Classifications

• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/06—Means for illuminating specimens
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/06—Means for illuminating specimens
  • G02B21/08—Condensers
  • G02B21/14—Condensers affording illumination for phase-contrast observation
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/06—Means for illuminating specimens
  • G02B21/08—Condensers
  • G02B21/086—Condensers for transillumination only
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/06—Means for illuminating specimens
  • G02B21/08—Condensers
  • G02B21/10—Condensers affording dark-field illumination
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
  • G02B21/361—Optical details, e.g. image relay to the camera or image sensor

Definitions

• the invention relates to a method for illuminating a microscopic object, a microscope and a use of a plate-shaped reflector.
• Retroreflectors are well known, e.g. https://de.wikipedia.org/wiki/Retroreflektor. In addition to the conventional macroscopically structured retroreflectors, there are those with microstructures as reflection elements.
• EP0200521 A2 describes retroreflective sheet materials which use small glass beads embedded in a matrix of synthetic resin. Similar retroreflectors are also known from US4957335A, WO9822837A1, WO003070483A1 and WO02006085690A1.
• W02006136381 A1, DE102009060884A1, DE29701903U1 and DE29707066U1 describe retroreflective sheeting which uses microprism formations which induce backscattering properties. From US3689346A a retroreflective sheeting is known.
• DE4117911A1 describes a retroreflective sheeting which produces light reflectance in a slightly divergent manner. Further microretroreflectors are known from DE102005063331 A1 and EP0880716A1 and
• AT508102A1 is a lighting device for a microscope with a ring illumination for dark field illumination from below or bright field transmitted light illumination known.
• the object of the invention is to enable a transmitted light bright field or dark field recording and / or a phase contrast recording of a sample with a space-saving EPI lighting.
• the scanning of multiple samples or multiple points of a sample should be possible.
• the invention enables a compact illumination for a microscope. In this case, advantageously, both the lighting and the observation can be done from below. As a result, an application in cell biology or as a cell microscope is possible.
• the present invention also provides a simple way of microscopically examining transparent and / or semi-transparent objects in a sample.
• the object is achieved by a use according to claim 1, a method according to claim 2 and a microscope according to claim 19 or D.
• the method according to the invention serves to receive at least one microscopic image of a sample.
• the method can be particularly advantageous if transparent and / or semi-transparent objects are to be examined. These may be present in a liquid, for example water, a nutrient solution, oil or formaldehyde.
• Investigational objects may be, for example, plant, animal or eukaryotic cells or cell aggregates, cell organelles and their constituents, for example chromosomes, viruses, bacteria, antibodies, pollen, sperm, macromolecules, for example peptides, lipids, DNA, RNA or molecular assemblies.
• the optical axis may be the optical axis of a microscope objective.
• the following method of taking a microscopic image is illustrated.
• the image of at least one region of at least one sample is recorded.
• the sample is arranged in a sample plane.
• the sample plane may be perpendicular to the optical axis, which may be indicated in the z direction.
• the picture is taken from a first page. As a result, the direction of observation can be predetermined.
• This method comprises generating at least one beam with the aid of at least one light source.
• the beam may also be referred to as an illumination beam. It can be advantageously provided exactly one light source. However, it is also possible to provide a plurality of light sources.
• the light source can emit light with a spectral distribution. It may, for example, be infrared, visible or ultraviolet light.
• the method comprises guiding the beam through the sample plane to a plate-shaped reflector.
• the plate-shaped reflector can be a plate normal and a define a replacement solder other than the plate standard with respect to the illumination beam.
• the plate normal can lie in the direction of the optical axis, ie in the z-direction.
• the plate surface may lie in an xy plane.
• the plate may have a structure that causes a reflection of an incident light beam around the replacement solder. It can be provided exactly one or more individual reflections. This may mean that the emergent light beam leaves the reflector after exactly one or more individual reflections.
• a replacement solder can be understood as the direction of an angle bisector between the incident and the outgoing light beam.
• the replacement solder can also be referred to as the effective incidence solder with respect to an incident light beam.
• the reference beam for determining the replacement solder the central ray of the incident light beam can be selected.
• the replacement solder can also be understood as the direction of the difference vector of the normalized failure vector and the normalized incident vector.
• the normalized incident vector or failure vector can be the direction vector of the incident or outgoing light beam. If, as in the case of a retroreflector, the direction of incidence and exit are exactly opposite, the replacement solder can be defined in the same direction as the direction of the failure vector.
• the use of the term replacement solder to describe the method or article of the present invention may in this case be redundant.
