ES8304672A1 - Procedimiento perfeccionado para la preparacion de un material de copias fotosensible. - Google Patents
Procedimiento perfeccionado para la preparacion de un material de copias fotosensible.Info
- Publication number
- ES8304672A1 ES8304672A1 ES507352A ES507352A ES8304672A1 ES 8304672 A1 ES8304672 A1 ES 8304672A1 ES 507352 A ES507352 A ES 507352A ES 507352 A ES507352 A ES 507352A ES 8304672 A1 ES8304672 A1 ES 8304672A1
- Authority
- ES
- Spain
- Prior art keywords
- naphthoquinone
- photosensible
- material made
- made therefrom
- mixture based
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
PROCEDIMIENTO PARA LA OBTENCION DE UN MATERIAL DE COPIAS FOTOSENSIBLE. CONSISTE EN APLICAR SOBRE UN SOPORTE DE UNA CAPA UNA DISOLUCION DE UN AGLUTINANTE RESINOSO INSOLUBLE EN AGUA Y SOLUBLE O INCHABLE EN DISOLUCIONES ALCALINAS ACUOSAS, Y DE UN ESTER DE ACIDO 1,2-NAFTOQUINONA-2-DIAZIDA-SULFONICO DE FORMULA (I), EN LA QUE D ES 1,2-NAFTOQUINONA-2-DIAZIDA-4-SULFONILO O 1,2-NAFTOQUINONA-2-DIAZIDA-5-SULFONILO, EN UN DISOLVENTE ORGANICO; Y SECAR A UNA TEMPERATURA ENTRE 50 C Y 130 C. ESTOS MATERIALES TIENEN APLICACIONES PARA EL RECUBRIMIENTO DE LAS PLACAS DE IMPRIMIR.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803043967 DE3043967A1 (de) | 1980-11-21 | 1980-11-21 | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
ES507352A0 ES507352A0 (es) | 1983-03-01 |
ES8304672A1 true ES8304672A1 (es) | 1983-03-01 |
Family
ID=6117287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES507352A Expired ES8304672A1 (es) | 1980-11-21 | 1981-11-20 | Procedimiento perfeccionado para la preparacion de un material de copias fotosensible. |
Country Status (10)
Country | Link |
---|---|
US (1) | US4407926A (es) |
EP (1) | EP0052788B1 (es) |
JP (1) | JPS57114138A (es) |
AT (1) | ATE8820T1 (es) |
AU (1) | AU542667B2 (es) |
BR (1) | BR8107551A (es) |
CA (1) | CA1168657A (es) |
DE (2) | DE3043967A1 (es) |
ES (1) | ES8304672A1 (es) |
ZA (1) | ZA817990B (es) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3124936A1 (de) * | 1981-06-25 | 1983-01-20 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
US4600684A (en) * | 1983-02-10 | 1986-07-15 | Oki Electric Industry Co., Ltd. | Process for forming a negative resist using high energy beam |
US4588670A (en) * | 1985-02-28 | 1986-05-13 | American Hoechst Corporation | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist |
US5217840A (en) * | 1985-08-12 | 1993-06-08 | Hoechst Celanese Corporation | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
US5256522A (en) * | 1985-08-12 | 1993-10-26 | Hoechst Celanese Corporation | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
JPS62178562A (ja) * | 1986-01-30 | 1987-08-05 | Japan Synthetic Rubber Co Ltd | 1,2−キノンジアジド化合物の製造方法 |
US5162510A (en) * | 1986-05-02 | 1992-11-10 | Hoechst Celanese Corporation | Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer |
US5035976A (en) * | 1986-05-02 | 1991-07-30 | Hoechst Celanese Corporation | Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents |
US4902785A (en) * | 1986-05-02 | 1990-02-20 | Hoechst Celanese Corporation | Phenolic photosensitizers containing quinone diazide and acidic halide substituents |
US4732836A (en) * | 1986-05-02 | 1988-03-22 | Hoechst Celanese Corporation | Novel mixed ester O-quinone photosensitizers |
US4732837A (en) * | 1986-05-02 | 1988-03-22 | Hoechst Celanese Corporation | Novel mixed ester O-quinone photosensitizers |
DE3729034A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial |
JPS6478249A (en) * | 1987-09-18 | 1989-03-23 | Fuji Photo Film Co Ltd | Photosensitive material and image forming method |
JP2552891B2 (ja) * | 1988-01-26 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5212043A (en) * | 1988-02-17 | 1993-05-18 | Tosho Corporation | Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent |
JP2552900B2 (ja) * | 1988-06-07 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2930310B2 (ja) * | 1988-12-21 | 1999-08-03 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
US4992356A (en) * | 1988-12-27 | 1991-02-12 | Olin Hunt Specialty Products Inc. | Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group |
US4957846A (en) * | 1988-12-27 | 1990-09-18 | Olin Hunt Specialty Products Inc. | Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group |
US4992596A (en) * | 1988-12-27 | 1991-02-12 | Olin Hunt Specialty Products Inc. | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures |
JP2700918B2 (ja) * | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5019478A (en) * | 1989-10-30 | 1991-05-28 | Olin Hunt Specialty Products, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
US5219714A (en) * | 1989-10-30 | 1993-06-15 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
US5196517A (en) * | 1989-10-30 | 1993-03-23 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use as photoactive compounds |
JP2743111B2 (ja) * | 1990-05-31 | 1998-04-22 | 冨士薬品工業株式会社 | 光粘着化感光性組成物 |
JPH0627655A (ja) * | 1990-11-28 | 1994-02-04 | Hoechst Celanese Corp | ポジ型フォトレジスト組成物 |
DE4137325A1 (de) * | 1991-11-13 | 1993-05-19 | Hoechst Ag | Lichtempfindliches gemisch auf der basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches material |
US5554481A (en) * | 1993-09-20 | 1996-09-10 | Fuji Photo Film Co., Ltd. | Positive working photoresist composition |
JPH09185161A (ja) | 1995-10-31 | 1997-07-15 | Minnesota Mining & Mfg Co <3M> | 低光学ドットゲインカラー校正複合材料 |
US6025105A (en) * | 1998-02-18 | 2000-02-15 | Toshiba America Business Solutions, Inc. | Toner compositions and use |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE506677A (es) * | 1950-10-31 | |||
NL88160C (es) * | 1953-03-11 | |||
NL130248C (es) | 1959-01-21 | |||
US3635709A (en) * | 1966-12-15 | 1972-01-18 | Polychrome Corp | Light-sensitive lithographic plate |
US3802885A (en) * | 1967-08-15 | 1974-04-09 | Algraphy Ltd | Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base |
JPS505083B1 (es) | 1970-09-16 | 1975-02-28 | ||
JPS5431712B2 (es) * | 1972-07-11 | 1979-10-09 | ||
JPS5421089B2 (es) * | 1973-05-29 | 1979-07-27 | ||
US4105450A (en) * | 1973-07-27 | 1978-08-08 | Fuji Photo Film Co., Ltd. | Spectrally sensitized positive light-sensitive o-quinone diazide containing composition |
DE2847878A1 (de) * | 1978-11-04 | 1980-05-22 | Hoechst Ag | Lichtempfindliches gemisch |
JPS561045A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
-
1980
- 1980-11-21 DE DE19803043967 patent/DE3043967A1/de not_active Withdrawn
-
1981
- 1981-10-27 AT AT81109008T patent/ATE8820T1/de not_active IP Right Cessation
- 1981-10-27 DE DE8181109008T patent/DE3165261D1/de not_active Expired
- 1981-10-27 EP EP81109008A patent/EP0052788B1/de not_active Expired
- 1981-11-12 US US06/320,489 patent/US4407926A/en not_active Expired - Fee Related
- 1981-11-16 CA CA000390142A patent/CA1168657A/en not_active Expired
- 1981-11-18 ZA ZA817990A patent/ZA817990B/xx unknown
- 1981-11-20 AU AU77681/81A patent/AU542667B2/en not_active Ceased
- 1981-11-20 JP JP56185609A patent/JPS57114138A/ja active Granted
- 1981-11-20 ES ES507352A patent/ES8304672A1/es not_active Expired
- 1981-11-20 BR BR8107551A patent/BR8107551A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CA1168657A (en) | 1984-06-05 |
ES507352A0 (es) | 1983-03-01 |
ATE8820T1 (de) | 1984-08-15 |
ZA817990B (en) | 1982-10-27 |
JPH0138289B2 (es) | 1989-08-14 |
EP0052788A1 (de) | 1982-06-02 |
BR8107551A (pt) | 1982-08-17 |
JPS57114138A (en) | 1982-07-15 |
AU542667B2 (en) | 1985-02-28 |
DE3043967A1 (de) | 1982-06-24 |
DE3165261D1 (en) | 1984-09-06 |
EP0052788B1 (de) | 1984-08-01 |
AU7768181A (en) | 1982-05-27 |
US4407926A (en) | 1983-10-04 |
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