ES8601730A1 - Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz - Google Patents

Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz

Info

Publication number
ES8601730A1
ES8601730A1 ES531247A ES531247A ES8601730A1 ES 8601730 A1 ES8601730 A1 ES 8601730A1 ES 531247 A ES531247 A ES 531247A ES 531247 A ES531247 A ES 531247A ES 8601730 A1 ES8601730 A1 ES 8601730A1
Authority
ES
Spain
Prior art keywords
highly
moving
onto
continuously depositing
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES531247A
Other languages
English (en)
Other versions
ES531247A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of ES8601730A1 publication Critical patent/ES8601730A1/es
Publication of ES531247A0 publication Critical patent/ES531247A0/es
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Insulated Conductors (AREA)
  • Liquid Crystal (AREA)

Abstract

PROCEDIMIENTO PARA DEPOSITAR CONTINUAMENTE UNA PELICULA ELECTRICAMENTE CONDUCTORA, DELGADA Y TRANSMISORA DE LA LUZ, SOBRE UN SUSTRATO MOVIL. COMPRENDE LAS SIGUIENTES FASES: PRIMERA, SE HACE EL VACIO EN UNA CAMARA Y SE HACE AVANZAR CONTINUAMENTE UNA BANDA CONTINUA DE MATERIAL DE SUSTRATO A TRAVES DE DICHA CAMARA; SEGUNDA, SE PROPORCIONA UNA FUENTE DE MATERIAL METALICO Y SE EVAPORA DICHO MATERIAL METALICO EN LA CAMARA EN LA QUE SE HA HECHO EL VACIO, DE MODO QUE SE PRODUZCA UN VAPOR METALICO EN UNA ZONA DEFINIDA ENTRE EL SUSTRATO Y LA FUENTE DE MATERIAL METALICO; TERCERA, SE REPONE EL MATERIAL METALICO A MEDIDA QUE ESTE SE EVAPORA; CUARTA, SE INTRODUCE OXIGENO EN LA ZONA EN ESTADO GASEOSO; Y POR ULTIMO, SE INTRODUCE ENERGIA ELECTROMAGNETICA EN LA ZONA PARA DESARROLLAR UN PLASMA IONIZADO A PARTIR DE LOS ATOMOS DE OXIGENO GASEOSO Y DE LOS ATOMOS METALICOS EVAPORADOS EN LA ZONA.
ES531247A 1983-04-04 1984-04-03 Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz Granted ES531247A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48161983A 1983-04-04 1983-04-04

Publications (2)

Publication Number Publication Date
ES8601730A1 true ES8601730A1 (es) 1985-11-01
ES531247A0 ES531247A0 (es) 1985-11-01

Family

ID=23912695

Family Applications (2)

Application Number Title Priority Date Filing Date
ES531247A Granted ES531247A0 (es) 1983-04-04 1984-04-03 Un metodo de depositar continuamente una pelicula electricamente conductora, delgada y transmisora de la luz
ES540884A Expired ES8606028A1 (es) 1983-04-04 1985-03-01 Perfeccionamientos introducidos en un aparato para depositarcontinuamente sobre un sustrato una pelicula transmisora de la luz y electricamente conductora

Family Applications After (1)

Application Number Title Priority Date Filing Date
ES540884A Expired ES8606028A1 (es) 1983-04-04 1985-03-01 Perfeccionamientos introducidos en un aparato para depositarcontinuamente sobre un sustrato una pelicula transmisora de la luz y electricamente conductora

Country Status (9)

Country Link
EP (1) EP0121443A3 (es)
JP (1) JPS59217904A (es)
KR (1) KR910009044B1 (es)
AU (1) AU2626984A (es)
BR (1) BR8401540A (es)
CA (1) CA1219547A (es)
ES (2) ES531247A0 (es)
IN (1) IN160768B (es)
ZA (1) ZA842404B (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2612602B2 (ja) * 1987-12-17 1997-05-21 東洋インキ製造 株式会社 連続蒸着フィルムの製造方法および装置
US7700166B2 (en) 2005-06-06 2010-04-20 Createc Fischer & Co. Gmbh Process for evaporating high-melting materials
DE102005025935B4 (de) * 2005-06-06 2007-06-28 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle und Verfahren zur Verdampfung hochschmelzender Materialien
SE536952C2 (sv) * 2012-06-25 2014-11-11 Impact Coatings Ab Kontinuerlig rulle-till-rulle-anordning

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US448139A (en) * 1891-03-10 Bag-frame
DE1621387A1 (de) * 1967-10-09 1971-06-24 Hochvakuum Dresden Veb Verfahren und Einrichtung zum Bedampfen grosser bewegter Flaechen
US3563202A (en) * 1969-06-25 1971-02-16 Pennwalt Corp Mobile vbaporative firing source
US3772174A (en) * 1971-04-21 1973-11-13 Nasa Deposition of alloy films
US4170662A (en) * 1974-11-05 1979-10-09 Eastman Kodak Company Plasma plating
JPS5265183A (en) * 1975-11-26 1977-05-30 Matsushita Electric Ind Co Ltd Production process of thin film of compounds
JPS5399497A (en) * 1977-02-12 1978-08-30 Citizen Watch Co Ltd Transparent conductive film for display apparatus
JPS55133703A (en) * 1979-04-06 1980-10-17 Nippon Electric Co Method of producing transparent conductive film
JPS56136410A (en) * 1980-03-28 1981-10-24 Teijin Ltd Method of producing transparent conductive laminate
JPS575865A (en) * 1980-06-14 1982-01-12 Konishiroku Photo Ind Co Ltd Apparatus for forming transparent electroconductive film
US4417092A (en) * 1981-03-16 1983-11-22 Exxon Research And Engineering Co. Sputtered pin amorphous silicon semi-conductor device and method therefor
JPS5897204A (ja) * 1981-12-05 1983-06-09 コニカ株式会社 透明導電膜の製造方法

Also Published As

Publication number Publication date
CA1219547A (en) 1987-03-24
EP0121443A3 (en) 1985-01-09
KR910009044B1 (ko) 1991-10-28
ZA842404B (en) 1984-11-28
EP0121443A2 (en) 1984-10-10
ES8606028A1 (es) 1986-04-16
ES531247A0 (es) 1985-11-01
AU2626984A (en) 1984-10-11
BR8401540A (pt) 1984-11-13
IN160768B (es) 1987-08-01
KR840008534A (ko) 1984-12-15
JPH053689B2 (es) 1993-01-18
JPS59217904A (ja) 1984-12-08
ES540884A0 (es) 1986-04-16

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