FR2807450B1 - Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages - Google Patents

Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages

Info

Publication number
FR2807450B1
FR2807450B1 FR0004381A FR0004381A FR2807450B1 FR 2807450 B1 FR2807450 B1 FR 2807450B1 FR 0004381 A FR0004381 A FR 0004381A FR 0004381 A FR0004381 A FR 0004381A FR 2807450 B1 FR2807450 B1 FR 2807450B1
Authority
FR
France
Prior art keywords
palladium
alloys
bath
electrochemical deposition
electrolytic bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0004381A
Other languages
English (en)
French (fr)
Other versions
FR2807450A1 (fr
Inventor
Jose Gonzalez
Lionel Chalumeau
Michel Limayrac
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Engelhard CLAL SAS
Original Assignee
Engelhard CLAL SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0004381A priority Critical patent/FR2807450B1/fr
Application filed by Engelhard CLAL SAS filed Critical Engelhard CLAL SAS
Priority to AU2001248465A priority patent/AU2001248465A1/en
Priority to CNB01809757XA priority patent/CN1190522C/zh
Priority to DE60102364T priority patent/DE60102364T2/de
Priority to ES01921482T priority patent/ES2220757T3/es
Priority to US10/239,863 priority patent/US6743346B2/en
Priority to AT01921482T priority patent/ATE262055T1/de
Priority to JP2001575263A priority patent/JP4790191B2/ja
Priority to EP01921482A priority patent/EP1272691B1/fr
Priority to PCT/FR2001/001021 priority patent/WO2001077417A1/fr
Publication of FR2807450A1 publication Critical patent/FR2807450A1/fr
Application granted granted Critical
Publication of FR2807450B1 publication Critical patent/FR2807450B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
FR0004381A 2000-04-06 2000-04-06 Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages Expired - Fee Related FR2807450B1 (fr)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FR0004381A FR2807450B1 (fr) 2000-04-06 2000-04-06 Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages
EP01921482A EP1272691B1 (fr) 2000-04-06 2001-04-05 Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages
DE60102364T DE60102364T2 (de) 2000-04-06 2001-04-05 Elektrolytische lösung zur elektrochemischen abscheidung von palladium oder dessen legierungen
ES01921482T ES2220757T3 (es) 2000-04-06 2001-04-05 Baño electrolitico destinado para el deposito electroquimico del paladio o de sus aleaciones.
US10/239,863 US6743346B2 (en) 2000-04-06 2001-04-05 Electrolytic solution for electrochemical deposit of palladium or its alloys
AT01921482T ATE262055T1 (de) 2000-04-06 2001-04-05 Elektrolytische lösung zur elektrochemischen abscheidung von palladium oder dessen legierungen
AU2001248465A AU2001248465A1 (en) 2000-04-06 2001-04-05 Electrolytic solution for electrochemical deposit of palladium or its alloys
CNB01809757XA CN1190522C (zh) 2000-04-06 2001-04-05 用于钯或其合金电化学沉积的电解液
PCT/FR2001/001021 WO2001077417A1 (fr) 2000-04-06 2001-04-05 Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages
JP2001575263A JP4790191B2 (ja) 2000-04-06 2001-04-05 パラジウム又はその合金を電気化学的に析出させるための電解浴

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0004381A FR2807450B1 (fr) 2000-04-06 2000-04-06 Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages

Publications (2)

Publication Number Publication Date
FR2807450A1 FR2807450A1 (fr) 2001-10-12
FR2807450B1 true FR2807450B1 (fr) 2002-07-05

Family

ID=8848927

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0004381A Expired - Fee Related FR2807450B1 (fr) 2000-04-06 2000-04-06 Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages

Country Status (10)

