EP3508604B1 - Metallmaskenmaterial und herstellungsverfahren dafür - Google Patents

Metallmaskenmaterial und herstellungsverfahren dafür Download PDF

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Publication number
EP3508604B1
EP3508604B1 EP17846645.4A EP17846645A EP3508604B1 EP 3508604 B1 EP3508604 B1 EP 3508604B1 EP 17846645 A EP17846645 A EP 17846645A EP 3508604 B1 EP3508604 B1 EP 3508604B1
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metal mask
mask material
rolling
sample
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Application number
EP17846645.4A
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English (en)
French (fr)
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EP3508604A4 (de
EP3508604A1 (de
Inventor
Akihiro Omori
Takuya Okamoto
Yasuyuki Iida
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Proterial Ltd
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Hitachi Metals Ltd
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/02—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • C21D8/0221—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips characterised by the working steps
    • C21D8/0236—Cold rolling
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/02—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • C21D8/04—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips to produce plates or strips for deep-drawing
    • C21D8/0421—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips to produce plates or strips for deep-drawing characterised by the working steps
    • C21D8/0436—Cold rolling
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/04—Ferrous alloys, e.g. steel alloys containing manganese
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/46—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for sheet metals

Definitions

  • the present invention relates to a metal mask material and a production method therefor.
  • a metal mask is used for deposition on a substrate and generation of color patterning.
  • a method of performing etching processing on an Fe-Ni alloy thin plate is known as one of methods of forming an opening.
  • various methods have been proposed.
  • Patent Literature 1 describes a material for etching processing in which, in order to enable formation of a high-definition etching pattern, a surface roughness measured in a direction perpendicular to a rolling direction is Ra: 0.08 to 0.20 ⁇ m, a surface roughness measured in the rolling direction is Ra: 0.01 to 0.10 ⁇ m, and the surface roughness measured in a direction perpendicular to the rolling direction has a rough surface roughness Ra exceeding the surface roughness measured in the rolling direction by 0.02 ⁇ m.
  • Patent Literature 2 describes a metal mask material in which etching properties are improved by adjusting X-ray diffraction intensities of crystal orientations (111), (200), (220), and (311) on the rolled surface.
  • Patent Literature 3 relates to a method for producing an Fe-Ni-based alloy thin plate used for, for example, a lead frame or a metal mask.
  • the adhesiveness can be improved in a thin Fe-Ni-based alloy thin plate having a thickness of 0.25 mm or less, poor adhesion between the Fe-Ni-based alloy thin plate and a counterpart material that is in close contact with the thin plate can be prevented.
  • the anchor effect can be enhanced by the unevenness formed on the surface, and the adhesion can be dramatically improved.
  • Patent Literature 1 discloses an invention in which etching characteristics are improved by adjusting a surface roughness Ra measured in a direction perpendicular to a rolling direction and a surface roughness Ra measured in the rolling direction.
  • Patent Literature 2 discloses an invention in which etching properties are improved by adjusting crystal orientations of the rolled surface.
  • etching properties are improved by adjusting crystal orientations of the rolled surface.
  • An objective of the present invention is to provide a metal mask material in which change in shape after etching is minimized and which has more favorable etching properties, and a production method therefor.
  • etching processing with higher precision can be performed, and change in shape after etching can be significantly minimized, and thereby the present invention has been completed.
  • a metal mask material of the present invention includes a steel strip wound in a coil shape and a rectangular thin plate produced by cutting the steel strip.
  • the metal mask material of the present invention is an Fe-Ni alloy having a chemical composition including, by mass%, C: 0.01% or less, Si: 0.5% or less, Mn: 1.0% or less, and Ni: 30 to 50%, with the balance being made up of Fe and inevitable impurities are as follows.
  • C is an element that influences etching properties. Since etching properties deteriorate when an excess amount of C is included, the upper limit of C is set to 0.01%. There may be 0% of C, but it is incorporated in a small amount in a production process, and thus the lower limit is not particularly limited.
  • Si and Mn are generally used for the purpose of deoxidation and are contained in a small amount in the Fe-Ni alloy. However, when an excessive amount thereof is contained, since segregation easily occurs, Si: 0.5% or less, and Mn: 1.0% or less are set. Preferably, an amount of Si and an amount of Mn are Si: 0.1% or less, and Mn: 0.5% or less. The lower limits of Si and Mn can be set to, for example, 0.05% for Si and 0.05% for Mn.
  • Ni is an element that has a function of allowing adjustment of a coefficient of thermal expansion and greatly influences low thermal expansion characteristics. Since there is no effect of lowering a coefficient of thermal expansion when a content is less than 30% or exceeds 50%, a range for Ni is set to 30 to 50%. Preferably, an amount of Ni is 32 to 45%.
