ES2944135T3 - Baño de galvanizado que contiene cromo trivalente y proceso para depositar cromo - Google Patents

Baño de galvanizado que contiene cromo trivalente y proceso para depositar cromo Download PDF

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Publication number
ES2944135T3
ES2944135T3 ES15701521T ES15701521T ES2944135T3 ES 2944135 T3 ES2944135 T3 ES 2944135T3 ES 15701521 T ES15701521 T ES 15701521T ES 15701521 T ES15701521 T ES 15701521T ES 2944135 T3 ES2944135 T3 ES 2944135T3
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ES
Spain
Prior art keywords
acid
chromium
galvanizing bath
bath
complexing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES15701521T
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English (en)
Spanish (es)
Inventor
Zilio Diego Dal
Gianluigi Schiavon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coventya SpA
Original Assignee
Coventya SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=49989624&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2944135(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Coventya SpA filed Critical Coventya SpA
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Publication of ES2944135T3 publication Critical patent/ES2944135T3/es
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ES15701521T 2014-01-24 2015-01-26 Baño de galvanizado que contiene cromo trivalente y proceso para depositar cromo Active ES2944135T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14152463.7A EP2899299A1 (en) 2014-01-24 2014-01-24 Electroplating bath containing trivalent chromium and process for depositing chromium
PCT/EP2015/051469 WO2015110627A1 (en) 2014-01-24 2015-01-26 Electroplating bath containing trivalent chromium and process for depositing chromium

Publications (1)

Publication Number Publication Date
ES2944135T3 true ES2944135T3 (es) 2023-06-19

Family

ID=49989624

Family Applications (1)

Application Number Title Priority Date Filing Date
ES15701521T Active ES2944135T3 (es) 2014-01-24 2015-01-26 Baño de galvanizado que contiene cromo trivalente y proceso para depositar cromo

Country Status (12)

Country Link
US (2) US10619258B2 (OSRAM)
EP (2) EP2899299A1 (OSRAM)
JP (1) JP6534391B2 (OSRAM)
KR (2) KR20160113610A (OSRAM)
CN (2) CN105917031B (OSRAM)
BR (1) BR112016016834B1 (OSRAM)
CA (1) CA2935934C (OSRAM)
ES (1) ES2944135T3 (OSRAM)
HU (1) HUE061836T2 (OSRAM)
MX (1) MX383305B (OSRAM)
PL (1) PL3097222T3 (OSRAM)
WO (1) WO2015110627A1 (OSRAM)