Country Link
US (1) US6743346B2 (enExample)
EP (1) EP1272691B1 (enExample)
JP (1) JP4790191B2 (enExample)
CN (1) CN1190522C (enExample)
AT (1) ATE262055T1 (enExample)
AU (1) AU2001248465A1 (enExample)
DE (1) DE60102364T2 (enExample)
ES (1) ES2220757T3 (enExample)
FR (1) FR2807450B1 (enExample)
WO (1) WO2001077417A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2807422B1 (fr) * 2000-04-06 2002-07-05 Engelhard Clal Sas Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot de palladium ou d'un de ses alliages
US20050205425A1 (en) * 2002-06-25 2005-09-22 Integran Technologies Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents
US6828898B2 (en) * 2003-04-03 2004-12-07 Cts Corporation Fuel tank resistor card having improved corrosion resistance
US8361553B2 (en) * 2004-07-30 2013-01-29 Kimberly-Clark Worldwide, Inc. Methods and compositions for metal nanoparticle treated surfaces
EP2116550B1 (de) * 2008-05-07 2010-07-14 Umicore Galvanotechnik GmbH Verfahren zur Herstellung von Komplexen des Palladium(hydrogen) carbonats mit Aminliganden
CN102037162B (zh) * 2008-05-07 2013-03-27 尤米科尔电镀技术有限公司 Pd-和Pd-Ni-电镀浴
CN101838830B (zh) * 2010-05-07 2012-08-15 厦门大学 一种电镀钯镍合金的电解液
SG179380A1 (en) 2010-09-21 2012-04-27 Rohm & Haas Elect Mat Cyanide-free silver electroplating solutions
CN102677110B (zh) * 2012-04-19 2016-08-10 永保纳米科技(深圳)有限公司 一种金钯合金电镀液及其制备方法和电镀工艺
KR102482321B1 (ko) * 2014-09-04 2022-12-27 니혼 고쥰도가가쿠 가부시키가이샤 팔라듐 도금액 및 그것을 사용하여 얻어진 팔라듐 피막
JP6189878B2 (ja) * 2015-01-14 2017-08-30 松田産業株式会社 パラジウム又はパラジウム合金めっき用シアン耐性付与剤、めっき液、めっき液へのシアン耐性付与方法
CN104694053B (zh) * 2015-02-15 2016-09-07 滁州云林数码影像耗材有限公司 一种墙体用丙烯酸酯压敏胶及其制备方法
CN107858718A (zh) * 2017-11-28 2018-03-30 江苏澳光电子有限公司 一种用于塑料表面电镀的钯镀液及其应用
CN108864200B (zh) * 2018-08-06 2020-12-11 金川集团股份有限公司 电镀用硫酸乙二胺钯的一步制备方法
CN109183096B (zh) * 2018-11-08 2021-04-23 杭州云会五金电镀有限公司 一种用于合金的表面电镀液及电镀工艺
CN114084984A (zh) * 2022-01-20 2022-02-25 河北海力香料股份有限公司 一种从联苯四甲酸含钯废水中回收钯的方法
CN116675717B (zh) * 2022-02-22 2025-11-25 北京车和家汽车科技有限公司 钯配合物激发剂、纳米复合材料、后整理剂、纺织面料及其应用

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1051383A (enExample) * 1965-02-17
CH572989A5 (enExample) * 1973-04-27 1976-02-27 Oxy Metal Industries Corp
US3925170A (en) * 1974-01-23 1975-12-09 American Chem & Refining Co Method and composition for producing bright palladium electrodepositions
US4278514A (en) * 1980-02-12 1981-07-14 Technic, Inc. Bright palladium electrodeposition solution
JPS5747891A (en) * 1980-09-03 1982-03-18 Nippon Dento Kogyo Kk Gold-palladium alloy plating bath
US4297177A (en) * 1980-09-19 1981-10-27 American Chemical & Refining Company Incorporated Method and composition for electrodepositing palladium/nickel alloys
GB2112018B (en) * 1981-02-27 1984-08-15 Western Electric Co Palladium and palladium alloys electroplating procedure
GB8612361D0 (en) * 1986-05-21 1986-06-25 Engelhard Corp Gold electroplating bath
EP0415632A1 (en) * 1989-08-29 1991-03-06 AT&T Corp. Palladium alloy electroplating process
JPH06340983A (ja) * 1993-06-02 1994-12-13 Takamatsu Mekki Kogyo Kk パラジウムー銅メッキ被覆を有する装身具
JPH0711476A (ja) * 1993-06-23 1995-01-13 Kojima Kagaku Yakuhin Kk パラジウムめっき液
KR0171685B1 (ko) * 1994-02-26 1999-02-18 문성수 팔라듐 2원 또는 3원 합금 도금 조성물, 이를 이용한 도금방법 및 도금체
JPH07278870A (ja) * 1994-04-08 1995-10-24 Kojima Kagaku Yakuhin Kk パラジウムめっき液
US5976344A (en) * 1996-05-10 1999-11-02 Lucent Technologies Inc. Composition for electroplating palladium alloys and electroplating process using that composition
JP3685276B2 (ja) * 1996-07-01 2005-08-17 日本エレクトロプレイテイング・エンジニヤース株式会社 パラジウム・銀合金めっき浴
FR2807422B1 (fr) * 2000-04-06 2002-07-05 Engelhard Clal Sas Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot de palladium ou d'un de ses alliages

Also Published As

Publication number Publication date
JP4790191B2 (ja) 2011-10-12
DE60102364T2 (de) 2005-03-17
EP1272691A1 (fr) 2003-01-08
ES2220757T3 (es) 2004-12-16
FR2807450A1 (fr) 2001-10-12
US6743346B2 (en) 2004-06-01
ATE262055T1 (de) 2004-04-15
EP1272691B1 (fr) 2004-03-17
CN1430683A (zh) 2003-07-16
JP2003530486A (ja) 2003-10-14
CN1190522C (zh) 2005-02-23
AU2001248465A1 (en) 2001-10-23
DE60102364D1 (de) 2004-04-22
US20030183533A1 (en) 2003-10-02
WO2001077417A1 (fr) 2001-10-18

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Effective date: 20051230