FR2451615A1 - Memoire a semi-conducteurs comportant des cellules a un transistor realisees suivant la technologie v-mos - Google Patents

Memoire a semi-conducteurs comportant des cellules a un transistor realisees suivant la technologie v-mos

Info

Publication number
FR2451615A1
FR2451615A1 FR8005046A FR8005046A FR2451615A1 FR 2451615 A1 FR2451615 A1 FR 2451615A1 FR 8005046 A FR8005046 A FR 8005046A FR 8005046 A FR8005046 A FR 8005046A FR 2451615 A1 FR2451615 A1 FR 2451615A1
Authority
FR
France
Prior art keywords
zones
semiconductor memory
mos technology
cells
buried
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR8005046A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2451615A1 publication Critical patent/FR2451615A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0847Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/34DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the transistor being at least partially in a trench in the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

MEMOIRE A SEMI-CONDUCTEURS COMPORTANT DES CELLULES A UN TRANSISTOR REALISEES SUIVANT LA TECHNOLOGIE V-MOS. DANS CETTE MEMOIRE COMPORTANT DES ZONES ENSEVELIES PREVUES SELON UNE SUCCESSION DE COUCHES CONSTITUEES PAR UN SUBSTRAT SEMI-CONDUCTEUR 1, UNE COUCHE EPITAXIALE 3 ET UNE ZONE ENSEVELIE 2 ET DES SILLONS 5 EN FORME DE V, LES ZONES ENSEVELIES 2 FORMANT DES CONDUCTEURS DE BITS ET DES ZONES D'UN TYPE DE CONDUCTIVITE OPPOSE DANS LA COUCHE 3, ENGLOBENT POUR CHAQUE CELLULE DE MEMOIRE, DES ZONES PARTIELLES 34-1, 34-2 SEPAREES PAR LE SILLON 5 FORMANT DES CAPACITES PARTIELLES BRANCHEES EN PARALLELE DES CELLULES DE MEMOIRE. APPLICATION NOTAMMENT AUX MEMOIRES A DES CELLULES A UN TRANSISTOR.
FR8005046A 1979-03-13 1980-03-06 Memoire a semi-conducteurs comportant des cellules a un transistor realisees suivant la technologie v-mos Withdrawn FR2451615A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792909820 DE2909820A1 (de) 1979-03-13 1979-03-13 Halbleiterspeicher mit eintransistorzellen in v-mos-technologie

Publications (1)

Publication Number Publication Date
FR2451615A1 true FR2451615A1 (fr) 1980-10-10

Family

ID=6065259

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8005046A Withdrawn FR2451615A1 (fr) 1979-03-13 1980-03-06 Memoire a semi-conducteurs comportant des cellules a un transistor realisees suivant la technologie v-mos

Country Status (4)

Country Link
JP (1) JPS55125668A (fr)
DE (1) DE2909820A1 (fr)
FR (1) FR2451615A1 (fr)
GB (1) GB2044997A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59161860A (ja) * 1983-03-07 1984-09-12 Hitachi Ltd 半導体メモリ装置
JPS60257560A (ja) * 1984-06-04 1985-12-19 Mitsubishi Electric Corp 半導体メモリ装置
US4651183A (en) * 1984-06-28 1987-03-17 International Business Machines Corporation High density one device memory cell arrays
JPH0793365B2 (ja) * 1984-09-11 1995-10-09 株式会社東芝 半導体記憶装置およびその製造方法
US5204281A (en) * 1990-09-04 1993-04-20 Motorola, Inc. Method of making dynamic random access memory cell having a trench capacitor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4003036A (en) * 1975-10-23 1977-01-11 American Micro-Systems, Inc. Single IGFET memory cell with buried storage element
FR2379134A1 (fr) * 1977-01-31 1978-08-25 Siemens Ag Memoire a semi-conducteurs
GB2011175A (en) * 1977-12-27 1979-07-04 American Micro Syst Improvements in or relating to a semiconductor device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4003036A (en) * 1975-10-23 1977-01-11 American Micro-Systems, Inc. Single IGFET memory cell with buried storage element
FR2379134A1 (fr) * 1977-01-31 1978-08-25 Siemens Ag Memoire a semi-conducteurs
GB2011175A (en) * 1977-12-27 1979-07-04 American Micro Syst Improvements in or relating to a semiconductor device
FR2413789A1 (fr) * 1977-12-27 1979-07-27 American Micro Syst Dispositif de memoire a semi-conducteurs

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/77 *
EXBK/78 *

Also Published As

Publication number Publication date
JPS55125668A (en) 1980-09-27
DE2909820A1 (de) 1980-09-18
GB2044997A (en) 1980-10-22

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