated healing agents and methods of producing the same
CN100551450C (zh) * 2007-05-29 2009-10-21 中国科学院上海硅酸盐研究所 一种抗菌型生物活性钛涂层的制备方法
CA2664369A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
JP2009094488A (ja) * 2007-09-21 2009-04-30 Semiconductor Energy Lab Co Ltd 半導体膜付き基板の作製方法
JP5452900B2 (ja) * 2007-09-21 2014-03-26 株式会社半導体エネルギー研究所 半導体膜付き基板の作製方法
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
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US8791044B2 (en) * 2010-04-30 2014-07-29 The United States Of America As Represented By The Administrator Of The U.S. Environmental Protection Agency Doped titanium dioxide as a visible and sun light photo catalyst
WO2013009913A2 (en) * 2011-07-11 2013-01-17 Lotus Applied Technology, Llc Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
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CN102989456A (zh) * 2011-09-14 2013-03-27 大汉光电股份有限公司 双掺杂的光触媒材料
CN102717560B (zh) * 2012-06-13 2015-02-18 南京工业大学 太阳光引发的有机-无机复合自清洁涂层及制备方法
US10060019B2 (en) * 2012-11-16 2018-08-28 The Boeing Company Thermal spray coated reinforced polymer composites
US20140153122A1 (en) * 2012-11-30 2014-06-05 Guardian Industries Corp. Concentrating solar power apparatus having mirror coating and anti-soiling coating
WO2014183097A1 (en) * 2013-05-09 2014-11-13 Massachusetts Institute Of Technology Anti-fingerprint photocatalytic nanostructure for transparent surfaces
JP2016530344A (ja) * 2013-06-06 2016-09-29 ハネウェル・インターナショナル・インコーポレーテッド 液体酸化チタン組成物、それを形成するための方法、およびそれを用いて基材の、または基材を被覆する物質層をエッチングするための方法
DE102014111935A1 (de) * 2014-08-20 2016-02-25 Heraeus Deutschland GmbH & Co. KG Zweilagiges Schichtsystem mit teilabsorbierender Schicht sowie Verfahren und Sputtertarget zur Herstellung dieser Schicht
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Also Published As

Publication number Publication date
US20070092734A1 (en) 2007-04-26
CN1816645B (zh) 2010-04-28
FR2857030A1 (fr) 2005-01-07
KR20060121660A (ko) 2006-11-29
CN1816645A (zh) 2006-08-09
WO2005012593A1 (fr) 2005-02-10
JP2007516343A (ja) 2007-06-21
EP1644554A1 (fr) 2006-04-12
US7976909B2 (en) 2011-07-12

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Effective date: 20140331