  • Components other than the above elements are Fe and inevitable impurities.
  • an arithmetic average roughness Ra (according to JIS-B-0601-2001) is 0.05 to 0.25 ⁇ m, and a maximum height Rz (according to JIS-B-0601-2001) is 1.5 ⁇ m or less.
  • Ra and Rz are within the above ranges, the material of the present invention can be etched with high precision.
  • Ra exceeds 0.25 ⁇ m, since the surface of the material is too rough, variations occur during etching, and etching processing with high precision becomes difficult.
  • Ra is less than 0.05 ⁇ m, the adhesion of a resist is likely to be lowered.
  • Rz exceeds 1.5 ⁇ m even if Ra is within the above range, this is not preferable because a large peak part in a roughness curve is formed in a part of the surface of the material, etching progresses from the peak part and this causes etching unevenness.
  • the upper limit of Ra is more preferably 0.13 ⁇ m, and the upper limit of Rz is more preferably 1.0 ⁇ m.
  • the lower limit of Rz is not particularly limited.
  • the lower limit of Rz is preferably set to 0.3 ⁇ m.
  • these restrictions on the surface roughness be satisfied for both a surface roughness in a direction perpendicular to a rolling direction (hereinafter referred to as a "width direction” or “direction perpendicular to a rolling direction") and a surface roughness in the rolling direction (hereinafter referred to as a "longitudinal direction”) of the metal mask material.
  • a difference in Ra between a direction perpendicular to a rolling direction and the rolling direction of the material is preferably adjusted to be less than 0.02 ⁇ m. Accordingly, unevenness during etching can be minimized.
  • the surface roughness can be measured using a contact type or non-contact type roughness meter that is generally used.
  • the metal mask material of the present embodiment has a skewness Rsk (according to JIS-B-0601-2001) of less than 0 in addition to the above surface roughness.
  • Rsk according to JIS-B-0601-2001
  • etching can progress more uniformly. If Rsk>0, a difference in etching progress between the peak part and the valley part of the roughness curve tends to be large. However, when Rsk is less than 0, etching unevenness can be further minimized. This is more conspicuous in a thin plate material in which etching progresses in a short time and the progress of etching is likely to be nonuniform. More preferably, Rsk ⁇ -1.0.
  • the lower limit of Rsk is not particularly limited. However, since it is difficult to produce a material having a very small Rsk, the lower limit is preferably set to about -3.0. In addition, a difference in Rsk between the rolling direction and the width direction of the material is preferably 0.7 or less, more preferably 0.5 or less, and most preferably 0.2 or less.
  • Rsk of the present embodiment has a negative value both in a rolling direction and a direction perpendicular to the rolling direction.
  • the metal mask material of the present embodiment is applied to a material with a plate thickness of less than 0.10 mm in order to obtain the above effect of Rsk sufficiently and form patterns with higher definition.
  • the plate thickness is less than 0.06 mm, and more preferably, the plate thickness is less than 0.03 mm.
  • the lower limit is not particularly limited. However, since etching becomes difficult when the thickness is too thin, it is set to 0.01 mm.
  • a sample with a length of 150 mm and a width of 30 mm is cut out, the sample is etched from one side, and an amount of warpage when 60% of the plate thickness of the sample is removed is 15 mm or less.
  • an amount of warpage when any of 20%, 30%, and 50% of the plate thickness of the sample is removed is 15 mm or less.
  • amounts of warpage when any of 20, 30, and 50% of the plate thickness of the sample is removed are all 15 mm or less.
  • the amount of warpage is preferably 13 mm or less, more preferably 11 mm or less, and still more preferably 9 mm or less.
  • an amount of warpage when 50% of the plate thickness of the sample is removed, in which the balance of the stress easily breaks down and large warpage is likely to occur is 9 mm or less, and an amount of warpage when 20% or 30% of the plate thickness is removed is preferably 6 mm or less.
  • the sample is cut so that a length direction of the cut sample corresponds to the rolling direction, and the warpage is measured.
  • the sample is hung of which an upper end of the cut sample is in contact with a vertical surface plate, and a horizontal distance between a lower end of the cut sample separated from the vertical surface plate due to warpage and the vertical surface plate is measured as an amount of warpage.
  • processes of vacuum melting-hot forging-hot rolling-cold rolling can be applied.
  • a homogenization heat treatment is performed at about 1,200 °C in a step before cold rolling, and during the cold rolling process, in order to reduce the hardness of the cold rolled material, annealing at 800 to 950 °C can be performed at least once.
  • a polishing process of removing scale on the surface and an ear trimming process of removing an off-gauge part (a part with a thick plate thickness) at the end of the material and removing an ear wave part generated in rolling processing may be performed.
  • a furnace used during the heat treatment process existing furnaces such as a vertical type furnace and a horizontal type furnace (a horizontal furnace) may be used.