• the method comprises guiding the beam through the sample plane to a plate-shaped reflector, wherein the reflector is a retroreflector.
• the replacement solder can be fixed, i. regardless of the angle of incidence. For deflecting the beam, a simple reflection on a reflection surface may be provided for each beam, i. exactly one single reflection. Then the replacement solder can be equal to the incident slot of the respective beam on the reflection surface.
• the replacement solder can correspond in this case to the surface normal of the reflection surface.
• the replacement solder can also be dependent on the direction of the incident light beam. This may be the case in particular if the reflection at the reflector comprises a plurality of individual reflections, for example two.
• the method comprises deflecting the beam through the reflector.
• the method comprises illuminating the sample with the deflected beam.
• the method includes capturing the microscopic image with an image sensor.
• the microscopic image can be an intensity contrast image.
• the microscopic image may also be advantageous, but need not be, a phase contrast image. Also advantageous may be a microscopic image, which is a superimposition of a phase contrast image with an intensity contrast image.
• At least one plate-shaped reflector for deflecting at least one illumination beam.
• the illumination beam serves to illuminate at least one sample.
• the indicated use is intended for taking at least a microscopic image of the sample from a first side.
• the picture is taken with an image sensor.
• the plate-shaped reflector has a plate normal and a different from the plate normal Excellencelot with respect to the lighting on a second side, which is opposite to the first side with respect to the sample, arranged. The opposite can be more accurately understood with respect to the sample level.
• the sample can be arranged in a horizontal sample plane, for example in an xy plane.
• the taking of the microscopic image can advantageously be done from above with respect to gravity.
• the first side may be the top of the sample.
• the second side can then be the bottom of the sample. This may make it possible to illuminate the sample in the transmitted light process, even if the illumination and the image recording in the sense of epi-illumination (epi-illumination) from the same side, namely the first page done.
• An epi-illumination is to be understood as meaning illumination that takes place from the same hemisphere as the observation.
• This half-space can be defined with respect to the sample level. In the other half-space may advantageously be arranged the reflector.
• the taking of the microscopic image can be carried out particularly advantageously from below with respect to the gravitational force. Then the first side can be the bottom of the sample. The second side can then be the top of the sample.
• the image can be captured by a microscope objective.
• the microscope objective can be provided for this purpose as a first Fourier lens.
• a camera lens which can be provided as a further, namely a second, Fourier lens, be present.
• the arrangement of both Fourier lenses can cause an image of the sample on the sensor.
• the camera lens can also be called a tube lens.
• a camera lens does not necessarily have to be present.
• the microscope objective itself can be provided for imaging the sample onto the image sensor. The image on the image sensor can therefore be done without a camera lens, if the microscope objective is designed accordingly.
• the beam can be guided to illuminate the sample through the microscope objective. But it may also be advantageous to pass the beam of illumination on the microscope objective. In the latter case, the lens can be made smaller because the illumination beam does not need to be passed through the lens.
• the beam of illumination before being deflected by the reflector through the microscope objective is provided.
• the illumination of the specimen with the deflected beam can take place in a beam direction at a mean elevation angle ⁇ and a mean azimuth angle y.
• the beam can be collimated even before the deflection in order to illuminate the sample with parallel light. But there may also be deviations from the parallelism. Then one can specify a mean elevation angle ⁇ and a mean azimuth angle of the radiation beam.
• the deflected beam may have a central beam.
• the central ray of the central ray of the beam can be considered.
• the incident beam may also have a central beam. This may be the beam of the incident beam leaving the reflector as the central beam of the deflected beam.
• the azimuth angle y and the elevation angle ⁇ one can use a spherical coordinate ordinate system, where the zenith describes the optical axis, which may lie in the direction z.
• the azimuth angle can be specified with respect to the direction x.
• the direction x can be set so that the xz half plane with positive x comprises a central ray of the deflected light beam.
• the elevation angle may be the angle of the central ray of the deflected beam to the xy plane.
• the elevation angle can be determined as 90 ° minus the angle of the central ray of the deflected beam with the optical axis of the microscope objective.
• the elevation angle can be between 45 ° and 90 °, particularly advantageously between 70 ° and 85 °.
• the elevation angle can advantageously be chosen smaller than the right angle. This may correspond to an oblique incidence of the beam on the sample, also called oblique illumination - called oblique illumination. This can improve the contrast in the case of transparent and / or semi-transparent objects in the sample.
• the central ray of the deflected beam can thus be inclined to the optical axis.
