ES2061584T3 - Compuesto de resina curable por radiacion de energia activa, conteniendo un polimero copolimerizado por injerto con una cadena que contiene un grupo diciclopentenilo. - Google Patents
Compuesto de resina curable por radiacion de energia activa, conteniendo un polimero copolimerizado por injerto con una cadena que contiene un grupo diciclopentenilo.Info
- Publication number
- ES2061584T3 ES2061584T3 ES88115155T ES88115155T ES2061584T3 ES 2061584 T3 ES2061584 T3 ES 2061584T3 ES 88115155 T ES88115155 T ES 88115155T ES 88115155 T ES88115155 T ES 88115155T ES 2061584 T3 ES2061584 T3 ES 2061584T3
- Authority
- ES
- Spain
- Prior art keywords
- active energy
- energy radiation
- diciclopentenyl
- composite
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F285/00—Macromolecular compounds obtained by polymerising monomers on to preformed graft polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Graft Or Block Polymers (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
Abstract
LA COMPOSICION COMPRENDE (I) UN POLIMERO COPOLIMERIZADO POR UN INERTO CON UNA CADENA PRINCIPAL QUE CONTIENE UN GRUPO DERIVADO DE DICICLO PENTENILO CON UN PESO MOLECULAR PROMEDIO EN NUMERO DE 5000 O MAYOR Y UN PESO MOLECULAR PROMEDIO EN PESO DE 50000 O MENOR, (II) UN POLIMERO LINEAL CON UN PMPN DE 5000 O MAYOR Y UN PMPP DE 350000 O MENOR Y CON UNA TEMPERATURA DE TRANSICION VITREA DE 60 (GRADOS) C O MAYOR, (III) UN MONOMERO CON UN ENLACE INSATURADO ETILENICAMENTE, Y (IV) UN INICIADOR DE FOTOPOLIMERIZACION CAPAZ DE GENERARA RADICALES LIBRES CON IRRADIACION DE UNA RADIACION ENERGETICA ACTIVA. LA COMPOSICION PUEDE SER CURADA ADECUADAMENTE CON UNA RADIACION ENERGETICA ACTIVA TAL COMO UV O HAZ DE ELECTRONES Y ES CAPAZ DE SER LAMINADA SEGUN UN DISEÑO DESEADO SOBRE UN LAMINADO RECUBIERTO DE COBRE PARA UTILIZAR COMO TARJETA IMPRESA O SOBRE UNA PLACA DE METAL, VIDRIO, CERAMICA O PLASTICO.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22949287 | 1987-09-16 | ||
JP15907688 | 1988-06-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2061584T3 true ES2061584T3 (es) | 1994-12-16 |
Family
ID=26485990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES88115155T Expired - Lifetime ES2061584T3 (es) | 1987-09-16 | 1988-09-15 | Compuesto de resina curable por radiacion de energia activa, conteniendo un polimero copolimerizado por injerto con una cadena que contiene un grupo diciclopentenilo. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5068263A (es) |
EP (1) | EP0307920B1 (es) |
JP (1) | JP2656569B2 (es) |
DE (1) | DE3887414T2 (es) |
ES (1) | ES2061584T3 (es) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2573661B2 (ja) * | 1988-07-09 | 1997-01-22 | キヤノン株式会社 | 感光感熱型接着剤 |
JP2719799B2 (ja) * | 1988-10-14 | 1998-02-25 | 日本合成化学工業株式会社 | 感光性樹脂組成物 |
EP0447588B1 (en) * | 1990-03-22 | 1994-08-31 | Canon Kabushiki Kaisha | Liquid jet recording head and recording apparatus having same |
JPH07170054A (ja) * | 1993-12-14 | 1995-07-04 | Canon Inc | 紫外線硬化性組成物、これを用いたパターン形成方法及び配線基板の製造方法 |
JPH08165441A (ja) * | 1994-10-13 | 1996-06-25 | Canon Inc | 活性エネルギー線重合性組成物、これを含む記録媒体及びこれを用いた画像形成方法 |
DE60223195T2 (de) * | 2001-05-25 | 2008-08-14 | Nippon Paint Co., Ltd. | Verfahren zum Beschichten von Kunststofformteilen, ultraviolett härtbare Unterschicht für Metallbedampfung und Kunststofformteile |
JP4384570B2 (ja) * | 2003-12-01 | 2009-12-16 | 東京応化工業株式会社 | 厚膜用ホトレジスト組成物及びレジストパターンの形成方法 |
WO2009125806A1 (ja) * | 2008-04-10 | 2009-10-15 | リンテック株式会社 | エネルギー線硬化性層用樹脂組成物および貫通孔形成用シート |
US9453139B2 (en) | 2013-08-20 | 2016-09-27 | Rohm And Haas Electronic Materials Llc | Hot melt compositions with improved etch resistance |
CN115703901B (zh) * | 2021-08-10 | 2024-05-07 | 中国石油天然气股份有限公司 | 一种abs树脂加工助剂及其制备方法、abs树脂复合加工助剂 |
CN115124648A (zh) * | 2022-07-05 | 2022-09-30 | 中国海洋大学 | 一种含环氧基和双环戊烯基的丙烯酸树脂及其制备方法与它的用途 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3686673T2 (de) * | 1985-06-10 | 1993-04-15 | Canon Kk | Strahlenhaertbare harzzusammensetzung. |
DE3620254C2 (de) * | 1985-06-18 | 1994-05-05 | Canon Kk | Durch Strahlen mit wirksamer Energie härtbare Harzmischung |
US4688054A (en) * | 1985-07-09 | 1987-08-18 | Canon Kabushiki Kaisha | Liquid jet recording head |
US4688052A (en) * | 1985-07-13 | 1987-08-18 | Canon Kabushiki Kaisha | Liquid jet recording head having a layer of a resin composition curable with an active energy ray |
