FR2648468B1 - RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON - Google Patents

RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON

Info

Publication number
FR2648468B1
FR2648468B1 FR8907111A FR8907111A FR2648468B1 FR 2648468 B1 FR2648468 B1 FR 2648468B1 FR 8907111 A FR8907111 A FR 8907111A FR 8907111 A FR8907111 A FR 8907111A FR 2648468 B1 FR2648468 B1 FR 2648468B1
Authority
FR
France
Prior art keywords
electron
radiation
resin composition
composition sensitive
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR8907111A
Other languages
French (fr)
Other versions
FR2648468A1 (en
Inventor
Christophe Pierrat
Charles Rosilio
Francoise Vinet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR8907111A priority Critical patent/FR2648468B1/en
Priority to JP50840390A priority patent/JPH04505668A/en
Priority to EP19900908560 priority patent/EP0474716A1/en
Priority to PCT/FR1990/000373 priority patent/WO1990015363A1/en
Publication of FR2648468A1 publication Critical patent/FR2648468A1/en
Application granted granted Critical
Publication of FR2648468B1 publication Critical patent/FR2648468B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
FR8907111A 1989-05-30 1989-05-30 RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON Expired - Lifetime FR2648468B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8907111A FR2648468B1 (en) 1989-05-30 1989-05-30 RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON
JP50840390A JPH04505668A (en) 1989-05-30 1990-05-29 Resin composition sensitive to ultraviolet rays and electron beams
EP19900908560 EP0474716A1 (en) 1989-05-30 1990-05-29 Resin composition sensitive to uv radiation and to electrons
PCT/FR1990/000373 WO1990015363A1 (en) 1989-05-30 1990-05-29 Resin composition sensitive to uv radiation and to electrons

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8907111A FR2648468B1 (en) 1989-05-30 1989-05-30 RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON

Publications (2)

Publication Number Publication Date
FR2648468A1 FR2648468A1 (en) 1990-12-21
FR2648468B1 true FR2648468B1 (en) 1992-12-04

Family

ID=9382173

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8907111A Expired - Lifetime FR2648468B1 (en) 1989-05-30 1989-05-30 RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON

Country Status (4)

Country Link
EP (1) EP0474716A1 (en)
JP (1) JPH04505668A (en)
FR (1) FR2648468B1 (en)
WO (1) WO1990015363A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5236043B2 (en) * 1974-02-21 1977-09-13
EP0136110A3 (en) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Positive photosensitive compositions useful as photoresists
NO173574C (en) * 1984-06-01 1993-12-29 Rohm & Haas Method of producing a thermally stable, positive or negative image on a substrate surface

Also Published As

Publication number Publication date
EP0474716A1 (en) 1992-03-18
WO1990015363A1 (en) 1990-12-13
JPH04505668A (en) 1992-10-01
FR2648468A1 (en) 1990-12-21

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Legal Events

Date Code Title Description
ST Notification of lapse