• the elevation angle can also be selected 90 °. Then the central ray of the deflected beam may be parallel to the optical axis.
• the light bundles can have the same elevation angle ⁇ . These can be arranged distributed azimuthal evenly.
• the azimuth angle of the first beam can be 0 ° and that of a second beam can be 180 °.
• the light source can be advantageously designed as an LED.
• This can be arranged in a pupil plane (22) or in a plane conjugate to the pupil plane.
• the pupil plane may be the plane in which a diaphragm is located.
• the pupil plane may be the focal plane of the microscope objective opposite the sample. A slight deviation of the position of the LED from the pupil plane can be neglected. Therefore, it is possible, for example, to fix the LEDs on the diaphragm ring. Under a conjugate plane one can understand such a plane, which is projected onto the pupil plane by means of a relay optics.
• the relay optics can be designed as a relay lens (relay lens) or, for example, comprise two Fourier lenses.
• the light source can be designed as an LED and in each case have a diffuser arranged directly in front of the light-generating surface.
• the diffuser may be provided to homogenize the directional intensity distribution. Arranging directly in front of the light-generating area may cause directional homogenization without significantly increasing the radiating area.
• the light sources can have a diameter of the luminous surfaces which is smaller than 30% of the focal length of the microscope objective.
• the luminous surface of the light source may be, for example, circular, square or rectangular.
• the light source may be, for example, an LED chip or a packaged SMD LED.
• the light beam may be linearly polarized in a first direction of polarization.
• the light beam may be unpolarized.
• the sample may comprise a liquid sample substance. This can be on a sample carrier. With respect to gravitational force, the sample carrier may be at the bottom and the liquid sample substance at the top. Thereby, a dripping of the sample substance can be prevented. In this case, lighting and observation of the sample from below may be advantageous. For this one can expediently use a transparent sample carrier.
• the first page can be the bottom.
• the reflector may in this case be arranged above the sample.
• the sample may comprise a cover, for example a coverslip.
• the microscope or the microscope objective can have a field of view.
• the field of view can be at a given focal plane, an area in the focal plane, which can be detected with the image sensor.
• the focal plane can be the plane that can be sharply imaged onto the image sensor.
• the focal plane can be perpendicular to the optical axis. Conveniently, the focal plane can be located in the sample. The focal plane may coincide with the sample plane. Then the microscope can be focused on the sample plane.
• the beam path can be provided such that the deflected beam completely illuminates the field of view.
• the beam may have a cut surface with the focal plane before deflecting.
• the cut surface may contain the field of view. Then the sample can be illuminated from two sides. As a result, simultaneous incident and transmitted light illumination of the sample can be realized. With such combined incident and transmitted light illumination, certain patterns in the sample can be better recognized.
• the cut surface may be outside the field of view. This may mean that the beam is guided through the sample plane at a point outside a field of view. Then the sample can only be transmitted by transmitted light, i. be illuminated from the back. The back can be the second side.
• the deflected beam may also have another interface with the focal plane, which may be referred to as a sample surface illuminated by the deflected beam.
• the sample surface illuminated by the deflected beam may contain the field of view.
• the deflected beam as a bundle of parallel rays.
• the beam may already be present as a parallel beam bundle before deflecting the reflector.
• the vergence of the beam can be preserved during the redirection.
• the provision of a vergence and / or the diffuser can also cause the reflection of the beam becomes less sensitive to, for example, a tilting of the sample, unevenness of the reflector, etc.
• the reflector may be formed as a Fresnel prism.
• a Fresnel prism is made
• the Fresnel prism may comprise a plurality of reflection surfaces with reflection surface normals.
• the reflection surface normal may be inclined to the plate normal.
• the reflection surface normals can each be the incident slot of an incident beam.
• the incident slot can correspond to the replacement solder of the reflector.
• the beam deflection at the Fresnel prism can be done by a simple reflection.
• the Fresnel prism may have a periodic structure. In each period, exactly one reflection surface can be provided.
• the reflection face normal of the Fresnel prism may be parallel.
• the reflector may be integrally formed as a plate or a foil.
• a foil can be considered as a thin plate.
• the reflector may be formed as a layer on a carrier plate or a carrier foil. This layer or the surface of the plate may have a step structure.
• the reflector may be designed so that a plurality of beams of the beam, which were deflected at different reflection surfaces of the reflector, contribute to the illumination of the field of view.
• the reflector may be formed as a periodic relief structure.
• a periodic structure may be in one direction, for example x. However, it is also possible to use a periodic structure in two directions, for example x and y.
