Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
  • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
  • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
  • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
  • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
  • F16K3/16—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together
  • F16K3/18—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
  • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
  • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
  • F16K3/30—Details
  • F16K3/314—Forms or constructions of slides; Attachment of the slide to the spindle
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
  • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
  • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
  • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
  • H01L21/67005—Apparatus not specifically provided for elsewhere
  • H01L21/67011—Apparatus for manufacture or treatment
  • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
  • H01L21/67005—Apparatus not specifically provided for elsewhere
  • H01L21/67011—Apparatus for manufacture or treatment
  • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
  • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
  • B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor

Definitions

• the invention relates to a CVD reactor with a gas-tight and evacuatable reactor housing and an inner housing therein, which means for feeding a process gas and means for holding a in the inner housing by means of the process gases to be treated substrate, wherein the inner housing of a sealing element a closure element has closable loading opening and the sealing element rests in its closed position with a circumferential sealing zone on a on the outside of the inner housing surrounding the loading opening counter-sealing zone.
• a CVD reactor in which a process chamber in which a gas inlet member and a substrate supporting susceptor is shielded against the process chamber surrounding space with a housing.
• the housing has a loading opening, which can be closed with a closure element.
• DE 10 2014 106 467 AI discloses a closure element with a sealing element which is pivotally mounted about a pivot axis to a carrier.
• a CVD reactor in particular a MOCVD reactor, coating steps are carried out.
• substrates consisting of silicon or a III-V compound are coated in the process chamber of the CVD reactor with one or more layers.
• the substrate is preferably a monocrystalline solid, on the surface of which one or more, in particular III-V layers are deposited monocrystalline.
• the susceptor carrying the substrate is heated to a process temperature.
• the process temperatures can be in the range between 1000 ° C and 1200 ° C, the high temperatures are achieved in particular in the deposition of nitrides.
• organometallic compounds in particular of III group elements, are fed into the process chamber as process gases.
• the elements of the V main group are fed as hydrides into the process chamber.
• Nitrogen for example, is fed into the process chamber as NH 3 .
• the gaseous starting materials decompose in the gas phase above the substrate and on the surface of the substrate.
• Both parasitic coatings arise on the surface of the susceptor and on the surface of a wall surrounding the process chamber. These must be removed from time to time.
• the removal of parasitic coatings can be done by dry etching. For this purpose, an etching gas is fed into the process chamber.
• the parasitic coatings are converted by means of the etching gas into volatile products, which can be removed by means of a carrier gas from the process chamber.
• a carrier gas from the process chamber.
• Cl 2 or another halogen compound or another halogen may be used. It can also be used HCl.
• the invention has for its object to provide measures by which the etching effect of the cleaning gas is limited only to the region of the process chamber.
• the process chamber is encapsulated by an inner housing arranged in the reactor housing.
• the inner housing has a loading opening, which can be closed by a sealing element of a closure element.
• the sealing element has a sealing surface and a sealing zone surrounding the sealing surface.
• the sealing zone In a closed position in which the sealing element closes the loading opening, the sealing zone is located at a counter-sealing zone of the inner housing.
• the counter-view zone is formed by an edge region of the loading opening.
• the counter-sealing zone is formed by the surface of the wall of the inner housing facing outwards, that is to say into the region surrounding the process chamber. In the closed position, the sealing element bears against the outside of the counter-sealing zone.
• a carrier which is displaceable by mechanical drive means such that the sealing element is brought from the closed position to an open position.
• the sealing element moves away from the loading opening, so that it is free for loading and unloading of the process chamber.
• the carrier and the sealing element are arranged in the region of the reactor housing surrounding the process chamber, that is to say the inner housing.
• a vacuum pump is provided with which the reactor housing and the process chamber are evacuated. In particular, in equal pressure on both sides of the sealing element, the sealing element closes the loading opening gas-tight.
• Another aspect of the invention is to increase the tightness of the sealing element in the closed position.
• the sealing element and at least one spatial axis are pivotally mounted on the carrier.
• Spatial axes are understood to mean the mutually perpendicular X, Y and Z axes, which indicate the three spatial axes.
• a Y-axis is directed in the direction of the loading direction through the loading opening.
• the inner housing has a cylindrical jacket wall. This cylindrical jacket wall forms the loading opening, so that the counter-sealing zones are curved.
• the sealing element may have a sealing surface which forms a cylinder jacket inner surface.
• the axis defining the cylinder of the inner housing is preferably the Z-axis.
