FR2781917B1 - Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee - Google Patents

Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee

Info

Publication number
FR2781917B1
FR2781917B1 FR9809642A FR9809642A FR2781917B1 FR 2781917 B1 FR2781917 B1 FR 2781917B1 FR 9809642 A FR9809642 A FR 9809642A FR 9809642 A FR9809642 A FR 9809642A FR 2781917 B1 FR2781917 B1 FR 2781917B1
Authority
FR
France
Prior art keywords
magnetic heads
carrying surface
integrated magnetic
specified height
collective realization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9809642A
Other languages
English (en)
Other versions
FR2781917A1 (fr
Inventor
Jean Baptiste Albertini
Gerard Barrois
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR9809642A priority Critical patent/FR2781917B1/fr
Priority to EP99932978A priority patent/EP1018111A1/fr
Priority to US09/508,505 priority patent/US6658723B1/en
Priority to JP2000562896A priority patent/JP2002521783A/ja
Priority to PCT/FR1999/001838 priority patent/WO2000007179A1/fr
Publication of FR2781917A1 publication Critical patent/FR2781917A1/fr
Application granted granted Critical
Publication of FR2781917B1 publication Critical patent/FR2781917B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • G11B5/3106Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3116Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • Y10T29/49021Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032Fabricating head structure or component thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • Y10T29/49021Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032Fabricating head structure or component thereof
    • Y10T29/49036Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49041Fabricating head structure or component thereof including measuring or testing with significant slider/housing shaping or treating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • Y10T29/49021Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032Fabricating head structure or component thereof
    • Y10T29/49036Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043Depositing magnetic layer or coating
    • Y10T29/49046Depositing magnetic layer or coating with etching or machining of magnetic material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • Y10T29/49021Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032Fabricating head structure or component thereof
    • Y10T29/49048Machining magnetic material [e.g., grinding, etching, polishing]

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
FR9809642A 1998-07-28 1998-07-28 Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee Expired - Fee Related FR2781917B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR9809642A FR2781917B1 (fr) 1998-07-28 1998-07-28 Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee
EP99932978A EP1018111A1 (fr) 1998-07-28 1999-07-27 Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee
US09/508,505 US6658723B1 (en) 1998-07-28 1999-07-27 Method for collective production of magnetic heads having a bearing surface with specific height
JP2000562896A JP2002521783A (ja) 1998-07-28 1999-07-27 所定高さとされた支持面を有した磁気ヘッドを集積化して大量生産するための方法
PCT/FR1999/001838 WO2000007179A1 (fr) 1998-07-28 1999-07-27 Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9809642A FR2781917B1 (fr) 1998-07-28 1998-07-28 Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee

Publications (2)

Publication Number Publication Date
FR2781917A1 FR2781917A1 (fr) 2000-02-04
FR2781917B1 true FR2781917B1 (fr) 2000-09-08

Family

ID=9529108

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9809642A Expired - Fee Related FR2781917B1 (fr) 1998-07-28 1998-07-28 Procede de realisation collective de tetes magnetiques integrees a surface portante de hauteur determinee

Country Status (5)

Country Link
US (1) US6658723B1 (fr)
EP (1) EP1018111A1 (fr)
JP (1) JP2002521783A (fr)
FR (1) FR2781917B1 (fr)
WO (1) WO2000007179A1 (fr)

Family Cites Families (37)

