ES8307385A1 - Un procedimiento para la preparacion de una plancha de impresion. - Google Patents
Un procedimiento para la preparacion de una plancha de impresion.Info
- Publication number
- ES8307385A1 ES8307385A1 ES506472A ES506472A ES8307385A1 ES 8307385 A1 ES8307385 A1 ES 8307385A1 ES 506472 A ES506472 A ES 506472A ES 506472 A ES506472 A ES 506472A ES 8307385 A1 ES8307385 A1 ES 8307385A1
- Authority
- ES
- Spain
- Prior art keywords
- light
- sensitive
- compound
- mixture
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
PROCEDIMIENTO PARA LA PREPARACION DE UNA PLANCHA DE IMPRESION. SE EXPONE A LA IMAGEN UN MATERIAL DE COPIAS FOTOSENSIBLE CONSTITUIDO POR UN SOPORTE Y UNA CAPA, CONSTITUIDA A SU VEZ POR UNA MEZCLA FOTOSENSIBLE QUE CONTIENE UN LIGANTE INSOLUBLE EN AGUA, QUE ES SOLUBLE EN SOLUCIONES ACUOSAS ALCALINAS, UNA O- O P-QUINONDIAZIDA FOTOSENSIBLE O UNA MEZCLA DE UN COMPUESTO QUE ELIMINA UN ACIDO POR EXPOSICION A LA LUZ Y UN COMPUESTO QUE CONTIENE COMO MINIMO UN GRUPO C-O-C QUE PUEDE SER ESCINDICO POR UN ACIDO, Y UN DERIVADO DE FENOL. SE ELIMINAN POR LAVADO LAS ZONAS DE LA CAPA SIN IMAGEN CON UNA SOLUCION REVELADORA ACUOSA ALCALINA Y POR ULTIMO SE CALIENTA EL MATERIAL A TEMPERATURA ELEVADA PARA ENDURECER LA CAPA DE IMAGEN.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803039926 DE3039926A1 (de) | 1980-10-23 | 1980-10-23 | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8307385A1 true ES8307385A1 (es) | 1983-06-16 |
ES506472A0 ES506472A0 (es) | 1983-06-16 |
Family
ID=6114973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES506472A Granted ES506472A0 (es) | 1980-10-23 | 1981-10-22 | Un procedimiento para la preparacion de una plancha de impresion. |
Country Status (10)
Country | Link |
---|---|
US (1) | US4387152A (es) |
EP (1) | EP0050802B1 (es) |
JP (1) | JPS57111529A (es) |
AU (1) | AU7665281A (es) |
BR (1) | BR8106818A (es) |
CA (1) | CA1151934A (es) |
DE (2) | DE3039926A1 (es) |
ES (1) | ES506472A0 (es) |
FI (1) | FI813292L (es) |
ZA (1) | ZA817130B (es) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3144480A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3144499A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
DE3246037A1 (de) * | 1982-12-09 | 1984-06-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
US5084372A (en) * | 1982-12-09 | 1992-01-28 | Hoechst Celanese Corporation | Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound |
DE3323343A1 (de) * | 1983-06-29 | 1985-01-10 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
DE3325022A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
SU1165004A1 (ru) * | 1983-09-01 | 1986-10-15 | Центральный научно-исследовательский институт промышленности лубяных волокон | Способ подготовки ровницы из волокна льн ного луба к мокрому пр дению |
DE3406927A1 (de) * | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
DE3442756A1 (de) * | 1984-11-23 | 1986-05-28 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen |
DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
US4600683A (en) * | 1985-04-22 | 1986-07-15 | International Business Machines Corp. | Cross-linked polyalkenyl phenol based photoresist compositions |
US4626492A (en) * | 1985-06-04 | 1986-12-02 | Olin Hunt Specialty Products, Inc. | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound |
US4650745A (en) * | 1985-06-04 | 1987-03-17 | Philip A. Hunt Chemical Corporation | Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development |
US5256522A (en) * | 1985-08-12 | 1993-10-26 | Hoechst Celanese Corporation | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
US4931381A (en) * | 1985-08-12 | 1990-06-05 | Hoechst Celanese Corporation | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment |
US5217840A (en) * | 1985-08-12 | 1993-06-08 | Hoechst Celanese Corporation | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
US4929536A (en) * | 1985-08-12 | 1990-05-29 | Hoechst Celanese Corporation | Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
DE3528929A1 (de) * | 1985-08-13 | 1987-02-26 | Hoechst Ag | Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern |
CA1308596C (en) * | 1986-01-13 | 1992-10-13 | Rohm And Haas Company | Microplastic structures and method of manufacture |
AU8173487A (en) * | 1986-10-20 | 1988-05-06 | Macdermid, Incorporated | Image reversal system and process |
JP2551943B2 (ja) * | 1987-03-12 | 1996-11-06 | 三菱化学株式会社 | 感光性平版印刷版 |
MY103006A (en) * | 1987-03-30 | 1993-03-31 | Microsi Inc | Photoresist compositions |
DE3711263A1 (de) * | 1987-04-03 | 1988-10-13 | Hoechst Ag | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von druckformen |
DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
DE3724791A1 (de) * | 1987-07-27 | 1989-02-09 | Merck Patent Gmbh | Positiv-fotoresist-zusammensetzungen |
DE3725949A1 (de) * | 1987-08-05 | 1989-02-16 | Hoechst Ag | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien |
