FR2301842B1 - - Google Patents

Info

Publication number
FR2301842B1
FR2301842B1 FR7604596A FR7604596A FR2301842B1 FR 2301842 B1 FR2301842 B1 FR 2301842B1 FR 7604596 A FR7604596 A FR 7604596A FR 7604596 A FR7604596 A FR 7604596A FR 2301842 B1 FR2301842 B1 FR 2301842B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7604596A
Other versions
FR2301842A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2062075A external-priority patent/JPS5611944B2/ja
Priority claimed from JP3594075A external-priority patent/JPS51111102A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of FR2301842A1 publication Critical patent/FR2301842A1/fr
Application granted granted Critical
Publication of FR2301842B1 publication Critical patent/FR2301842B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR7604596A 1975-02-19 1976-02-19 Plaque de tirage photosensible comportant une couche d'enduction de structure inegale Granted FR2301842A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2062075A JPS5611944B2 (fr) 1975-02-19 1975-02-19
JP3594075A JPS51111102A (en) 1975-03-24 1975-03-24 Photosensitive printing plates

Publications (2)

Publication Number Publication Date
FR2301842A1 FR2301842A1 (fr) 1976-09-17
FR2301842B1 true FR2301842B1 (fr) 1981-08-07

Family

ID=26357595

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7604596A Granted FR2301842A1 (fr) 1975-02-19 1976-02-19 Plaque de tirage photosensible comportant une couche d'enduction de structure inegale

Country Status (4)

Country Link
US (3) US4216289A (fr)
DE (1) DE2606793C2 (fr)
FR (1) FR2301842A1 (fr)
GB (1) GB1542131A (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512974A (en) * 1978-07-15 1980-01-29 Konishiroku Photo Ind Co Ltd Photosensitive printing plate
JPS5734558A (en) * 1980-08-11 1982-02-24 Fuji Photo Film Co Ltd Photosensitive printing plate
EP0058017B1 (fr) * 1981-02-06 1986-04-16 Crosfield Electronics Limited Formation de surfaces imprimées
JPS5895349A (ja) * 1981-11-30 1983-06-06 Fuji Photo Film Co Ltd 感光性プレ−トの現像補充液補充方法
JPS58137469A (ja) * 1982-02-10 1983-08-15 Fuji Photo Film Co Ltd 記録材料のマツト化方法
US4631246A (en) * 1982-04-14 1986-12-23 E. I. Du Pont De Nemours And Company Uniform cover sheet with rough surface in a photosensitive element
US4567128A (en) * 1982-04-14 1986-01-28 E. I. Du Pont De Nemours And Company Cover sheet in a photosensitive element
JPS58182636A (ja) * 1982-04-20 1983-10-25 Fuji Photo Film Co Ltd 感光性印刷版
US4588676A (en) * 1983-06-24 1986-05-13 Rca Corporation Photoexposing a photoresist-coated sheet in a vacuum printing frame
US4664996A (en) * 1983-06-24 1987-05-12 Rca Corporation Method for etching a flat apertured mask for use in a cathode-ray tube
US4656107A (en) * 1983-06-24 1987-04-07 Rca Corporation Photographic printing plate for use in a vacuum printing frame
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
US4650738A (en) * 1984-10-22 1987-03-17 American Hoechst Corporation Negative working diazo color proofing method
US4659642A (en) * 1984-10-22 1987-04-21 American Hoechst Corporation Positive working naphthoquinone diazide color proofing transfer process
US4997735A (en) * 1989-04-28 1991-03-05 Eastman Kodak Company Vacuum contacting process for photographic elements
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
JPH06773A (ja) * 1992-06-22 1994-01-11 Fuji Photo Film Co Ltd 研磨テープの製造方法
DE4335425A1 (de) * 1993-10-18 1995-04-20 Hoechst Ag Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial
DE4439184A1 (de) * 1994-11-03 1996-05-09 Hoechst Ag Lichtempfindliches Aufzeichnungsmaterial
DE19533021A1 (de) * 1995-09-07 1997-03-13 Hoechst Ag Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung
DE19705909A1 (de) * 1996-08-23 1998-08-20 Inst Physikalische Hochtech Ev Neuartige Dünnschichten für die Mikrosystemtechnik und Mikrostrukturierung sowie ihre Verwendung
JP3855181B2 (ja) * 1997-03-28 2006-12-06 富士写真フイルム株式会社 感光性印刷版の製造方法
JP2000029204A (ja) * 1998-07-14 2000-01-28 Fuji Photo Film Co Ltd 記録材料及びそのマット化方法
JP4361651B2 (ja) * 1999-11-08 2009-11-11 コダックグラフィックコミュニケーションズ株式会社 感光性印刷版およびその製造方法
JP4231791B2 (ja) * 2002-03-14 2009-03-04 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フレキソ印刷版として使用するための感光性エレメント
WO2005081336A1 (fr) * 2004-02-20 2005-09-01 Matsushita Electric Industrial Co., Ltd. Procédé de production d’une batterie secondaire ionique lithium
US20090202938A1 (en) * 2008-02-08 2009-08-13 Celin Savariar-Hauck Method of improving surface abrasion resistance of imageable elements
CN108054326A (zh) * 2012-08-06 2018-05-18 住友化学株式会社 分隔件的制造方法、分隔件及二次电池的制造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2992101A (en) * 1957-02-18 1961-07-11 Eastman Kodak Co Suppression of newton's rings in printing color films
NL280795A (fr) * 1958-11-26
BE588832A (fr) * 1959-03-18
DE1447671A1 (de) * 1963-11-06 1969-02-20 Fuji Photo Film Co Ltd Fotografisches Material mit gerauhter Oberflaeche
DE1202136B (de) * 1964-06-04 1965-09-30 Agfa Ag Photographisches Material mit einer aussen angeordneten, eine rauhe Oberflaeche besitzenden Schutzschicht
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
DE1572315B2 (de) * 1967-05-26 1976-05-26 Hoechst Ag, 6000 Frankfurt Verfahren und druckplatte zum herstellen von halbton-druckformen
US3539344A (en) * 1967-05-31 1970-11-10 Eastman Kodak Co Photographic elements having protective bead coatings
US3652273A (en) * 1967-09-11 1972-03-28 Ibm Process using polyvinyl butral topcoat on photoresist layer
US3687703A (en) * 1968-06-26 1972-08-29 Fuji Photo Film Co Ltd Production of photographic sensitive materials
US3615468A (en) * 1968-11-06 1971-10-26 Sylvania Electric Prod Photoprinting process and article
US3897251A (en) * 1972-02-03 1975-07-29 Gte Sylvania Inc Process for utilizing a photoprinting article and method for making said article
JPS5426923B2 (fr) * 1972-03-21 1979-09-06
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
US3891943A (en) * 1974-08-06 1975-06-24 Liconix Long life helium metal vapor laser
JPS5229302A (en) * 1975-08-28 1977-03-05 Fuji Photo Film Co Ltd Photoosensitive printing plate

Also Published As

Publication number Publication date
US4216289A (en) 1980-08-05
US4251620A (en) 1981-02-17
DE2606793A1 (de) 1976-09-02
US4288526A (en) 1981-09-08
FR2301842A1 (fr) 1976-09-17
GB1542131A (en) 1979-03-14
DE2606793C2 (de) 1983-10-20

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