ES2105532T3 - Evaporador para recubrimiento de banda continua al vacio. - Google Patents
Evaporador para recubrimiento de banda continua al vacio.Info
- Publication number
- ES2105532T3 ES2105532T3 ES94308158T ES94308158T ES2105532T3 ES 2105532 T3 ES2105532 T3 ES 2105532T3 ES 94308158 T ES94308158 T ES 94308158T ES 94308158 T ES94308158 T ES 94308158T ES 2105532 T3 ES2105532 T3 ES 2105532T3
- Authority
- ES
- Spain
- Prior art keywords
- elements
- evaporation
- evaporator
- coating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
UN EVAPORADOR PARA GENERAR VAPOR POR DEPOSICION COMO REVESTIMIENTO SOBRE UN SUSTRATO DE BOBINA (21) EN UN PROCESO DE REVESTIMIENTO DE BOBINA DE VACIO COMPRENDE UNOS ELEMENTOS DE EVAPORACION (15,32) COMPUESTOS DE ELEMENTOS DE SALIDA DE VAPOR (29) A TRAVES DE LOS CUALES SE TRANSPORTA EL MATERIAL DE REVESTIMIENTO (36) DESDE LOS ELEMENTOS (15,32) Y SE DEPOSITA SOBRE EL SUSTRATO (21). LOS ELEMENTOS DE EVAPORACION COMPRENDEN ADEMAS UNOS ELEMENTOS MEDIANTE LOS CUALES SE PUEDE SUMINISTRAR UN GAS INERTE A LOS ELEMENTOS (15,32) PARA ATENUAR LA EVAPORACION DEL MATERIAL Y/O ENFRIAR LOS MISMOS. POR ELLO, LA EVAPORACION PUEDE SER RAPIDAMENTE INTERRUMPIDA PARA PERMITIR LA RECOLOCACION DEL SUSTRATO Y/O DEL MATERIAL DE REVESTIMIENTO. EL GAS INERTE PUEDE RECIRCULARSE VENTAJOSAMENTE A TRAVES DE LOS ELEMENTOS DE REFRIGERACION Y ALGUNO O TODOS LOS GASES INERTES PUEDEN SER "RETROALIMENTADOS" EN LOS ELEMENTOS DE EVAPORACION A TRAVES DE LOS ELEMENTOS DE SALIDA DE VAPOR. EL APARATO POSIBILITA QUE LOS TIEMPOS DE PARADA EN EL PROCESO DE REVESTIMIENTO SEAN REDUCIDOS SIGNIFICATIVAMENTE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB939323033A GB9323033D0 (en) | 1993-11-09 | 1993-11-09 | Evaporator for vacuum web coating |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2105532T3 true ES2105532T3 (es) | 1997-10-16 |
Family
ID=10744842
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES94308158T Expired - Lifetime ES2105532T3 (es) | 1993-11-09 | 1994-11-04 | Evaporador para recubrimiento de banda continua al vacio. |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0652303B1 (es) |
JP (1) | JPH07286265A (es) |
KR (1) | KR950014354A (es) |
CA (1) | CA2135423A1 (es) |
DE (1) | DE69405513T2 (es) |
ES (1) | ES2105532T3 (es) |
GB (2) | GB9323033D0 (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19537779A1 (de) * | 1995-10-11 | 1997-04-17 | Leybold Ag | Beschichtungsanlage für Folien |
DE19537781A1 (de) * | 1995-10-11 | 1997-04-17 | Leybold Ag | Beschichtungsanlage für Folien |
US6202591B1 (en) | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
US20020011205A1 (en) * | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
US7339139B2 (en) | 2003-10-03 | 2008-03-04 | Darly Custom Technology, Inc. | Multi-layered radiant thermal evaporator and method of use |