• the reflector can deflect an incident light beam of the beam by means of at least two successive individual reflections.
• exactly two reflection surfaces can be provided in each period.
• the replacement solder may be different from the incident slot of the first single reflection.
• more than two reflections for example three, may be provided.
• the reflector can be designed as a microprism array and / or microlens array.
• the reflector can be designed as a retroreflector with respect to a plurality of beam directions.
• Such an embodiment can be designed especially as a cat's eye or as a retroreflective retro-reflector with, for example, three-plane angle reflectors. In this case, the deflection of the incident beam can be done by three reflections.
• the reflector can bring about a deflection of the incident beam which deviates from a retroreflection with respect to a plurality of beam directions.
• the angular difference between an incident and the corresponding incident beam can be independent of the angle of incidence within a certain angular range. This may mean that a replacement solder in this angular range varies with the angle of incidence.
• Such a reflector may for example have V-trenches with a roof edge angle. A roof angle of 90 ° can cause a retroreflection, while another, preferably smaller, angle causes a deviating from a retroreflection deflection of the incident beam. In this case, due to multiple individual reflections on both sides of the V-trenches, the angular difference between an incident and the corresponding incident beam within a certain angular range can be independent of the angle of incidence.
• the incident on the sample beam of illumination can be split in the sample and / or by refraction on a sample back in at least a first beam and at least one second beam.
• a splitting can be, for example, by refractive index differences in the sample, inner optical interfaces in the sample, a curved sample back and / or the formation of menisci, for example be effected in a liquid sample.
• the second beam may strike the reflector at a different angle of incidence than the first beam.
• the use of a retroreflector as a reflector can be particularly advantageous. Namely, by using the retroreflector, the first and second beams can each be reflected back on themselves and thus reflected back to the same location of the sample from which they originated.
• first and a second beam are for illustrative purposes only.
• the associated outgoing beam to the incident beam be exactly opposite.
• the replacement solder in this case can be the direction of the outgoing light beam.
• the term replacement solder can be redundant in this case. Therefore, if the reflector is designed as a retroreflector, one can dispense with the use of the term replacement solder.
• the retroreflector can be designed such that it as out
• a transmitted-light bright-field image and / or a transmitted-light dark-field image can be recorded with oblique illumination.
• the recording of the image as a superposition of an transmitted light field image with a phase contrast image.
• the recording of the image can be done as a superposition of a transmitted light dark field image with a phase contrast image.
• phase contrast image In the case of a phase contrast image, at least one phase plate may additionally be provided. This can be arranged for example in the diaphragm plane. In this case, coaxial illumination through the microscope objective may be advantageous.
• the phase plate may include a retarder plate and a gray filter.
• the phase plate may be formed as a phase ring.
• the phase contrast image with the reflector according to the invention can be recorded, for example, with one of the known methods according to Zernicke, relief phase contrast according to DE102012005911, or luminance contrast according to DE102007029814.
• Varel contrast image it is also possible to take a Varel contrast image.
• the Varel contrasting method is used, in which a superposition of oblique bright field illumination with phase contrast is used.
• a Hoffman modulator can be provided in three parts, with three segments with different optical attenuation. The middle segment can be arranged centrally or off-center with respect to the optical axis.
• a light source aperture may be provided, preferably in a plane of the illumination beam path conjugate to the pupil plane.
• the light source aperture can be designed as a slit diaphragm.
• the slit can preferably be partially covered with a polarizing filter.
• the slot can be arranged centrally or off-center with respect to the illumination beam path.
• another polarizing filter in the Illumination beam path be present.
• beam offset between the incident beam and the associated emergent beam may occur.
• a beam offset can be up to a few millimeters in a retroreflector with macroscopic reflection elements, such as a conventional retroreflector (cat's eye) from the bicycle shop.
• a micro-prism array or encapsulated micro glass beads as a retroreflector may be advantageous.
• retroreflectors are available, for example, as films in the retro reflection classes RA1, RA2, RA2 / B, RA2 / C and RA3 for street signs, for example the film 3M TM Engineer Grade Prismatic Series 3430 according to "Technical Information SG 103 / 10.2017” 3M Anlagennique GmbFI company or Avery Dennison® T T7500B microprismatic retroreflective sheeting.
• Microcube reflectors which can be constructed as fullcube triple arrays, are even more suitable.
• the reflector "3M TM Diamond Grade DG 3. Reflective Sheeting" can be used.
• Pyramidal triple arrays can be more cost effective than fullcube arrays.
