ES2655733T3 - Procedimiento para el desdoblamiento selectivo de silanos superiores - Google Patents
Procedimiento para el desdoblamiento selectivo de silanos superiores Download PDFInfo
- Publication number
- ES2655733T3 ES2655733T3 ES11779126.9T ES11779126T ES2655733T3 ES 2655733 T3 ES2655733 T3 ES 2655733T3 ES 11779126 T ES11779126 T ES 11779126T ES 2655733 T3 ES2655733 T3 ES 2655733T3
- Authority
- ES
- Spain
- Prior art keywords
- equal
- oligomeric
- silanes
- general formula
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/08—Silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/06—Washing
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010043648A DE102010043648A1 (de) | 2010-11-09 | 2010-11-09 | Verfahren zur selektiven Spaltung höherer Silane |
| DE102010043648 | 2010-11-09 | ||
| PCT/EP2011/068534 WO2012062560A2 (de) | 2010-11-09 | 2011-10-24 | Verfahren zur selektiven spaltung höherer silane |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2655733T3 true ES2655733T3 (es) | 2018-02-21 |
Family
ID=44907831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES11779126.9T Active ES2655733T3 (es) | 2010-11-09 | 2011-10-24 | Procedimiento para el desdoblamiento selectivo de silanos superiores |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9481580B2 (zh) |
| EP (1) | EP2637968B1 (zh) |
| JP (1) | JP5721848B2 (zh) |
| KR (1) | KR101819262B1 (zh) |
| CN (1) | CN103180246B (zh) |
| DE (1) | DE102010043648A1 (zh) |
| ES (1) | ES2655733T3 (zh) |
| TW (1) | TWI511924B (zh) |
| WO (1) | WO2012062560A2 (zh) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011004058A1 (de) | 2011-02-14 | 2012-08-16 | Evonik Degussa Gmbh | Monochlorsilan, Verfahren und Vorrichtung zu dessen Herstellung |
| DE102013207441A1 (de) * | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hexachlordisilan durch Spaltung von höheren Polychlorsilanen wie Octachlortrisilan |
| WO2015111886A1 (ko) | 2014-01-24 | 2015-07-30 | 한화케미칼 주식회사 | 폐가스의 정제방법 및 정제장치 |
| CN105314637B (zh) * | 2014-07-30 | 2019-07-12 | 江苏中能硅业科技发展有限公司 | 卤硅聚合物裂解制备卤硅烷的方法及装置 |
| JP6486049B2 (ja) | 2014-09-25 | 2019-03-20 | デンカ株式会社 | ペンタクロロジシランの製造方法並びに該方法により製造されるペンタクロロジシラン |
| DE102014018435A1 (de) * | 2014-12-10 | 2016-06-16 | Silicon Products Bitterfeld GmbH&CO.KG | Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen |
| CN106882809B (zh) * | 2017-03-24 | 2018-05-04 | 亚洲硅业（青海）有限公司 | 一种三氯氢硅的制备方法 |
| TWI791547B (zh) * | 2017-07-31 | 2023-02-11 | 中國大陸商南大光電半導體材料有限公司 | 製備五氯二矽烷之方法及包含五氯二矽烷之經純化的反應產物 |
| CN109081351B (zh) * | 2018-08-31 | 2021-05-11 | 四川永祥新能源有限公司 | 一种冷氢化系统产生的高沸物的处理系统和方法 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE536407A (zh) * | 1954-03-12 | |||
| JPS5283419A (en) * | 1975-12-29 | 1977-07-12 | Shin Etsu Chem Co Ltd | Preparation of methylchlorosilanes |
| US4676967A (en) | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| JPS59195519A (ja) * | 1983-04-15 | 1984-11-06 | Mitsui Toatsu Chem Inc | ヘキサクロロジシランの製造法 |
| DE3711444A1 (de) | 1987-04-04 | 1988-10-13 | Huels Troisdorf | Verfahren und vorrichtung zur herstellung von dichlorsilan |
| JPH0791049B2 (ja) * | 1988-01-21 | 1995-10-04 | 大阪チタニウム製造株式会社 | 多結晶シリコンの製造におけるポリマーのトリクロロシラン転化方法 |
| DE3925357C1 (zh) | 1989-07-31 | 1991-04-25 | Degussa Ag, 6000 Frankfurt, De | |
| DE4304256A1 (de) * | 1993-02-12 | 1994-08-18 | Solvay Deutschland | Katalysator zur Disproportionierung von Aryl- oder Alkylhalogendisilanen zu Aryl- oder Alkylhalogenmono- und Aryl- oder Alkylhalogenpolysilanen |
| US5292909A (en) * | 1993-07-14 | 1994-03-08 | Dow Corning Corporation | Catalytic conversion of direct process high-boiling component to chlorosilane monomers in the presence of hydrogen chloride and hydrogen |
