JPS50113305A - - Google Patents

Info

Publication number
JPS50113305A
JPS50113305A JP49020925A JP2092574A JPS50113305A JP S50113305 A JPS50113305 A JP S50113305A JP 49020925 A JP49020925 A JP 49020925A JP 2092574 A JP2092574 A JP 2092574A JP S50113305 A JPS50113305 A JP S50113305A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49020925A
Other languages
Japanese (ja)
Other versions
JPS5236043B2 (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49020925A priority Critical patent/JPS5236043B2/ja
Priority to GB7230/75A priority patent/GB1494043A/en
Priority to FR7505313A priority patent/FR2262329B1/fr
Priority to DE2507548A priority patent/DE2507548C2/de
Priority to CA220,777A priority patent/CA1061156A/fr
Publication of JPS50113305A publication Critical patent/JPS50113305A/ja
Priority to US05/789,587 priority patent/US4139384A/en
Publication of JPS5236043B2 publication Critical patent/JPS5236043B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F112/22—Oxygen
    • C08F112/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP49020925A 1974-02-21 1974-02-21 Expired JPS5236043B2 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (fr) 1974-02-21 1974-02-21
GB7230/75A GB1494043A (en) 1974-02-21 1975-02-20 Photosensitive lithographic printing plate precursors
FR7505313A FR2262329B1 (fr) 1974-02-21 1975-02-20
DE2507548A DE2507548C2 (de) 1974-02-21 1975-02-21 Vorsensibilisierte lithographische Druckplatte und deren Verwendung zur Erzeugung von Bildern
CA220,777A CA1061156A (fr) 1974-02-21 1975-02-21 Plaque lithographique a couche de resine d'oxyde diazoique photosensible
US05/789,587 US4139384A (en) 1974-02-21 1977-04-21 Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (fr) 1974-02-21 1974-02-21

Publications (2)

Publication Number Publication Date
JPS50113305A true JPS50113305A (fr) 1975-09-05
JPS5236043B2 JPS5236043B2 (fr) 1977-09-13

Family

ID=12040784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49020925A Expired JPS5236043B2 (fr) 1974-02-21 1974-02-21

Country Status (5)

Country Link
JP (1) JPS5236043B2 (fr)
CA (1) CA1061156A (fr)
DE (1) DE2507548C2 (fr)
FR (1) FR2262329B1 (fr)
GB (1) GB1494043A (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2065211A1 (fr) 2007-11-30 2009-06-03 Agfa Graphics N.V. Procédé pour traiter une plaque d'impression lithographique
EP2098376A1 (fr) 2008-03-04 2009-09-09 Agfa Graphics N.V. Procédé pour réaliser un support de plaque d'impression lithographique
EP2106924A1 (fr) 2008-03-31 2009-10-07 Agfa Graphics N.V. Procédé pour traiter une plaque d'impression lithographique
US8419923B2 (en) 2006-08-03 2013-04-16 Agfa Graphics Nv Lithographic printing plate support
EP3032334A1 (fr) 2014-12-08 2016-06-15 Agfa Graphics Nv Système permettant de réduire les débris d'ablation
WO2017157571A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Procédé et appareil de traitement d'une plaque d'impression lithographique
EP3637188A1 (fr) 2018-10-08 2020-04-15 Agfa Nv Précurseur de révélateur effervescent pour le traitement d'un précurseur de plaque d'impression lithographique

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS62227143A (ja) * 1986-03-28 1987-10-06 Toshiba Corp 感光性組成物
FR2648468B1 (fr) * 1989-05-30 1992-12-04 Commissariat Energie Atomique Composition de resine sensible aux rayonnements uv et aux electrons
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법
US6528228B2 (en) 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
CN112650023B (zh) * 2020-12-23 2023-07-14 上海彤程电子材料有限公司 一种高分辨率光刻胶组合物及其应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (fr) * 1972-05-05 1974-11-27

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8419923B2 (en) 2006-08-03 2013-04-16 Agfa Graphics Nv Lithographic printing plate support
EP2065211A1 (fr) 2007-11-30 2009-06-03 Agfa Graphics N.V. Procédé pour traiter une plaque d'impression lithographique
EP2098376A1 (fr) 2008-03-04 2009-09-09 Agfa Graphics N.V. Procédé pour réaliser un support de plaque d'impression lithographique
EP2106924A1 (fr) 2008-03-31 2009-10-07 Agfa Graphics N.V. Procédé pour traiter une plaque d'impression lithographique
EP3032334A1 (fr) 2014-12-08 2016-06-15 Agfa Graphics Nv Système permettant de réduire les débris d'ablation
WO2017157572A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Appareil permettant de traiter une plaque d'impression lithographique, et procédé correspondant
WO2017157571A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Procédé et appareil de traitement d'une plaque d'impression lithographique
WO2017157578A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Procédé de traitement d'une plaque d'impression lithographique
WO2017157575A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Procédé et appareil de traitement de plaque d'impression lithographique
WO2017157576A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Procédé de traitement d'une plaque d'impression lithographique
WO2017157579A1 (fr) 2016-03-16 2017-09-21 Agfa Graphics Nv Procédé de traitement d'une plaque d'impression lithographique
EP3637188A1 (fr) 2018-10-08 2020-04-15 Agfa Nv Précurseur de révélateur effervescent pour le traitement d'un précurseur de plaque d'impression lithographique
WO2020074258A1 (fr) 2018-10-08 2020-04-16 Agfa Nv Précurseur de révélateur effervescent pour le traitement d'un précurseur de plaque d'impression lithographique

Also Published As

Publication number Publication date
GB1494043A (en) 1977-12-07
FR2262329B1 (fr) 1977-04-15
CA1061156A (fr) 1979-08-28
DE2507548C2 (de) 1984-10-11
DE2507548A1 (de) 1975-09-04
FR2262329A1 (fr) 1975-09-19
JPS5236043B2 (fr) 1977-09-13

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