* Cited by examiner, † Cited by third party
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US4049944A (en) * 1973-02-28 1977-09-20 Hughes Aircraft Company Process for fabricating small geometry semiconductive devices including integrated components
US4334950A (en) * 1979-07-17 1982-06-15 Bell Telephone Laboratories, Incorporated Advantageous fabrication technique for devices relying on magnetic properties
US4418472A (en) * 1981-11-23 1983-12-06 Xerox Corporation Method of delineating thin film magnetic head arrays
US4437924A (en) * 1982-04-19 1984-03-20 Jerobee Industries, Inc. Method of making fine-line die
JPS6074111A (ja) * 1983-09-30 1985-04-26 Fujitsu Ltd 薄膜磁気ヘッドとその製造方法
US4552831A (en) * 1984-02-06 1985-11-12 International Business Machines Corporation Fabrication method for controlled via hole process
CA1247737A (fr) * 1984-03-16 1988-12-28 Yoshihiko Kawai Tete magnetique
JPS61227214A (ja) * 1985-03-29 1986-10-09 Sankyo Seiki Mfg Co Ltd 磁気ヘツドの製造方法
JPS62132210A (ja) * 1985-12-04 1987-06-15 Sony Corp 薄膜磁気ヘツドの製造方法
US4899434A (en) * 1987-07-28 1990-02-13 Applied Magnetics Corporation Method of making a thin film magnetic head with a leveler layer and superstrate
FR2646001B1 (fr) * 1989-04-14 1995-09-01 Europ Composants Electron Procede de realisation d'un dispositif utilisant une structure de films a couches minces
US5222006A (en) * 1989-06-16 1993-06-22 Canon Denshi Kabushiki Kaisha Magnetic head and core chip having a magnetic thin film
FR2661030B1 (fr) * 1990-04-13 1995-04-07 Thomson Csf Tete magnetique d'enregistrement/lecture et procedes de realisation.
US5156704A (en) * 1990-06-01 1992-10-20 Computer And Communications Technology Corp. Method for fabricating magnetic head air bearing sliders
FR2664729B1 (fr) * 1990-07-11 1992-09-18 Commissariat Energie Atomique Procede de fabrication de tete magnetique possedant un entrefer presentant un azimut controlable.
JPH0474305A (ja) * 1990-07-17 1992-03-09 Sony Corp 磁気ヘッド及びその製造方法
JP2971538B2 (ja) * 1990-07-30 1999-11-08 松下電器産業株式会社 薄膜磁気ヘッド
DE69111002T2 (de) * 1990-09-20 1995-11-02 Dainippon Screen Mfg Verfahren zur Herstellung von kleinen Durchgangslöchern in dünne Metallplatten.
US5174857A (en) * 1990-10-29 1992-12-29 Gold Star Co., Ltd. Slope etching process
WO1994002938A1 (fr) * 1992-07-17 1994-02-03 Ampex Systems Corporation Transducteur a tete composite en metal et ferrite et procede de fabrication correspondant
US5521781A (en) * 1992-10-30 1996-05-28 Shin-Etsu Chemical Co., Ltd. Substrate for magnetic recording medium
JP3282347B2 (ja) * 1993-09-07 2002-05-13 ソニー株式会社 エッチング法、色選別機構及びその作製方法、並びに、陰極線管
JPH07169015A (ja) * 1993-12-10 1995-07-04 Sony Corp 磁気ヘッド
FR2716996B1 (fr) * 1994-03-07 1996-04-05 Commissariat Energie Atomique Tête magnétique verticale et son procédé de réalisation.
FR2726931B1 (fr) * 1994-11-16 1996-12-06 Commissariat Energie Atomique Tete magnetique verticale a bobinage integre et son procede de realisation
JPH08203030A (ja) * 1995-01-25 1996-08-09 Sony Corp 磁気ヘッド装置及びその製造方法
DE19546985C1 (de) * 1995-12-15 1997-01-16 Thomas Scholl Herstellung eines Prophylaktikums
US5742452A (en) * 1996-01-10 1998-04-21 International Business Machines Corporation Low mass magnetic recording head and suspension
FR2745111B1 (fr) * 1996-02-15 1998-03-13 Commissariat Energie Atomique Tete magnetique verticale a bobinage integre et son procede de realisation
FR2747226B1 (fr) * 1996-04-04 1998-04-30 Commissariat Energie Atomique Procedes de realisation d'une tete magnetique double a entrefers d'azimuts opposes
US5870123A (en) * 1996-07-15 1999-02-09 Xerox Corporation Ink jet printhead with channels formed in silicon with a (110) surface orientation
JPH1098162A (ja) * 1996-09-20 1998-04-14 Hitachi Ltd 半導体集積回路装置の製造方法
US5935451A (en) * 1997-02-24 1999-08-10 Lucent Technologies Inc. Fabrication of etched features
JP3449459B2 (ja) * 1997-06-02 2003-09-22 株式会社ジャパンエナジー 薄膜形成装置用部材の製造方法および該装置用部材
US6024884A (en) * 1998-03-12 2000-02-15 Storage Technology Corporation Method for creating microstructures
US6183940B1 (en) * 1998-03-17 2001-02-06 Integrated Device Technology, Inc. Method of retaining the integrity of a photoresist pattern
US6156485A (en) * 1999-01-19 2000-12-05 Taiwan Semiconductor Manufacturing Company Ltd. Film scheme to solve high aspect ratio metal etch masking layer selectivity and improve photo I-line PR resolution capability in quarter-micron technology

Also Published As

Publication number Publication date
WO2000007179A1 (fr) 2000-02-10
FR2781917A1 (fr) 2000-02-04
JP2002521783A (ja) 2002-07-16
US6658723B1 (en) 2003-12-09
EP1018111A1 (fr) 2000-07-12

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20060331