FR2420194A1 - Films magnetiques minces amorphes a axe facile stable et leur procede de fabrication - Google Patents
Films magnetiques minces amorphes a axe facile stable et leur procede de fabricationInfo
- Publication number
- FR2420194A1 FR2420194A1 FR7903174A FR7903174A FR2420194A1 FR 2420194 A1 FR2420194 A1 FR 2420194A1 FR 7903174 A FR7903174 A FR 7903174A FR 7903174 A FR7903174 A FR 7903174A FR 2420194 A1 FR2420194 A1 FR 2420194A1
- Authority
- FR
- France
- Prior art keywords
- manufacturing process
- films
- amorphic
- magnetic films
- thin magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/584—Non-reactive treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/132—Amorphous metallic alloys, e.g. glassy metals containing cobalt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Films minces magnétiques amorphes à perméabilité élevée et à axe magnétique facile stable, ainsi que leur procédé de fabrication. Les films selon l'invention sont obtenus par dépôt d'un alliage comprenant un métal de transition choisi parmi le Fe, Co, Ni et un élément choisi parmi Si et B. Les films ainsi obtenus sont recuits sous gaz inerte, à une température inférieure à la température de Curie et inférieure à la température de cristallisation de l'alliage, pendant un intervalle de temps suffisant pour assurer un haut degré de stabilisation de la direction d'anisotropie magnétique dans le plan du film. La température de recuit et l'intervalle de temps varient conformément à la relation d'Arrhénius. La figure montre un exemple de courbe d'hystérésis d'un film selon l'invention.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/886,020 US4236946A (en) | 1978-03-13 | 1978-03-13 | Amorphous magnetic thin films with highly stable easy axis |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2420194A1 true FR2420194A1 (fr) | 1979-10-12 |
FR2420194B1 FR2420194B1 (fr) | 1982-10-15 |
Family
ID=25388204
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7903174A Granted FR2420194A1 (fr) | 1978-03-13 | 1979-02-01 | Films magnetiques minces amorphes a axe facile stable et leur procede de fabrication |
Country Status (5)
Country | Link |
---|---|
US (1) | US4236946A (fr) |
JP (1) | JPS6032335B2 (fr) |
DE (1) | DE2908972A1 (fr) |
FR (1) | FR2420194A1 (fr) |
GB (1) | GB2016528B (fr) |
Families Citing this family (74)
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JPS54135357A (en) * | 1978-04-12 | 1979-10-20 | Tdk Electronics Co Ltd | Variable inductor |
US4271232A (en) * | 1978-08-28 | 1981-06-02 | International Business Machines Corporation | Amorphous magnetic film |
JPS5571006A (en) * | 1978-11-22 | 1980-05-28 | Matsushita Electric Ind Co Ltd | Magnetic thin film and its manufacturing method |
JPS565962A (en) * | 1979-06-27 | 1981-01-22 | Sony Corp | Manufacture of amorphous magnetic alloy |
JPS5779157A (en) * | 1980-10-31 | 1982-05-18 | Sony Corp | Manufacture of amorphous magnetic alloy |
GB2095699A (en) * | 1981-03-25 | 1982-10-06 | Nat Res Dev | Magnetic metallic glass alloy |
US4402745A (en) * | 1981-04-27 | 1983-09-06 | Marko Materials, Inc. | New iron-aluminum-copper alloys which contain boron and have been processed by rapid solidification process and method |
US4405368A (en) * | 1981-05-07 | 1983-09-20 | Marko Materials, Inc. | Iron-aluminum alloys containing boron which have been processed by rapid solidification process and method |
US4650725A (en) * | 1981-07-22 | 1987-03-17 | Allied Corporation | Homogeneous, ductile cobalt based hardfacing foils |
JPH06104870B2 (ja) * | 1981-08-11 | 1994-12-21 | 株式会社日立製作所 | 非晶質薄膜の製造方法 |
US4645715A (en) * | 1981-09-23 | 1987-02-24 | Energy Conversion Devices, Inc. | Coating composition and method |