• the loading opening can also be arranged in a flat jacket wall.
• a fastening arrangement which has one or more elastic elements.
• the sealing element is elastically deflectable supported by a carrier in at least one spatial direction.
• the sealing element may have the shape of my sealing plate. This has an extension surface, which may be curved.
• the direction of displacement is preferably the direction of a surface normal of a tangent surface in the middle of the surface of the sealing element.
• the mounting arrangement may be provided in pairs.
• the at least one, preferably two attachment arrangements each have an elastic element, which develops a sealing force in the closed position.
• the first elastic element thus preferably acts in the direction of the Y axis.
• a second elastic element can be provided, which unfolds a spring action which counteracts the spring action of the first elastic element. is set.
• Both elastic elements can be arranged axially one behind the other in the direction of the Y-axis and hold the sealing element in a center-sprung middle neutral position. In the middle neutral position, a first force applied to the sealing element by a prestressed first elastic element corresponds to a second force applied by the second elastic element to the sealing element. The two forces are opposite to each other to hold the sealing element in the middle neutral position.
• both elastic elements have the same spring characteristic, ie the same spring stiffness.
• the preferred two mounting arrangements are offset from one another in the direction of the X-axis and act in parallel in the direction of the Y-axis.
• the mounting arrangement may comprise a head and a shaft.
• the shank can be designed as a threaded shank.
• There may be provided a holder to which the head is attached.
• the head is in particular on a contact surface.
• the holder is in particular provided to support the sealing element.
• the fastening arrangement can be fastened to a joint head, wherein this joint head is preferably adjustable relative to the support by at least one spatial axis.
• the mounting hole can connect two mutually pioneering bearing surfaces together.
• the contact surfaces can be formed by supporting surfaces and are preferably formed by edges of the fastening bore. At these edges, the elastic elements can be supported.
• the first elastic element may be supported on a first support surface on one side of the attachment bore and the second elastic element on a second support surface on the other side of the attachment bore.
• the first fastening element preferably also supports itself on the holder so that it is compressed when the holder shifts toward the joint body.
• the second elastic element may additionally be supported on a body fixedly connected to the shaft, this body being fastened to the shaft on the side opposite the head.
• the body may be a sliding sleeve, which is displaceably arranged in a guide of the joint body.
• a head of the carrier has a bearing bore extending in the X direction.
• a bearing shaft is mounted, which protrudes with its two mutually pioneering ends of the bearing bore.
• the bearing axis supports the joint body, in particular with the two ends of the bearings facing away from each other, so that the joint body can be pivoted about the X-axis.
• Pivot limiting means may comprise adjusting means or be formed by adjusting means. These adjustment means may comprise an adjustment screw. However, they can also have spring elements, so that the joint body can not only be limited in terms of limit stops but also can be pivoted by spring force from an adjustable central neutral position about the X axis. At the two ends of the bearing shaft protruding from the bearing bore, these or other adjustment means can act. This can be an adjustment screw. The adjusting screw can be adjusted radially - with respect to the bearing axis. As a result, the joint body can be adjusted in the direction of the Z axis.
• the adjusting screw is spatially associated with an elastic pressure element, wherein the elastically acting pressure element of the adjusting screw - based on the Lagerach- se - diametrically opposed.
• the elastic pressure element may have a pressure screw, which acts on a spring element, which is supported on the opposite side of the adjusting screw on the bearing axis.
• the adjusting means for the linear adjustment of the joint body in the direction Z axis or for adjusting the inclination position of the joint body - with respect to the Y axis - may be associated with legs of the joint body, wherein the carrier head of the carrier is disposed between the legs.
• the joint body is also carrier of a holder. The holder can be displaced by means of the fastening arrangement in the direction of the Y-axis elastically with respect to the joint body.
• the sealing element can be plugged onto the holder or an intermediate carrier supported by the holder.
• the sealing element is preferably made of a material which is resistant to high temperatures, for example of a coated graphite.
• the joint body and the holder may be made of a metal.
• the intermediate carrier fixedly connected to the holder may be an insulating body which thermally insulates the holder from the sealing element.
• the sealing element may have a ramp with a locking projection.
• the ramp is preferably located on the side facing away from the sealing surface side of the sealing element.
• the holder or a bracket attached to the bracket may have a spring-loaded detent pin, the locking head slides when attaching the sealing element on the intermediate carrier along the ramp and overflows the locking projection.
• the up- stuck the sealing element on the intermediate carrier takes place in the direction of the Z axis, ie in a tangential direction relative to the sealing surface.