• Fullcube or pyramidal triple arrays can be produced, for example, in a plastic injection molding process or be embossed in a plastic substrate, a glass substrate or in a flexible plastic film.
• the beam of illumination can be guided through the microscope objective to the sample.
• Such a beam guidance can be advantageous in particular when using a retroreflector. Such a beam guidance can also be used in particular for phase contrast recordings.
• the reflector may also cause diffraction and interference of the light.
• the reflector can in principle also be designed as a reflection grating, preferably as a blazed grating.
• this can have the disadvantage that large-area blaze grids are currently very expensive.
• the wavelength-dependent diffraction angle occurring in a grating may be disadvantageous. Therefore, it may be advantageous to minimize diffraction effects.
• the structural widths of the reflector can be chosen so large that the reflection angle corresponds to at least more than a tenth, preferably more than thirtieth, and more preferably more than one hundredth diffraction order of a blazed grating.
• the period of the reflector may for example be between 50 micrometers and 5 millimeters, preferably between 0.1 millimeter and 2 millimeters. Then, beams diffracted in different orders of diffraction may be mixed due to the spectral width of the light source and / or the convergence of the beam at the location of the sample. As a result, diffraction and dispersion effects in the beam deflection at the reflector can be avoided. Also advantageously, the period of the reflector between dmhi and IOOmhi amount. Although such fine structures are more difficult to produce, this may be advantageous because of the low beam offset.
• a front projection screen such as those based on reflection volume holograms, may be known as "daylight-compatible front projection screens based on reflection volume holograms"; von Spiegel, Wolff, Darmstadt (2006), http://elib.tu-darmstadt.de/diss/000799, be used as a reflector.
• a retroreflector having both holographic and retortive layers. Such a reflector is described in US5656360.
• the reflector may be spaced apart along the optical axis, i. can be measured in the z direction, be arranged to the sample plane, which is equal to or greater than half the focal length, particularly advantageously greater than the simple focal length of the microscope objective.
• this distance can be selected smaller than 10 times, particularly advantageously smaller than 5 times the focal length of the objective. Otherwise, if the distance is too great, angle errors of the prisms could otherwise cause artifacts in the microscopic image.
• the plate normal of the reflector may be parallel to the optical axis, i. be selected in z-direction.
• the distance of the reflector to the sample plane can be fixed. Alternatively, this distance can be changed, but this can be more complex.
• the light source can be chosen such that its coherence length is less than twice the aforementioned distance. Then artefacts due to interference of transmitted and incident illumination can be avoided. Alternatively, the light source may be selected such that its coherence length is greater than twice the aforementioned distance. Then, as a result of interference from transmitted and reflected light illumination, contrasts of certain objects in the sample can be exaggerated.
• the retroreflector may be configured such that the beam offset between an incident and a emergent beam is at most less than 100mhi.
• retro reflections from microprismarrays with a period of less than 100 ⁇ m or retroreflectors with microglass spheres of less than 100 ⁇ m in diameter may be suitable.
• such a retroreflector can be chosen in which the half-width of the backscattered light intensity is less than 5 °, more advantageously less than 3 ° and most preferably less than 1 °. Then an incident beam can be thrown back as accurately as possible in itself. As a result, the highest possible contrast in the microscopic image can be achieved.
• the half width of the backscattered intensity may be greater than 20 angular minutes. Then small angle errors of the prism angle can be compensated.
• Particularly advantageous may be a retroreflector of the lighting performance class RA3 (formerly "Type 3"). Such retroreflectors may have or exceed a minimum retroreflective value of 300 cd / lx per m 2 at an illumination angle of 5 ° and a viewing angle of 0.33 °.
• the deflected beam can cause transmitted-light bright-field illumination or one or a transmitted-light darkfield illumination of the sample.
• a plurality of microscopic images of a plurality of samples and / or a sample may be taken at several locations.
• a microscope camera comprising the image sensor can be used.
• the microscope camera may include a camera lens.
• the microscope camera can be moved from the taking of an image to the acquisition of a next image respectively with respect to the sample or the sample.
• the reflector can be arranged fixed with respect to the samples or the sample. That can mean that he is not moved with the camera.
• the light source may be fixed with respect to the microscope camera. This can mean that the light source is moved with the microscope camera.
• a beam path comprising at least one illumination beam path and at least one imaging beam path
• At least one light source for generating at least one beam
• a plate-shaped reflector for deflecting the beam wherein the deflected beam is provided for illuminating the sample, and wherein the plate-shaped reflector has a plate normal and a different from the plate normal Optimizlot with respect to the illumination beam,
• At least one microscope objective for the imaging beam path is provided.
• a microscope for receiving at least one image of at least one sample in at least one field of view comprising
• a beam path comprising at least one illumination beam path and at least one imaging beam path
• At least one light source for generating at least one illumination beam
• At least one microscope objective for the imaging beam path is provided.
• the microscope objective can be used both for the illumination beam path and for the imaging beam path.
• both the not yet deflected illumination beam and the deflected illumination beam can be provided simultaneously for illuminating the sample.
• the light source, the microscope objective and the image sensor in the sense of an epi-illumination on one side of the sample, the reflector in the sense of an epi-illumination on one side of the sample
• the reflector in the other side of the sample.
• Geometrically, such an embodiment of the invention can be expressed more precisely in such a way that the light source, the microscope objective and the image sensor are arranged with respect to the sample plane in a common half space, the reflector is arranged in the other half space.
• the illumination beam path can be provided parallel to the optical axis. As a result, the structure can be inexpensive.
• the illumination beam path may also advantageously be provided inclined to the optical axis. As a result, the contrast of the recording can be improved.
• the microscope may include a camera lens.
• At least one second light source may be present in addition to the first light source.
• a second illumination beam can be generated.
• the second light source may be operable independently of the first light source.
• the plate-shaped reflector may also be provided for deflecting the second beam.
• the deflected second beam may be provided to illuminate the sample.
• the second beam can cause a second illumination situation different from a first illumination situation.
• Such a microscope can also be advantageously used to take a plurality of images for the methods described above. In this case, the microscope may have several, for example two, light sources and illumination beam paths.
• the illumination of the first recording can be done with the first light source and the illumination of a second recording with a second light source. Then, a sum image and / or a difference image can be calculated from both images, which can have an improved contrast in comparison to the individual images.
• a focus plane can be present in the microscope, which can be imaged sharply on the image sensor.
• the field of view can be provided, which can be detected by the image sensor.
• the illumination beam may have a sectional area with the focal plane in the beam path before deflecting the reflector. This section may contain the field of view. In this way, a combined incident and transmitted illumination of the sample can be achieved. This can be particularly advantageous when the illumination is through the microscope objective.
• Fig. 1 shows a first embodiment
• Fig. 2 shows a second embodiment.
• Fig. 3 shows a third embodiment.
• Fig. 4 shows a fourth embodiment.
• Fig. 5 shows a fifth and a sixth embodiment.
• Fig. 6 shows a seventh embodiment.
• FIG. 7 shows a first embodiment of the illumination beam path in a sectional plane.
• FIG 8 shows a second embodiment of the illumination beam path in a sectional plane.
• Fig. 9 shows a light source
• Fig. 10 shows an eighth embodiment.
• Fig. 11 shows a ninth embodiment.
• Fig. 12 shows a tenth embodiment.
• Fig. 13 shows a beam deflection on an element of a microprism array.
• Fig. 14 shows a section of a reflector.
• Fig. 1 shows a first embodiment. Shown is a device for receiving at least one microscopic image 1, which can also be described as a microscope.
• the optical axis 2 of the microscope objective lies in the z-direction.
• a sample 7 with transparent and / or semitransparent objects 9 is located on a sample carrier 10.
• the microscope comprises a microscope objective 20 with an optical axis 2.
• the light source 17 is arranged slightly in front of the pupil plane 22.
• the pupil plane is the xy plane in which the diaphragm 21, which can also be called a pupil, is located. By this arrangement, the light source, a slight divergence of the beam 3 is effected.
• the plane 16 is the focal plane in which objects are sharply imaged onto the image sensor 25.
• the focal plane is at the same time the sample plane 8 in which the sample is arranged.
• the beam 3 is guided through the sample plane 8 to a plate-shaped reflector 11.
• the plate-shaped reflector 11 has a plate normal 12 and a deviating from the plate normalIALlot 14 with respect to the illumination beam 3.
• the reflector 11 may be formed as a Fresnel prism.
• the Fresnel prism comprises a plurality of reflection surfaces 13 with reflection surface normals 14.
• the reflection surface normals are inclined with respect to the plate standard 12.
• the reflection surface normals are each the incident slot of an incident beam.
• the incidence slot corresponds to the replacement slot of the reflector.
• the reflector has a periodic structure with a period 29 in the x direction. Each period 29 comprises a reflection surface. The steep flanks between the reflection surfaces 13, however, are not intended for reflection.
• the deflected beam 4 has a central beam 5 on. With the deflected beam 4, the sample is illuminated.
