ES2157494T3 - Procedimiento para la fabricacion de placas de imprimir de resina fotosensible. - Google Patents

Procedimiento para la fabricacion de placas de imprimir de resina fotosensible.

Info

Publication number
ES2157494T3
ES2157494T3 ES97102229T ES97102229T ES2157494T3 ES 2157494 T3 ES2157494 T3 ES 2157494T3 ES 97102229 T ES97102229 T ES 97102229T ES 97102229 T ES97102229 T ES 97102229T ES 2157494 T3 ES2157494 T3 ES 2157494T3
Authority
ES
Spain
Prior art keywords
photosensible
resin
procedure
manufacture
disclosure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97102229T
Other languages
English (en)
Inventor
Masahiro Yoshida
Kenji Fujioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp, Asahi Chemical Industry Co Ltd filed Critical Asahi Kasei Corp
Application granted granted Critical
Publication of ES2157494T3 publication Critical patent/ES2157494T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

LA PRESENTE INVENCION SE RELACIONA CON UNA REVELADORA PARA UNA PLACA DE IMPRESION CON UNA RESINA FOTOSENSIBLE QUE COMPRENDE UNA SOLUCION DE REVELADO Y UN AGENTE DE ABSTRACCION DE HIDROGENO QUE PUEDE ABSTRAER LOS ATOMOS DE HIDROGENO DE UN COMPUESTO AL IRRADIARLO CON UNA RADIACION ACTIVA; Y CON UN PROCESO DE PRODUCCION DE UNA PLACA DE IMPRESION CON UNA RESINA FOTOSENSIBLE QUE COMPRENDE EL REVELADO DE UNA RESINA FOTOSENSIBLE EXPUESTA CON DICHA REVELADORA Y, DESPUES, LA IRRADIACION DE LA SUPERFICIE DE LA PLACA CURADA OBTENIDA CON UNA RADIACION ACTIVA.
ES97102229T 1996-02-20 1997-02-12 Procedimiento para la fabricacion de placas de imprimir de resina fotosensible. Expired - Lifetime ES2157494T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5537896 1996-02-20

Publications (1)

Publication Number Publication Date
ES2157494T3 true ES2157494T3 (es) 2001-08-16

Family

ID=12996831

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97102229T Expired - Lifetime ES2157494T3 (es) 1996-02-20 1997-02-12 Procedimiento para la fabricacion de placas de imprimir de resina fotosensible.

Country Status (6)

Country Link
US (1) US5856066A (es)
EP (1) EP0791859B1 (es)
CN (1) CN1092346C (es)
AU (1) AU685720B2 (es)
DE (1) DE69704969T2 (es)
ES (1) ES2157494T3 (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0822902B1 (de) * 1995-04-27 2000-01-26 METRONIC GERÄTEBAU GMBH & CO. Verfahren und vorrichtung zum härten von uv-druckfarben
EP0880076B1 (en) 1996-12-06 2010-03-31 Asahi Kasei Kabushiki Kaisha Process for the production of photosensitive resin printing plates and treating fluid
US6582886B1 (en) 2001-11-27 2003-06-24 Nupro Technologies, Inc. Developing solvent for photopolymerizable printing plates
US6994026B2 (en) * 2002-03-22 2006-02-07 Agfa-Gevaert Preparation of a flexographic printing plate
MXPA05008777A (es) * 2003-02-19 2005-10-18 Asahi Kasei Chemicals Corp Proceso para producir placa de impresion revelable con agua para el uso en implesion en relieve.
JP4439473B2 (ja) * 2003-12-26 2010-03-24 旭化成イーマテリアルズ株式会社 凸版印刷用水現像感光性樹脂版
US7247344B2 (en) * 2004-11-16 2007-07-24 Timothy Gotsick Method and apparatus for applying surface treatments to photosensitive printing elements during thermal development
JP5164982B2 (ja) 2007-06-18 2013-03-21 旭化成イーマテリアルズ株式会社 感光性樹脂組成物、フレキソ印刷版、及びフレキソ印刷版の製造方法
EP3677434B1 (en) * 2017-08-31 2022-10-19 FUJIFILM Corporation Lithographic printing original plate and method for producing lithographic printing plate

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3429852A (en) * 1967-03-30 1969-02-25 Nat Starch Chem Corp Ethylenically unsaturated derivatives of benzophenone and crosslinkable polymers thereof
US3776889A (en) * 1971-01-07 1973-12-04 Powers Chemco Inc Allyl carbamate esters of hydroxy-containing polymers
JPS53143669A (en) * 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
JPS5616182A (en) * 1979-07-18 1981-02-16 Tokyo Shibaura Electric Co Character pattern generator
US4603058A (en) * 1984-10-05 1986-07-29 Macdermid, Incorporated Post-treatment of cured, radiation sensitive, polymerizable resins to eliminate surface tack
JPH073581B2 (ja) * 1984-11-16 1995-01-18 旭化成工業株式会社 感光性樹脂版の作成方法
DE3512179A1 (de) * 1985-04-03 1986-12-04 Merck Patent Gmbh, 6100 Darmstadt Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives
JPS62187848A (ja) * 1986-02-10 1987-08-17 Fuotopori Ouka Kk 感光性樹脂表面の粘着防止方法
GB8716378D0 (en) * 1987-07-11 1987-08-19 Autotype Int Ltd Photopolymerisable compositions
DE3836403A1 (de) * 1988-10-26 1990-05-03 Hoechst Ag Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
IT1228982B (it) * 1989-03-07 1991-07-11 Lamberti Flli Spa Dispersioni acquose di fotoiniziatori e loro impiego.
DE3908059A1 (de) * 1989-03-13 1990-09-27 Basf Ag Verfahren zur herstellung einer reliefdruckplatte mit klebfreier druckender oberflaeche
JPH04366847A (ja) * 1991-06-13 1992-12-18 Konica Corp 湿し水不要感光性平版印刷版用現像液

Also Published As

Publication number Publication date
EP0791859B1 (en) 2001-05-30
AU685720B2 (en) 1998-01-22
DE69704969D1 (de) 2001-07-05
EP0791859A3 (en) 1998-01-21
EP0791859A2 (en) 1997-08-27
CN1092346C (zh) 2002-10-09
CN1162131A (zh) 1997-10-15
DE69704969T2 (de) 2002-04-04
AU1483097A (en) 1997-08-28
US5856066A (en) 1999-01-05

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