ES2058135T3 - Procedimiento para la obtencion de figuras en positivo. - Google Patents
Procedimiento para la obtencion de figuras en positivo.Info
- Publication number
- ES2058135T3 ES2058135T3 ES87810196T ES87810196T ES2058135T3 ES 2058135 T3 ES2058135 T3 ES 2058135T3 ES 87810196 T ES87810196 T ES 87810196T ES 87810196 T ES87810196 T ES 87810196T ES 2058135 T3 ES2058135 T3 ES 2058135T3
- Authority
- ES
- Spain
- Prior art keywords
- procedure
- composition
- parts
- alkaline developer
- obtaining positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
COMPRENDE: I) UNA CAPA DE UNA COMPOSICION CONTENIENDO: A) UN MATERIAL ORGANICO FORMADO POR PELICULA Y B) UN SULFONATO DE OXAMIDAS AROMATICO IRRADIADO CON UNA MUESTRA CONOCIDA DE UN RAYO ACTINICO, CON LO QUE DICHA COMPOSICION RECIBE EN LAS PARTES DE LA SUPERFICIE TRATADA UNA ELEVADA SOLUBILIDAD EN UN REVELADOR ACUOSO-ALCALINO, COMO EN LAS PARTES DE LA SUPERFICIE NO TRATADA; Y II) LAS PARTES DE SUPERFICIE TRATADA DE DICHA COMPOSICION SE RETIRAN MEDIANTE UN TRATAMIENTO CON UN REVELADOR ACUOSO ALCALINO. EL PROCEDIMIENTO DE GRABADO ES APROPIADO PARA LA FABRICACION DE PLACAS DE PRESION Y CIRCUITOS DE CONMUTACION.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB868608528A GB8608528D0 (en) | 1986-04-08 | 1986-04-08 | Production of positive images |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2058135T3 true ES2058135T3 (es) | 1994-11-01 |
Family
ID=10595851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES87810196T Expired - Lifetime ES2058135T3 (es) | 1986-04-08 | 1987-04-02 | Procedimiento para la obtencion de figuras en positivo. |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0241423B1 (es) |
JP (1) | JP2547324B2 (es) |
DE (1) | DE3787394D1 (es) |
ES (1) | ES2058135T3 (es) |
GB (1) | GB8608528D0 (es) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2594112B2 (ja) * | 1987-05-28 | 1997-03-26 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
EP0293058B1 (en) * | 1987-05-28 | 1995-08-30 | Nippon Paint Co., Ltd. | A positive photosensitive resinous composition |
US5104770A (en) * | 1988-03-11 | 1992-04-14 | Hoechst Celanese Corporation | Positive-working photoresist compositions |
EP0361907A3 (en) * | 1988-09-29 | 1991-05-02 | Hoechst Celanese Corporation | Photoresist compositions for deep uv image reversal |
KR900005232A (ko) * | 1988-09-29 | 1990-04-13 | 존 에이 페니 | 음화 상 생성방법. |
JP2598979B2 (ja) * | 1988-10-07 | 1997-04-09 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
JPH031036A (ja) * | 1989-05-25 | 1991-01-07 | Hitachi Ltd | 空気調和機 |
JP2645384B2 (ja) * | 1990-05-21 | 1997-08-25 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
EP0571330B1 (de) * | 1992-05-22 | 1999-04-07 | Ciba SC Holding AG | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
EP0599779A1 (de) * | 1992-10-29 | 1994-06-01 | OCG Microelectronic Materials AG | Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum |
EP0709410A3 (en) | 1994-10-26 | 1997-03-26 | Ocg Microelectronic Materials | Polymers |
JPH0962005A (ja) * | 1995-06-14 | 1997-03-07 | Fuji Photo Film Co Ltd | ネガ型感光性組成物 |
JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
JP3456808B2 (ja) * | 1995-09-29 | 2003-10-14 | 東京応化工業株式会社 | ホトレジスト組成物 |
MY117352A (en) * | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
JP3587413B2 (ja) * | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
JP3591743B2 (ja) * | 1996-02-02 | 2004-11-24 | 東京応化工業株式会社 | 化学増幅型レジスト組成物 |
EP1124158A1 (en) | 1996-02-26 | 2001-08-16 | Matsushita Electric Industrial Co., Ltd. | Pattern forming material and pattern forming method |
JP3665166B2 (ja) | 1996-07-24 | 2005-06-29 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
EP0925529B1 (en) * | 1996-09-02 | 2003-04-16 | Ciba SC Holding AG | Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity |
JP3053072B2 (ja) * | 1996-09-10 | 2000-06-19 | 東京応化工業株式会社 | レジスト積層体及びそれを用いたパターン形成方法 |
DK199901098A (da) * | 1998-08-18 | 2000-02-19 | Ciba Sc Holding Ag | Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse |
TW575792B (en) * | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
SG78412A1 (en) | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
NL1014545C2 (nl) | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
JP3931482B2 (ja) | 1999-06-02 | 2007-06-13 | 住友化学株式会社 | 化学増幅ネガ型レジスト組成物 |
US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
KR100875612B1 (ko) | 2001-06-01 | 2008-12-24 | 시바 홀딩 인크 | 치환된 옥심 유도체 및 이를 포함하는 조성물 |
KR101193824B1 (ko) | 2004-07-20 | 2012-10-24 | 시바 홀딩 인크 | 옥심 유도체 및 잠산으로서의 이의 용도 |
GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
WO2010112408A1 (en) | 2009-03-30 | 2010-10-07 | Basf Se | Uv-dose indicator films |
CN107708647B (zh) | 2015-04-29 | 2021-02-19 | Bsn医疗有限公司 | 医疗洗浴设备 |
MX2017013601A (es) | 2015-04-29 | 2018-07-06 | Bsn Medical Gmbh | Un proceso de etapas multiples para la produccion de no. |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE9811T1 (de) * | 1980-07-14 | 1984-10-15 | Akzo N.V. | Einen blockierten katalysator enthaltende waermehaertbare ueberzugszusammensetzung. |
US4540598A (en) * | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
GB8413395D0 (en) * | 1984-05-25 | 1984-07-04 | Ciba Geigy Ag | Production of images |
EP0199672B1 (de) * | 1985-04-12 | 1988-06-01 | Ciba-Geigy Ag | Oximsulfonate mit reaktiven Gruppen |
-
1986
- 1986-04-08 GB GB868608528A patent/GB8608528D0/en active Pending
-
1987
- 1987-04-02 DE DE87810196T patent/DE3787394D1/de not_active Expired - Fee Related
- 1987-04-02 ES ES87810196T patent/ES2058135T3/es not_active Expired - Lifetime
- 1987-04-02 EP EP19870810196 patent/EP0241423B1/de not_active Expired - Lifetime
- 1987-04-08 JP JP62086731A patent/JP2547324B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0241423A3 (en) | 1989-10-18 |
GB8608528D0 (en) | 1986-05-14 |
EP0241423B1 (de) | 1993-09-15 |
JP2547324B2 (ja) | 1996-10-23 |
JPH01124848A (ja) | 1989-05-17 |
EP0241423A2 (de) | 1987-10-14 |
DE3787394D1 (de) | 1993-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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