DE69126283D1 - Fotoempfindliches, polymeres Druckmaterial und mit Wasser entwickelbare Druckplatten - Google Patents

Fotoempfindliches, polymeres Druckmaterial und mit Wasser entwickelbare Druckplatten

Info

Publication number
DE69126283D1
DE69126283D1 DE69126283T DE69126283T DE69126283D1 DE 69126283 D1 DE69126283 D1 DE 69126283D1 DE 69126283 T DE69126283 T DE 69126283T DE 69126283 T DE69126283 T DE 69126283T DE 69126283 D1 DE69126283 D1 DE 69126283D1
Authority
DE
Germany
Prior art keywords
printing
photosensitive
printing medium
medium
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69126283T
Other languages
English (en)
Other versions
DE69126283T2 (de
Inventor
William R Wagner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of DE69126283D1 publication Critical patent/DE69126283D1/de
Application granted granted Critical
Publication of DE69126283T2 publication Critical patent/DE69126283T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Graft Or Block Polymers (AREA)
DE69126283T 1990-12-03 1991-11-29 Fotoempfindliches, polymeres Druckmaterial und mit Wasser entwickelbare Druckplatten Expired - Lifetime DE69126283T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/621,640 US5348844A (en) 1990-12-03 1990-12-03 Photosensitive polymeric printing medium and water developable printing plates

Publications (2)

Publication Number Publication Date
DE69126283D1 true DE69126283D1 (de) 1997-07-03
DE69126283T2 DE69126283T2 (de) 1997-09-04

Family

ID=24490995

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69126283T Expired - Lifetime DE69126283T2 (de) 1990-12-03 1991-11-29 Fotoempfindliches, polymeres Druckmaterial und mit Wasser entwickelbare Druckplatten

Country Status (9)

Country Link
US (1) US5348844A (de)
EP (1) EP0489553B1 (de)
AT (1) ATE153781T1 (de)
AU (1) AU650697B2 (de)
CA (1) CA2056762A1 (de)
DE (1) DE69126283T2 (de)
DK (1) DK0489553T3 (de)
ES (1) ES2101726T3 (de)
GR (1) GR3024132T3 (de)

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DE4211390A1 (de) * 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
DE4211391A1 (de) * 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
JPH06214386A (ja) * 1993-01-20 1994-08-05 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物
WO1994023342A1 (en) * 1993-03-31 1994-10-13 Nippon Zeon Co., Ltd. Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate
US6210854B1 (en) * 1993-08-27 2001-04-03 E. I. Du Pont De Nemours And Company Aqueous developable flexographic printing plate
EP0675412B1 (de) * 1994-03-30 2001-01-17 Japan Synthetic Rubber Co., Ltd. Fotoempfindliche Harzzusammensetzung
US5422225A (en) * 1994-06-23 1995-06-06 Shell Oil Company Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版
JP3011864B2 (ja) * 1994-12-09 2000-02-21 日本ペイント株式会社 水現像性感光性樹脂組成物
US5863704A (en) * 1995-04-26 1999-01-26 Nippon Zeon Company, Ltd. Photosensitive composition and photosensitive rubber plate
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
JPH11509306A (ja) * 1995-06-02 1999-08-17 ナップ システムズ，インコーポレイテッド マイクロ波エネルギーにより希釈剤含有樹脂の希釈剤濃度を低減する方法
US5770353A (en) * 1996-06-28 1998-06-23 Eastman Kodak Company Photographic element having improved ferrotyping resistance and surface appearance
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
US5976763A (en) * 1997-03-05 1999-11-02 Roberts; David H. Highly sensitive water-developable photoreactive resin compositions and printing plates prepared therefrom
DE19715169A1 (de) * 1997-04-11 1998-10-15 Basf Drucksysteme Gmbh Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichungungsmaterial
US6127094A (en) * 1997-10-02 2000-10-03 Napp Systems Inc. Acrylate copolymer-containing water-developable photosensitive resins and printing plates prepared therefrom
US6197479B1 (en) 1998-06-26 2001-03-06 Toray Industries, Inc. Photosensitive resin composition, method for producing photosensitive resin composition, and printing plate material
US6262825B1 (en) 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
AU2002224117B2 (en) * 2000-11-28 2005-01-27 Asahi Kasei Chemicals Corporation Improved water-developable photosensitive resin for flexography
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
JP2005523950A (ja) * 2002-04-26 2005-08-11 アルベマール・コーポレーシヨン 光開始重合における新規な種類のアミン共開始剤
MXPA05008777A (es) * 2003-02-19 2005-10-18 Asahi Kasei Chemicals Corp Proceso para producir placa de impresion revelable con agua para el uso en implesion en relieve.
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
ES2333442T3 (es) 2005-08-26 2010-02-22 Agfa Graphics N.V. Precursor de placa de impresion fotopolimerico.
JP6538390B2 (ja) * 2015-03-24 2019-07-03 株式会社タムラ製作所 感光性樹脂組成物
US11493844B2 (en) 2017-04-04 2022-11-08 Asahi Kasei Kabushiki Kaisha Photosensitive resin composition for flexographic printing plate, flexographic printing original plate, flexographic printing plate, and copolymer

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CA1105758A (en) * 1976-05-06 1981-07-28 Yoshihiro Hosaka PHOTOSENSITIVE COMPOSITIONS CONTAINING A COPOLYMER DERIVED FROM A CONJUGATED DIOLEFIN AND AN .alpha. .beta. ETHYLENICALLY UNSATURATED CARBOXYLIC ACID OR ANHYDRIDE
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JPS6036953B2 (ja) * 1977-05-27 1985-08-23 神崎製紙株式会社 感圧複写紙
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JPS61181811A (ja) * 1985-02-08 1986-08-14 Japan Synthetic Rubber Co Ltd ランダム共役ジエン系共重合体およびその製造方法
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JPH085927B2 (ja) * 1986-12-26 1996-01-24 日本合成ゴム株式会社 感光性樹脂組成物
EP0295944A3 (de) * 1987-06-18 1989-09-06 Napp Systems (Usa) Inc. Lichtempfindliche Harzzusammensetzung und damit hergestellte Druckplatte
JPS6449035A (en) * 1987-08-20 1989-02-23 Japan Synthetic Rubber Co Ltd Photosensitive resin composition
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Also Published As

Publication number Publication date
GR3024132T3 (en) 1997-10-31
EP0489553A1 (de) 1992-06-10
AU8836691A (en) 1992-06-04
US5348844A (en) 1994-09-20
CA2056762A1 (en) 1992-06-04
EP0489553B1 (de) 1997-05-28
ES2101726T3 (es) 1997-07-16
DE69126283T2 (de) 1997-09-04
AU650697B2 (en) 1994-06-30
DK0489553T3 (da) 1997-06-30
ATE153781T1 (de) 1997-06-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition