NL299194A - - Google Patents

Info

Publication number
NL299194A
NL299194A NL299194DA NL299194A NL 299194 A NL299194 A NL 299194A NL 299194D A NL299194D A NL 299194DA NL 299194 A NL299194 A NL 299194A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL299194A publication Critical patent/NL299194A/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/637Lateral IGFETs having no inversion channels, e.g. buried channel lateral IGFETs, normally-on lateral IGFETs or depletion-mode lateral IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
NL299194D 1962-10-15 NL299194A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US230449A US3283221A (en) 1962-10-15 1962-10-15 Field effect transistor

Publications (1)

Publication Number Publication Date
NL299194A true NL299194A (en:Method)

Family

ID=22865266

Family Applications (1)

Application Number Title Priority Date Filing Date
NL299194D NL299194A (en:Method) 1962-10-15

Country Status (8)

Country Link
US (1) US3283221A (en:Method)
AT (1) AT245626B (en:Method)
BE (1) BE638316A (en:Method)
CH (1) CH441509A (en:Method)
DE (1) DE1283399B (en:Method)
ES (1) ES292458A1 (en:Method)
GB (1) GB1060731A (en:Method)
NL (1) NL299194A (en:Method)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335038A (en) * 1964-03-30 1967-08-08 Ibm Methods of producing single crystals on polycrystalline substrates and devices using same
BE666834A (en:Method) * 1964-07-13
US3375419A (en) * 1965-02-25 1968-03-26 Union Carbide Corp Field effect transistor with poly-p-xylylene insulated gate structure and method
US3378737A (en) * 1965-06-28 1968-04-16 Teledyne Inc Buried channel field effect transistor and method of forming
US3459944A (en) * 1966-01-04 1969-08-05 Ibm Photosensitive insulated gate field effect transistor
US3458798A (en) * 1966-09-15 1969-07-29 Ibm Solid state rectifying circuit arrangements
US3461323A (en) * 1968-02-08 1969-08-12 Bendix Corp Negative resistance semiconductor device
US3593070A (en) * 1968-12-17 1971-07-13 Texas Instruments Inc Submount for semiconductor assembly
US3591852A (en) * 1969-01-21 1971-07-06 Gen Electric Nonvolatile field effect transistor counter
US3967305A (en) * 1969-03-27 1976-06-29 Mcdonnell Douglas Corporation Multichannel junction field-effect transistor and process
JPS4915668B1 (en:Method) * 1969-04-15 1974-04-16
US3648127A (en) * 1970-09-28 1972-03-07 Fairchild Camera Instr Co Reach through or punch{13 through breakdown for gate protection in mos devices
US3914137A (en) * 1971-10-06 1975-10-21 Motorola Inc Method of manufacturing a light coupled monolithic circuit by selective epitaxial deposition
US4021835A (en) * 1974-01-25 1977-05-03 Hitachi, Ltd. Semiconductor device and a method for fabricating the same
US4065781A (en) * 1974-06-21 1977-12-27 Westinghouse Electric Corporation Insulated-gate thin film transistor with low leakage current
US4000504A (en) * 1975-05-12 1976-12-28 Hewlett-Packard Company Deep channel MOS transistor
US4132998A (en) * 1977-08-29 1979-01-02 Rca Corp. Insulated gate field effect transistor having a deep channel portion more highly doped than the substrate
JPS6019152B2 (ja) * 1977-08-31 1985-05-14 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 電界効果トランジスタ
US4166223A (en) * 1978-02-06 1979-08-28 Westinghouse Electric Corp. Dual field effect transistor structure for compensating effects of threshold voltage
NL7904200A (nl) * 1979-05-29 1980-12-02 Philips Nv Lagenveldeffecttransistor.
US4523368A (en) * 1980-03-03 1985-06-18 Raytheon Company Semiconductor devices and manufacturing methods
GB2140617B (en) * 1980-03-03 1985-06-19 Raytheon Co Methods of forming a field effect transistor
JPS58188165A (ja) * 1982-04-28 1983-11-02 Nec Corp 半導体装置
US4575746A (en) * 1983-11-28 1986-03-11 Rca Corporation Crossunders for high density SOS integrated circuits
JPS62128175A (ja) * 1985-11-29 1987-06-10 Hitachi Ltd 半導体装置
GB2233822A (en) * 1989-07-12 1991-01-16 Philips Electronic Associated A thin film field effect transistor
KR20060078925A (ko) * 2004-12-30 2006-07-05 동부일렉트로닉스 주식회사 전류의 제어가 정반대인 금속 산화물 반도체 트랜지스터

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1900018A (en) * 1928-03-28 1933-03-07 Lilienfeld Julius Edgar Device for controlling electric current
FR1037293A (fr) * 1951-05-19 1953-09-15 Licentia Gmbh Redresseur sec à contrôle électrique et son procédé de fabrication
US2756285A (en) * 1951-08-24 1956-07-24 Bell Telephone Labor Inc Semiconductor signal translating devices
US2791759A (en) * 1955-02-18 1957-05-07 Bell Telephone Labor Inc Semiconductive device
US2993998A (en) * 1955-06-09 1961-07-25 Sprague Electric Co Transistor combinations
US2900531A (en) * 1957-02-28 1959-08-18 Rca Corp Field-effect transistor
US2979427A (en) * 1957-03-18 1961-04-11 Shockley William Semiconductor device and method of making the same
NL237225A (en:Method) * 1958-03-19
NL245195A (en:Method) * 1958-12-11
FR1293699A (fr) * 1960-05-02 1962-05-18 Westinghouse Electric Corp Dispositif semi-conducteur
FR1306187A (fr) * 1960-09-26 1962-10-13 Westinghouse Electric Corp Transistor unipolaire
NL293447A (en:Method) * 1962-05-31

Also Published As

Publication number Publication date
CH441509A (de) 1967-08-15
DE1283399B (de) 1968-11-21
US3283221A (en) 1966-11-01
ES292458A1 (es) 1964-04-01
GB1060731A (en) 1967-03-08
BE638316A (en:Method)
AT245626B (de) 1966-03-10

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