FR2307823A2 - Compositions photopolymerisables contenant des dimeres nitroso pour inhiber selectivement la polymerisation thermique - Google Patents
Compositions photopolymerisables contenant des dimeres nitroso pour inhiber selectivement la polymerisation thermiqueInfo
- Publication number
- FR2307823A2 FR2307823A2 FR7512132A FR7512132A FR2307823A2 FR 2307823 A2 FR2307823 A2 FR 2307823A2 FR 7512132 A FR7512132 A FR 7512132A FR 7512132 A FR7512132 A FR 7512132A FR 2307823 A2 FR2307823 A2 FR 2307823A2
- Authority
- FR
- France
- Prior art keywords
- compsn
- nitroso
- dimer
- positive working
- polymerisable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000018 nitroso group Chemical group N(=O)* 0.000 title abstract 5
- 239000000178 monomer Substances 0.000 title abstract 3
- 150000003254 radicals Chemical class 0.000 abstract 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 239000000539 dimer Substances 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7512132A FR2307823A2 (fr) | 1975-04-18 | 1975-04-18 | Compositions photopolymerisables contenant des dimeres nitroso pour inhiber selectivement la polymerisation thermique |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7512132A FR2307823A2 (fr) | 1975-04-18 | 1975-04-18 | Compositions photopolymerisables contenant des dimeres nitroso pour inhiber selectivement la polymerisation thermique |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2307823A2 true FR2307823A2 (fr) | 1976-11-12 |
FR2307823B2 FR2307823B2 (fr) | 1980-04-18 |
Family
ID=9154148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7512132A Granted FR2307823A2 (fr) | 1975-04-18 | 1975-04-18 | Compositions photopolymerisables contenant des dimeres nitroso pour inhiber selectivement la polymerisation thermique |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2307823A2 (fr) |
-
1975
- 1975-04-18 FR FR7512132A patent/FR2307823A2/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2307823B2 (fr) | 1980-04-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8608411A1 (es) | Una placa sensible a la radiacion | |
GB1010203A (en) | Presensitized positive acting lithographic plates | |
US3888672A (en) | Photopolymerizable process capable of yielding a reverse image | |
US4987055A (en) | Photopolymerizable composition comprising (meth)acrylates with photooxidizable groups, and a recording material produced therefrom | |
JPS5473578A (en) | Pattern exposure method of semiconductor substrate and pattern exposure apparatus | |
FR2307823A2 (fr) | Compositions photopolymerisables contenant des dimeres nitroso pour inhiber selectivement la polymerisation thermique | |
ES8207357A1 (es) | Un procedimiento para preparar un aducto fotosensible. | |
US4985341A (en) | Photopolymerizable mixture, and a recording material produced therefrom | |
GB1293722A (en) | Photoresist process | |
JPS5612645A (en) | Developing method for positive type photosensitive lithographic plate | |
JPS56167135A (en) | Contact exposing method | |
ES8609752A1 (es) | Un metodo para obtener una placa de impresion de relieve | |
JPS52134719A (en) | Electrophotographic copying | |
JPS6435548A (en) | Photopolymerizable composition | |
NL7501162A (en) | Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation | |
JPS5596952A (en) | Production of photomask | |
JPS5388728A (en) | Method of forming pattern | |
JPS5272175A (en) | Mask patterning of resist meterial | |
JPS5515125A (en) | Halftone gravure engraving method | |
JPS57205737A (en) | Photosensitive laminate structure | |
JPS5778140A (en) | Forming method for photoresist film | |
GB719084A (en) | Electro-forming metal grids | |
GB721873A (en) | Process for deep-etching of metal photo-mechanical printing plates | |
JPS5366173A (en) | Light exposure method | |
JPS56144539A (en) | Formation of fine pattern |