  • a vertical type furnace in which deflection due to an own weight is unlikely to occur is preferably used.
  • a rolling reduction ratio in a final pass of a finish cold rolling process is adjusted to 35% or less.
  • the rolling reduction ratio exceeds 35%, the residual distortion of the material increases and the occurrence of deformation during etching processing tends to increase.
  • the upper limit of the rolling reduction ratio is 15%, more preferably the upper limit of the rolling reduction ratio is 10%, and most preferably, the upper limit of the rolling reduction ratio is 6%.
  • the lower limit of the rolling reduction ratio is set to 2%.
  • the number of rolling passes in the finish cold rolling is not particularly specified.
  • a rolling pass may be performed a plurality of times (for example, 3 times or more, preferably 4 times or more, and more preferably 5 times or more).
  • these restrictions on the rolling reduction ratio are preferably applied to all passes of the finish cold rolling.
  • a roller used in the final pass of the finish cold rolling a roller having a surface roughness Ra of 0.05 to 0.25 ⁇ m in a direction perpendicular to a circumferential direction (a direction in which a roller rotates) of the roller is used.
  • the upper limit of Ra is 0.15 ⁇ m.
  • the material of the roller is not particularly limited.
  • an alloy tool steel roller defined in JIS-G4404 can be used.
  • a bite angle which is an angle at which the rolled material and a work roller start to come in contact with each other is set to less than 1.0°.
  • a rolling oil is intentionally introduced between the rolled material and the work roller, and an uneven part on the surface of the work roller is prevented from being excessively transferred to the rolled material. Accordingly, a difference between a surface roughness in a direction perpendicular to a rolling direction and a surface roughness in the rolling direction of the metal mask material is reduced and Rsk can be easily adjusted to have a negative value more reliably.
  • the bite angle is preferably adjusted to less than 0.4°.
  • the lower limit can be set to 0.05°.
  • R indicates the radius of the roller
  • ho indicates the plate thickness of the material before rolling
  • hi indicates the plate thickness of the material after rolling.
  • a rolling speed is preferably set to 60 m/min or more.
  • the rolling speed is set to 60 m/min or more, a rolling oil is reliably introduced between the work roller and the metal mask material, and an oil pit for adjusting Rsk to have a negative value can be formed more reliably.
  • the lower limit of the rolling speed is 80 m/min.
  • the upper limit of the rolling speed is not particularly set, but if the rolling speed is too fast, a large amount of rolling oil is introduced between the work roller and the material, and it is conceivable that there would be a possibility of slipping failure. Therefore, for example, 300 m/min can be set.
  • distortion relief annealing may be performed in order to remove distortion remaining in the metal mask material after finish rolling and minimize shape defects occurring in the material.
  • the distortion relief annealing is preferably performed at a temperature of about 400 to 700 °C.
  • an annealing time is not particularly limited. However, when the time is too long, characteristics such as the tensile strength significantly deteriorate, and when the time is too short, an effect of removing the distortion is not obtained. Therefore, about 0.5 to 2.0 min is preferable.
  • a bite angle of the roller of sample No. 1 was 0.26° and the number of passes during finish rolling was 7.
  • a bite angle of the roller of sample No. 2 was 0.51°, and the number of passes during finish rolling was 4.
  • a rolling speed during the finish cold rolling was an average of 80 m/min.
  • a roughness Ra in a direction perpendicular to a circumferential direction (a direction in which a roller rotates) of the roller used for finish cold rolling was in a range of 0.05 to 0.2 ⁇ m.
  • distortion relief annealing was performed at a temperature of 500 °C for 1 minute.
  • a surface roughness and a warpage of the obtained sample were measured.
  • Surface roughnesses Ra, Rz, and Rsk were measured according to measurement methods shown in JIS B0601 and JIS B0651, three places were randomly selected, and surface roughnesses were measured in the longitudinal direction and the width direction.
  • a stylus type roughness meter was used as a measurement device and measurement was performed under conditions of an evaluation length of 4 mm, a measurement speed of 0.3 mm/s, and a cutoff value of 0.8 mm. Table 2 shows average values at three places.
  • a cut sample with a length of 150 mm and a width of 30 mm was prepared, and etched from one side so that the plate thickness became 2/5, and an amount of warpage when the cut sample was hung on a vertical surface plate was then measured and evaluated.
  • the cut sample was collected from the central part in the width direction of the prepared sample so that the length direction corresponded to the rolling direction.
  • a ferric chloride aqueous solution was used as an etching solution, and the etching solution with a liquid temperature of 50 °C was sprayed thereon, and thus a test piece corroded.
  • Table 2 Sample No.
  • the metal mask material of the present invention had an optimal surface state such that it exhibited favorable etching processability, and it was possible to minimize change in shape after deep etching exceeding half of the plate thickness.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Heat Treatment Of Sheet Steel (AREA)
  • Metal Rolling (AREA)
  • ing And Chemical Polishing (AREA)

