ES2101726T3 - Medio de impresion polimero fotosensible y placas de impresion desarrollables en agua. - Google Patents
Medio de impresion polimero fotosensible y placas de impresion desarrollables en agua.Info
- Publication number
- ES2101726T3 ES2101726T3 ES91311120T ES91311120T ES2101726T3 ES 2101726 T3 ES2101726 T3 ES 2101726T3 ES 91311120 T ES91311120 T ES 91311120T ES 91311120 T ES91311120 T ES 91311120T ES 2101726 T3 ES2101726 T3 ES 2101726T3
- Authority
- ES
- Spain
- Prior art keywords
- printing
- printing medium
- water
- medium
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Graft Or Block Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
UN MEDIO DE IMPRESION FOTOSENSIBLE SE COMPONE DE UN COPOLIMERO LATEX, UN COPOLIMERO EN BLOQUE ELASTOMERICO, TERMOPLASTICO LINEAL, UN COMPUESTO QUE CONTIENE UN ATOMO DE NITROGENO BASICO, UN COMPUESTO NO SATURADO ETILENICAMENTE Y UN SISTEMA DE INICIACION DE POLIMERIZACION. EL MEDIO DE IMPRESION TIENE UNA MICROESTRUCTURA DE DOMINIOS DIFERENTES DEL COPOLIMERO LATEX Y DE COPOLIMERO EN BLOQUE ELASTOMERICO EN UNA MATRIZ DE LOS OTROS COMPONENTES. EL MEDIO DE IMPRESION SE APOYA TIPICAMENTE EN UN SUSTRATO PARA FORMAR UNA PLANCHA DE IMPRESION. EL MEDIO DE IMPRESION ES FOTOSENSIBLE Y SE FORMAN IMAGENES MEDIANTE LA EXPOSICION A UNA RADIACION ACTINICA A TRAVES DE UNA PELICULA NEGATIVA FOTOGRAFICA. LAS PARTES NO EXPUESTAS SE LAVAN EN UN MEDIO DISPERSOR DE AGUA, SIN UTILIZAR SOLVENTES ORGANICOS, LO QUE PRODUCE UNA PLANCHA DE IMPRESION, QUE DESPUES DE SECARLA Y EXPONERLA POSTERORMENTE A UNA LUZ UW, ESTA LISTA PARA IMPRIMIR.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/621,640 US5348844A (en) | 1990-12-03 | 1990-12-03 | Photosensitive polymeric printing medium and water developable printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2101726T3 true ES2101726T3 (es) | 1997-07-16 |
Family
ID=24490995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES91311120T Expired - Lifetime ES2101726T3 (es) | 1990-12-03 | 1991-11-29 | Medio de impresion polimero fotosensible y placas de impresion desarrollables en agua. |
Country Status (9)
Country | Link |
---|---|
US (1) | US5348844A (es) |
EP (1) | EP0489553B1 (es) |
AT (1) | ATE153781T1 (es) |
AU (1) | AU650697B2 (es) |
CA (1) | CA2056762A1 (es) |
DE (1) | DE69126283T2 (es) |
DK (1) | DK0489553T3 (es) |
ES (1) | ES2101726T3 (es) |
GR (1) | GR3024132T3 (es) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9110418D0 (en) * | 1991-05-14 | 1991-07-03 | Du Pont Howson Ltd | Radiation-sensitive material |
DE4211391A1 (de) * | 1992-04-04 | 1993-10-07 | Hoechst Ag | Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten |
DE4211390A1 (de) * | 1992-04-04 | 1993-10-07 | Hoechst Ag | Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten |
GB2273366B (en) * | 1992-11-18 | 1996-03-27 | Du Pont | Forming images on radiation-sensitive plates |
JPH06214386A (ja) * | 1993-01-20 | 1994-08-05 | Japan Synthetic Rubber Co Ltd | 感光性樹脂組成物 |
EP0699961B1 (en) * | 1993-03-31 | 2000-11-15 | Nippon Zeon Co., Ltd. | Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate |
US6210854B1 (en) * | 1993-08-27 | 2001-04-03 | E. I. Du Pont De Nemours And Company | Aqueous developable flexographic printing plate |
EP0675412B1 (en) * | 1994-03-30 | 2001-01-17 | Japan Synthetic Rubber Co., Ltd. | Photosensitive resin composition |
US5422225A (en) * | 1994-06-23 | 1995-06-06 | Shell Oil Company | Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend |
JPH1031303A (ja) * | 1994-09-29 | 1998-02-03 | Nippon Zeon Co Ltd | 感光性組成物及び感光性ゴム版 |
JP3011864B2 (ja) * | 1994-12-09 | 2000-02-21 | 日本ペイント株式会社 | 水現像性感光性樹脂組成物 |
US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
US5677108A (en) * | 1995-04-28 | 1997-10-14 | Polaroid Corporation | On-press removable quenching overcoat for lithographic plates |
