ES2047987T3 - Fracciones de resina silsesquioxano de hidrogeno asi como su utilizacion como material de revestimiento. - Google Patents

Fracciones de resina silsesquioxano de hidrogeno asi como su utilizacion como material de revestimiento.

Info

Publication number
ES2047987T3
ES2047987T3 ES91310448T ES91310448T ES2047987T3 ES 2047987 T3 ES2047987 T3 ES 2047987T3 ES 91310448 T ES91310448 T ES 91310448T ES 91310448 T ES91310448 T ES 91310448T ES 2047987 T3 ES2047987 T3 ES 2047987T3
Authority
ES
Spain
Prior art keywords
fractions
hydrogen silsesquioxane
well
coating material
silsesquioxane resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91310448T
Other languages
English (en)
Inventor
Larry Frazier Hanneman
Theresa Eileen Gentle
Kenneth George Sharp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Application granted granted Critical
Publication of ES2047987T3 publication Critical patent/ES2047987T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H10P14/6925—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material comprising hydrogen silsesquioxane, e.g. HSQ
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
    • C04B41/455—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application the coating or impregnating process including a chemical conversion or reaction
    • C04B41/4554—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application the coating or impregnating process including a chemical conversion or reaction the coating or impregnating material being an organic or organo-metallic precursor of an inorganic material
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Structural Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
  • Ceramic Products (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Catalysts (AREA)

Abstract

ESTA INVENCION SE REFIERE A FRACCIONES DE RESINAS DE SILSESQUIOXANO DE HIDROGENO (RESINAS-H) DERIVADAS DE UN PROCESO DE EXTRACCION UTILIZANDO UNO O MAS FLUIDOS EN, CERCA DE O POR ENCIMA DE, SU ESTADO CRITICO. ESTAS FRACCIONES PUEDEN COMPRENDER FRACCIONES DE PESO MOLECULAR PEQUEÑO CON UNA DISPERSIDAD MENOR DE 3.0, O A FRACCIONES UTILES PARA APLICAR REVESTIMIENTOS EN SUSTRATOS. ESTA INVENCION TAMBIEN SE REFIERE A UN METODO PARA UTILIZAR DICHAS FRACCIONES EN LA FORMACION DE REVESTIMIENTOS CERAMICOS SOBRE SUSTRATOS
ES91310448T 1990-11-28 1991-11-13 Fracciones de resina silsesquioxano de hidrogeno asi como su utilizacion como material de revestimiento. Expired - Lifetime ES2047987T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/618,865 US5063267A (en) 1990-11-28 1990-11-28 Hydrogen silsesquioxane resin fractions and their use as coating materials

Publications (1)

Publication Number Publication Date
ES2047987T3 true ES2047987T3 (es) 1994-03-01

Family

ID=24479445

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91310448T Expired - Lifetime ES2047987T3 (es) 1990-11-28 1991-11-13 Fracciones de resina silsesquioxano de hidrogeno asi como su utilizacion como material de revestimiento.

Country Status (8)

Country Link
US (1) US5063267A (es)
EP (1) EP0493879B1 (es)
JP (1) JPH04275337A (es)
KR (1) KR960007346B1 (es)
CA (1) CA2055306C (es)
DE (1) DE69100590T2 (es)
ES (1) ES2047987T3 (es)
TW (1) TW218858B (es)

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US5436029A (en) * 1992-07-13 1995-07-25 Dow Corning Corporation Curing silicon hydride containing materials by exposure to nitrous oxide
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US5310583A (en) * 1992-11-02 1994-05-10 Dow Corning Corporation Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
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US5387480A (en) * 1993-03-08 1995-02-07 Dow Corning Corporation High dielectric constant coatings
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US5456952A (en) * 1994-05-17 1995-10-10 Lsi Logic Corporation Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
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US5501875A (en) 1994-12-27 1996-03-26 Dow Corning Corporation Metal coated silica precursor powders
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US5985229A (en) * 1995-09-21 1999-11-16 Toagosei Co., Ltd. Solid silica derivative and process for producing the same
US5609925A (en) 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
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US5766522A (en) * 1996-07-19 1998-06-16 Morton International, Inc. Continuous processing of powder coating compositions
US6114414A (en) * 1996-07-19 2000-09-05 Morton International, Inc. Continuous processing of powder coating compositions
US6583187B1 (en) 1996-07-19 2003-06-24 Andrew T. Daly Continuous processing of powder coating compositions
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US5807611A (en) * 1996-10-04 1998-09-15 Dow Corning Corporation Electronic coatings
US5776235A (en) * 1996-10-04 1998-07-07 Dow Corning Corporation Thick opaque ceramic coatings
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US5707681A (en) * 1997-02-07 1998-01-13 Dow Corning Corporation Method of producing coatings on electronic substrates
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US6572974B1 (en) 1999-12-06 2003-06-03 The Regents Of The University Of Michigan Modification of infrared reflectivity using silicon dioxide thin films derived from silsesquioxane resins
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Also Published As

Publication number Publication date
JPH0579693B2 (es) 1993-11-04
US5063267A (en) 1991-11-05
JPH04275337A (ja) 1992-09-30
KR960007346B1 (ko) 1996-05-31
EP0493879A2 (en) 1992-07-08
EP0493879A3 (en) 1992-09-30
CA2055306A1 (en) 1992-05-29
TW218858B (es) 1994-01-11
DE69100590T2 (de) 1994-05-11
EP0493879B1 (en) 1993-11-03
CA2055306C (en) 1996-06-18
KR920009891A (ko) 1992-06-25
DE69100590D1 (de) 1993-12-09

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