EP0217137B1 (en) * | 1985-08-29 | 1992-04-08 | E.I. Du Pont De Nemours And Company | Photopolymerizable composition of acrylic copolymer containing dicyclopentenyl acrylate or methacrylate |
JPH0686505B2 (ja) * | 1986-03-10 | 1994-11-02 | キヤノン株式会社 | 活性エネルギ−線硬化型樹脂組成物 |
-
1988
- 1988-09-15 US US07/244,301 patent/US5068263A/en not_active Expired - Lifetime
- 1988-09-15 EP EP88115155A patent/EP0307920B1/en not_active Expired - Lifetime
- 1988-09-15 DE DE3887414T patent/DE3887414T2/de not_active Expired - Lifetime
- 1988-09-15 ES ES88115155T patent/ES2061584T3/es not_active Expired - Lifetime
- 1988-09-16 JP JP63231646A patent/JP2656569B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0307920A3 (en) | 1989-06-14 |
JPH0297516A (ja) | 1990-04-10 |
JP2656569B2 (ja) | 1997-09-24 |
EP0307920B1 (en) | 1994-01-26 |
DE3887414D1 (de) | 1994-03-10 |
US5068263A (en) | 1991-11-26 |
EP0307920A2 (en) | 1989-03-22 |
DE3887414T2 (de) | 1994-05-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES2061584T3 (es) | Compuesto de resina curable por radiacion de energia activa, conteniendo un polimero copolimerizado por injerto con una cadena que contiene un grupo diciclopentenilo. | |
ES2135899T3 (es) | Procedimiento de produccion de un producto fotocromico obtenido por endurecimiento. | |
ES2040791T3 (es) | Compuesto de resina curable mediante radiaciones de energia activa, que contiene resina epoxi y un monomero con un enlace etilenicamente no saturado. | |
ES2040792T3 (es) | Compuesto de resina curable por radiaciones de energia activa, que contiene poliuretano fotopolimerizable. | |
ES2103246T3 (es) | Metodo para generar una especie reactiva y aplicaciones del mismo. | |
ES2098499T3 (es) | Macromoleculas inhibidas en el enmarañamiento. | |
ES2118914T3 (es) | Resinas de moldeo y moldes transparentes a la radiacion uv realizados a partir de las mismas. | |
ES2040790T3 (es) | Compuesto de resina curable mediante radiaciones de energia activa, que contiene una resina epoxi dotada de, como minimo, un compuesto que tiene uno o varios grupos epoxi en la molecula. | |
ATE527099T1 (de) | Photohärtbare zusammensetzungen | |
ES2128786T3 (es) | Polimeros ramificados de cadena larga y su produccion. | |
ES2050120T3 (es) | Aditivos de cemento hidraulico y composiciones de cemento hidraulico que los contienen. | |
ES2040793T3 (es) | Compuesto de resina curable con radiaciones de energia activa conteniendo resina epoxi semiesterificada como componente. | |
ES8707140A1 (es) | Un metodo para conformar articulos polimeros compuestos que tienen segmentos polimeros distintos | |
ES2031891T3 (es) | Adhesivo sensible a la presion reticulado por monomeros de cetona aromatica copolimerizable. | |
ES2059496T3 (es) | Composicion de resina epoxidica curable. | |
ES2040794T3 (es) | Compuesto de resina curable mediante radiaciones de energia activa, que contiene una resina epoxi semi-esterificada y monomero que tiene un enlace etilenicamente insaturado. | |
ES2090011T3 (es) | Modificador resistente al impacto, para plasticos. | |
ES2137925T3 (es) | Polioles modificados con resina epoxidica como dispersantes para polioles de polimeros con alto contenido en solidos y alto contenido en estireno. | |
IT8123806A0 (it) | Procedimento di preparazione di polimeri oppure di copolimeri acrilici idrosolubili di peso molecolare elevato e a basso contenuto in monomero (monomeri)residuo (residui). | |
GR3021493T3 (en) | Process for producing flexible, fibre-based, protective, auxiliary and insulating materials for electrical purposes using impregnating materials curable by high-energy radiation | |
NO874994L (no) | Varmtherdende anhydridmonomer. | |
GR78977B (es) | ||
JPS53110543A (en) | Optical branching and coupling circuit | |
ES2073436T3 (es) | Uso de dispersantes de peso molecular elevado en un procedimiento para preparar polioles-polimeros estables en polioles que tienen pesos moleculares superiores a 4.000. | |
NZ219854A (en) | Liquid thermal or radiation curable polymer containing more than one pendant group having two hydroxy groups, one esterified by an acrylic acid or derivative and the other esterified by maleic acid or a derivative |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
Ref document number: 307920 Country of ref document: ES |