JP2005219369A (ja) | 2004-02-06 | 2005-08-18 | Konica Minolta Holdings Inc | 空隙型インクジェット記録用紙及びその製造方法とインクジェット記録方法 |
AT501143B1 (de) * | 2004-05-14 | 2006-11-15 | Hueck Folien Gmbh | Sputterkathode zum einsatz im hochvakuum |
JP4697411B2 (ja) * | 2005-07-13 | 2011-06-08 | 住友電気工業株式会社 | 真空蒸着装置および真空蒸着装置の運転方法 |
KR100729097B1 (ko) * | 2005-12-28 | 2007-06-14 | 삼성에스디아이 주식회사 | 증발원 및 이를 이용한 박막 증착방법 |
CN103898450B (zh) * | 2012-12-25 | 2017-06-13 | 北京创昱科技有限公司 | 一种铜铟镓硒共蒸发线性源装置及其使用方法 |
CN109746142B (zh) * | 2017-11-06 | 2021-04-02 | 张家港康得新光电材料有限公司 | 镀膜装置 |
JP6605163B1 (ja) * | 2019-03-05 | 2019-11-13 | 日本エア・リキード株式会社 | 固体材料容器 |
SG11202111356VA (en) * | 2019-05-13 | 2021-12-30 | Ulvac Inc | Vapor deposition unit and vacuum vapor deposition apparatus provided with vapor deposition unit |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4094269A (en) * | 1974-06-14 | 1978-06-13 | Zlafop Pri Ban | Vapor deposition apparatus for coating continuously moving substrates with layers of volatizable solid substances |
US4466876A (en) * | 1981-03-17 | 1984-08-21 | Clarion Co., Ltd. | Thin layer depositing apparatus |
JPS61204639A (ja) * | 1985-03-07 | 1986-09-10 | Fuji Electric Co Ltd | 電子写真用感光体の製造方法 |
JPS62235466A (ja) * | 1986-04-02 | 1987-10-15 | Canon Inc | 蒸着物質発生装置 |
JPH075435B2 (ja) * | 1987-03-31 | 1995-01-25 | 住友電気工業株式会社 | 超電導薄膜の製造方法及び装置 |
JPS6431964A (en) * | 1987-07-25 | 1989-02-02 | Mitsui Petrochemical Ind | Crucible for melting metal |
GB2210826B (en) * | 1987-10-19 | 1992-08-12 | Bowater Packaging Ltd | Barrier packaging materials |
JPH046627A (ja) * | 1990-04-23 | 1992-01-10 | Matsushita Electric Ind Co Ltd | 高機能性薄膜とその製造方法 |
DE4128382C1 (es) * | 1991-08-27 | 1992-07-02 | Leybold Ag, 6450 Hanau, De |
-
1993
- 1993-11-09 GB GB939323033A patent/GB9323033D0/en active Pending
-
1994
- 1994-11-02 GB GB9422066A patent/GB2283759A/en not_active Withdrawn
- 1994-11-04 ES ES94308158T patent/ES2105532T3/es not_active Expired - Lifetime
- 1994-11-04 DE DE69405513T patent/DE69405513T2/de not_active Expired - Fee Related
- 1994-11-04 EP EP94308158A patent/EP0652303B1/en not_active Expired - Lifetime
- 1994-11-09 KR KR1019940029247A patent/KR950014354A/ko not_active IP Right Cessation
- 1994-11-09 CA CA002135423A patent/CA2135423A1/en not_active Abandoned
- 1994-11-09 JP JP6274823A patent/JPH07286265A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH07286265A (ja) | 1995-10-31 |
DE69405513D1 (de) | 1997-10-16 |
GB9323033D0 (en) | 1994-01-05 |
GB9422066D0 (en) | 1994-12-21 |
EP0652303A1 (en) | 1995-05-10 |
CA2135423A1 (en) | 1995-05-10 |
DE69405513T2 (de) | 1998-01-22 |
KR950014354A (ko) | 1995-06-16 |
EP0652303B1 (en) | 1997-09-10 |
GB2283759A (en) | 1995-05-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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