Claims (9)

  1. Metallmaskenmaterial, wobei das Metallmaskenmaterial dadurch gekennzeichnet ist, dass es in Masse-%, C: 0,01 % oder weniger, Si: 0,5 % oder weniger, Mn: 1,0 % oder weniger, und Ni: 30 bis 50 % enthält, wobei der Rest aus Fe und unvermeidbaren Verunreinigungen zusammengesetzt ist,
    wobei für das Metallmaskenmaterial sowohl eine Oberflächenrauhigkeit in einer Walzrichtung als auch eine Oberflächenrauhigkeit in einer Richtung senkrecht zu der Walzrichtung eine arithmetische mittlere Rauhigkeit Ra von 0,05 µm oder mehr und 0,25 µm oder weniger und eine maximale Höhe Rz von 1,5 µm oder weniger aufweisen und eine Schrägheit Rsk kleiner als 0 ist, und
    wobei, wenn eine Probe mit einer Länge von 150 mm und einer Breite von 30 mm aus dem Metallmaskenmaterial ausgeschnitten wird und 60% der Plattendicke der Probe durch Ätzen der Probe von einer Seite entfernt wird, ein Verzugsmaß 15 mm oder weniger beträgt und die Plattendicke 0,01 mm oder mehr und weniger als 0,10 mm beträgt.
  2. Metallmaskenmaterial gemäß Anspruch 1,
    wobei die Schrägheit Rsk -3,0 oder mehr beträgt.
  3. Metallmaskenmaterial gemäß Anspruch 1 oder 2,
    wobei eine Differenz zwischen einer Schrägheit Rsk in einer Walzrichtung des Metallmaskenmaterials und einer Schrägheit Rsk in einer Richtung senkrecht zu der Walzrichtung 0,7 oder weniger beträgt.
  4. Metallmaskenmaterial gemäß irgendeinem der Ansprüche 1 bis 3,
    wobei eine Differenz zwischen einer Oberflächenrauhigkeit Ra in der Walzrichtung des Metallmaskenmaterials und einer Oberflächenrauhigkeit Ra in der Richtung senkrecht zu der Walzrichtung weniger als 0,02 µm beträgt.
  5. Metallmaskenmaterial gemäß irgendeinem der Ansprüche 1 bis 4,
    wobei, wenn eine Probe mit einer Länge von 150 mm und einer Breite von 30 mm aus dem Metallmaskenmaterial ausgeschnitten wird und eines von 20 %, 30 % und 50 % der Plattendicke der Probe durch Ätzen der Probe von einer Seite entfernt wird, ein Verzugsmaß 15 mm oder weniger beträgt.
  6. Verfahren zur Herstellung eines Metallmaskenmaterials, wobei das Verfahren zur Herstellung eines Metallmaskenmaterials gekennzeichnet ist, durch Kaltwalzen eines Kaltwalzmaterials, das, in Masse-%, C: 0,01% oder weniger, Si: 0,5% oder weniger, Mn: 1,0 % oder weniger, und Ni: 30 bis 50 % enthält, wobei der Rest aus Fe und unvermeidbaren Verunreinigungen zusammengesetzt ist, um ein Metallmaskenmaterial zu erhalten, wobei
    Bedingungen in einer Decklage eines Fertigkaltwalzprozesses für das Kaltwalzmaterial sind, dass ein Walzreduktionsverhältnis 35 % oder weniger und 2 % oder mehr beträgt und ein Bisswinkel einer Walzrolle weniger als 1,0° und eine Oberflächenrauhigkeit in einer Richtung senkrecht zu einer Umfangsrichtung einer Rolle eine arithmetische mittlere Rauhigkeit Ra von 0,05 bis 0,25 µm aufweist;
    für das Metallmaskenmaterial sowohl eine Oberflächenrauhigkeit in einer Walzrichtung als auch eine Oberflächenrauhigkeit in einer Richtung senkrecht zur Walzrichtung eine arithmetische mittlere Rauhigkeit Ra von 0,05 µm oder mehr und 0,25 µm oder weniger und eine maximale Höhe Rz von 1,5 µm oder weniger aufweisen und eine Schrägheit Rsk weniger als 0 ist;
    wenn eine Probe mit einer Länge von 150 mm und einer Breite von 30 mm aus dem Metallmaskenmaterial ausgeschnitten wird und 60% der Plattendicke der Probe durch Ätzen der Probe von einer Seite entfernt wird, beträgt das Verzugsmaß 15 mm oder weniger; und
    die Plattendicke des Materials nach dem Fertigkaltwalzen 0,01 mm oder mehr und weniger als 0,10 mm beträgt.
  7. Verfahren zur Herstellung eines Metallmaskenmaterials gemäß Anspruch 6, wobei der Bisswinkel der Walzrolle weniger als 0,4° beträgt.
  8. Verfahren zur Herstellung eines Metallmaskenmaterials gemäß Anspruch 6 oder 7,
    wobei ein Walzreduktionsverhältnis in dem letzten Schritt des Fertigkaltwalzprozesses 15% oder weniger beträgt.
  9. Verfahren zur Herstellung eines Metallmaskenmaterials gemäß irgendeinem der Ansprüche 6 bis 8,
    wobei die Walzgeschwindigkeit im Kaltfertigwalzprozess 60 m/min oder mehr beträgt.
EP17846645.4A 2016-08-31 2017-08-31 Metallmaskenmaterial und herstellungsverfahren dafür Active EP3508604B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016169880 2016-08-31
PCT/JP2017/031348 WO2018043641A1 (ja) 2016-08-31 2017-08-31 メタルマスク用素材およびその製造方法

