ES2088935T3 - Composicion de resina fotosensible utilizable para formar una estructura en relieve. - Google Patents
Composicion de resina fotosensible utilizable para formar una estructura en relieve.Info
- Publication number
- ES2088935T3 ES2088935T3 ES90119036T ES90119036T ES2088935T3 ES 2088935 T3 ES2088935 T3 ES 2088935T3 ES 90119036 T ES90119036 T ES 90119036T ES 90119036 T ES90119036 T ES 90119036T ES 2088935 T3 ES2088935 T3 ES 2088935T3
- Authority
- ES
- Spain
- Prior art keywords
- photosensitive resin
- composition
- relief structure
- resin usable
- excellent results
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Abstract
UNA COMPOSICION DE RESINA FOTOSENSIBLE PARA SU UTILIZACION EN LA FORMACION DE ESTRUCTURA EN RELIEVE QUE COMPRENDE, EN PROPORCIONES ESPECIFICAS UN COMPONENTE DE RESINA LIQUIDA FOTOSENSIBLE QUE COMPRENDE UN URETANO PREPOLIMERO Y UN MONOMERO O SATURADO ETILENICALMENTE POLIMERIZABLE, UN INICIADOR DE FOTOPOLIMERIZACION, UN INHIBIDOR DE POLIMERIZACION TERMAL Y UN COMPUESTO AMINO NO SATURADO ESPECIFICO. EL COMPUESTO DE RESINA FOTOSENSIBLE DE UNOS EXCELENTES RESULTADOS, DADO QUE NO SUFRE LOS EFECTOS DEL FENOMENO TUNEL QUE SE OBSERVA FRECUENTEMENTE EN LAS FORMACIONES EN RELIEVE EN COMPARACION CON LOS COMPUESTOS DE RESINA FOTOSENSIBLES CONVENCIONALES, DE MODO QUE UNA ESTRUCTURA EN RELIEVE FOTORESINA ASI HECHA, NO SOLO SE CARACTERIZA POR SUS PROPIEDADES MECANICAS EXCELENTES Y POR ESTAR EXENTA DE EFECTO TUNEL, SINO QUE DA TAMBIEN EXCELENTES RESULTADOS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1296113A JP2644898B2 (ja) | 1989-11-16 | 1989-11-16 | レリーフ形成用感光性樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2088935T3 true ES2088935T3 (es) | 1996-10-01 |
Family
ID=17829305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES90119036T Expired - Lifetime ES2088935T3 (es) | 1989-11-16 | 1990-10-04 | Composicion de resina fotosensible utilizable para formar una estructura en relieve. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5336585A (es) |
EP (1) | EP0427950B1 (es) |
JP (1) | JP2644898B2 (es) |
DE (1) | DE69027835T2 (es) |
ES (1) | ES2088935T3 (es) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5736298A (en) * | 1992-10-02 | 1998-04-07 | Japan Synthetic Rubber Co., Ltd. | Water developable photosensitive resin composition |
US5543228A (en) * | 1992-11-10 | 1996-08-06 | Dai Nippon Printing Co., Ltd. | Molded relief hologram |
WO1995000567A1 (fr) * | 1993-06-18 | 1995-01-05 | Asahi Kasei Kogyo Kabushiki Kaisha | Composition de resine photosensible destinee a une planche d'impression pour carton ondule |
ES2136838T3 (es) * | 1994-03-04 | 1999-12-01 | Asahi Chemical Ind | Composicion de resina fotosensible liquida a utilizar en la formacion de una estructura de relieve. |
DE69512007T2 (de) * | 1994-12-13 | 2000-01-27 | Macdermid Imaging Technology | Weichreliefsphotopolymerdruckplatten für Flexographie |
US5900444A (en) * | 1996-10-08 | 1999-05-04 | Zamore; Alan | Irradiation conversion of thermoplastic to thermoset polyurethane |
DE69732121T2 (de) * | 1996-10-08 | 2005-12-01 | Alan Zamore | Umwandlung von thermoplastischen zu duroplastischen polymeren durch bestrahlung |
US7749585B2 (en) | 1996-10-08 | 2010-07-06 | Alan Zamore | Reduced profile medical balloon element |
US6656550B1 (en) | 1996-10-08 | 2003-12-02 | Alan M. Zamore | Dilatation device of uniform outer diameter |
US7728049B2 (en) * | 1996-10-08 | 2010-06-01 | Zamore Alan M | Irradiation conversion of thermoplastic to thermoset polymers |