US4578728A (en) * | 1981-12-09 | 1986-03-25 | Matsushita Electric Industrial Co., Ltd. | Magnetic head |
JPS58120759A (ja) * | 1982-01-08 | 1983-07-18 | Toshiba Corp | 磁気ヘツド用非晶質合金 |
JPS58153308A (ja) * | 1982-03-08 | 1983-09-12 | Nec Corp | 非晶質軟磁性薄膜パタ−ンの製造方法 |
US4450206A (en) * | 1982-05-27 | 1984-05-22 | Allegheny Ludlum Steel Corporation | Amorphous metals and articles made thereof |
US4501316A (en) * | 1982-05-27 | 1985-02-26 | Allegheny Ludlum Steel Corporation | Method of casting amorphous metals |
US4483724A (en) * | 1982-09-27 | 1984-11-20 | Allied Corporation | Iron-boron solid solution alloys having high saturation magnetization and low magnetostriction |
CA1214660A (fr) * | 1982-09-30 | 1986-12-02 | Koichiro Inomata | Dynamometre, et sa fabrication |
JPS59179748A (ja) * | 1983-03-31 | 1984-10-12 | Toshiba Corp | 磁気ヘツド用非晶質合金 |
JPS6044383B2 (ja) * | 1983-07-26 | 1985-10-03 | 株式会社東芝 | 磁気ヘツド用非晶質合金 |
US5284528A (en) * | 1983-05-23 | 1994-02-08 | Allied-Signal Inc. | Metallic glasses having a combination of high permeability, low coercivity, low ac core loss, low exciting power and high thermal stability |
US5110378A (en) * | 1988-08-17 | 1992-05-05 | Allied-Signal Inc. | Metallic glasses having a combination of high permeability, low coercivity, low ac core loss, low exciting power and high thermal stability |
DE3323196A1 (de) * | 1983-06-28 | 1985-01-03 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Loetbare haftende schicht |
KR890003043B1 (ko) * | 1983-07-16 | 1989-08-19 | 알프스덴기 가부시기 가이샤 | 자기헤드 |
US4762755A (en) * | 1983-11-02 | 1988-08-09 | Hitachi, Ltd. | Ferromagnetic material and a magnetic head using the same material |
JPS60174844A (ja) * | 1984-02-21 | 1985-09-09 | Aisin Seiki Co Ltd | ひずみゲ−ジ材料用非晶質合金 |
US4816127A (en) * | 1984-11-15 | 1989-03-28 | Xidex Corporation | Method of producing thin-film storage disk |
NL8403595A (nl) * | 1984-11-27 | 1986-06-16 | Philips Nv | Magneetkop met kerndelen van amorf ferromagnetisch metaal. |
JPS61174784A (ja) * | 1985-01-30 | 1986-08-06 | Hitachi Metals Ltd | 積層型磁歪振動子およびその製造方法 |
US4663009A (en) * | 1985-02-08 | 1987-05-05 | Hewlett-Packard Company | System and method for depositing plural thin film layers on a substrate |
JPS61217925A (ja) * | 1985-03-23 | 1986-09-27 | Victor Co Of Japan Ltd | 磁気記録媒体 |
US5082747A (en) * | 1985-11-12 | 1992-01-21 | Hedgcoth Virgle L | Magnetic recording disk and sputtering process and apparatus for producing same |
US4894133A (en) * | 1985-11-12 | 1990-01-16 | Virgle L. Hedgcoth | Method and apparatus making magnetic recording disk |
US4823113A (en) * | 1986-02-27 | 1989-04-18 | Allied-Signal Inc. | Glassy alloy identification marker |
JPH0834154B2 (ja) * | 1986-11-06 | 1996-03-29 | ソニー株式会社 | 軟磁性薄膜 |
US4834814A (en) * | 1987-01-12 | 1989-05-30 | Allied-Signal Inc. | Metallic glasses having a combination of high permeability, low coercivity, low AC core loss, low exciting power and high thermal stability |
EP0303324A1 (fr) * | 1987-08-10 | 1989-02-15 | Koninklijke Philips Electronics N.V. | Matériau magnétique, son procédé de fabrication et tête magnétique munie de ce matériau |
KR910009974B1 (ko) * | 1988-01-14 | 1991-12-07 | 알프스 덴기 가부시기가이샤 | 고포화 자속밀도 합금 |
JP2674131B2 (ja) * | 1988-09-09 | 1997-11-12 | ソニー株式会社 | 磁性薄膜 |
JP2643227B2 (ja) * | 1988-02-22 | 1997-08-20 | ソニー株式会社 | 磁性薄膜 |
US4994320A (en) * | 1988-06-08 | 1991-02-19 | Eastman Kodak Company | Thin magnetic film having long term stabilized uniaxial anisotropy |
US4995923A (en) * | 1988-10-17 | 1991-02-26 | Mitsui Petrochemical Industries, Ltd. | Thin film of amorphous alloy |
NL8802873A (nl) * | 1988-11-22 | 1990-06-18 | Philips Nv | Zachtmagnetische multilaagfilm en magneetkop voorzien van een dergelijke zachtmagnetische multilaagfilm. |