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EP3508604A1 EP3508604A1 (de) 2019-07-10
EP3508604A4 EP3508604A4 (de) 2020-01-01
EP3508604B1 true EP3508604B1 (de) 2020-12-09

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EP (1) EP3508604B1 (de)
JP (1) JP6807038B2 (de)
KR (1) KR102200854B1 (de)
CN (1) CN109642289B (de)
WO (1) WO2018043641A1 (de)

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EP3712296A4 (de) 2017-11-14 2021-08-11 Dai Nippon Printing Co., Ltd. Metallplatte zur herstellung von dampfabscheidungsmasken, herstellungsverfahren für metallplatten, dampfabscheidungsmaske, herstellungsverfahren für dampfabscheidungsmaske und dampfabscheidungsmaskenvorrichtung mit dampfabscheidungsmaske
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CN116987977B (zh) * 2023-09-25 2024-01-02 安泰科技股份有限公司 一种fmm掩模用铁镍基精密合金材料、合金带材及冶炼工艺

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CN105803333A (zh) * 2015-01-20 2016-07-27 日立金属株式会社 Fe-Ni系合金薄板的制造方法
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JPWO2018043641A1 (ja) 2019-06-24
CN109642289A (zh) 2019-04-16
CN109642289B (zh) 2021-06-01
JP6807038B2 (ja) 2021-01-06
WO2018043641A1 (ja) 2018-03-08
KR102200854B9 (ko) 2022-07-20
KR102200854B1 (ko) 2021-01-11
EP3508604A1 (de) 2019-07-10
KR20190034263A (ko) 2019-04-01

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