FR2368144A1 - Structure compacte de d - Google Patents

Structure compacte de d

Info

Publication number
FR2368144A1
FR2368144A1 FR7730866A FR7730866A FR2368144A1 FR 2368144 A1 FR2368144 A1 FR 2368144A1 FR 7730866 A FR7730866 A FR 7730866A FR 7730866 A FR7730866 A FR 7730866A FR 2368144 A1 FR2368144 A1 FR 2368144A1
Authority
FR
France
Prior art keywords
transfer device
load transfer
depositions
fabrication
conductive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7730866A
Other languages
English (en)
French (fr)
Other versions
FR2368144B1 (forum.php
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fairchild Semiconductor Corp
Original Assignee
Fairchild Camera and Instrument Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fairchild Camera and Instrument Corp filed Critical Fairchild Camera and Instrument Corp
Publication of FR2368144A1 publication Critical patent/FR2368144A1/fr
Application granted granted Critical
Publication of FR2368144B1 publication Critical patent/FR2368144B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/01—Manufacture or treatment
    • H10D44/041—Manufacture or treatment having insulated gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/40—Charge-coupled devices [CCD]
    • H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/40—Charge-coupled devices [CCD]
    • H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472—Surface-channel CCD
    • H10D44/474—Two-phase CCD

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
FR7730866A 1976-10-15 1977-10-13 Structure compacte de d Granted FR2368144A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/732,614 US4097885A (en) 1976-10-15 1976-10-15 Compact, two-phase charge-coupled-device structure utilizing multiple layers of conductive material

Publications (2)

Publication Number Publication Date
FR2368144A1 true FR2368144A1 (fr) 1978-05-12
FR2368144B1 FR2368144B1 (forum.php) 1983-09-09

Family

ID=24944271

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7730866A Granted FR2368144A1 (fr) 1976-10-15 1977-10-13 Structure compacte de d

Country Status (6)

Country Link
US (1) US4097885A (forum.php)
JP (1) JPS5349961A (forum.php)
CA (1) CA1111137A (forum.php)
DE (1) DE2743299A1 (forum.php)
FR (1) FR2368144A1 (forum.php)
GB (1) GB1575690A (forum.php)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0137554A3 (en) * 1983-09-23 1985-05-22 N.V. Philips' Gloeilampenfabrieken Method of manufacturing a semiconductor device and semiconductor device manufactured by the use of such a method
FR2603732A1 (fr) * 1986-09-04 1988-03-11 Werk Fernsehelektronik Veb Registre a decalage a accouplement de charge (registre ccd) avec une tres petite trame en supprimant une zone de transfert

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4385432A (en) * 1978-05-18 1983-05-31 Texas Instruments Incorporated Closely-spaced double level conductors for MOS read only
US4377904A (en) * 1978-10-10 1983-03-29 Texas Instruments Incorporated Method of fabricating a narrow band-gap semiconductor CCD imaging device
US4231149A (en) * 1978-10-10 1980-11-04 Texas Instruments Incorporated Narrow band-gap semiconductor CCD imaging device and method of fabrication
US4234362A (en) * 1978-11-03 1980-11-18 International Business Machines Corporation Method for forming an insulator between layers of conductive material
JPS56138951A (en) * 1980-03-31 1981-10-29 Fujitsu Ltd Manufacture of semiconductor memory device
JPH02266537A (ja) * 1989-04-07 1990-10-31 Mitsubishi Electric Corp 電荷転送素子
JP2642523B2 (ja) * 1991-03-19 1997-08-20 株式会社東芝 電荷結合素子を持つ半導体集積回路装置の製造方法
KR0165326B1 (ko) * 1995-12-28 1998-12-15 김광호 전하전송소자 및 그 제조방법
US6218686B1 (en) 1995-12-28 2001-04-17 Samsung Electronics Co. Ltd. Charge coupled devices
KR100268440B1 (ko) 1998-09-21 2000-10-16 윤종용 고감도 고체 촬상 장치
KR20010001327A (ko) * 1999-06-03 2001-01-05 김영환 전하 결합 소자
JP2004006671A (ja) * 2002-03-22 2004-01-08 Sanyo Electric Co Ltd 電荷結合素子およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2260870A1 (forum.php) * 1974-02-08 1975-09-05 Fairchild Camera Instr Co
US3909925A (en) * 1974-05-06 1975-10-07 Telex Computer Products N-Channel charge coupled device fabrication process

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3795847A (en) * 1973-03-26 1974-03-05 Gen Electric Method and apparatus for storing and transferring information
US3967306A (en) * 1973-08-01 1976-06-29 Trw Inc. Asymmetrical well charge coupled device
US3943543A (en) * 1974-07-26 1976-03-09 Texas Instruments Incorporated Three level electrode configuration for three phase charge coupled device
JPS51138175A (en) * 1975-05-26 1976-11-29 Fujitsu Ltd Method of manufacturing charge coupled device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2260870A1 (forum.php) * 1974-02-08 1975-09-05 Fairchild Camera Instr Co
US3931674A (en) * 1974-02-08 1976-01-13 Fairchild Camera And Instrument Corporation Self aligned CCD element including two levels of electrodes and method of manufacture therefor
US3909925A (en) * 1974-05-06 1975-10-07 Telex Computer Products N-Channel charge coupled device fabrication process

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXBK/71 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0137554A3 (en) * 1983-09-23 1985-05-22 N.V. Philips' Gloeilampenfabrieken Method of manufacturing a semiconductor device and semiconductor device manufactured by the use of such a method
FR2603732A1 (fr) * 1986-09-04 1988-03-11 Werk Fernsehelektronik Veb Registre a decalage a accouplement de charge (registre ccd) avec une tres petite trame en supprimant une zone de transfert

Also Published As

Publication number Publication date
JPS5514545B2 (forum.php) 1980-04-17
CA1111137A (en) 1981-10-20
DE2743299A1 (de) 1978-04-20
FR2368144B1 (forum.php) 1983-09-09
US4097885A (en) 1978-06-27
GB1575690A (en) 1980-09-24
JPS5349961A (en) 1978-05-06

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