| US5292912A (en) * | 1993-07-19 | 1994-03-08 | Dow Corning Corporation | Catalytic conversion of direct process high-boiling component to chlorosilane monomers in the presence of hydrogen chloride |
| DE4431995A1 (de) * | 1994-09-08 | 1996-03-14 | Wacker Chemie Gmbh | Verfahren zur Herstellung von wasserstoffhaltigen Methylchlorsilanen |
| JP3362630B2 (ja) * | 1997-02-28 | 2003-01-07 | 信越化学工業株式会社 | 直接法メチルクロルシラン合成より副生する高沸点成分からのモノシラン類の製造方法 |
| DE10017168A1 (de) | 2000-04-07 | 2001-10-11 | Bayer Ag | Verfahren und Anlage zur Herstellung von Silan |
| DE10057521B4 (de) | 2000-11-21 | 2009-04-16 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Silanen |
| DE10061680A1 (de) | 2000-12-11 | 2002-06-20 | Solarworld Ag | Verfahren zur Herstellung von Silan |
| DE10336545B3 (de) * | 2003-08-05 | 2005-04-14 | Ge Bayer Silicones Gmbh & Co. Kg | Verfahren zur Herstellung von Chlorsilanen |
| DE102004045245B4 (de) | 2004-09-17 | 2007-11-15 | Degussa Gmbh | Vorrichtung und Verfahren zur Herstellung von Silanen |
| DE102005024041A1 (de) | 2005-05-25 | 2006-11-30 | City Solar Ag | Verfahren zur Herstellung von Silicium aus Halogensilanen |
| DE102005046105B3 (de) | 2005-09-27 | 2007-04-26 | Degussa Gmbh | Verfahren zur Herstellung von Monosilan |
| DE102006009953A1 (de) | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Verfahren zur Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
| DE102007007874A1 (de) | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
| DE102007059170A1 (de) | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
| KR101573933B1 (ko) * | 2008-02-29 | 2015-12-02 | 미쓰비시 마테리알 가부시키가이샤 | 트리클로로실란의 제조 방법 및 제조 장치 |
| DE102009027730A1 (de) | 2009-07-15 | 2011-01-27 | Evonik Degussa Gmbh | Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen |
| DE102009027728A1 (de) | 2009-07-15 | 2011-01-20 | Evonik Degussa Gmbh | Verfahren zur Behandlung von Katalysator-Präkursoren |
| JP5321314B2 (ja) * | 2009-07-23 | 2013-10-23 | 三菱マテリアル株式会社 | クロロシラン重合物の分解方法および分解装置 |
| DE102009053804B3 (de) | 2009-11-18 | 2011-03-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
| DE102010043649A1 (de) | 2010-11-09 | 2012-05-10 | Evonik Degussa Gmbh | Verfahren zur Spaltung höherer Silane |
| DE102010043646A1 (de) | 2010-11-09 | 2012-05-10 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Trichlorsilan |
-
2010
- 2010-11-09 DE DE102010043648A patent/DE102010043648A1/de not_active Withdrawn
-
2011
- 2011-10-24 US US13/884,473 patent/US9481580B2/en active Active
- 2011-10-24 ES ES11779126.9T patent/ES2655733T3/es active Active
- 2011-10-24 EP EP11779126.9A patent/EP2637968B1/de active Active
- 2011-10-24 KR KR1020137014602A patent/KR101819262B1/ko active IP Right Grant
- 2011-10-24 WO PCT/EP2011/068534 patent/WO2012062560A2/de active Application Filing
- 2011-10-24 CN CN201180054019.9A patent/CN103180246B/zh active Active
- 2011-10-24 JP JP2013538121A patent/JP5721848B2/ja active Active
- 2011-11-07 TW TW100140520A patent/TWI511924B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2637968A2 (de) | 2013-09-18 |
| JP2013542168A (ja) | 2013-11-21 |
| KR101819262B1 (ko) | 2018-01-16 |
| EP2637968B1 (de) | 2017-12-06 |
| DE102010043648A1 (de) | 2012-05-10 |
| CN103180246B (zh) | 2016-08-17 |
| TWI511924B (zh) | 2015-12-11 |
| US9481580B2 (en) | 2016-11-01 |
| CN103180246A (zh) | 2013-06-26 |
| WO2012062560A3 (de) | 2012-07-12 |
| JP5721848B2 (ja) | 2015-05-20 |
| KR20130105678A (ko) | 2013-09-25 |
| WO2012062560A2 (de) | 2012-05-18 |
| US20130294995A1 (en) | 2013-11-07 |
| TW201235297A (en) | 2012-09-01 |
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