ES292458A1 - Un dispositivo de semiconductor - Google Patents
Un dispositivo de semiconductorInfo
- Publication number
- ES292458A1 ES292458A1 ES0292458A ES292458A ES292458A1 ES 292458 A1 ES292458 A1 ES 292458A1 ES 0292458 A ES0292458 A ES 0292458A ES 292458 A ES292458 A ES 292458A ES 292458 A1 ES292458 A1 ES 292458A1
- Authority
- ES
- Spain
- Prior art keywords
- layer
- silicon
- channels
- aluminium
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005669 field effect Effects 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 238000000151 deposition Methods 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 5
- 108091006146 Channels Proteins 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052782 aluminium Inorganic materials 0.000 abstract 4
- 239000004411 aluminium Substances 0.000 abstract 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 4
- 229910052710 silicon Inorganic materials 0.000 abstract 4
- 239000010703 silicon Substances 0.000 abstract 4
- 238000005275 alloying Methods 0.000 abstract 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 3
- 229910052737 gold Inorganic materials 0.000 abstract 3
- 239000010931 gold Substances 0.000 abstract 3
- 229910052757 nitrogen Inorganic materials 0.000 abstract 3
- 229910052698 phosphorus Inorganic materials 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 2
- 229910052796 boron Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 1
- 102000004129 N-Type Calcium Channels Human genes 0.000 abstract 1
- 108090000699 N-Type Calcium Channels Proteins 0.000 abstract 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 abstract 1
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 abstract 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 229920000620 organic polymer Polymers 0.000 abstract 1
- 239000011574 phosphorus Substances 0.000 abstract 1
- -1 polyethylene terephthalate Polymers 0.000 abstract 1
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract 1
- 239000005020 polyethylene terephthalate Substances 0.000 abstract 1
- 239000005049 silicon tetrachloride Substances 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/637—Lateral IGFETs having no inversion channels, e.g. buried channel lateral IGFETs, normally-on lateral IGFETs or depletion-mode lateral IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Junction Field-Effect Transistors (AREA)
- Thin Film Transistor (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US230449A US3283221A (en) | 1962-10-15 | 1962-10-15 | Field effect transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES292458A1 true ES292458A1 (es) | 1964-04-01 |
Family
ID=22865266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES0292458A Expired ES292458A1 (es) | 1962-10-15 | 1963-10-14 | Un dispositivo de semiconductor |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3283221A (en:Method) |
| AT (1) | AT245626B (en:Method) |
| BE (1) | BE638316A (en:Method) |
| CH (1) | CH441509A (en:Method) |
| DE (1) | DE1283399B (en:Method) |
| ES (1) | ES292458A1 (en:Method) |
| GB (1) | GB1060731A (en:Method) |
| NL (1) | NL299194A (en:Method) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3335038A (en) * | 1964-03-30 | 1967-08-08 | Ibm | Methods of producing single crystals on polycrystalline substrates and devices using same |
| BE666834A (en:Method) * | 1964-07-13 | |||
| US3375419A (en) * | 1965-02-25 | 1968-03-26 | Union Carbide Corp | Field effect transistor with poly-p-xylylene insulated gate structure and method |
| US3378737A (en) * | 1965-06-28 | 1968-04-16 | Teledyne Inc | Buried channel field effect transistor and method of forming |
| US3459944A (en) * | 1966-01-04 | 1969-08-05 | Ibm | Photosensitive insulated gate field effect transistor |
| US3458798A (en) * | 1966-09-15 | 1969-07-29 | Ibm | Solid state rectifying circuit arrangements |
| US3461323A (en) * | 1968-02-08 | 1969-08-12 | Bendix Corp | Negative resistance semiconductor device |
| US3593070A (en) * | 1968-12-17 | 1971-07-13 | Texas Instruments Inc | Submount for semiconductor assembly |
| US3591852A (en) * | 1969-01-21 | 1971-07-06 | Gen Electric | Nonvolatile field effect transistor counter |
