ES2031802T1 - Procedimiento de tratamiento por deposito de metales y horno para la realizacion de dicho procedimiento. - Google Patents

Procedimiento de tratamiento por deposito de metales y horno para la realizacion de dicho procedimiento.

Info

Publication number
ES2031802T1
ES2031802T1 ES199191403288T ES91403288T ES2031802T1 ES 2031802 T1 ES2031802 T1 ES 2031802T1 ES 199191403288 T ES199191403288 T ES 199191403288T ES 91403288 T ES91403288 T ES 91403288T ES 2031802 T1 ES2031802 T1 ES 2031802T1
Authority
ES
Spain
Prior art keywords
procedure
electrode
substrate
deposition
oven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
ES199191403288T
Other languages
English (en)
Inventor
Eric Damond
Georges Dervieux
Patrick Jacquot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Innovatique SA
Original Assignee
Innovatique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innovatique SA filed Critical Innovatique SA
Publication of ES2031802T1 publication Critical patent/ES2031802T1/es
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

EL PROCESO DE DEPOSICION SEGUN LA INVENCION, DE TIPO PVD, UTILIZA UN HORNO DE TRATAMIENTO TERMICO BAJO VACIO EN EL INTERIOR DEL CUAL SE EVAPOR LA SUSTANCIA DE UN BLANCO (12) QUE CONSTITUYE UN PRIMER ELECTRODO Y SE DEPOSITAN LAS PARTICULAS GASEOSAS ASI PRODUCIDAS SOBRE UN SUSTRATO LLEVADO A UN POTENCIAL DE UN SEGUNDO ELECTRODO, QUE ES DISTINTO DEL PRIMER ELECTRODO. DURANTE ESTA DEPOSICION, EL SUSTRATO ES LLEVADO A UNA TEMPERATURA DE TRATAMIENTO COMPRENDIDA ENTRE 800 C Y 1200 C, Y EL BLANCO (12) ASI COMO SUS ORGANOS ANEXOS SE ENFRIAN CONSTANTEMENTE POR UNA CORRIENTE DE FLUIDO DE ENFRIAMIENTO DE MANERA QUE EL MATERIAL DEL BLANCO (12) PERMANEZCA SOLIDO Y QUE LA EVAPORACION PRODUCIDA EN LA SUPERFICIE DEL BLANCO (12) SE EFECTUE POR SUBLIMACION. LA INVENCION PERMITE MEJORAR LA REGULARIDAD DE LA DEPOSICION, SU ANCLAJE EN EL SUSTRATO ASI COMO EL TIEMPO DE TRATAMIENTO.
ES199191403288T 1990-12-06 1991-12-05 Procedimiento de tratamiento por deposito de metales y horno para la realizacion de dicho procedimiento. Pending ES2031802T1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9015331A FR2670218B1 (fr) 1990-12-06 1990-12-06 Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.

Publications (1)

Publication Number Publication Date
ES2031802T1 true ES2031802T1 (es) 1993-01-01

Family

ID=9402994

Family Applications (1)

Application Number Title Priority Date Filing Date
ES199191403288T Pending ES2031802T1 (es) 1990-12-06 1991-12-05 Procedimiento de tratamiento por deposito de metales y horno para la realizacion de dicho procedimiento.

Country Status (10)

Country Link
US (2) US5278861A (es)
EP (1) EP0489659B1 (es)
JP (1) JPH0744080B2 (es)
KR (1) KR940004902B1 (es)
CN (1) CN1063128A (es)
CA (1) CA2056910A1 (es)
DE (2) DE489659T1 (es)
ES (1) ES2031802T1 (es)
FR (1) FR2670218B1 (es)
TW (1) TW257796B (es)

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JP3121743B2 (ja) * 1994-08-10 2001-01-09 日立造船株式会社 プラズマ式溶融方法
DE4443740B4 (de) * 1994-12-08 2005-09-15 W. Blösch AG Vorrichtung zum Beschichten von Substraten
CH689558A5 (de) * 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
US5895559A (en) * 1996-04-08 1999-04-20 Christy; Ronald Cathodic arc cathode
US6131533A (en) * 1996-08-15 2000-10-17 Citizen Watch Co., Ltd. Jig for forming hard carbon film over inner surface of guide bush using the jig
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
US5972185A (en) * 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
DE19824364A1 (de) * 1998-05-30 1999-12-02 Bosch Gmbh Robert Verfahren zum Aufbringen eines Verschleißschutz-Schichtsystems mit optischen Eigenschaften auf Oberflächen
US6436254B1 (en) * 2001-04-03 2002-08-20 General Electric Company Cathode mounting system for cathodic arc cathodes
DE10126985A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Anordnung zur Stromzuführung für eine Kathode einer Lichtbogen-Verdampfungsvorrichtung
DE10256417A1 (de) * 2002-12-02 2004-06-09 Pvt Plasma Und Vakuum Technik Gmbh Lichtbogenverdampfungsvorrichtung
US20040126492A1 (en) * 2002-12-30 2004-07-01 Weaver Scott Andrew Method and apparatus for using ion plasma deposition to produce coating
ES2305920T3 (es) 2005-02-18 2008-11-01 Siemens Aktiengesellschaft Aleacion de mcralx, capa protectora de aleacion de mcralx, y procedimiento para su obtencion.
US7329595B2 (en) * 2005-04-26 2008-02-12 Lucent Technologies Inc. Deposition of carbon-containing layers using vitreous carbon source
BRPI0803774B1 (pt) * 2008-06-11 2018-09-11 Univ Federal De Santa Catarina Ufsc processo e reator de plasma para tratamento de peças metálicas
US8211234B2 (en) 2008-09-02 2012-07-03 United Technologies Corporation Coater platter homing tool
PL2236641T3 (pl) 2009-03-30 2012-05-31 Oerlikon Trading Ag Sposób wstępnej obróbki podłoży w procesie PVD
CN102094172B (zh) * 2010-12-03 2014-01-01 无锡润鹏复合新材料有限公司 一种TiWN/MoS2复合薄膜的制备方法
DE102014014970B4 (de) 2014-10-14 2020-01-02 NICE Solar Energy GmbH Vorrichtung und Verfahren zur Schichtdickenmessung für Dampfabscheideverfahren
PL230547B1 (pl) 2015-04-29 2018-11-30 Amp Spolka Z Ograniczona Odpowiedzialnoscia Piec prozniowy hybrydowy
RU2662516C1 (ru) * 2017-07-21 2018-07-26 федеральное государственное бюджетное образовательное учреждение высшего образования "Уфимский государственный авиационный технический университет" Способ получения износостойкого градиентного покрытия системы ti-al на стальной детали в вакууме
EP3502302B1 (en) 2017-12-22 2022-03-02 Ge Avio S.r.l. Nitriding process for carburizing ferrium steels
CN110480025B (zh) * 2019-09-06 2020-12-08 陕西师范大学 一种高密度纳米材料气相制备方法

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Publication number Priority date Publication date Assignee Title
DE661185C (de) * 1936-02-01 1938-06-13 Bernhard Berghaus Verfahren und Vorrichtung zur Herstellung von metallischen UEberzuegen aus mittels eines Lichtbogens in einer Kammer verdampften Metallen
US3306764A (en) * 1959-08-19 1967-02-28 Nuclear Technical Service Corp Method for forming a refractory metal or carbide coating on refractory materials and article
US3494852A (en) * 1966-03-14 1970-02-10 Whittaker Corp Collimated duoplasmatron-powered deposition apparatus
US3454814A (en) * 1966-07-29 1969-07-08 Atomic Energy Commission Tubular vapor source
US3748253A (en) * 1972-01-24 1973-07-24 Gte Automatic Electric Lab Inc Apparatus with labyrinth heat exchanger for the sputtering depositionof thin films
US4009090A (en) * 1975-12-03 1977-02-22 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
FR2465793A1 (fr) * 1979-09-26 1981-03-27 Leybold Heraeus Gmbh & Co Kg Procede pour le depot de couches d'alliage sur des substrats metalliques a une temperature elevee
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Also Published As

Publication number Publication date
FR2670218A1 (fr) 1992-06-12
CN1063128A (zh) 1992-07-29
KR920012517A (ko) 1992-07-27
US5363400A (en) 1994-11-08
JPH04277499A (ja) 1992-10-02
TW257796B (es) 1995-09-21
FR2670218B1 (fr) 1993-02-05
US5278861A (en) 1994-01-11
KR940004902B1 (ko) 1994-06-04
DE69116117D1 (de) 1996-02-15
EP0489659B1 (fr) 1996-01-03
DE489659T1 (de) 1992-09-24
CA2056910A1 (fr) 1992-06-07
EP0489659A1 (fr) 1992-06-10
JPH0744080B2 (ja) 1995-05-15

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