ES2040794T3 - Compuesto de resina curable mediante radiaciones de energia activa, que contiene una resina epoxi semi-esterificada y monomero que tiene un enlace etilenicamente insaturado. - Google Patents

Compuesto de resina curable mediante radiaciones de energia activa, que contiene una resina epoxi semi-esterificada y monomero que tiene un enlace etilenicamente insaturado.

Info

Publication number
ES2040794T3
ES2040794T3 ES198888115158T ES88115158T ES2040794T3 ES 2040794 T3 ES2040794 T3 ES 2040794T3 ES 198888115158 T ES198888115158 T ES 198888115158T ES 88115158 T ES88115158 T ES 88115158T ES 2040794 T3 ES2040794 T3 ES 2040794T3
Authority
ES
Spain
Prior art keywords
ethylenically unsaturated
active energy
epoxy resin
energy radiation
unsaturated link
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198888115158T
Other languages
English (en)
Inventor
Hiromichi Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of ES2040794T3 publication Critical patent/ES2040794T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C08F290/144—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

ESTA COMPOSICION MEJORADA COMPRENDE (I) UN POLIMERO COPOLIMERIZADO POR INJERTO CON UN PESO MOLECULAR PROMEDIO EN NUMERO (PMPN) DE 5000 O MAYOR Y UN PESO MOLECULAR PROMEDIO EN PESO (PMPP) DE 50000 O MENOR, (II) UN POLIMERO LINEAL CON PMPN DE 5000 O MAYOR Y UN PMPP DE 350000 O MENOR Y CON UNA TEMPERATURA DE TRANSICION VITREA DE 60 (GRADOS) C O MAYOR, (III) UNA RESINA EPOXI SEMIESTERIFICADA, (IV) UN MONOMERO QUE TIENE UN ENLACE INSATURADO ETILENICAMENTE, Y (V) UN INICIADOR DE POLIMERIZACION CAPAZ DE GENERAR UN ACIDO LEWIS POR IRRADIACION DE UNA RADIACION ENERGETICA ACTIVA. LA COMPOSICION PUEDE SER CURADA ADECUADAMENTE CON UNA RADIACION ENERGETICA ACTIVA TAL COMO UV O HAZ DE ELECTRONES Y ES CAPAZ DE SER LAMINADA SEGUN UN DISEÑO DETERMINADO SOBRE UN LAMINADO RECUBIERTO DE COBRE PARA UTILIZAR COMO TARJETA IMPRESA O SOBRE UNA PLACA DE METAL, VIDRIO, CERAMICA O PLASTICO.
ES198888115158T 1987-09-16 1988-09-15 Compuesto de resina curable mediante radiaciones de energia activa, que contiene una resina epoxi semi-esterificada y monomero que tiene un enlace etilenicamente insaturado. Expired - Lifetime ES2040794T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22949287 1987-09-16
JP15907888 1988-06-29

Publications (1)

Publication Number Publication Date
ES2040794T3 true ES2040794T3 (es) 1993-11-01

Family

ID=26485992

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198888115158T Expired - Lifetime ES2040794T3 (es) 1987-09-16 1988-09-15 Compuesto de resina curable mediante radiaciones de energia activa, que contiene una resina epoxi semi-esterificada y monomero que tiene un enlace etilenicamente insaturado.

Country Status (4)

Country Link
US (1) US5068257A (es)
EP (1) EP0307923B1 (es)
DE (1) DE3881135T2 (es)
ES (1) ES2040794T3 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5238730A (en) * 1988-04-04 1993-08-24 Hitachi Chemical Company, Ltd. Electrical laminate with dibasic acid-modified epoxy (meth)acrylate
JP2573661B2 (ja) * 1988-07-09 1997-01-22 キヤノン株式会社 感光感熱型接着剤
DE69012095T2 (de) * 1990-03-22 1995-02-02 Canon Kk Flüssigkeitsstrahlaufzeichnungskopf und Aufzeichnungsgerät, versehen mit diesem Kopf.
JPH07170054A (ja) * 1993-12-14 1995-07-04 Canon Inc 紫外線硬化性組成物、これを用いたパターン形成方法及び配線基板の製造方法
JPH08165441A (ja) * 1994-10-13 1996-06-25 Canon Inc 活性エネルギー線重合性組成物、これを含む記録媒体及びこれを用いた画像形成方法
EP1193558A3 (en) * 2000-09-18 2002-08-14 JSR Corporation Radiation-sensitive resin composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3847770A (en) * 1972-04-10 1974-11-12 Continental Can Co Photopolymerizable compositions prepared from beta hydroxy esters and polyitaconates
DE3686673T2 (de) * 1985-06-10 1993-04-15 Canon Kk Strahlenhaertbare harzzusammensetzung.
DE3620254C2 (de) * 1985-06-18 1994-05-05 Canon Kk Durch Strahlen mit wirksamer Energie härtbare Harzmischung
US4688054A (en) * 1985-07-09 1987-08-18 Canon Kabushiki Kaisha Liquid jet recording head
US4688052A (en) * 1985-07-13 1987-08-18 Canon Kabushiki Kaisha Liquid jet recording head having a layer of a resin composition curable with an active energy ray

Also Published As

Publication number Publication date
EP0307923A2 (en) 1989-03-22
DE3881135D1 (de) 1993-06-24
DE3881135T2 (de) 1993-09-16
EP0307923B1 (en) 1993-05-19
EP0307923A3 (en) 1989-06-14
US5068257A (en) 1991-11-26

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