EP0422760A1 (fr) * | 1989-10-12 | 1991-04-17 | Mitsubishi Rayon Co., Ltd | Alliage amorphe et procédé pour sa fabrication |
JPH03242983A (ja) * | 1990-02-06 | 1991-10-29 | Internatl Business Mach Corp <Ibm> | 磁気構造体の製造方法 |
JPH04218905A (ja) * | 1990-03-23 | 1992-08-10 | Unitika Ltd | 薄膜状磁性材料及びその製造方法 |
JP2742631B2 (ja) * | 1990-07-24 | 1998-04-22 | トヨタ自動車株式会社 | 非晶質磁性膜の製造方法 |
US5057200A (en) * | 1990-08-15 | 1991-10-15 | Hmt Technology Corporation | Method of forming thin-film recording medium |
US5492775A (en) * | 1993-05-28 | 1996-02-20 | International Business Machines Corporation | Barium ferrite thin film for longitudinal recording |
US5949334A (en) * | 1995-10-02 | 1999-09-07 | Sensormatic Electronics Corporation | Magnetostrictive element having optimized bias-field-dependent resonant frequency characteristic |
US6018296A (en) * | 1997-07-09 | 2000-01-25 | Vacuumschmelze Gmbh | Amorphous magnetostrictive alloy with low cobalt content and method for annealing same |
DE19940458A1 (de) * | 1999-08-25 | 2001-03-01 | Nanogate Gmbh | Verfahren zur Veränderung von Beschichtungsmaterialien |
WO2002016663A1 (fr) * | 2000-08-21 | 2002-02-28 | Citizen Watch Co., Ltd. | Métal mou, procédé de fabrication dudit métal mou, pièce décorative et procédé de fabrication de ladite pièce décorative |
US6689234B2 (en) | 2000-11-09 | 2004-02-10 | Bechtel Bwxt Idaho, Llc | Method of producing metallic materials |
JP3836696B2 (ja) * | 2001-08-31 | 2006-10-25 | 株式会社東芝 | 半導体製造システムおよび半導体装置の製造方法 |
US7262064B2 (en) * | 2001-10-12 | 2007-08-28 | Sony Corporation | Magnetoresistive effect element, magnetic memory element magnetic memory device and manufacturing methods thereof |
JP4178867B2 (ja) * | 2002-08-02 | 2008-11-12 | ソニー株式会社 | 磁気抵抗効果素子及び磁気メモリ装置 |
US7059768B2 (en) * | 2003-08-01 | 2006-06-13 | Hitachi Global Storage Technologies Netherlands | Standards for the calibration of a vacuum thermogravimetric analyzer for determination of vapor pressures of compounds |
US7341765B2 (en) * | 2004-01-27 | 2008-03-11 | Battelle Energy Alliance, Llc | Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates |
JP4283263B2 (ja) * | 2005-10-20 | 2009-06-24 | 本田技研工業株式会社 | 磁歪式トルクセンサの製造方法 |
US20080205130A1 (en) * | 2007-02-28 | 2008-08-28 | Freescale Semiconductor, Inc. | Mram free layer synthetic antiferromagnet structure and methods |
US7830641B2 (en) * | 2007-04-17 | 2010-11-09 | Hitachi Global Storage Technologies Netherlands B.V. | Tunneling magnetoresistive (TMR) sensor with a Co-Fe-B free layer having a negative saturation magnetostriction |
CN102654671B (zh) * | 2011-11-14 | 2014-09-10 | 京东方科技集团股份有限公司 | 液晶显示器及其制作方法 |
US10893609B2 (en) | 2012-09-11 | 2021-01-12 | Ferric Inc. | Integrated circuit with laminated magnetic core inductor including a ferromagnetic alloy |
US11064610B2 (en) | 2012-09-11 | 2021-07-13 | Ferric Inc. | Laminated magnetic core inductor with insulating and interface layers |
US11116081B2 (en) | 2012-09-11 | 2021-09-07 | Ferric Inc. | Laminated magnetic core inductor with magnetic flux closure path parallel to easy axes of magnetization of magnetic layers |
US11197374B2 (en) | 2012-09-11 | 2021-12-07 | Ferric Inc. | Integrated switched inductor power converter having first and second powertrain phases |
US11058001B2 (en) | 2012-09-11 | 2021-07-06 | Ferric Inc. | Integrated circuit with laminated magnetic core inductor and magnetic flux closure layer |
US11302469B2 (en) | 2014-06-23 | 2022-04-12 | Ferric Inc. | Method for fabricating inductors with deposition-induced magnetically-anisotropic cores |
US10629357B2 (en) | 2014-06-23 | 2020-04-21 | Ferric Inc. | Apparatus and methods for magnetic core inductors with biased permeability |
US9991040B2 (en) * | 2014-06-23 | 2018-06-05 | Ferric, Inc. | Apparatus and methods for magnetic core inductors with biased permeability |