| US3967305A (en) * | 1969-03-27 | 1976-06-29 | Mcdonnell Douglas Corporation | Multichannel junction field-effect transistor and process |
| JPS4915668B1 (en:Method) * | 1969-04-15 | 1974-04-16 | ||
| US3648127A (en) * | 1970-09-28 | 1972-03-07 | Fairchild Camera Instr Co | Reach through or punch{13 through breakdown for gate protection in mos devices |
| US3914137A (en) * | 1971-10-06 | 1975-10-21 | Motorola Inc | Method of manufacturing a light coupled monolithic circuit by selective epitaxial deposition |
| US4021835A (en) * | 1974-01-25 | 1977-05-03 | Hitachi, Ltd. | Semiconductor device and a method for fabricating the same |
| US4065781A (en) * | 1974-06-21 | 1977-12-27 | Westinghouse Electric Corporation | Insulated-gate thin film transistor with low leakage current |
| US4000504A (en) * | 1975-05-12 | 1976-12-28 | Hewlett-Packard Company | Deep channel MOS transistor |
| US4132998A (en) * | 1977-08-29 | 1979-01-02 | Rca Corp. | Insulated gate field effect transistor having a deep channel portion more highly doped than the substrate |
| JPS6019152B2 (ja) * | 1977-08-31 | 1985-05-14 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | 電界効果トランジスタ |
| US4166223A (en) * | 1978-02-06 | 1979-08-28 | Westinghouse Electric Corp. | Dual field effect transistor structure for compensating effects of threshold voltage |
| NL7904200A (nl) * | 1979-05-29 | 1980-12-02 | Philips Nv | Lagenveldeffecttransistor. |
| US4523368A (en) * | 1980-03-03 | 1985-06-18 | Raytheon Company | Semiconductor devices and manufacturing methods |
| GB2140617B (en) * | 1980-03-03 | 1985-06-19 | Raytheon Co | Methods of forming a field effect transistor |
| JPS58188165A (ja) * | 1982-04-28 | 1983-11-02 | Nec Corp | 半導体装置 |
| US4575746A (en) * | 1983-11-28 | 1986-03-11 | Rca Corporation | Crossunders for high density SOS integrated circuits |
| JPS62128175A (ja) * | 1985-11-29 | 1987-06-10 | Hitachi Ltd | 半導体装置 |
| GB2233822A (en) * | 1989-07-12 | 1991-01-16 | Philips Electronic Associated | A thin film field effect transistor |
| KR20060078925A (ko) * | 2004-12-30 | 2006-07-05 | 동부일렉트로닉스 주식회사 | 전류의 제어가 정반대인 금속 산화물 반도체 트랜지스터 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1900018A (en) * | 1928-03-28 | 1933-03-07 | Lilienfeld Julius Edgar | Device for controlling electric current |
| FR1037293A (fr) * | 1951-05-19 | 1953-09-15 | Licentia Gmbh | Redresseur sec à contrôle électrique et son procédé de fabrication |
| US2756285A (en) * | 1951-08-24 | 1956-07-24 | Bell Telephone Labor Inc | Semiconductor signal translating devices |
| US2791759A (en) * | 1955-02-18 | 1957-05-07 | Bell Telephone Labor Inc | Semiconductive device |
| US2993998A (en) * | 1955-06-09 | 1961-07-25 | Sprague Electric Co | Transistor combinations |
| US2900531A (en) * | 1957-02-28 | 1959-08-18 | Rca Corp | Field-effect transistor |
| US2979427A (en) * | 1957-03-18 | 1961-04-11 | Shockley William | Semiconductor device and method of making the same |
| NL237225A (en:Method) * | 1958-03-19 | |||
| NL245195A (en:Method) * | 1958-12-11 | |||
| FR1293699A (fr) * | 1960-05-02 | 1962-05-18 | Westinghouse Electric Corp | Dispositif semi-conducteur |
| FR1306187A (fr) * | 1960-09-26 | 1962-10-13 | Westinghouse Electric Corp | Transistor unipolaire |
| NL293447A (en:Method) * | 1962-05-31 |
-
0
- NL NL299194D patent/NL299194A/xx unknown
- BE BE638316D patent/BE638316A/xx unknown
-
1962
- 1962-10-15 US US230449A patent/US3283221A/en not_active Expired - Lifetime
-
1963
- 1963-08-29 CH CH1066163A patent/CH441509A/de unknown
- 1963-09-20 AT AT759363A patent/AT245626B/de active
- 1963-09-26 GB GB38032/63A patent/GB1060731A/en not_active Expired
- 1963-10-10 DE DER36306A patent/DE1283399B/de active Pending
- 1963-10-14 ES ES0292458A patent/ES292458A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CH441509A (de) | 1967-08-15 |
| DE1283399B (de) | 1968-11-21 |
| NL299194A (en:Method) | |
| US3283221A (en) | 1966-11-01 |
| GB1060731A (en) | 1967-03-08 |
| BE638316A (en:Method) | |
| AT245626B (de) | 1966-03-10 |
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