• the sealing element can be replaced by a substantially identical adjusting element having fferniermaschinemaschine-passage openings through which the adjusting tools can reach through to adjust the inclination position of the joint body or the holder or to tension the spring elements or to relax.
• FIG. 1 shows schematically the structure of a MOCVD reactor
• Carrier 12 has fixed sealing element 11, with which a loading opening 7 of an inner housing 2 is closed,
• 5b is a second exploded view of the essential elements of the closure element 10,
• Fig. 12 is a view according to Figure 10, but with another
• Fig. 14 is a view according to Figure 10, but with another
• FIG. 15 is a view according to Figure 8, but with dashed lines articulated body 14 and
• Fig. 16 an adjustment member 15 which is interchangeable with a sealing element 11.
• FIG. 1 shows schematically the structure of a MOCVD reactor which has a gas-tight reactor housing 1 which contains a loading opening 8 which can be closed by a door 9. Outside the door 9 is atmospheric pressure. Within the reactor housing 1, an adjustable subatmospheric pressure prevail. For this purpose, a vacuum pump, not shown in the drawings, is provided.
• an inner housing 2 which closes the process chamber located in the inner housing in a gastight manner against the environment of the inner housing 2.
• a gas inlet member 4 for introducing process gases, which are supplied from the outside via a gas supply line 3.
• a heatable susceptor 5 which carries the substrate to be coated.
• Figure 2 shows an enlarged loading opening 7 in a cylindrical wall of the inner housing 2.
• the loading opening 7 is surrounded on the outwardly facing side of the inner housing 2 by a counter-sealing zone T.
• a sealing zone 10 'of a sealing element 11 of a closure element 10 is located in a closed position.
• the sealing connection 10 ', T is at least substantially gas-tight if the same pressure prevails in the inner housing 2, which also in which the inner housing 2 is surrounded. Benden volume of the reactor housing 1 prevails.
• S denotes an axis of symmetry which passes through the gas inlet member 4 and the center of the susceptor 5.
• the inner housing 2 forms a cylindrical jacket wall, in which the loading opening 7 is arranged.
• the sealing element 11 is supported by a carrier 12.
• the carrier 12 is adjustable with a mechanical holding device, not shown, within the reactor housing 1 between two positions. In a closed position, the sealing element 11 closes the loading opening 7. In an open position, the loading opening 7 is open for loading or unloading of the susceptor 5 with a substrate 6.
• An unillustrated gripper or the like can reach through the aligned loading openings 7, 8, when the closure element 10 and the door 9 each occupy their open positions.
• the closure element 10 and in particular a sealing element 11 formed by the closure element 10 moves away from the axis of symmetry S.
• the carrier 12 has a carrier head 13, which has a bearing bore.
• the bearing bore 18 ' extends in an X direction.
• a bearing shaft 18 which forms a bearing shaft.
• the bearing shaft 18 has two free ends, each protruding from an end portion of the bearing bore 18 '.
• Each of the two ends of the bearing shaft 18 is inserted in an elongated opening of a leg 14 'of a joint body 14. As the figure shows 7, engage at the free ends of the bearing axis 18 in the legs 14' arranged adjustable holding elements.
• a setting screw 20 is inserted in a bore which is formed transversely to the X-axis, in the exemplary embodiment in the direction of the Z-axis.
• the bearing point can be in one direction Adjust Sz in the direction of the Z axis.
• a spring element 22 which is acted upon by a pressure screw 21.
• the spring element 22 is supported on the bearing axis 18 on the side opposite the adjusting screw 20.
• the adjusting screw 20 and the pressure screw 21 can be adjusted in the direction of the Z-axis.
• a stopper plunger 24 has a stop end 24 'which can be supported on the carrier head 13.
• a spring element 25, which is designed as a helical-compression spring, is supported at one end on a stop face 13 'of the carrier head 13 and at a second end at a pressure end 24 "of the stop ram 24.
• a shank end 26 engages "a pressure screw 26, whose head 26 'has a very aubwerkmaschineschwengaged opening, with which the pressure screw 26 and thus the distance of the stop end 24' of the stop surface 13 'can be adjusted .
• the distances are in the figure 13 with a and
• the joint body 14 is held in a central position by means of the two spring elements 25. From this center position, the joint body 14 can be pivoted about the X axis until the stop ends 24 'contact the contact surface 13'.
• the figure 14 additionally shows holes 27 of the holder 15 and holes 28 of a holder carried by the intermediate carrier 16. Through the holes 27, 28, a screwing can be inserted through to adjust the pressure screws 26.
