JPS5236043B2 - - Google Patents

Info

Publication number
JPS5236043B2
JPS5236043B2 JP49020925A JP2092574A JPS5236043B2 JP S5236043 B2 JPS5236043 B2 JP S5236043B2 JP 49020925 A JP49020925 A JP 49020925A JP 2092574 A JP2092574 A JP 2092574A JP S5236043 B2 JPS5236043 B2 JP S5236043B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49020925A
Other languages
Japanese (ja)
Other versions
JPS50113305A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49020925A priority Critical patent/JPS5236043B2/ja
Priority to FR7505313A priority patent/FR2262329B1/fr
Priority to GB7230/75A priority patent/GB1494043A/en
Priority to DE2507548A priority patent/DE2507548C2/en
Priority to CA220,777A priority patent/CA1061156A/en
Publication of JPS50113305A publication Critical patent/JPS50113305A/ja
Priority to US05/789,587 priority patent/US4139384A/en
Publication of JPS5236043B2 publication Critical patent/JPS5236043B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F112/22—Oxygen
    • C08F112/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP49020925A 1974-02-21 1974-02-21 Expired JPS5236043B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (en) 1974-02-21 1974-02-21
FR7505313A FR2262329B1 (en) 1974-02-21 1975-02-20
GB7230/75A GB1494043A (en) 1974-02-21 1975-02-20 Photosensitive lithographic printing plate precursors
DE2507548A DE2507548C2 (en) 1974-02-21 1975-02-21 Presensitized lithographic printing plate and its use for forming images
CA220,777A CA1061156A (en) 1974-02-21 1975-02-21 Lithographic plate with layer of photosensitive diazo-oxide resin
US05/789,587 US4139384A (en) 1974-02-21 1977-04-21 Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (en) 1974-02-21 1974-02-21

Publications (2)

Publication Number Publication Date
JPS50113305A JPS50113305A (en) 1975-09-05
JPS5236043B2 true JPS5236043B2 (en) 1977-09-13

Family

ID=12040784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49020925A Expired JPS5236043B2 (en) 1974-02-21 1974-02-21

Country Status (5)

Country Link
JP (1) JPS5236043B2 (en)
CA (1) CA1061156A (en)
DE (1) DE2507548C2 (en)
FR (1) FR2262329B1 (en)
GB (1) GB1494043A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2523324A1 (en) * 1982-03-15 1983-09-16 Shipley Co PHOTOCHEMICAL RESIST COMPOSITION CONTAINING DIAZO SENSITIZER AND POLYVINYLPHENOL RESIN AND APPLICATIONS THEREOF
EP0095388A2 (en) * 1982-05-25 1983-11-30 Sumitomo Chemical Company, Limited Positive-type photoresist compositions

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62227143A (en) * 1986-03-28 1987-10-06 Toshiba Corp Photosensitive composition
FR2648468B1 (en) * 1989-05-30 1992-12-04 Commissariat Energie Atomique RESIN COMPOSITION SENSITIVE TO UV RADIATION AND ELECTRON
JP2567282B2 (en) * 1989-10-02 1996-12-25 日本ゼオン株式会社 Positive resist composition
DE4106356A1 (en) * 1991-02-28 1992-09-03 Hoechst Ag RADIATION-SENSITIVE POLYMERS WITH NAPHTHOQUINONE-2-DIAZIDE-4-SULFONYL GROUPS AND THEIR USE IN A POSITIVE WORKING RECORDING MATERIAL
JP3290316B2 (en) 1994-11-18 2002-06-10 富士写真フイルム株式会社 Photosensitive lithographic printing plate
JP3506295B2 (en) 1995-12-22 2004-03-15 富士写真フイルム株式会社 Positive photosensitive lithographic printing plate
KR100363695B1 (en) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 Organic diffuse reflection prevention polymer and its manufacturing method
US6528228B2 (en) * 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
EP2065211B1 (en) 2007-11-30 2010-05-26 Agfa Graphics N.V. A method for treating a lithographic printing plate
ES2430562T3 (en) 2008-03-04 2013-11-21 Agfa Graphics N.V. Method for manufacturing a support of a lithographic printing plate
ATE514561T1 (en) 2008-03-31 2011-07-15 Agfa Graphics Nv METHOD FOR TREATING A LITHOGRAPHIC PRINTING PLATE
EP3032334B1 (en) 2014-12-08 2017-10-18 Agfa Graphics Nv A system for reducing ablation debris
BR112018068753A2 (en) 2016-03-16 2019-01-22 Agfa Nv method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
CN112650023B (en) * 2020-12-23 2023-07-14 上海彤程电子材料有限公司 High-resolution photoresist composition and application thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2523324A1 (en) * 1982-03-15 1983-09-16 Shipley Co PHOTOCHEMICAL RESIST COMPOSITION CONTAINING DIAZO SENSITIZER AND POLYVINYLPHENOL RESIN AND APPLICATIONS THEREOF
EP0095388A2 (en) * 1982-05-25 1983-11-30 Sumitomo Chemical Company, Limited Positive-type photoresist compositions

Also Published As

Publication number Publication date
FR2262329A1 (en) 1975-09-19
FR2262329B1 (en) 1977-04-15
CA1061156A (en) 1979-08-28
DE2507548A1 (en) 1975-09-04
GB1494043A (en) 1977-12-07
JPS50113305A (en) 1975-09-05
DE2507548C2 (en) 1984-10-11

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