US4837121A (en) * | 1987-11-23 | 1989-06-06 | Olin Hunt Specialty Products Inc. | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin |
US5024921A (en) * | 1987-11-23 | 1991-06-18 | Ocg Microelectronic Materials, Inc. | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image |
US4970287A (en) * | 1987-11-23 | 1990-11-13 | Olin Hunt Specialty Products Inc. | Thermally stable phenolic resin compositions with ortho, ortho methylene linkage |
JPH02502312A (ja) * | 1987-12-10 | 1990-07-26 | マクダーミツド インコーポレーテツド | 像反転性乾燥フィルムホトレジスト |
US5177172A (en) * | 1988-05-31 | 1993-01-05 | Ocg Microelectronic Materials, Inc. | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions |
US5002851A (en) * | 1988-05-31 | 1991-03-26 | Olin Hunt Specialty Products, Inc. | Light sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol substituted trihydroxybenzophenone as reactant |
US5254440A (en) * | 1988-05-31 | 1993-10-19 | Ocg Microelectronic Materials, Inc. | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist images |
US5239122A (en) * | 1988-05-31 | 1993-08-24 | Ocg Microelectronic Materials, Inc. | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions |
US5238775A (en) * | 1990-02-20 | 1993-08-24 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
US5306594A (en) * | 1991-11-04 | 1994-04-26 | Ocg Microelectronic Materials, Inc. | Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol |
JP3391471B2 (ja) * | 1992-02-25 | 2003-03-31 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
DE4222968A1 (de) * | 1992-07-13 | 1994-01-20 | Hoechst Ag | Positiv-arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial |
JPH0643637A (ja) * | 1992-07-23 | 1994-02-18 | Sumitomo Chem Co Ltd | パターンの保持方法 |
JP2944327B2 (ja) * | 1992-09-14 | 1999-09-06 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
EP0599779A1 (de) * | 1992-10-29 | 1994-06-01 | OCG Microelectronic Materials AG | Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum |
US5876895A (en) * | 1992-12-24 | 1999-03-02 | Sumitomo Chemical Company, Limited | Photosensitive resin composition for color filter |
DE4306152A1 (de) * | 1993-02-27 | 1994-09-01 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial |
DE69407879T2 (de) * | 1993-06-30 | 1998-04-30 | Fuji Photo Film Co Ltd | Phenolverbindungen, die Methoxymethylgruppen oder Hydroxymethylgruppen enthalten |
JP3130188B2 (ja) * | 1993-08-31 | 2001-01-31 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
JP3810538B2 (ja) * | 1997-11-28 | 2006-08-16 | 富士写真フイルム株式会社 | ポジ型画像形成材料 |
JP6313604B2 (ja) * | 2014-02-05 | 2018-04-18 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法 |
JP6267982B2 (ja) * | 2014-02-05 | 2018-01-24 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、電子デバイスの製造方法、新規化合物、及び、新規化合物の製造方法 |
JP6361361B2 (ja) * | 2014-08-06 | 2018-07-25 | 信越化学工業株式会社 | ポジ型リフトオフレジスト組成物及びパターン形成方法 |
JP6615232B2 (ja) * | 2016-01-29 | 2019-12-04 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL247406A (es) * | 1959-01-17 | |||
US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
CH621416A5 (es) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
CH613059A5 (en) | 1975-06-30 | 1979-08-31 | Hoechst Ag | Method for producing a flat-bed printing forme |
DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
DE2641100A1 (de) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | Lichtempfindliche kopierschicht |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
DE2828037A1 (de) * | 1978-06-26 | 1980-01-10 | Hoechst Ag | Lichtempfindliches gemisch |
DE2855393A1 (de) * | 1978-12-21 | 1980-07-03 | Hoechst Ag | Verfahren zum herstellen von flachdruckformen |
-
1980
- 1980-10-23 DE DE19803039926 patent/DE3039926A1/de not_active Withdrawn
-
1981
- 1981-10-08 CA CA000387589A patent/CA1151934A/en not_active Expired
- 1981-10-15 EP EP81108356A patent/EP0050802B1/de not_active Expired
- 1981-10-15 DE DE8181108356T patent/DE3169864D1/de not_active Expired
- 1981-10-15 ZA ZA817130A patent/ZA817130B/xx unknown
- 1981-10-20 JP JP56166530A patent/JPS57111529A/ja active Granted
- 1981-10-20 US US06/313,354 patent/US4387152A/en not_active Expired - Lifetime
- 1981-10-20 AU AU76652/81A patent/AU7665281A/en not_active Abandoned
- 1981-10-21 FI FI813292A patent/FI813292L/fi not_active Application Discontinuation
- 1981-10-22 ES ES506472A patent/ES506472A0/es active Granted
- 1981-10-22 BR BR8106818A patent/BR8106818A/pt unknown
Also Published As
Publication number | Publication date |
---|---|
EP0050802A3 (en) | 1982-08-18 |
FI813292L (fi) | 1982-04-24 |
US4387152A (en) | 1983-06-07 |
JPH0149932B2 (es) | 1989-10-26 |
CA1151934A (en) | 1983-08-16 |
DE3039926A1 (de) | 1982-05-27 |
EP0050802A2 (de) | 1982-05-05 |
ZA817130B (en) | 1982-09-29 |
BR8106818A (pt) | 1982-07-06 |
JPS57111529A (en) | 1982-07-12 |
EP0050802B1 (de) | 1985-04-10 |
DE3169864D1 (en) | 1985-05-15 |
ES506472A0 (es) | 1983-06-16 |
AU7665281A (en) | 1982-04-29 |
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