GB1494043A - Photosensitive lithographic printing plate precursors - Google Patents

Photosensitive lithographic printing plate precursors

Info

Publication number
GB1494043A
GB1494043A GB7230/75A GB723075A GB1494043A GB 1494043 A GB1494043 A GB 1494043A GB 7230/75 A GB7230/75 A GB 7230/75A GB 723075 A GB723075 A GB 723075A GB 1494043 A GB1494043 A GB 1494043A
Authority
GB
United Kingdom
Prior art keywords
photo
sensitive
layer
printing plate
styrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7230/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1494043A publication Critical patent/GB1494043A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F112/22—Oxygen
    • C08F112/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1494043 Photo-sensitive diazo resin materials FUJI PHOTO FILM CO Ltd 20 Feb 1975 [21 Feb 1974] 7230/75 Heading G2C [Also in Division C3] A photo-sensitive lithographic printing plate precursor has a hydrophilic support and a photosensitive layer containing a photo-sensitive quinonediazide resin consisting of hydroxystyrene units and substituted styrene units having a quinonediazide group bonded to the benzene ring of the styrene'unit via an oxygen atom e.g. a diazide resin containing repeating units of the Formula:- where X is -SO 2 - or -CO-, R<SP>1</SP> is an optionally substituted quinonediazide group, R<SP>2</SP> is alkyl or aryl which may be substitutued by an o-quinonediazide group, and x and z are integers and y is zero or an integer. The photo-sensitive layer may contain alkali-soluble resins such as phenolformaldehyde, cresol resin, styrene/maleic anhydride copolymer or shellac, organic dyes, spiropyrans which discolour on exposure and organic ester plasticizers. A subbing layer and optionally a second hydrophilic layer may be present between the photo-sensitive layer and the support. After imagewise exposure, the printing plate precursor is treated with an alkaline developer solution and the exposed areas removed by brushing to give a positive image.
GB7230/75A 1974-02-21 1975-02-20 Photosensitive lithographic printing plate precursors Expired GB1494043A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (en) 1974-02-21 1974-02-21

Publications (1)

Publication Number Publication Date
GB1494043A true GB1494043A (en) 1977-12-07

Family

ID=12040784

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7230/75A Expired GB1494043A (en) 1974-02-21 1975-02-20 Photosensitive lithographic printing plate precursors

Country Status (5)

Country Link
JP (1) JPS5236043B2 (en)
CA (1) CA1061156A (en)
DE (1) DE2507548C2 (en)
FR (1) FR2262329B1 (en)
GB (1) GB1494043A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate
EP1111467A1 (en) * 1999-12-22 2001-06-27 Kodak Polychrome Graphics Company Ltd. Chemical resistant underlayer for positive-working printing plates
CN112650023A (en) * 2020-12-23 2021-04-13 阜阳申邦新材料技术有限公司 High-resolution photoresist composition and application thereof

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS58205147A (en) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd Positive type photoresist composition
JPS62227143A (en) * 1986-03-28 1987-10-06 Toshiba Corp Photosensitive composition
FR2648468B1 (en) * 1989-05-30 1992-12-04 Commissariat Energie Atomique RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON
JP2567282B2 (en) * 1989-10-02 1996-12-25 日本ゼオン株式会社 Positive resist composition
DE4106356A1 (en) * 1991-02-28 1992-09-03 Hoechst Ag RADIATION-SENSITIVE POLYMERS WITH NAPHTHOQUINONE-2-DIAZIDE-4-SULFONYL GROUPS AND THEIR USE IN A POSITIVE WORKING RECORDING MATERIAL
KR100363695B1 (en) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 Organic diffuse reflection prevention polymer and its manufacturing method
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
DE602007006822D1 (en) 2007-11-30 2010-07-08 Agfa Graphics Nv Process for treating a lithographic printing plate
ES2430562T3 (en) 2008-03-04 2013-11-21 Agfa Graphics N.V. Method for manufacturing a support of a lithographic printing plate
ES2365885T3 (en) 2008-03-31 2011-10-13 Agfa Graphics N.V. A METHOD TO TREAT A LITHOGRAPHIC PRINT IRON.
EP3032334B1 (en) 2014-12-08 2017-10-18 Agfa Graphics Nv A system for reducing ablation debris
EP3430474A1 (en) 2016-03-16 2019-01-23 Agfa Nv Method and apparatus for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate
EP1111467A1 (en) * 1999-12-22 2001-06-27 Kodak Polychrome Graphics Company Ltd. Chemical resistant underlayer for positive-working printing plates
US6528228B2 (en) 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
CN112650023A (en) * 2020-12-23 2021-04-13 阜阳申邦新材料技术有限公司 High-resolution photoresist composition and application thereof

Also Published As

Publication number Publication date
CA1061156A (en) 1979-08-28
FR2262329B1 (en) 1977-04-15
JPS5236043B2 (en) 1977-09-13
FR2262329A1 (en) 1975-09-19
DE2507548A1 (en) 1975-09-04
JPS50113305A (en) 1975-09-05
DE2507548C2 (en) 1984-10-11

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee