FR2262329B1 - - Google Patents

Info

Publication number
FR2262329B1
FR2262329B1 FR7505313A FR7505313A FR2262329B1 FR 2262329 B1 FR2262329 B1 FR 2262329B1 FR 7505313 A FR7505313 A FR 7505313A FR 7505313 A FR7505313 A FR 7505313A FR 2262329 B1 FR2262329 B1 FR 2262329B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7505313A
Other versions
FR2262329A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of FR2262329A1 publication Critical patent/FR2262329A1/fr
Application granted granted Critical
Publication of FR2262329B1 publication Critical patent/FR2262329B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F112/22—Oxygen
    • C08F112/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
FR7505313A 1974-02-21 1975-02-20 Expired FR2262329B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (fr) 1974-02-21 1974-02-21

Publications (2)

Publication Number Publication Date
FR2262329A1 FR2262329A1 (fr) 1975-09-19
FR2262329B1 true FR2262329B1 (fr) 1977-04-15

Family

ID=12040784

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7505313A Expired FR2262329B1 (fr) 1974-02-21 1975-02-20

Country Status (5)

Country Link
JP (1) JPS5236043B2 (fr)
CA (1) CA1061156A (fr)
DE (1) DE2507548C2 (fr)
FR (1) FR2262329B1 (fr)
GB (1) GB1494043A (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS62227143A (ja) * 1986-03-28 1987-10-06 Toshiba Corp 感光性組成物
FR2648468B1 (fr) * 1989-05-30 1992-12-04 Commissariat Energie Atomique Composition de resine sensible aux rayonnements uv et aux electrons
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법
US6528228B2 (en) * 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
EP1884372B1 (fr) 2006-08-03 2009-10-21 Agfa Graphics N.V. Support pour plaque d'impression lithographique
DE602007006822D1 (de) 2007-11-30 2010-07-08 Agfa Graphics Nv Verfahren zur Behandlung einer Lithografiedruckplatte
EP2098376B1 (fr) 2008-03-04 2013-09-18 Agfa Graphics N.V. Procédé pour réaliser un support de plaque d'impression lithographique
ATE514561T1 (de) 2008-03-31 2011-07-15 Agfa Graphics Nv Verfahren zur behandlung einer lithografischen druckplatte
EP3032334B1 (fr) 2014-12-08 2017-10-18 Agfa Graphics Nv Système permettant de réduire les débris d'ablation
US20190079406A1 (en) 2016-03-16 2019-03-14 Agfa Nv Method for processing a lithographic printing plate
EP3637188A1 (fr) 2018-10-08 2020-04-15 Agfa Nv Précurseur de révélateur effervescent pour le traitement d'un précurseur de plaque d'impression lithographique
CN112650023B (zh) * 2020-12-23 2023-07-14 上海彤程电子材料有限公司 一种高分辨率光刻胶组合物及其应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (fr) * 1972-05-05 1974-11-27

Also Published As

Publication number Publication date
JPS50113305A (fr) 1975-09-05
JPS5236043B2 (fr) 1977-09-13
CA1061156A (fr) 1979-08-28
FR2262329A1 (fr) 1975-09-19
GB1494043A (en) 1977-12-07
DE2507548A1 (de) 1975-09-04
DE2507548C2 (de) 1984-10-11

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Legal Events

Date Code Title Description
ST Notification of lapse