ES527883A0 - Procedimiento para la obtencion de una plancha de impresion plana. - Google Patents

Procedimiento para la obtencion de una plancha de impresion plana.

Info

Publication number
ES527883A0
ES527883A0 ES527883A ES527883A ES527883A0 ES 527883 A0 ES527883 A0 ES 527883A0 ES 527883 A ES527883 A ES 527883A ES 527883 A ES527883 A ES 527883A ES 527883 A0 ES527883 A0 ES 527883A0
Authority
ES
Spain
Prior art keywords
compound
light
acid
procedure
obtaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES527883A
Other languages
English (en)
Other versions
ES8502555A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of ES527883A0 publication Critical patent/ES527883A0/es
Publication of ES8502555A1 publication Critical patent/ES8502555A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
ES527883A 1982-12-09 1983-12-07 Procedimiento para la obtencion de una plancha de impresion plana. Expired ES8502555A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19823246037 DE3246037A1 (de) 1982-12-09 1982-12-09 Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial

Publications (2)

Publication Number Publication Date
ES527883A0 true ES527883A0 (es) 1985-01-01
ES8502555A1 ES8502555A1 (es) 1985-01-01

Family

ID=6180498

Family Applications (1)

Application Number Title Priority Date Filing Date
ES527883A Expired ES8502555A1 (es) 1982-12-09 1983-12-07 Procedimiento para la obtencion de una plancha de impresion plana.

Country Status (10)