• the holder 15 is linearly displaceable relative to the joint body 14 in the Y direction.
• the spring or attachment assemblies 30 extend in the Y-axis.
• Each of the spring or mounting arrangements 30 has a shank 31 ", with which the holder 15 is slidingly connected to the articulated body 14.
• a head 31 'of the spring or mounting arrangement 30 is supported on the holder 15.
• the head 31' Shaft 31 "extends through a fastening bore 34 of the joint body 14.
• the shaft 31" also extends through a fastening bore 32 of the holder 15, wherein a respective disk 33, 33 'is provided on both sides of the fastening bore 32
• Disk 33 'or on the holder 15 is supported by a first elastic member 38, which may be a rubber buffer or a helical gear compression spring.
• the elastic element 38 is also supported on the joint body 14.
• the first elastic element 38 is supported on an edge of the fastening bore 34 facing the holder 15.
• the edge of the fastening bore 34 lying opposite this edge forms a support surface on which a second elastic element 39 is supported, which is supported by a sliding sleeve 35 on the other side.
• the sliding sleeve 35 can have an internal thread into which an external thread of the shank 31 "is screwed in.
• the head 31 'and the shank 31" can be formed by a screw 31.
• the sliding sleeve 35 is displaceable in the direction of the Y axis in a bearing recess 37 of the joint body 14.
• a guide screw 36 is provided, which engages in a recess of the sliding sleeve 35.
• the invention thus also relates to a sealing element 11 which is mounted floating relative to the support 12 and which can be displaced from an adjustable, central position against the elastic restoring force of an elastic element 38, 39 relative to the support 12 in a sealing direction, the sealing direction in particular being a radial direction on the axis S in Figure 1.
• a double floating bearing is provided, so that the sealing element 10 can also perform a slight pivoting in a plane in which the sealing direction runs.
• the head 31 has a ffertechnikmaschine-engagement opening with which the screw 31 can be rotated.
• the tension of the elastic elements 38, 39 is either increased or decreased.
• the holder 15 can be displaced linearly in the direction of Sy at two different points.
• the inclination position of the holder 15 can be adjusted about the Z axis.
• the first elastic element 38 can be tensioned in the final phase of closing the loading opening 7 with the sealing element 11 so that it unfolds a sealing force with which the sealing zone 10 'bears against the counter-sealing zone T.
• the intermediate carrier 16 is made of a heat-insulating material and firmly connected to the holder 15.
• Two blocks 17 are also firmly connected to the holder 15.
• the blocks 17 are screwed to the leg 15 'of the holder 15.
• the latching means shown in Figure 9 with which the plugged on the intermediate support 16 sealing element 11 is held in a snap-in connection.
• a fastening web 40 of the sealing element 11 engages in a fastening niche 41 of the intermediate support 16, wherein the fastening web 40 forms a run-on slope 44 and an adjoining locking projection 43.
• Within the bucket 17 is a bearing bore 48, which forms a guide portion 48 '.
• a piston portion 47 of a locking pin 46 displaced.
• the latching pin 46 forms a latching head 46 ', which engages behind the latching projection 43 in the latching position.
• the piston portion 47 is acted upon by a spring element 49, which is supported on a pressure screw 50.
• the intermediate carrier 16 forms a stop zone 42 in the form of a nose, on which the fastening web 40 can be supported, the stop zone 42 facing the locking pin 46.
• a stop extension 52 is provided, which is associated with the sealing element 11 and which can be supported on the intermediate carrier 16.
• the sealing element 11 has a closed sealing surface, which is surrounded by the sealing zone 10 '.
• An exchangeable against the sealing element 11, with the sealing element 11 otherwise identical adjustment member 55 has ringwerkmaschinegne- fürsteckö Maschinenen 56, 57 which are aligned with bearing bores with which the adjusting screws 26 and 31 can be adjusted.
• the adjustment element 55 is used instead of the sealing element 11.
• the sealing element 11 On the side of the sealing element 11 facing away from the sealing surface, the sealing element 11 has a centering rib 54.
• the centering rib 54 engages in a centering recess 53, which is arranged approximately in the center of the holder 15.
• a CVD reactor which is characterized in that the sealing element 11 to at least one spatial axis X, Y, Z tilt adjustable and / or pivotable and / or elastically deflected in the direction of one of the spatial axes X, Y, Z on a support 12 is attached.
