IN160768B - - Google Patents
Info
- Publication number
- IN160768B IN160768B IN282/DEL/84A IN282DE1984A IN160768B IN 160768 B IN160768 B IN 160768B IN 282DE1984 A IN282DE1984 A IN 282DE1984A IN 160768 B IN160768 B IN 160768B
- Authority
- IN
- India
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Electric Cables (AREA)
- Photovoltaic Devices (AREA)
- Physical Vapour Deposition (AREA)
- Non-Insulated Conductors (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48161983A | 1983-04-04 | 1983-04-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN160768B true IN160768B (es) | 1987-08-01 |
Family
ID=23912695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN282/DEL/84A IN160768B (es) | 1983-04-04 | 1984-03-30 |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP0121443A3 (es) |
| JP (1) | JPS59217904A (es) |
| KR (1) | KR910009044B1 (es) |
| AU (1) | AU2626984A (es) |
| BR (1) | BR8401540A (es) |
| CA (1) | CA1219547A (es) |
| ES (2) | ES531247A0 (es) |
| IN (1) | IN160768B (es) |
| ZA (1) | ZA842404B (es) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2612602B2 (ja) * | 1987-12-17 | 1997-05-21 | 東洋インキ製造 株式会社 | 連続蒸着フィルムの製造方法および装置 |
| DE102005025935B4 (de) * | 2005-06-06 | 2007-06-28 | Createc Fischer & Co. Gmbh | Hochtemperatur-Verdampferzelle und Verfahren zur Verdampfung hochschmelzender Materialien |
| US7700166B2 (en) | 2005-06-06 | 2010-04-20 | Createc Fischer & Co. Gmbh | Process for evaporating high-melting materials |
| SE536952C2 (sv) * | 2012-06-25 | 2014-11-11 | Impact Coatings Ab | Kontinuerlig rulle-till-rulle-anordning |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US448139A (en) * | 1891-03-10 | Bag-frame | ||
| DE1621387A1 (de) * | 1967-10-09 | 1971-06-24 | Hochvakuum Dresden Veb | Verfahren und Einrichtung zum Bedampfen grosser bewegter Flaechen |
| US3563202A (en) * | 1969-06-25 | 1971-02-16 | Pennwalt Corp | Mobile vbaporative firing source |
| US3772174A (en) * | 1971-04-21 | 1973-11-13 | Nasa | Deposition of alloy films |
| US4170662A (en) * | 1974-11-05 | 1979-10-09 | Eastman Kodak Company | Plasma plating |
| JPS5265183A (en) * | 1975-11-26 | 1977-05-30 | Matsushita Electric Ind Co Ltd | Production process of thin film of compounds |
| JPS5399497A (en) * | 1977-02-12 | 1978-08-30 | Citizen Watch Co Ltd | Transparent conductive film for display apparatus |
| JPS55133703A (en) * | 1979-04-06 | 1980-10-17 | Nippon Electric Co | Method of producing transparent conductive film |
| JPS56136410A (en) * | 1980-03-28 | 1981-10-24 | Teijin Ltd | Method of producing transparent conductive laminate |
| JPS575865A (en) * | 1980-06-14 | 1982-01-12 | Konishiroku Photo Ind Co Ltd | Apparatus for forming transparent electroconductive film |
| US4417092A (en) * | 1981-03-16 | 1983-11-22 | Exxon Research And Engineering Co. | Sputtered pin amorphous silicon semi-conductor device and method therefor |
| JPS5897204A (ja) * | 1981-12-05 | 1983-06-09 | コニカ株式会社 | 透明導電膜の製造方法 |
-
1984
- 1984-03-28 CA CA000450772A patent/CA1219547A/en not_active Expired
- 1984-03-30 AU AU26269/84A patent/AU2626984A/en not_active Abandoned
- 1984-03-30 IN IN282/DEL/84A patent/IN160768B/en unknown
- 1984-03-30 ZA ZA842404A patent/ZA842404B/xx unknown
- 1984-04-03 JP JP59066606A patent/JPS59217904A/ja active Granted
- 1984-04-03 KR KR1019840001749A patent/KR910009044B1/ko not_active IP Right Cessation
- 1984-04-03 BR BR8401540A patent/BR8401540A/pt unknown
- 1984-04-03 ES ES531247A patent/ES531247A0/es active Granted
- 1984-04-04 EP EP84302308A patent/EP0121443A3/en not_active Withdrawn
-
1985
- 1985-03-01 ES ES540884A patent/ES8606028A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| KR910009044B1 (ko) | 1991-10-28 |
| ZA842404B (en) | 1984-11-28 |
| ES8601730A1 (es) | 1985-11-01 |
| EP0121443A2 (en) | 1984-10-10 |
| JPS59217904A (ja) | 1984-12-08 |
| AU2626984A (en) | 1984-10-11 |
| ES8606028A1 (es) | 1986-04-16 |
| EP0121443A3 (en) | 1985-01-09 |
| ES531247A0 (es) | 1985-11-01 |
| ES540884A0 (es) | 1986-04-16 |
| BR8401540A (pt) | 1984-11-13 |
| JPH053689B2 (es) | 1993-01-18 |
| CA1219547A (en) | 1987-03-24 |
| KR840008534A (ko) | 1984-12-15 |