US5965460A (en) * | 1997-01-29 | 1999-10-12 | Mac Dermid, Incorporated | Polyurethane composition with (meth)acrylate end groups useful in the manufacture of polishing pads |
US6432203B1 (en) * | 1997-03-17 | 2002-08-13 | Applied Komatsu Technology, Inc. | Heated and cooled vacuum chamber shield |
US6732649B1 (en) * | 1999-09-28 | 2004-05-11 | Alexander C. Wall | Methods for providing custom rubber stamps |
US7001853B1 (en) * | 2002-08-30 | 2006-02-21 | Caliper Life Sciences, Inc. | Flow control of photo-polymerizable resin |
JP4293591B2 (ja) * | 2003-01-23 | 2009-07-08 | 川崎マイクロエレクトロニクス株式会社 | 表示装置の製造方法 |
US20070266945A1 (en) * | 2006-05-16 | 2007-11-22 | Asm Japan K.K. | Plasma cvd apparatus equipped with plasma blocking insulation plate |
CN101627339A (zh) * | 2007-06-18 | 2010-01-13 | 旭化成电子材料株式会社 | 感光性树脂组合物、柔性印刷版、以及柔性印刷版的制造方法 |
US9056520B2 (en) * | 2012-01-31 | 2015-06-16 | Hewlett-Packard Indigo B.V. | Embossing apparatus |
TW201523161A (zh) * | 2013-08-30 | 2015-06-16 | Nissan Chemical Ind Ltd | 光阻圖型之形成方法以及光阻圖型形成用組成物 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3960572A (en) * | 1973-02-21 | 1976-06-01 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive compositions comprising a polyester-polyether block polymer |
JPS549921B2 (es) * | 1973-10-23 | 1979-04-28 | ||
US4006024A (en) * | 1973-02-21 | 1977-02-01 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive compositions comprising a polyester-polyether block polymer |
US4139436A (en) * | 1977-02-07 | 1979-02-13 | The Goodyear Tire & Rubber Company | Polyetherurethane composition and polymer prepared by photopolymerization |
JPS55127551A (en) * | 1979-03-23 | 1980-10-02 | Toyobo Co Ltd | Photosensitive resin composition for flexographic printing plate |
JPS55153936A (en) * | 1979-04-28 | 1980-12-01 | Toyobo Co Ltd | Storage-stabilized photosensitive resin composition for flexographic plate |
US4418138A (en) * | 1981-11-03 | 1983-11-29 | Sericol Group Limited | Photopolymerizable materials for use in producing stencils for screen printing |
US4500629A (en) * | 1982-04-08 | 1985-02-19 | Ciba-Geigy Corporation | Method of forming images from liquid masses |
JPS59204837A (ja) * | 1983-05-09 | 1984-11-20 | Asahi Chem Ind Co Ltd | 光重合性積層体及びそれを用いたレジスト像形成方法 |
JPS6024542A (ja) * | 1983-07-20 | 1985-02-07 | Asahi Chem Ind Co Ltd | 新規な光重合性組成物 |
JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
JPS62177012A (ja) * | 1986-01-30 | 1987-08-03 | Nitto Electric Ind Co Ltd | 光硬化性樹脂組成物 |
JPH07113767B2 (ja) * | 1986-10-02 | 1995-12-06 | 旭化成工業株式会社 | 段ボ−ル印刷用感光性樹脂印刷版 |
JPS63305346A (ja) * | 1987-06-05 | 1988-12-13 | Asahi Chem Ind Co Ltd | 感光性樹脂組成物 |
-
1989
- 1989-11-16 JP JP1296113A patent/JP2644898B2/ja not_active Expired - Lifetime
-
1990
- 1990-10-04 EP EP90119036A patent/EP0427950B1/en not_active Revoked
- 1990-10-04 DE DE69027835T patent/DE69027835T2/de not_active Expired - Fee Related
- 1990-10-04 ES ES90119036T patent/ES2088935T3/es not_active Expired - Lifetime
-
1992
- 1992-12-30 US US07/999,578 patent/US5336585A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69027835D1 (de) | 1996-08-22 |
JPH03157657A (ja) | 1991-07-05 |
JP2644898B2 (ja) | 1997-08-25 |
US5336585A (en) | 1994-08-09 |
EP0427950A2 (en) | 1991-05-22 |
AU6227390A (en) | 1991-05-23 |
DE69027835T2 (de) | 1997-03-06 |
EP0427950A3 (en) | 1991-10-16 |
EP0427950B1 (en) | 1996-07-17 |
AU624994B2 (en) | 1992-06-25 |
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