ES2056176T3 - Disolvente para el revelado de capas que se pueden reticular a traves de la fotopolimerizacion asi como procedimientos para la fabricacion de formas en relieve. - Google Patents

Disolvente para el revelado de capas que se pueden reticular a traves de la fotopolimerizacion asi como procedimientos para la fabricacion de formas en relieve.

Info

Publication number
ES2056176T3
ES2056176T3 ES89119314T ES89119314T ES2056176T3 ES 2056176 T3 ES2056176 T3 ES 2056176T3 ES 89119314 T ES89119314 T ES 89119314T ES 89119314 T ES89119314 T ES 89119314T ES 2056176 T3 ES2056176 T3 ES 2056176T3
Authority
ES
Spain
Prior art keywords
photopolymerization
solvent
well
layers
procedures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES89119314T
Other languages
English (en)
Spanish (es)
Inventor
Hans-Joachim Dr Dipl Schlosser
Gunther Schon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of ES2056176T3 publication Critical patent/ES2056176T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
ES89119314T 1988-10-26 1989-10-18 Disolvente para el revelado de capas que se pueden reticular a traves de la fotopolimerizacion asi como procedimientos para la fabricacion de formas en relieve. Expired - Lifetime ES2056176T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3836403A DE3836403A1 (de) 1988-10-26 1988-10-26 Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen

Publications (1)

Publication Number Publication Date
ES2056176T3 true ES2056176T3 (es) 1994-10-01

Family

ID=6365924

Family Applications (1)

Application Number Title Priority Date Filing Date
ES89119314T Expired - Lifetime ES2056176T3 (es) 1988-10-26 1989-10-18 Disolvente para el revelado de capas que se pueden reticular a traves de la fotopolimerizacion asi como procedimientos para la fabricacion de formas en relieve.

Country Status (7)

Country Link
US (1) US5516623A (de)
EP (1) EP0365988B1 (de)
JP (1) JP2929546B2 (de)
AU (1) AU614674B2 (de)
CA (1) CA2001490C (de)
DE (2) DE3836403A1 (de)
ES (1) ES2056176T3 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4020374A1 (de) * 1990-06-27 1992-01-02 Basf Ag Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten
US5252432A (en) * 1990-06-27 1993-10-12 Basf Aktiengesellschaft Production of photopolymeric flexographic relief printing plates
DE4022221A1 (de) * 1990-07-12 1992-01-23 Basf Magnetics Gmbh Magnetband mit schleifmittel
JP3095273B2 (ja) * 1991-11-12 2000-10-03 東京応化工業株式会社 フレキソ印刷版用現像液
ES2157494T3 (es) * 1996-02-20 2001-08-16 Asahi Chemical Ind Procedimiento para la fabricacion de placas de imprimir de resina fotosensible.
US6280519B1 (en) 1998-05-05 2001-08-28 Exxon Chemical Patents Inc. Environmentally preferred fluids and fluid blends
US6818049B1 (en) 1998-05-05 2004-11-16 Exxonmobil Chemical Patents Inc. Environmentally preferred fluids and fluid blends
US8349185B2 (en) 2010-10-20 2013-01-08 E I Du Pont De Nemours And Company Method for rebalancing a multicomponent solvent solution
US8530142B2 (en) 2011-03-15 2013-09-10 Eastman Kodak Company Flexographic printing plate precursor, imaging assembly, and use

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (de) * 1951-08-20
US3656951A (en) * 1970-03-02 1972-04-18 Monsanto Co Photoresist compositions
FR2163896A5 (en) * 1971-12-06 1973-07-27 Eastman Kodak Co Stripping non hardened zones - of exposed photopolymerised layer using high bp solvents eg ethyl adipate
DE2454399C2 (de) * 1974-11-16 1981-09-24 Merck Patent Gmbh, 6100 Darmstadt Ablösemittel für Fotolacke
FR2455076A1 (fr) * 1979-04-24 1980-11-21 Rhone Poulenc Ind Composition pour l'elimination des resines photoresistantes
SU866793A1 (ru) * 1979-12-21 1981-09-23 Проектно-Технологический И Научно-Исследовательский Институт Состав дл удалени фоторезиста на каучуковой основе
US4423135A (en) * 1981-01-28 1983-12-27 E. I. Du Pont De Nemours & Co. Preparation of photosensitive block copolymer elements
US4400460A (en) * 1981-05-07 1983-08-23 E. I. Du Pont De Nemours And Compamy Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers
US4400459A (en) * 1981-05-07 1983-08-23 E. I. Du Pont De Nemours And Company Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates
JPS58137836A (ja) * 1982-02-10 1983-08-16 Toshiba Corp ゴム系レジストの処理剤
JPS59137950A (ja) * 1983-01-27 1984-08-08 Japan Synthetic Rubber Co Ltd レジストパタ−ンの形成方法
DE3600116A1 (de) * 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
US5312719A (en) * 1988-10-26 1994-05-17 E. I. Du Pont De Nemours And Company Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
DE3908763A1 (de) * 1989-03-17 1990-09-27 Basf Ag Lichtempfindliches aufzeichnungselement mit einer aufzeichnungsschicht und einer deckschicht unterschiedlicher loeslichkeitseigenschaften sowie verfahren zu seiner entwicklung in einem arbeitsgang

Also Published As

Publication number Publication date
CA2001490A1 (en) 1990-04-26
AU4374989A (en) 1990-05-03
DE58907886D1 (de) 1994-07-21
EP0365988A3 (en) 1990-12-12
EP0365988A2 (de) 1990-05-02
DE3836403A1 (de) 1990-05-03
EP0365988B1 (de) 1994-06-15
JP2929546B2 (ja) 1999-08-03
JPH02179645A (ja) 1990-07-12
CA2001490C (en) 2001-07-17
US5516623A (en) 1996-05-14
AU614674B2 (en) 1991-09-05

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