EP0830552A4 (en) | 1995-06-02 | 2000-02-09 | Napp Systems Inc | PROCESS FOR DECREASING THE LEVEL OF DILUENT IN RESINS CONTAINING A DILUENT USING MICROWAVE ENERGY |
US5770353A (en) * | 1996-06-28 | 1998-06-23 | Eastman Kodak Company | Photographic element having improved ferrotyping resistance and surface appearance |
US5811220A (en) * | 1996-10-10 | 1998-09-22 | Polaroid Corporation | On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel |
US5976763A (en) * | 1997-03-05 | 1999-11-02 | Roberts; David H. | Highly sensitive water-developable photoreactive resin compositions and printing plates prepared therefrom |
DE19715169A1 (de) * | 1997-04-11 | 1998-10-15 | Basf Drucksysteme Gmbh | Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichungungsmaterial |
US6127094A (en) * | 1997-10-02 | 2000-10-03 | Napp Systems Inc. | Acrylate copolymer-containing water-developable photosensitive resins and printing plates prepared therefrom |
US6197479B1 (en) * | 1998-06-26 | 2001-03-06 | Toray Industries, Inc. | Photosensitive resin composition, method for producing photosensitive resin composition, and printing plate material |
US6262825B1 (en) | 1999-08-24 | 2001-07-17 | Napp Systems, Inc. | Apparatus and method for the enhanced imagewise exposure of a photosensitive material |
JP3836433B2 (ja) * | 2000-11-28 | 2006-10-25 | 旭化成ケミカルズ株式会社 | 改良された水系現像可能なフレキソ印刷用感光性樹脂 |
US20080103222A1 (en) * | 2002-04-26 | 2008-05-01 | Albemarle Corporation | New Class of Amine Coinitiators in Photoinitiated Polymerizations |
EP1504038A1 (en) * | 2002-04-26 | 2005-02-09 | Albemarle Corporation | A new class of amine coinitiators in photoinitiated polymerizations |
KR100725570B1 (ko) * | 2003-02-19 | 2007-06-08 | 아사히 가세이 케미칼즈 가부시키가이샤 | 볼록판 인쇄용 수현상성 인쇄판의 제조 방법 |
US20060293404A1 (en) * | 2003-04-24 | 2006-12-28 | Santobianco John G | New class of amine coinitiators in photoinitiated polymerizations |
US7005232B2 (en) | 2003-06-16 | 2006-02-28 | Napp Systems, Inc. | Highly reflective substrates for the digital processing of photopolymer printing plates |
ATE445861T1 (de) | 2005-08-26 | 2009-10-15 | Agfa Graphics Nv | Photopolymer druckplattenvorläufer |
JP6538390B2 (ja) * | 2015-03-24 | 2019-07-03 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
TWI740023B (zh) | 2017-04-04 | 2021-09-21 | 日商旭化成股份有限公司 | 柔版印刷版用感光性樹脂組合物、柔版印刷原版、柔版印刷版及共聚物 |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2893868A (en) * | 1955-08-22 | 1959-07-07 | Du Pont | Polymerizable compositions |
US3642486A (en) * | 1970-03-19 | 1972-02-15 | Eastman Kodak Co | Vinylsulfonyl-containing compounds as hardening agents |
JPS503041B1 (es) * | 1970-03-27 | 1975-01-31 | ||
US3796578A (en) * | 1970-12-26 | 1974-03-12 | Asahi Chemical Ind | Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds |
CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
JPS5037700B1 (es) * | 1971-04-23 | 1975-12-04 | ||
US3948667A (en) * | 1971-06-21 | 1976-04-06 | Japan Synthetic Rubber Company Limited | Photosensitive compositions |
AU476446B2 (en) * | 1974-04-18 | 1976-09-23 | Japan Synthetic Rubber Co., Ltd | Photosensitive composition |
JPS5819475B2 (ja) * | 1975-11-28 | 1983-04-18 | 住友ノ−ガタック株式会社 | 感圧複写紙用呈色紙 |
DK198077A (da) * | 1976-05-06 | 1977-11-07 | Japan Synthetic Rubber Co Ltd | Fotosensitive kompositioner og trykkeplader der indeholder disse |
US4141868A (en) * | 1976-07-07 | 1979-02-27 | Rohm And Haas Company | Water-based coating compositions |
US4107013A (en) * | 1976-12-13 | 1978-08-15 | Scm Corporation | Ultraviolet curable latexes |
JPS6026128B2 (ja) * | 1976-12-23 | 1985-06-21 | 日石三菱株式会社 | 硬化性樹脂の製造方法 |
JPS609250B2 (ja) * | 1977-05-04 | 1985-03-08 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
JPS6036953B2 (ja) * | 1977-05-27 | 1985-08-23 | 神崎製紙株式会社 | 感圧複写紙 |
DE2861268D1 (en) * | 1977-11-29 | 1982-01-07 | Bexford Ltd | Photopolymerisable elements and a process for the production of printing plates therefrom |