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EP3382062A1 (en) * 2017-03-31 2018-10-03 COVENTYA S.p.A. Method for increasing the corrosion resistance of a chrome-plated substrate
PL3607115T3 (pl) * 2017-04-04 2022-10-03 Atotech Deutschland GmbH & Co. KG Kontrolowany sposób osadzania warstwy chromu albo stopu chromu na co najmniej jednym podłożu
PL3607116T3 (pl) * 2017-04-04 2023-08-07 Atotech Deutschland GmbH & Co. KG Sposób elektrolitycznego osadzania warstwy chromu lub stopu chromu na co najmniej jednym podłożu
CN108130570A (zh) * 2017-12-15 2018-06-08 北京科技大学 一种复合三价电镀铬工艺
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FR3087209B1 (fr) 2018-10-12 2022-11-04 Mecaprotec Ind Composition pour le chromage d’un substrat et procede de chromage mettant en œuvre une telle composition
WO2020079215A1 (en) * 2018-10-19 2020-04-23 Atotech Deutschland Gmbh A method for electrolytically passivating a surface of silver, silver alloy, gold, or gold alloy
EP3894615A1 (en) * 2018-12-11 2021-10-20 ATOTECH Deutschland GmbH A method for depositing a chromium or chromium alloy layer and plating apparatus
EP3744874A1 (en) 2019-05-29 2020-12-02 Coventya SAS Electroplated product with corrosion-resistant coating
US20230015534A1 (en) * 2019-12-18 2023-01-19 Atotech Deutschland GmbH & Co. KG Electroplating composition and method for depositing a chromium coating on a substrate
CA3162202A1 (en) * 2019-12-18 2021-06-24 Atotech Deutschland GmbH & Co. KG Method for reducing the concentration of iron ions in a trivalent chromium electroplating bath
RU2734986C1 (ru) * 2020-03-23 2020-10-27 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д. И. Менделеева" (РХТУ им. Д. И. Менделеева) Способ электрохимического нанесения хромовых покрытий из саморегулирующегося электролита на основе соединений трехвалентного хрома
FI129420B (en) * 2020-04-23 2022-02-15 Savroc Ltd AQUATIC ELECTRIC COATING BATH
CN115768927A (zh) * 2020-07-15 2023-03-07 塔塔钢铁荷兰科技有限责任公司 从三价铬电解质电沉积功能性或装饰性铬层的方法
KR102350114B1 (ko) * 2020-08-03 2022-01-10 김근호 친환경 알루미늄 전해 크로메이트 처리방법
CN112226791A (zh) * 2020-10-26 2021-01-15 厦门市金宝源实业有限公司 一种三价铬镀铬液及其制备方法以及三价铬镀铬方法
EP4023793A1 (en) * 2021-01-05 2022-07-06 Coventya SAS Electroplating bath for depositing chromium or chromium alloy from a trivalent chromium bath and process for depositing chromium or chromium alloy
EP4151779A1 (de) * 2021-09-15 2023-03-22 Trivalent Oberflächentechnik GmbH Chrom-indium-, chrom-bismut- und chrom-antimon-beschichtung, verfahren zur herstellung und verwendung
CN113735172B (zh) * 2021-10-08 2023-04-07 上海良仁化工有限公司 含铬污泥制备细颗粒氢氧化铬的方法
CN114525557B (zh) * 2022-03-01 2024-01-02 九牧厨卫股份有限公司 一种杀菌环保复合镀层及其制备方法和杀菌环保产品
CN114875459A (zh) * 2022-05-10 2022-08-09 成立航空股份有限公司 一种三价铬镀液及黑铬镀层
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CN115928108B (zh) * 2022-12-23 2023-08-01 中国科学院青海盐湖研究所 电化学氧化铬铁直接制备三价铬化合物的方法
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DE102024105074A1 (de) * 2024-02-22 2025-08-28 Trivalent Oberflächentechnik Gmbh Verfahren zur wenigstens teilweisen Beschichtung eines Substrats mit einer dreiwertigen Chromschicht

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Also Published As

Publication number Publication date
JP6534391B2 (ja) 2019-06-26
CN113818053B (zh) 2024-07-05
EP3097222B1 (en) 2023-03-29
US20170009361A1 (en) 2017-01-12
PL3097222T3 (pl) 2023-05-29
US20200308723A1 (en) 2020-10-01
EP3097222A1 (en) 2016-11-30
CN113818053A (zh) 2021-12-21
CA2935934A1 (en) 2015-07-30
EP2899299A1 (en) 2015-07-29
KR20160113610A (ko) 2016-09-30
US11905613B2 (en) 2024-02-20
MX383305B (es) 2025-03-13
CA2935934C (en) 2022-03-01
CN105917031A (zh) 2016-08-31
WO2015110627A1 (en) 2015-07-30
CN105917031B (zh) 2021-11-02
MX2016009533A (es) 2016-10-28
KR102430755B1 (ko) 2022-08-10
US10619258B2 (en) 2020-04-14
KR20210147081A (ko) 2021-12-06
BR112016016834B1 (pt) 2022-02-08
HUE061836T2 (hu) 2023-08-28
BR112016016834A2 (OSRAM) 2017-08-08
JP2017503926A (ja) 2017-02-02

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