US9230565B1 (en) * | 2014-06-24 | 2016-01-05 | Western Digital (Fremont), Llc | Magnetic shield for magnetic recording head |
US10354950B2 (en) | 2016-02-25 | 2019-07-16 | Ferric Inc. | Systems and methods for microelectronics fabrication and packaging using a magnetic polymer |
CN116574940A (zh) * | 2023-04-11 | 2023-08-11 | 中国科学院宁波材料技术与工程研究所 | 一种Co基磁敏纤维材料及其应用 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3374113A (en) * | 1965-01-13 | 1968-03-19 | Bell Telephone Labor Inc | Method for controlled aging of thin magnetic films by means of an easy axis annealing treatment |
FR2399710A1 (fr) * | 1977-08-04 | 1979-03-02 | Commissariat Energie Atomique | Procede de modification de la direction de facile aimantation d'une couche magnetique mince amorphe |
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US3039891A (en) * | 1957-11-14 | 1962-06-19 | Sperry Rand Corp | Method of treating ni-fe thin metal film of body of magnetic material by subjecting to heat treatment in a magnetic field oriented transversely to the preferred axis of magnetization |
US3472708A (en) * | 1964-10-30 | 1969-10-14 | Us Navy | Method of orienting the easy axis of thin ferromagnetic films |
US3409479A (en) * | 1965-04-29 | 1968-11-05 | Navy Usa | Method of heat treating thin magnetic films in a transverse magnetic field |
DE1558820B2 (de) * | 1967-01-25 | 1971-05-19 | Vacuumschmelze Gmbh | Verfahren zur herstellung einer nickel eisen molybden legierung mit einem induktionshub groesser als 3000 gauss und grosser impulspermeabilitaet |
US3850706A (en) * | 1972-09-15 | 1974-11-26 | Ibm | Mn{11 {118 {11 M{11 {11 Ga Ge FERROMAGNETIC MATERIALS WHERE M COMPRISES TRANSITION METALS |
US3940293A (en) * | 1972-12-20 | 1976-02-24 | Allied Chemical Corporation | Method of producing amorphous cutting blades |
JPS5812728B2 (ja) * | 1974-12-10 | 1983-03-10 | 富士写真フイルム株式会社 | ジキキロクバイタイノ セイホウ |
US4003768A (en) * | 1975-02-12 | 1977-01-18 | International Business Machines Corporation | Method for treating magnetic alloy to increase the magnetic permeability |
US4052201A (en) * | 1975-06-26 | 1977-10-04 | Allied Chemical Corporation | Amorphous alloys with improved resistance to embrittlement upon heat treatment |
US4067732A (en) * | 1975-06-26 | 1978-01-10 | Allied Chemical Corporation | Amorphous alloys which include iron group elements and boron |
US4038073A (en) * | 1976-03-01 | 1977-07-26 | Allied Chemical Corporation | Near-zero magnetostrictive glassy metal alloys with high saturation induction |
-
1978
- 1978-03-13 US US05/886,020 patent/US4236946A/en not_active Expired - Lifetime
-
1979
- 1979-02-01 FR FR7903174A patent/FR2420194A1/fr active Granted
- 1979-02-09 GB GB7904653A patent/GB2016528B/en not_active Expired
- 1979-02-14 JP JP54015118A patent/JPS6032335B2/ja not_active Expired
- 1979-03-07 DE DE19792908972 patent/DE2908972A1/de not_active Withdrawn
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3374113A (en) * | 1965-01-13 | 1968-03-19 | Bell Telephone Labor Inc | Method for controlled aging of thin magnetic films by means of an easy axis annealing treatment |
FR2399710A1 (fr) * | 1977-08-04 | 1979-03-02 | Commissariat Energie Atomique | Procede de modification de la direction de facile aimantation d'une couche magnetique mince amorphe |
Non-Patent Citations (1)
Title |
---|
EXBK/74 * |
Also Published As
Publication number | Publication date |
---|---|
FR2420194B1 (fr) | 1982-10-15 |
JPS6032335B2 (ja) | 1985-07-27 |
GB2016528B (en) | 1982-09-22 |
DE2908972A1 (de) | 1979-09-27 |
JPS54122000A (en) | 1979-09-21 |
US4236946A (en) | 1980-12-02 |
GB2016528A (en) | 1979-09-26 |
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