FI63784C - Oloeslig elektrod omfattande ett skikt av aedelmetall och foerfarande foer dess framstaellning - Google Patents

Oloeslig elektrod omfattande ett skikt av aedelmetall och foerfarande foer dess framstaellning Download PDF

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Publication number
FI63784C
FI63784C FI792211A FI792211A FI63784C FI 63784 C FI63784 C FI 63784C FI 792211 A FI792211 A FI 792211A FI 792211 A FI792211 A FI 792211A FI 63784 C FI63784 C FI 63784C
Authority
FI
Finland
Prior art keywords
iridium
ruthenium
layer
bath
precipitate
Prior art date
Application number
FI792211A
Other languages
English (en)
Finnish (fi)
Other versions
FI63784B (fi
FI792211A (fi
Inventor
Jr Anthony Joseph Scarpellino
James Mcewen
William Gerard Borner
Original Assignee
Inco Europ Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/924,631 external-priority patent/US4157943A/en
Priority claimed from US05/924,632 external-priority patent/US4189358A/en
Priority claimed from US05/924,618 external-priority patent/US4174378A/en
Application filed by Inco Europ Ltd filed Critical Inco Europ Ltd
Publication of FI792211A publication Critical patent/FI792211A/fi
Publication of FI63784B publication Critical patent/FI63784B/fi
Application granted granted Critical
Publication of FI63784C publication Critical patent/FI63784C/fi

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
    • C01B21/092—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms containing also one or more metal atoms
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
    • C01G55/002—Compounds containing, besides ruthenium, rhodium, palladium, osmium, iridium, or platinum, two or more other elements, with the exception of oxygen or hydrogen
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C01P2006/82—Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Claims (11)

1. Olöslig elektrod, vilken omfattar ett elektriskt ledande underlag, ett spärrskikt pä underlaget och ett icke-galvaniserat yttre ytskikt som innehäller ruteniumdioxid, och vilken är lämplig för användning särskilt i en elektrisk nickelutvinningsprocess, kännetecknad därav, att ett mellanskikt är en galvaniseraJ. ruteniumiridiumfällning som ätminstone partiellt oxiderats och placerats mellan spärr-skiktet och det yttre ytskiktet.
2. Elektrod enligt patentkravet 1, kännetecknad därav, att iridiumhalten av mellanskiktet är 0,1 - 36 %.
3. Elektrod enligt patentkravet 2, kännetecknad därav, att iridiumhalten av mellanskiktet är 2-4 %.
4. Förfarande för framställning av en elektrod enligt patentkravet 1, varvid ett spärrskikt utfälls pä ett underlag, ett mellanskikt utfälls och ett ruteniumdioxidhaltig yttre ytskikt utfälls icke-galvaniskt, kännetecknat därav, att mellanskiktet bildas genom galvanisering frän ett vatten-haltigt bad som innehäller en löslig ruteniumförening, en löslig iridiumförening, ett lösligt fluoboratsalt och fluoborsyra.
5. Förfarande enligt patentkravet 4, känneteck nat därav, att säsom ruteniumföreningen i badet används ett sait som innehäller rutenium i form av den komplexa anjonen /llu2N (HjO) ' vari Y är C1 eller Br.
6. Förfarande enligt patentkravet 4 eller 5, kännetecknat därav, att säsom iridiumföreningen i badet används en förening som framställs genom äterflödning av ett diammoniumhexahalogensalt av iridium och sulfamidsyra i vatten-lösning under en tid som är tillräcklig, efter destination och avkylning av äterflödesprodukten, för att tilläta bildandet av en fällning.
7. Förfarande enligt nägot av patentkraven 4-6, kännetecknat därav, aptt i badet inkluderats ätminstone 5 g/l fluoborsyra.
8. Förfarande enligt nägot av patentkraven 4-7, kännetecknat därav, att säsom det lösliga fluoboratet används natriumfluoborat och det används i en mängd av ätminstone 25 g/l.
FI792211A 1978-07-14 1979-07-13 Oloeslig elektrod omfattande ett skikt av aedelmetall och foerfarande foer dess framstaellning FI63784C (fi)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US92463178 1978-07-14
US05/924,631 US4157943A (en) 1978-07-14 1978-07-14 Composite electrode for electrolytic processes
US92463278 1978-07-14
US05/924,632 US4189358A (en) 1978-07-14 1978-07-14 Electrodeposition of ruthenium-iridium alloy
US92461878 1978-07-14
US05/924,618 US4174378A (en) 1978-07-14 1978-07-14 Iridium compound and preparation thereof

Publications (3)

Publication Number Publication Date
FI792211A FI792211A (fi) 1980-01-15
FI63784B FI63784B (fi) 1983-04-29
FI63784C true FI63784C (fi) 1983-08-10

Family

ID=27420656

Family Applications (1)

Application Number Title Priority Date Filing Date
FI792211A FI63784C (fi) 1978-07-14 1979-07-13 Oloeslig elektrod omfattande ett skikt av aedelmetall och foerfarande foer dess framstaellning

Country Status (5)

Country Link
EP (2) EP0007239B1 (sv)
AU (1) AU523857B2 (sv)
DE (1) DE2964533D1 (sv)
FI (1) FI63784C (sv)
NO (1) NO151668C (sv)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1859850A1 (en) * 2006-05-24 2007-11-28 Globe Union Industrial Corp. Metal-supported photocatalyst and method for preparing the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH512590A (fr) * 1970-03-20 1971-09-15 Sel Rex Corp Procédé pour le dépôt électrolytique d'alliages de ruthénium, bain aqueux pour la mise en oeuvre de ce procédé, et article revêtu d'un alliage de ruthénium obtenu par ce procédé
GB1351742A (en) * 1970-03-25 1974-05-01 Marston Excelsior Ltd Electrodes
SU461159A1 (ru) * 1973-02-27 1975-02-25 Ленинградский Ордена Ленина И Ордена Трудового Красного Знамени Государственный Университет Им.А.А.Жданова Электролит дл осаждени сплава на основе рутени
CA1041944A (en) * 1974-11-04 1978-11-07 Shinichiro Abe Non-contaminating anode suitable for electrowinning applications

Also Published As

Publication number Publication date
EP0007239B1 (en) 1983-01-19
EP0047566A2 (en) 1982-03-17
FI63784B (fi) 1983-04-29
DE2964533D1 (en) 1983-02-24
NO151668B (no) 1985-02-04
EP0007239A3 (en) 1980-05-14
FI792211A (fi) 1980-01-15
NO792299L (no) 1980-01-15
NO151668C (no) 1985-05-22
EP0007239A2 (en) 1980-01-23
AU4873379A (en) 1980-01-17
AU523857B2 (en) 1982-08-19

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Owner name: INCO EUROPE LIMITED