• a camera 23 which comprises a camera lens 24 and an image sensor 25.
• An image sensor 25 can be used to take one or more microscopic images of the sample. In order to illustrate the imaging beam path, light beams 6 from the object are shown here.
• Fig. 1 In the illumination shown in Fig. 1 is a bright field transmitted light illumination.
• the gravitational direction is here the z-direction.
• the sample is illuminated from below and observed from below.
• Fig. 2 shows a second embodiment.
• the reflector with respect to the beam 3 is executed in contrast to the first embodiment approximately as a retroreflector. Characteristic of this is that the incident light rays are reflected back almost in themselves.
• the other reference numerals correspond to those of the first embodiment.
• the illumination shown in FIG. 2 is a combined one Incident and transmitted-light dark-field illumination.
• Fig. 3 shows a third embodiment.
• the illumination beam 3 is guided past the objective 20 on the outside.
• the light source 17 here comprises a separate collimation device (not shown) for generating a parallel beam.
• the field of view 27 is shown.
• the cut surface 26 lies outside the field of view 27.
• the reflector is designed so that in each period with respect to the direction z rising edge 30 and a falling edge 31 are present. Only the longer running rising flanks are used as reflection surfaces 13.
• the other reference numerals correspond to those of the preceding embodiments.
• Fig. 4 shows a fourth embodiment. This is a transmitted-light bright field illumination, wherein the illumination beam 3 is passed outside of the lens 20.
• the other reference numerals correspond to those of the preceding embodiments.
• Fig. 5 shows a fifth and a sixth embodiment.
• a first light source 17.a for generating the first beam 3.a is provided.
• the reflector 11 has V trenches, wherein in each period 29 a with respect to the direction z rising edge 30 and an equally long falling edge 31 are present. Both flanks are used as reflection surfaces 13.
• the illustrated beams of the beam 3.a are deflected by a first reflection 15.a at a reflection surface and a subsequent second reflection 15.b at another reflection surface.
• the replacement solder 14 is dependent on the direction of the incident beam.
• the first replacement solder 14.a here denotes the replacement solder of the central ray of the incident beam 3.a.
• the interaction of both individual reflections produces the first deflected radiation beam 4.a, with which the sample is illuminated under an oblique incidence of light.
• the roof edge angle 32 is selected here smaller than 90 °.
• the other reference numerals correspond to those of the preceding embodiments.
• three reflections are provided for deflecting the beam.
• the reflector may be formed as a microprism array, for example as a fullcube or as a pyramidal triple microprism array.
• a second light source 17.b is additionally provided, which is operable independently of the first light source 17.a.
• the first light source is switched on, a first image is taken. Thereafter, the first light source is turned off and the second light source is turned on. Since the replacement solder depends on the direction of incidence of the light, the reflector 11 now has a second replacement solder 14.b and second incident beam 3.b is deflected into a second deflected beam 4.b and illuminates the sample from a different direction than the first deflected Beams 4.a. Under this illumination, a second image of the sample is taken. From these two images, one can calculate a difference image in which the contrasts of the observed objects can be improved.
• Fig. 6 shows a seventh embodiment.
• a scanner unit 33 which carries a microscope camera 23, the objective 20 and the light source 17.
• This scanner unit is arranged in an xy plane displaceable under the samples 34.
• the microscope camera comprises the image sensor 25 and a camera lens 24.
• the light source 17 is fixed with respect to the microscope camera.
• a displacement 34 of the scanner unit 33 with respect to the samples 7 is provided in each case.
• the reflector 11 is fixed with respect to the samples.
• FIG. 7 shows a first embodiment of the illumination beam path in a sectional plane. Shown here are the cut surface 26 of the incident beam with the focal plane, the field of view 27 and the illuminated by the deflected beam sample surface 28. As can be seen, this is a combined incident and transmitted light illumination , Such lighting is shown in Fig. 2 in the second embodiment.
• FIG. 8 shows a second embodiment of the illumination beam path in a sectional plane. Shown here are the cut surface 26 of the incident beam with the focal plane, which is outside the field of view, the field of view 27 and illuminated by the deflected beam sample surface 28. As can be seen, this is a transmitted light - Lighting.
• Fig. 9 shows a light source.
• the light source is an LED 17.
• a diffuser 18 In front of the light-emitting surface is a diffuser 18, and light source aperture 19.
• a homogeneous directional distribution of the illumination light over a limited range can be achieved.
• Fig. 10 shows an eighth embodiment.
• the reflector 11 is designed as a retroreflector.