• a CVD reactor which is characterized in that the sealing element 11 at least two spatial axes X, Y, Z and / or about the three spatial axes X, Y, Z at least tilt adjustable, and / or pivotally mounted on the carrier 12th is attached.
• a CVD reactor which is characterized by at least a first elastic member 38 of a spring and / or fastening assembly 30, which develops a sealing force in the closed position, with which the sealing zone 10 'is applied flat against the counter-sealing zone T.
• a CVD reactor characterized in that the sealing force is the sum of a first force generated by the first elastic member 38 and a second force generated by a second elastic member 39, the first force being opposed to the second force and both Elastic elements 38, 39 are biased against each other in a neutral position.
• a CVD reactor which is characterized in that the loading opening 7 is arranged in a curved portion of the inner housing 2 and the sealing element 11 has a curved sealing surface, the edge of the sealing zone 10 'forms and / or that the loading opening 7 a cylindrical wall of the inner housing 2 is assigned, wherein the carrier 12 is displaceable in a plane on which the contour axis of the cylindrical housing wall is perpendicular.
• a CVD reactor which is characterized in that the spring and / or fastening arrangement 30 has a second elastic element 39 whose spring direction is opposite to the spring direction of the first elastic element 38.
• a CVD reactor characterized in that the spring and / or attachment assembly 30 comprises a head 31 'and a shank 31 ", the head 31' being fixed to a holder 15 and the shank 31" in a fastening bore 34 of a joint head 14 is inserted and the elastic elements 38, 39 are directed away from one another, in particular from edges of the joint Mounting hole 34 formed supporting surfaces 34 ', 34 "support, wherein it is provided in particular that the first elastic member 38 is supported on the holder 15 and the second elastic member 39 on the shaft 31" and in particular on a connected to the shaft 31 "body, such as a slide - sleeve 35, supports.
• a CVD reactor which is characterized by a bearing axis 18, with which the closure element 10 is pivotable about an X-axis.
• a CVD reactor which is characterized by pivot limiting means 24, 25, with which the pivot angle of the closure element 10 can be limited about the X-axis and / or with which the closure element 10 is elastically adjustable in a starting position fixable.
• a CVD reactor characterized adjusting means 20 for adjusting a tilt position of the closure element 10 about the Y-axis, wherein it is provided in particular that the adjusting means 20 are adjusting screws, which are supported on end portions of the bearing axis 18.
• a CVD reactor which is characterized in that the adjusting means 20 resilient pressure elements 21, 22 spatially associated, in particular, is provided that the elastic pressure elements 21, 22 - relative to the bearing axis 18 - the adjustment means 20 are opposed and allow an elastic adjustment of the inclination position of the closure element 10 about the Y axis.
• a CVD reactor characterized in that the spring and / or fastening arrangement 30 has a tilt adjustment of the closure. siatas 10 allows the Z-axis and / or that the sealing element 11 is mounted floating in a sealing direction relative to the carrier 12.
• a CVD reactor which is characterized in that the sealing element 11 is connected via a detachable connection 43, 44, 46 with an intermediate carrier 16, wherein it is provided in particular that the intermediate carrier 16 is an insulating body and with a holder 15th is connected, which is pivotable relative to the carrier 12 about the at least one spatial axis X, Y, Z.
• a CVD reactor which is characterized in that the sealing element 11 is exchangeable for a substantially identical adjusting element 55, wherein the adjusting element 55 screwing through openings 56, 57 for actuating adjusting screws, with which the inclination position of a Intermediate carrier 16 and / or a holder 15 relative to the carrier 12 is adjustable.
• Insulating body 34 "supporting surfaces

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• Engineering & Computer Science (AREA)
• General Engineering & Computer Science (AREA)
• Chemical & Material Sciences (AREA)
• Mechanical Engineering (AREA)
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• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
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• Chemical Vapour Deposition (AREA)
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• 2017
  • 2017-10-06 DE DE102017123231.1A patent/DE102017123231A1/de active Pending
• 2018
  • 2018-10-02 US US16/652,647 patent/US11702740B2/en active Active
  • 2018-10-02 EP EP18782949.4A patent/EP3691778A1/de active Pending
  • 2018-10-02 KR KR1020207012200A patent/KR20200064104A/ko not_active Application Discontinuation
  • 2018-10-02 WO PCT/EP2018/076792 patent/WO2019068709A1/de unknown
  • 2018-10-02 CN CN201880077822.6A patent/CN111417458B/zh active Active
  • 2018-10-04 TW TW107135107A patent/TWI810209B/zh active

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