FR2750788B1 - Installation de pulverisation en courant continu pour la formation d'un disque optique - Google Patents

Installation de pulverisation en courant continu pour la formation d'un disque optique

Info

Publication number
FR2750788B1
FR2750788B1 FR9708265A FR9708265A FR2750788B1 FR 2750788 B1 FR2750788 B1 FR 2750788B1 FR 9708265 A FR9708265 A FR 9708265A FR 9708265 A FR9708265 A FR 9708265A FR 2750788 B1 FR2750788 B1 FR 2750788B1
Authority
FR
France
Prior art keywords
forming
direct current
optical disc
spraying system
current spraying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9708265A
Other languages
English (en)
Other versions
FR2750788A1 (fr
Inventor
Etsuro Ikeda
Itaru Suzuki
Yugi Kawana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of FR2750788A1 publication Critical patent/FR2750788A1/fr
Application granted granted Critical
Publication of FR2750788B1 publication Critical patent/FR2750788B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B2220/00—Record carriers by type
    • G11B2220/20—Disc-shaped record carriers
    • G11B2220/25—Disc-shaped record carriers characterised in that the disc is based on a specific recording technology
    • G11B2220/2537—Optical discs

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
FR9708265A 1996-07-02 1997-07-01 Installation de pulverisation en courant continu pour la formation d'un disque optique Expired - Fee Related FR2750788B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8172386A JPH1021586A (ja) 1996-07-02 1996-07-02 Ｄｃスパッタリング装置

Publications (2)

Publication Number Publication Date
FR2750788A1 FR2750788A1 (fr) 1998-01-09
FR2750788B1 true FR2750788B1 (fr) 1999-11-26

Family

ID=15940968

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9708265A Expired - Fee Related FR2750788B1 (fr) 1996-07-02 1997-07-01 Installation de pulverisation en courant continu pour la formation d'un disque optique

Country Status (4)

Country Link
US (1) US6022462A (fr)
JP (1) JPH1021586A (fr)
KR (1) KR980011183A (fr)
FR (1) FR2750788B1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6686597B2 (en) * 2000-09-04 2004-02-03 Pioneer Corporation Substrate rotating device, and manufacturing method and apparatus of recording medium master
JP4707271B2 (ja) * 2001-06-29 2011-06-22 三洋電機株式会社 エレクトロルミネッセンス素子の製造方法
JP2005042133A (ja) * 2003-07-22 2005-02-17 Seiko Epson Corp 蒸着マスク及びその製造方法、表示装置及びその製造方法、表示装置を備えた電子機器
JP3841106B1 (ja) * 2005-03-28 2006-11-01 ダイキン工業株式会社 生体侵襲反応低減方法、物質改質装置及び空気調和機
JP5129234B2 (ja) * 2007-03-06 2013-01-30 芝浦メカトロニクス株式会社 プラズマ処理装置
US8557093B2 (en) * 2007-03-22 2013-10-15 Sunpower Corporation Deposition system with electrically isolated pallet and anode assemblies
US9613784B2 (en) 2008-07-17 2017-04-04 Mks Instruments, Inc. Sputtering system and method including an arc detection
DE102009048341A1 (de) * 2009-06-06 2011-01-27 Von Ardenne Anlagentechnik Gmbh Substratträger für Sputterbeschichtungsanlage
CN103014647A (zh) * 2011-09-22 2013-04-03 吉富新能源科技(上海)有限公司 一种光伏玻璃溅镀无效边遮蔽装置
US11251019B2 (en) 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
JP6863199B2 (ja) 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3382791T2 (de) * 1982-12-15 1995-12-07 Sharp Kk Magneto-optischer Speicher.
FR2566808B1 (fr) * 1984-06-27 1986-09-19 Mircea Andrei Procede et reacteur de croissance epitaxiale en phase vapeur
JPS61201443A (ja) * 1985-03-04 1986-09-06 Hitachi Ltd 真空処理装置
US4756811A (en) * 1985-09-30 1988-07-12 Kabushiki Kaisha Toshiba Method for manufacturing bubble-mode optical recording media
JPS62116761A (ja) * 1985-11-15 1987-05-28 Sanyo Electric Co Ltd マスキング装置
JPS62136238A (ja) * 1985-12-10 1987-06-19 Mitsubishi Electric Corp スパツタリング装置
JPH0733574B2 (ja) * 1987-07-10 1995-04-12 セイコーエプソン株式会社 薄膜の製造装置における基板保持機構
DE3805380C2 (de) * 1988-02-20 1995-11-30 Leybold Ag Vorrichtung zum Herstellen von Schichten mit gleichmäßigem Dickenprofil auf Substraten durch Kathodenzerstäubung
JPH01298162A (ja) * 1988-05-26 1989-12-01 Nec Corp 光ディスク用スパッタ治具
JPH01298161A (ja) * 1988-05-26 1989-12-01 Nec Corp 光ディスク用スパッタ治具
JPH0280568A (ja) * 1988-09-16 1990-03-20 Seiko Epson Corp 薄膜製造装置における基板保持機構
JPH03191061A (ja) * 1989-12-20 1991-08-21 Mitsubishi Electric Corp 成膜用治具
JPH03201713A (ja) * 1989-12-28 1991-09-03 Clarion Co Ltd 圧電膜製造装置
JP2955112B2 (ja) * 1992-03-13 1999-10-04 シャープ株式会社 光磁気記憶媒体
DE9206635U1 (de) * 1992-05-15 1992-09-10 Balzers und Leybold Deutschland Holding AG, 63450 Hanau Vorrichtung zum Halten von Substraten
JPH05320900A (ja) * 1992-05-21 1993-12-07 Ricoh Co Ltd 基板保持体及び基板保持方法
EP0592174B1 (fr) * 1992-10-05 2001-09-05 Canon Kabushiki Kaisha Procédé de fabrication d'un support d'enregistrement optique, méthode de pulvérisation
DE9306789U1 (de) * 1993-05-05 1993-07-08 Hoechst Ag, 6230 Frankfurt Trägerpalette für Substrate von optischen Speichermedien
JPH0845121A (ja) * 1994-07-28 1996-02-16 Sony Corp スパッタリング装置
JPH08273207A (ja) * 1995-01-31 1996-10-18 Canon Inc 光情報記録媒体搬送用キヤリア、該キヤリアを用いた光情報記録媒体の製造方法及び製造装置

Also Published As

Publication number Publication date
KR980011183A (ko) 1998-04-30
FR2750788A1 (fr) 1998-01-09
US6022462A (en) 2000-02-08
JPH1021586A (ja) 1998-01-23

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Legal Events

Date Code Title Description
ST Notification of lapse