FR2789519B1 - Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor - Google Patents

Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor

Info

Publication number
FR2789519B1
FR2789519B1 FR9901369A FR9901369A FR2789519B1 FR 2789519 B1 FR2789519 B1 FR 2789519B1 FR 9901369 A FR9901369 A FR 9901369A FR 9901369 A FR9901369 A FR 9901369A FR 2789519 B1 FR2789519 B1 FR 2789519B1
Authority
FR
France
Prior art keywords
transistor
making
threshold voltage
current limiter
dynamic threshold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9901369A
Other languages
English (en)
Other versions
FR2789519A1 (fr
Inventor
Jean Luc Pelloie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR9901369A priority Critical patent/FR2789519B1/fr
Priority to JP2000597843A priority patent/JP2002536833A/ja
Priority to EP00901716A priority patent/EP1153435A1/fr
Priority to PCT/FR2000/000268 priority patent/WO2000046858A1/fr
Priority to US09/890,120 priority patent/US6787850B1/en
Publication of FR2789519A1 publication Critical patent/FR2789519A1/fr
Application granted granted Critical
Publication of FR2789519B1 publication Critical patent/FR2789519B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/903—FET configuration adapted for use as static memory cell
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/903—FET configuration adapted for use as static memory cell
    • Y10S257/904—FET configuration adapted for use as static memory cell with passive components,, e.g. polysilicon resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
FR9901369A 1999-02-05 1999-02-05 Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor Expired - Fee Related FR2789519B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR9901369A FR2789519B1 (fr) 1999-02-05 1999-02-05 Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor
JP2000597843A JP2002536833A (ja) 1999-02-05 2000-02-04 電流リミッタを備えたダイナミックしきい値電圧ｍｏｓトランジスタ、およびその製造方法
EP00901716A EP1153435A1 (fr) 1999-02-05 2000-02-04 Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor
PCT/FR2000/000268 WO2000046858A1 (fr) 1999-02-05 2000-02-04 Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor
US09/890,120 US6787850B1 (en) 1999-02-05 2000-02-04 Dynamic threshold voltage MOS transistor fitted with a current limiter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9901369A FR2789519B1 (fr) 1999-02-05 1999-02-05 Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor

Publications (2)

Publication Number Publication Date
FR2789519A1 FR2789519A1 (fr) 2000-08-11
FR2789519B1 true FR2789519B1 (fr) 2003-03-28

Family

ID=9541657

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9901369A Expired - Fee Related FR2789519B1 (fr) 1999-02-05 1999-02-05 Transistor mos a tension de seuil dynamique equipe d'un limiteur de courant, et procede de realisation d'un tel transistor

Country Status (5)

Country Link
US (1) US6787850B1 (fr)
EP (1) EP1153435A1 (fr)
JP (1) JP2002536833A (fr)
FR (1) FR2789519B1 (fr)
WO (1) WO2000046858A1 (fr)