Country Link
US (1) US5008175A (es)
EP (1) EP0111273B1 (es)
JP (1) JPS59113435A (es)
AT (1) ATE25776T1 (es)
AU (1) AU565734B2 (es)
BR (1) BR8306748A (es)
CA (1) CA1254788A (es)
DE (2) DE3246037A1 (es)
ES (1) ES8502555A1 (es)
ZA (1) ZA838409B (es)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3246106A1 (de) * 1982-12-13 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
SU1165004A1 (ru) * 1983-09-01 1986-10-15 Центральный научно-исследовательский институт промышленности лубяных волокон Способ подготовки ровницы из волокна льн ного луба к мокрому пр дению
US4902770A (en) * 1984-03-06 1990-02-20 Tokyo Ohka Kogyo Co., Ltd. Undercoating material for photosensitive resins
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
DE3617499A1 (de) * 1986-05-24 1987-11-26 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3634371A1 (de) * 1986-10-09 1988-04-21 Hoechst Ag Lichtempfindliches gemisch und hieraus hergestelltes lichtempfindliches kopiermaterial
DE3711263A1 (de) * 1987-04-03 1988-10-13 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von druckformen
EP0345305A4 (en) * 1987-12-10 1991-10-02 Macdermid Incorporated Image-reversible dry-film photoresists
US4914000A (en) * 1988-02-03 1990-04-03 Hoechst Celanese Corporation Three dimensional reproduction material diazonium condensates and use in light sensitive
DE3900735A1 (de) * 1989-01-12 1990-07-26 Hoechst Ag Neue mehrfunktionelle (alpha)-diazo-(beta)-ketoester, verfahren zu ihrer herstellung und deren verwendung
CA2019693A1 (en) * 1989-07-07 1991-01-07 Karen Ann Graziano Acid-hardening photoresists of improved sensitivity
JPH03139650A (ja) * 1989-10-25 1991-06-13 Matsushita Electric Ind Co Ltd 微細パターン形成材料及びパターン形成方法
JP3004044B2 (ja) * 1990-10-29 2000-01-31 東洋合成工業株式会社 感光性着色樹脂組成物
JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
JP3003808B2 (ja) * 1991-03-14 2000-01-31 東京応化工業株式会社 マイクロレンズ及びその製造方法
JPH0534921A (ja) * 1991-07-30 1993-02-12 Mitsubishi Kasei Corp ネガ型感光性組成物
JPH05181277A (ja) * 1991-11-11 1993-07-23 Mitsubishi Kasei Corp ネガ型感光性組成物
JPH0643637A (ja) * 1992-07-23 1994-02-18 Sumitomo Chem Co Ltd パターンの保持方法
EP0599779A1 (de) * 1992-10-29 1994-06-01 OCG Microelectronic Materials AG Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum
JPH06202320A (ja) * 1992-12-28 1994-07-22 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JP3575045B2 (ja) * 1993-06-21 2004-10-06 住友化学工業株式会社 カラーフィルター
JPH07120914A (ja) * 1993-10-21 1995-05-12 Hoechst Japan Ltd ポジ型ホトレジスト組成物
JP2953562B2 (ja) * 1994-07-18 1999-09-27 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いた多層レジスト材料
US5658708A (en) * 1995-02-17 1997-08-19 Fuji Photo Film Co., Ltd. Image recording material
US5547812A (en) * 1995-06-05 1996-08-20 International Business Machines Corporation Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer
US5763134A (en) 1996-05-13 1998-06-09 Imation Corp Composition comprising photochemical acid progenitor and specific squarylium dye
US6489078B1 (en) * 1996-07-19 2002-12-03 Agfa-Gevaert IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
US6190829B1 (en) * 1996-09-16 2001-02-20 International Business Machines Corporation Low “K” factor hybrid photoresist
JP3810538B2 (ja) * 1997-11-28 2006-08-16 富士写真フイルム株式会社 ポジ型画像形成材料
US6528218B1 (en) * 1998-12-15 2003-03-04 International Business Machines Corporation Method of fabricating circuitized structures
JP4042142B2 (ja) * 2000-09-08 2008-02-06 Ｊｓｒ株式会社 Ｅｌ表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびｅｌ表示素子
US6699636B2 (en) 2001-12-12 2004-03-02 Kodak Polychrome Graphics Llc Imaging element comprising a thermally activated crosslinking agent
KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법
US20030215736A1 (en) * 2002-01-09 2003-11-20 Oberlander Joseph E. Negative-working photoimageable bottom antireflective coating
US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
JP5412125B2 (ja) * 2008-05-01 2014-02-12 東京応化工業株式会社 液浸露光用ネガ型レジスト組成物およびレジストパターン形成方法
JP5401126B2 (ja) 2008-06-11 2014-01-29 東京応化工業株式会社 液浸露光用レジスト組成物およびそれを用いたレジストパターン形成方法
JP5172505B2 (ja) * 2008-07-07 2013-03-27 東京応化工業株式会社 ネガ型レジスト組成物およびそれを用いたレジストパターン形成方法
JP5853844B2 (ja) * 2011-05-20 2016-02-09 信越化学工業株式会社 マイクロ構造体の製造方法及び光パターン形成性犠牲膜形成用組成物
JP2018151527A (ja) * 2017-03-13 2018-09-27 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
AT293449B (de) * 1965-11-24 1971-10-11 Kalle Ag Verfahren zum Herstellen einer Offsetdruckplatte aus vorsensibilisiertem Druckplattenmaterial
DE1447963B2 (de) * 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
US4164421A (en) * 1972-12-09 1979-08-14 Fuji Photo Film Co., Ltd. Photocurable composition containing an o-quinonodiazide for printing plate
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4108664A (en) * 1976-11-01 1978-08-22 Gaf Corporation Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
US4247616A (en) * 1979-07-27 1981-01-27 Minnesota Mining And Manufacturing Company Positive-acting photoresist composition
DE3039926A1 (de) * 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial

Also Published As

Publication number Publication date
AU2191483A (en) 1984-06-14
EP0111273A2 (de) 1984-06-20
EP0111273A3 (en) 1984-12-05
AU565734B2 (en) 1987-09-24
JPS59113435A (ja) 1984-06-30
DE3246037A1 (de) 1984-06-14
US5008175A (en) 1991-04-16
BR8306748A (pt) 1984-07-17
JPH0439065B2 (es) 1992-06-26
ES8502555A1 (es) 1985-01-01
EP0111273B1 (de) 1987-03-04
DE3370085D1 (en) 1987-04-09
ATE25776T1 (de) 1987-03-15
ZA838409B (en) 1984-06-27
CA1254788A (en) 1989-05-30

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19970303