FR2802934B1 - Polymeres de revetement anti-reflichissant organiques et leur preparation - Google Patents

Polymeres de revetement anti-reflichissant organiques et leur preparation

Info

Publication number
FR2802934B1
FR2802934B1 FR0016959A FR0016959A FR2802934B1 FR 2802934 B1 FR2802934 B1 FR 2802934B1 FR 0016959 A FR0016959 A FR 0016959A FR 0016959 A FR0016959 A FR 0016959A FR 2802934 B1 FR2802934 B1 FR 2802934B1
Authority
FR
France
Prior art keywords
preparation
reflective coating
organic anti
coating polymers
polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0016959A
Other languages
English (en)
Other versions
FR2802934A1 (fr
Inventor
Sung Eun Hong
Min Ho Jung
Ki Ho Baik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Publication of FR2802934A1 publication Critical patent/FR2802934A1/fr
Application granted granted Critical
Publication of FR2802934B1 publication Critical patent/FR2802934B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/12—Esters of monohydric alcohols or phenols
    • C08F120/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F120/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
FR0016959A 1999-12-23 2000-12-22 Polymeres de revetement anti-reflichissant organiques et leur preparation Expired - Fee Related FR2802934B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019990061342A KR100355604B1 (ko) 1999-12-23 1999-12-23 난반사 방지막용 중합체와 그 제조방법

Publications (2)

Publication Number Publication Date
FR2802934A1 FR2802934A1 (fr) 2001-06-29
FR2802934B1 true FR2802934B1 (fr) 2003-02-14

Family

ID=19628985

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0016959A Expired - Fee Related FR2802934B1 (fr) 1999-12-23 2000-12-22 Polymeres de revetement anti-reflichissant organiques et leur preparation

Country Status (7)

Country Link
US (1) US6395397B2 (fr)
JP (1) JP3931036B2 (fr)
KR (1) KR100355604B1 (fr)
CN (1) CN1194022C (fr)
FR (1) FR2802934B1 (fr)
GB (1) GB2357512B (fr)
TW (1) TWI268938B (fr)

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KR100427440B1 (ko) * 1999-12-23 2004-04-17 주식회사 하이닉스반도체 유기 반사방지 화합물 및 그의 제조방법
US7309560B2 (en) * 2002-02-19 2007-12-18 Nissan Chemical Industries, Ltd. Composition for forming anti-reflective coating
KR100479686B1 (ko) * 2002-02-25 2005-03-30 한국과학기술연구원 Ｎ-히드록시페닐말레이미드 함유 내열성 고분자, 및 이를 포함하는 반사 방지막 조성물과 반사 방지막
TWI291726B (en) * 2002-10-25 2007-12-21 Nanya Technology Corp Process for etching metal layer
KR100832247B1 (ko) * 2002-11-27 2008-05-28 주식회사 동진쎄미켐 유기 난반사 방지막 조성물 및 이를 이용한 패턴 형성방법
EP1617289A4 (fr) 2003-04-02 2009-12-16 Nissan Chemical Ind Ltd Composition pour la formation d'un film de support pour la lithographie contenant un compose epoxydique et un compose d'acide carboxylique
TWI240302B (en) * 2003-04-08 2005-09-21 Nanya Technology Corp Method for increasing adhesion of rework photoresist on oxynitride film
US7368173B2 (en) * 2003-05-23 2008-05-06 Dow Corning Corporation Siloxane resin-based anti-reflective coating composition having high wet etch rate
KR100574490B1 (ko) * 2004-04-27 2006-04-27 주식회사 하이닉스반도체 상부 반사방지막 중합체, 이의 제조방법 및 이를 함유하는상부 반사방지막 조성물
KR100574491B1 (ko) * 2004-04-27 2006-04-27 주식회사 하이닉스반도체 상부 반사방지막 중합체, 이의 제조방법 및 이를 함유하는상부 반사방지막 조성물
CN100503756C (zh) * 2004-05-18 2009-06-24 罗姆及海斯电子材料有限公司 与上涂光致抗蚀剂一起使用的涂料组合物
KR100598176B1 (ko) 2004-07-06 2006-07-10 주식회사 하이닉스반도체 상부 반사방지막 중합체, 이의 제조방법 및 이를 함유하는상부 반사방지막 조성물
US7756384B2 (en) * 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
EP1819844B1 (fr) 2004-12-17 2008-07-09 Dow Corning Corporation Procede pour former un revetement anti-reflechissant
US7307053B2 (en) * 2005-12-20 2007-12-11 S.C. Johnson & Son, Inc. Combination air sanitizer, soft surface deodorizer/sanitizer and hard surface disinfectant
JP4881396B2 (ja) 2006-02-13 2012-02-22 ダウ・コーニング・コーポレイション 反射防止膜材料
US8409783B2 (en) * 2007-09-28 2013-04-02 Tokyo Ohka Kogyo Co., Ltd. Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer
JP5587791B2 (ja) 2008-01-08 2014-09-10 東レ・ダウコーニング株式会社 シルセスキオキサン樹脂
JP2011510133A (ja) * 2008-01-15 2011-03-31 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
EP2250213B1 (fr) * 2008-03-04 2013-08-21 Dow Corning Corporation Résines silsesquioxane
US8241707B2 (en) * 2008-03-05 2012-08-14 Dow Corning Corporation Silsesquioxane resins
WO2010068337A1 (fr) * 2008-12-10 2010-06-17 Dow Corning Corporation Revêtements antiréfléchissants gravables par voie humide
KR101690159B1 (ko) * 2008-12-10 2016-12-27 다우 코닝 코포레이션 변환가능한 반사방지 코팅
CN102245674B (zh) 2008-12-10 2014-12-10 陶氏康宁公司 倍半硅氧烷树脂
KR102662122B1 (ko) * 2016-06-01 2024-04-30 주식회사 동진쎄미켐 네거티브 톤 현상 공정에 이용되는 유기 반사방지막 형성용 조성물
EP4192808A1 (fr) * 2020-08-10 2023-06-14 Benjamin Moore & Co. Monomères biologiques et polymères fabriqués à partir de ceux-ci

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DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
JPS5815514A (ja) * 1981-07-21 1983-01-28 Dainippon Ink & Chem Inc 被覆用樹脂組成物
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DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
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JP2740837B2 (ja) 1987-01-30 1998-04-15 コニカ株式会社 多色転写画像形成方法
JP2547884B2 (ja) * 1990-04-06 1996-10-23 タムラ化研株式会社 感光性樹脂組成物
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KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법

Also Published As

Publication number Publication date
KR20010057923A (ko) 2001-07-05
JP3931036B2 (ja) 2007-06-13
GB2357512A (en) 2001-06-27
KR100355604B1 (ko) 2002-10-12
US20020009595A1 (en) 2002-01-24
TWI268938B (en) 2006-12-21
CN1300790A (zh) 2001-06-27
CN1194022C (zh) 2005-03-23
FR2802934A1 (fr) 2001-06-29
JP2001194799A (ja) 2001-07-19
GB2357512B (en) 2003-04-02
US6395397B2 (en) 2002-05-28
GB0031421D0 (en) 2001-02-07

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20100831