• the radiation beam 3 of the illumination is split into a plurality of radiation beams. This can be done by refractive index differences in the sample and / or by refraction on a curved sample back 35. Shown are a first 3.a, a second 3.b and a third beam 3.c. These fall in different directions on the retroreflector 11. Each beam is reflected back against the incident direction at the retroreflector, namely the first beam 3.a in the first deflected beam 4.a, the second beam 3.b in the second deflected beam 4.b and the third beam 3.c into the third deflected beam 4.c.
• the individual bundles of rays can here be assigned substitute solders whose direction corresponds to the respective outgoing beam.
• the first replacement solder 14.a corresponds to the first deflected beam 4.a
• the second replacement solder 14.b to the second deflected beam 4.b
• the third replacement solder 14.c to the third deflected beam 4.c.
• the description of the beam path by means of the replacement solders is redundant in the case of a retroreflector since the direction of the deflected beam against the incident beam is already clearly described by the function of the retroreflector.
• the deflection of the beam is effected by a plurality of reflections, by way of example given are a first reflection 15.a and a second reflection 15.b.
• the reflector as a microprism array
• three reflections for deflecting each beam are provided.
• a beam offset between the incident and the failing Beam arise.
• the size of the prisms or, in the case of embedded glass spheres, their diameter can be considered as structure size.
• the use of microprism arrays or the smallest possible embedded glass spheres for the retroreflector may be advantageous.
• the deflected radiation beams 4.a, 4.b, 4.c should namely hit the sample back as close as possible to the radiation beams 3.a, 3.b or 3.c.
• a transmitted light illumination can be achieved, which is divergent in parallel or in the same way as the incident beam of illumination 3.
• the illustration is an axis-parallel bright field illumination, ie that the radiation beam of the illumination 3 is parallel to the optical axis 2.
• oblique bright field illumination can be provided.
• the beam of the illumination 3 extends at an angle to the optical axis 2.
• the illumination beam is reflected with a partially transparent mirror 38.
• the illustration also shows an optional configuration for taking a Hoffman's modulation contrast image.
• This optional configuration comprises a modulator 37. This comprises three segments of different optical attenuation, which are indicated by dashed lines of different stroke width. This modulator is normally intended for the observation beam path (not shown). The illumination light is also passed through the modulator here.
• the optional configuration includes a slit (slit) 19.
• the aforementioned aperture may be fixed or rotatable and / or displaceable. This aperture is partially covered with a polarizer, which is shown in dashed lines.
• a further polarizer 39 may be provided, which acts on the whole used illumination beam. This can be rotatable.
• Fig. 11 shows a ninth embodiment.
• an oblique dark field illumination is provided here.
• a retroreflector 11 is used.
• a second light source (not shown) is provided which is operable independently of the first light source 17. Then, one partial image each can be recorded with one light source switched on and the microscopic image can be created as a difference image of both partial images.
• Fig. 12 shows a tenth embodiment.
• a phase plate 36 is provided, which is designed as a phase ring.
• a first illumination beam path 3 which emanates from a first point light source 17.a.
• further point light source can be specified, for example, a second point light source 17.b in the illustrated sectional image.
• an annular illumination is provided, which can be considered as a plurality of annularly arranged light sources.
• the individual light sources 17.a, 17.b can be fed by a single light source 17.
• the annular illumination can be coherent in order to accomplish a phase contrast recording as a microscopic image.
• the illumination beam is reflected with a partially transparent mirror 38.
• the phase plate is omitted and one or recorded several bright field images of the sample with oblique illumination.
• Fig. 13 shows a beam deflection on an element of a microprism array. Each beam undergoes a beam deflection through a first 15.a, a second 15.b and a third reflection 15.c on each of the surfaces of the microprism 40.
• Fig. 14 shows a section of a reflector.
• the reflector is a retroreflector, which in this exemplary embodiment is designed as a fullcube microprism array.
• the microprism array includes many trihedral microprisms 40. Such retroreflectors may be used in the above embodiments.

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• Optics & Photonics (AREA)
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• 2019
  • 2019-06-03 EP EP19729679.1A patent/EP3803494A1/de active Pending
  • 2019-06-03 US US16/972,401 patent/US20210231939A1/en not_active Abandoned
  • 2019-06-03 WO PCT/EP2019/064311 patent/WO2019233935A1/de unknown
  • 2019-06-03 CN CN201980037953.6A patent/CN112424668A/zh active Pending
  • 2019-06-03 JP JP2020567236A patent/JP2021527842A/ja active Pending

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