KR840001770A - 수산관 형광막 형성용 조성물 및 수상관 형광막 형성방법 - Google Patents
수산관 형광막 형성용 조성물 및 수상관 형광막 형성방법 Download PDFInfo
- Publication number
- KR840001770A KR840001770A KR1019820004345A KR820004345A KR840001770A KR 840001770 A KR840001770 A KR 840001770A KR 1019820004345 A KR1019820004345 A KR 1019820004345A KR 820004345 A KR820004345 A KR 820004345A KR 840001770 A KR840001770 A KR 840001770A
- Authority
- KR
- South Korea
- Prior art keywords
- fluorescent film
- tube fluorescent
- film forming
- water tube
- composition
- Prior art date
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims 6
- 239000000203 mixture Substances 0.000 title claims 5
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 239000012736 aqueous medium Substances 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- -1 halogen ion Chemical class 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 2
- 239000000843 powder Substances 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 229940085991 phosphate ion Drugs 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/18—Luminescent screens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Luminescent Compositions (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (9)
- 적어도 하기의 일반식으로 표시되는 반복단위(1) 및 (2)를 가지는 감광성수지와 CaS계 형광체분말이 수성매체 중에 분산되어 있는 것을 특징으로 하는 수상관 형광막 형성조성물.
-
- (식중, R는 수소원자, 알킬기 또는 저급히드록시 알킬기를 나타내고, X-는 강산의 음이온을 나타낸다.)
- X-가 할로겐이온, 황산이온, 인산이온 또는 P-톨루엔 설폰산 이온인 것을 특징으로 하는 특허청구의 범위 제1항에 기재된 수상관 형광막 형성용 조성물.
- 감광성 수지가 일반식(1)으로 표시되는 반복단위를 0.5∼10mol% 함유하는 것을 특징으로 하는 특허청구의 범위 제1항에 기재된 수상관 형광막 형성용 조성물.
- 적어도 하기의 일반식으로 표시되는 반복단위(1) 및 (2)를 가지는 감광성수지와 CaS계 형광체분말이 수성매체 중에 분산되어 있는 수상관 형광막 형성용 조성물.
-
- (식중, R는 수소원자, 알킬기 또는 저급히드록시 알킬기를 나타내고, X-는 강산의 음이온을 표시한다)를 수상관의 페이스 플레이트 패널 내면에 도포하고, 마스크를 사용해서 소망의 패턴상으로 노광한 후, 현상하고, 이어서 인화하므로써 소망 패턴상의 형광막을 형성하는 것을 특징으로 하는 수상관 형광막 형성방법.
- ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56198668A JPS58101187A (ja) | 1981-12-11 | 1981-12-11 | 受像管螢光膜形成用組成物および受像管螢光膜形成方法 |
JP198668 | 1981-12-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR840001770A true KR840001770A (ko) | 1984-05-16 |
KR860001675B1 KR860001675B1 (ko) | 1986-10-16 |
Family
ID=16395053
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8204345A KR860001675B1 (ko) | 1981-12-11 | 1982-09-27 | 수상관 형광막 형성용 조성물 |
Country Status (3)
Country | Link |
---|---|
US (1) | US4424265A (ko) |
JP (1) | JPS58101187A (ko) |
KR (1) | KR860001675B1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3297929B2 (ja) * | 1992-03-25 | 2002-07-02 | ソニー株式会社 | 陰極線管の蛍光面の形成方法 |
-
1981
- 1981-12-11 JP JP56198668A patent/JPS58101187A/ja active Pending
-
1982
- 1982-09-20 US US06/419,628 patent/US4424265A/en not_active Expired - Lifetime
- 1982-09-27 KR KR8204345A patent/KR860001675B1/ko active
Also Published As
Publication number | Publication date |
---|---|
KR860001675B1 (ko) | 1986-10-16 |
JPS58101187A (ja) | 1983-06-16 |
US4424265A (en) | 1984-01-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8304672A1 (es) | Procedimiento perfeccionado para la preparacion de un material de copias fotosensible. | |
KR970049038A (ko) | 화학적으로 증폭된 포지티브 포토레지스트 | |
KR840001484A (ko) | 제막(除膜) 조성물 및 내막식(耐膜蝕) 제거방법 | |
ES527883A0 (es) | Procedimiento para la obtencion de una plancha de impresion plana. | |
KR850004111A (ko) | 페노바비탈 및 카밤아제핀 공액체의 제조방법 | |
JPS56110927A (en) | Manufacture of silver halide photographic material | |
KR870005272A (ko) | 양성-작용성 방사선-감응성 혼합물 | |
GB1536047A (en) | Developer for lithographic printing plate | |
KR890005570A (ko) | 포지티브 방사선-감응성 혼합물, 및 이로부터 제조된 방사선-감응성 기록물질 | |
DE2832530C2 (de) | Lichtempfindliches Material für die Gerbentwicklung | |
JPS5562446A (en) | Photosensitive resin composition for screen printing plate | |
AU8577282A (en) | Light-sensitive mixture and copying material prepared therefrom | |
JPS6455553A (en) | Photosensitive composition, photosensitive copying material produced therefrom and making of negative relief copy | |
KR850005630A (ko) | 음성 포토레지스트 시스템(Negative photoresist system) | |
KR840002155A (ko) | 수상관 형광막 형성용 조성물 및 수상관 형광막 형성방법 | |
KR860000413A (ko) | 동 또는 동합금 기재표면에의 내부식성 피막 형성방법 | |
BR8106859A (pt) | Mistura foto-sensivel e material de copia foto-sensivel | |
KR840001770A (ko) | 수산관 형광막 형성용 조성물 및 수상관 형광막 형성방법 | |
GB2114765A (en) | Method for making a negative working lithographic printing plate | |
KR830005325A (ko) | 수용성 화학 발광 시스템 | |
JPS5536840A (en) | Silver halide photographic material | |
KR890007120A (ko) | 염료를 함유하는 양성-작용성 감광성 조성물 및 이러한 조성물로부터 제조된 양성-작용성 감광성 기록물질 | |
JPS5555336A (en) | Color photographic material | |
US3552970A (en) | Single sheet master for diffusion transfer | |
KR830005089A (ko) | 퀴논 화합물의 제조방법 |