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JP2002134746A (ja) * 2000-10-30 2002-05-10 Toshiba Corp 半導体装置及びその製造方法
JP3845272B2 (ja) * 2001-06-19 2006-11-15 シャープ株式会社 Ｓｒａｍ及びその製造方法
JP2003332582A (ja) * 2002-05-13 2003-11-21 Toshiba Corp 半導体装置及びその製造方法
US20050208857A1 (en) * 2004-03-19 2005-09-22 Nike, Inc. Article of apparel incorporating a modifiable textile structure
US8247840B2 (en) * 2004-07-07 2012-08-21 Semi Solutions, Llc Apparatus and method for improved leakage current of silicon on insulator transistors using a forward biased diode
US7375402B2 (en) * 2004-07-07 2008-05-20 Semi Solutions, Llc Method and apparatus for increasing stability of MOS memory cells
US7224205B2 (en) * 2004-07-07 2007-05-29 Semi Solutions, Llc Apparatus and method for improving drive-strength and leakage of deep submicron MOS transistors
US7683433B2 (en) * 2004-07-07 2010-03-23 Semi Solution, Llc Apparatus and method for improving drive-strength and leakage of deep submicron MOS transistors
US7651905B2 (en) * 2005-01-12 2010-01-26 Semi Solutions, Llc Apparatus and method for reducing gate leakage in deep sub-micron MOS transistors using semi-rectifying contacts
WO2006072094A2 (fr) 2004-12-29 2006-07-06 Semi Solutions Llc. Appareil et procede destines a ameliorer la resistance d'attaque, la fuite et la stabilite de transistors mos submicroniques profonds et de cellules de memoire
US7898297B2 (en) * 2005-01-04 2011-03-01 Semi Solution, Llc Method and apparatus for dynamic threshold voltage control of MOS transistors in dynamic logic circuits
US7863689B2 (en) * 2006-09-19 2011-01-04 Semi Solutions, Llc. Apparatus for using a well current source to effect a dynamic threshold voltage of a MOS transistor
US7923840B2 (en) * 2007-01-10 2011-04-12 International Business Machines Corporation Electrically conductive path forming below barrier oxide layer and integrated circuit
US8207784B2 (en) * 2008-02-12 2012-06-26 Semi Solutions, Llc Method and apparatus for MOSFET drain-source leakage reduction
US7960229B2 (en) * 2008-04-10 2011-06-14 Globalfoundries Inc. Metal oxide semiconductor transistor with reduced gate height, and related fabrication methods
TWI494673B (zh) * 2012-09-21 2015-08-01 Innocom Tech Shenzhen Co Ltd 顯示裝置
CN105280715B (zh) * 2015-11-30 2018-05-08 上海华虹宏力半导体制造有限公司 Soi体接触器件结构
FR3048288B1 (fr) 2016-02-25 2018-03-23 Stmicroelectronics (Crolles 2) Sas Detecteur electronique integre de variations de potentiel a haute sensibilite
KR102395616B1 (ko) * 2016-10-10 2022-05-09 어플라이드 머티어리얼스, 인코포레이티드 화학적 기계적 연마를 위한 실시간 프로파일 제어

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US4228447A (en) * 1979-02-12 1980-10-14 Tektronix, Inc. Submicron channel length MOS inverter with depletion-mode load transistor
JPS58151062A (ja) * 1982-01-28 1983-09-08 Toshiba Corp 半導体装置
US4906587A (en) * 1988-07-29 1990-03-06 Texas Instruments Incorporated Making a silicon-on-insulator transistor with selectable body node to source node connection
JPH04241466A (ja) * 1991-01-16 1992-08-28 Casio Comput Co Ltd 電界効果型トランジスタ
US5451798A (en) * 1993-03-18 1995-09-19 Canon Kabushiki Kaisha Semiconductor device and its fabrication method
US5559368A (en) * 1994-08-30 1996-09-24 The Regents Of The University Of California Dynamic threshold voltage mosfet having gate to body connection for ultra-low voltage operation
JP3463269B2 (ja) * 1995-04-21 2003-11-05 日本電信電話株式会社 Ｍｏｓｆｅｔ回路
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JPH09252125A (ja) * 1996-03-15 1997-09-22 Toshiba Corp 半導体装置
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KR100451381B1 (ko) * 1998-07-30 2005-06-01 엘지.필립스 엘시디 주식회사 박막트랜지스터및그제조방법
US6015993A (en) * 1998-08-31 2000-01-18 International Business Machines Corporation Semiconductor diode with depleted polysilicon gate structure and method
US6100564A (en) * 1998-09-30 2000-08-08 International Business Machines Corporation SOI pass-gate disturb solution
JP3408762B2 (ja) * 1998-12-03 2003-05-19 シャープ株式会社 Ｓｏｉ構造の半導体装置及びその製造方法

Also Published As

Publication number Publication date
US6787850B1 (en) 2004-09-07
EP1153435A1 (fr) 2001-11-14
FR2789519A1 (fr) 2000-08-11
JP2002536833A (ja) 2002-10-29
WO2000046858A1 (fr) 2000-08-10

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Effective date: 20121031