US4177074A (en) * | 1978-01-25 | 1979-12-04 | E. I. Du Pont De Nemours And Company | Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates |
JPS5565949A (en) * | 1978-11-13 | 1980-05-17 | Fuji Photo Film Co Ltd | Subbing method for photographic material |
JPS5946381B2 (ja) * | 1979-07-03 | 1984-11-12 | コニカ株式会社 | カラ−拡散転写用写真要素 |
NL7905548A (nl) * | 1979-07-17 | 1981-01-20 | Unilever Nv | Vaste koolwaterstofharsen. |
DE3164954D1 (en) * | 1980-03-04 | 1984-08-30 | Mitsubishi Rayon Co | Coating composition and process for preparing synthetic resin shaped articles by using same |
JPS57128332A (en) * | 1980-05-15 | 1982-08-09 | Fuji Photo Film Co Ltd | Method for subbing photographic material |
US4400460A (en) * | 1981-05-07 | 1983-08-23 | E. I. Du Pont De Nemours And Compamy | Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers |
US4400459A (en) * | 1981-05-07 | 1983-08-23 | E. I. Du Pont De Nemours And Company | Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates |
US4427759A (en) * | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
US4426504A (en) * | 1982-06-07 | 1984-01-17 | Battelle Development Corporation | Flexible dicyclopentenyl oxyethyl methacrylate curable compositions |
JPS609250A (ja) * | 1983-06-28 | 1985-01-18 | Nec Corp | 通信制御方式 |
US4996134A (en) * | 1984-04-13 | 1991-02-26 | Japan Synthetic Rubber Co., Ltd. | Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer |
NZ212161A (en) * | 1984-06-08 | 1988-06-30 | Ishikawa Katsukiyo | Photo-polymerisable composition and printing plate prepared therefrom |
US4622088A (en) * | 1984-12-18 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Process for preparing photopolymer flexographic element with melt extrusion coated elastomeric surface layer |
JPS61181811A (ja) * | 1985-02-08 | 1986-08-14 | Japan Synthetic Rubber Co Ltd | ランダム共役ジエン系共重合体およびその製造方法 |
US4952481A (en) * | 1985-02-12 | 1990-08-28 | Napp Systems (Usa), Inc. | Photosensitive resin composition |
GB8700594D0 (en) * | 1986-01-29 | 1987-02-18 | Ici Plc | Curable coating compositions |
JPH085927B2 (ja) * | 1986-12-26 | 1996-01-24 | 日本合成ゴム株式会社 | 感光性樹脂組成物 |
JPH02230152A (ja) * | 1987-06-18 | 1990-09-12 | Napp Syst Usa Inc | 感光性樹脂組成物 |
JPS6449035A (en) * | 1987-08-20 | 1989-02-23 | Japan Synthetic Rubber Co Ltd | Photosensitive resin composition |
JP2581094B2 (ja) * | 1987-08-20 | 1997-02-12 | 日本合成ゴム株式会社 | 感光性樹脂組成物 |
JP2560375B2 (ja) * | 1988-01-16 | 1996-12-04 | 日本合成ゴム株式会社 | 感光性樹脂組成物 |
JPH01300246A (ja) * | 1988-05-28 | 1989-12-04 | Nippon Paint Co Ltd | フレキソ印刷用感光性樹脂組成物 |
JP2683703B2 (ja) * | 1988-08-24 | 1997-12-03 | 日本合成ゴム株式会社 | 感光性樹脂組成物 |
US4952181A (en) * | 1988-09-08 | 1990-08-28 | Brunswick Corporation | Marine shift cable assembly with spring guide |
-
1990
- 1990-12-03 US US07/621,640 patent/US5348844A/en not_active Expired - Lifetime
-
1991
- 1991-11-29 DE DE69126283T patent/DE69126283T2/de not_active Expired - Lifetime
- 1991-11-29 AT AT91311120T patent/ATE153781T1/de active
- 1991-11-29 ES ES91311120T patent/ES2101726T3/es not_active Expired - Lifetime
- 1991-11-29 DK DK91311120.9T patent/DK0489553T3/da active
- 1991-11-29 EP EP91311120A patent/EP0489553B1/en not_active Expired - Lifetime
- 1991-12-02 CA CA002056762A patent/CA2056762A1/en not_active Abandoned
- 1991-12-02 AU AU88366/91A patent/AU650697B2/en not_active Ceased
-
1997
- 1997-07-16 GR GR970401782T patent/GR3024132T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
AU8836691A (en) | 1992-06-04 |
DK0489553T3 (da) | 1997-06-30 |
EP0489553B1 (en) | 1997-05-28 |
DE69126283T2 (de) | 1997-09-04 |
CA2056762A1 (en) | 1992-06-04 |
DE69126283D1 (de) | 1997-07-03 |
ATE153781T1 (de) | 1997-06-15 |
AU650697B2 (en) | 1994-06-30 |
GR3024132T3 (en) | 1997-10-31 |
EP0489553A1 (en) | 1992-06-10 |
US5348844A (en) | 1994-09-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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