JPS57114138A - Photosensitive mixture and copying material - Google Patents

Photosensitive mixture and copying material

Info

Publication number
JPS57114138A
JPS57114138A JP56185609A JP18560981A JPS57114138A JP S57114138 A JPS57114138 A JP S57114138A JP 56185609 A JP56185609 A JP 56185609A JP 18560981 A JP18560981 A JP 18560981A JP S57114138 A JPS57114138 A JP S57114138A
Authority
JP
Japan
Prior art keywords
diazide
naphthoquinone
printing plates
aqueous alkaline
sulfonyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56185609A
Other languages
English (en)
Other versions
JPH0138289B2 (ja
Inventor
Shiyutaaruhoofuen Pauru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS57114138A publication Critical patent/JPS57114138A/ja
Publication of JPH0138289B2 publication Critical patent/JPH0138289B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP56185609A 1980-11-21 1981-11-20 Photosensitive mixture and copying material Granted JPS57114138A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803043967 DE3043967A1 (de) 1980-11-21 1980-11-21 Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (2)

Publication Number Publication Date
JPS57114138A true JPS57114138A (en) 1982-07-15
JPH0138289B2 JPH0138289B2 (ja) 1989-08-14

Family

ID=6117287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56185609A Granted JPS57114138A (en) 1980-11-21 1981-11-20 Photosensitive mixture and copying material

Country Status (10)

Country Link
US (1) US4407926A (ja)
EP (1) EP0052788B1 (ja)
JP (1) JPS57114138A (ja)
AT (1) ATE8820T1 (ja)
AU (1) AU542667B2 (ja)
BR (1) BR8107551A (ja)
CA (1) CA1168657A (ja)
DE (2) DE3043967A1 (ja)
ES (1) ES8304672A1 (ja)
ZA (1) ZA817990B (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
JPH01309052A (ja) * 1988-06-07 1989-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH02167550A (ja) * 1988-12-21 1990-06-27 Fuji Photo Film Co Ltd 感光性組成物
JPH0436927A (ja) * 1990-05-31 1992-02-06 Fuji Yakuhin Kogyo Kk 光粘着化感光性組成物
JPH05265205A (ja) * 1991-11-13 1993-10-15 Hoechst Ag オルトナフトキノンジアジドスルフォン酸エステルを含む感光性混合物、およびそれでつくった記録材料

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3124936A1 (de) * 1981-06-25 1983-01-20 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4600684A (en) * 1983-02-10 1986-07-15 Oki Electric Industry Co., Ltd. Process for forming a negative resist using high energy beam
US4588670A (en) * 1985-02-28 1986-05-13 American Hoechst Corporation Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
JPS62178562A (ja) * 1986-01-30 1987-08-05 Japan Synthetic Rubber Co Ltd １，２−キノンジアジド化合物の製造方法
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
DE3729034A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
DE68915148T2 (de) * 1988-02-17 1994-08-18 Tosoh Corp Fotoresist-zusammensetzung.
US4957846A (en) * 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
US4992356A (en) * 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group
US4992596A (en) * 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
JPH0627655A (ja) * 1990-11-28 1994-02-04 Hoechst Celanese Corp ポジ型フォトレジスト組成物
US5554481A (en) * 1993-09-20 1996-09-10 Fuji Photo Film Co., Ltd. Positive working photoresist composition
JPH09185161A (ja) 1995-10-31 1997-07-15 Minnesota Mining & Mfg Co <3M> 低光学ドットゲインカラー校正複合材料
US6025105A (en) * 1998-02-18 2000-02-15 Toshiba America Business Solutions, Inc. Toner compositions and use

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (ja) * 1950-10-31
BE526866A (ja) * 1953-03-11
BE586713A (ja) 1959-01-21
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US3802885A (en) * 1967-08-15 1974-04-09 Algraphy Ltd Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base
JPS505083B1 (ja) 1970-09-16 1975-02-28
JPS5431712B2 (ja) * 1972-07-11 1979-10-09
JPS5421089B2 (ja) * 1973-05-29 1979-07-27
US4105450A (en) * 1973-07-27 1978-08-08 Fuji Photo Film Co., Ltd. Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
JPH01309052A (ja) * 1988-06-07 1989-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH02167550A (ja) * 1988-12-21 1990-06-27 Fuji Photo Film Co Ltd 感光性組成物
JPH0436927A (ja) * 1990-05-31 1992-02-06 Fuji Yakuhin Kogyo Kk 光粘着化感光性組成物
JPH05265205A (ja) * 1991-11-13 1993-10-15 Hoechst Ag オルトナフトキノンジアジドスルフォン酸エステルを含む感光性混合物、およびそれでつくった記録材料

Also Published As

Publication number Publication date
AU542667B2 (en) 1985-02-28
DE3043967A1 (de) 1982-06-24
JPH0138289B2 (ja) 1989-08-14
EP0052788B1 (de) 1984-08-01
ZA817990B (en) 1982-10-27
ES507352A0 (es) 1983-03-01
DE3165261D1 (en) 1984-09-06
CA1168657A (en) 1984-06-05
BR8107551A (pt) 1982-08-17
ATE8820T1 (de) 1984-08-15
AU7768181A (en) 1982-05-27
ES8304672A1 (es) 1983-03-01
US4407926A (en) 1983-10-04
EP0052788A1 (de) 1982-06-02

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