EP3192090B1 - Noyau magnétique, composant inductif et procédé de fabrication d'un noyau magnétique - Google Patents

Noyau magnétique, composant inductif et procédé de fabrication d'un noyau magnétique Download PDF

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Publication number
EP3192090B1
EP3192090B1 EP15749777.7A EP15749777A EP3192090B1 EP 3192090 B1 EP3192090 B1 EP 3192090B1 EP 15749777 A EP15749777 A EP 15749777A EP 3192090 B1 EP3192090 B1 EP 3192090B1
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EP
European Patent Office
Prior art keywords
magnetic core
magnetic
magnetic material
materials
core
Prior art date
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Active
Application number
EP15749777.7A
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German (de)
English (en)
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EP3192090A1 (fr
Inventor
Alexander Gerfer
Dragan Dinulovic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuerth Elektronik Eisos GmbH and Co KG
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Wuerth Elektronik Eisos GmbH and Co KG
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/132—Amorphous metallic alloys, e.g. glassy metals containing cobalt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type 
    • H01F17/04—Fixed inductances of the signal type  with magnetic core
    • H01F17/06—Fixed inductances of the signal type  with magnetic core with core substantially closed in itself, e.g. toroid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/24—Magnetic cores
    • H01F27/26—Fastening parts of the core together; Fastening or mounting the core on casing or support
    • H01F27/263—Fastening parts of the core together
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F3/00—Cores, Yokes, or armatures
    • H01F3/10—Composite arrangements of magnetic circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041—Printed circuit coils
    • H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type 
    • H01F17/0006—Printed inductances
    • H01F17/0033—Printed inductances with the coil helically wound around a magnetic core
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F3/00—Cores, Yokes, or armatures
    • H01F3/10—Composite arrangements of magnetic circuits
    • H01F2003/106—Magnetic circuits using combinations of different magnetic materials

Definitions

  • the invention relates to a magnetic core for an inductive component, manufactured using thin-film technology.
  • the invention also relates to a method for producing a magnetic core using thin-film technology.
  • an inductive component manufactured using thin-film technology, which contains a magnetic core in the form of a ring and two coil devices.
  • the magnetic core is made from a single magnetic material using thin-film technology.
  • a magnetic core in the form of a slotted circular ring which has an inner core and an outer core.
  • the outer core has multiple layers of an amorphous magnetic material, an insulating film, and an insulating layer between the amorphous magnetic material and the insulating film.
  • the inner magnetic core is made up of multiple layers of the amorphous magnetic material and insulating film. The individual layers of the amorphous magnetic material are always separated from one another both in the inner core and in the outer core by a layer of the insulating film.
  • a magnetic core which consists of two different magnetic materials and forms a closed ring. Between two soft magnetic layers (eg made of NiFe alloy) there is a hard magnetic layer (eg made of Nd-Fe-B or Al-Ni-Co) to set the permeability of the core.
  • the layers are produced using thin-film technology.
  • an inductive component in which the magnetic core is designed in a ring shape from alternating areas of at least two different materials.
  • the core contains ferrite material, oxide ceramic and superparamagnetic material.
  • the invention aims to improve a magnetic core for an inductive component and a method for producing a magnetic core using thin-film technology.
  • a magnetic core for an inductive component produced using thin-film technology, in which the magnetic core consists of at least two different magnetic materials, the magnetic core forming a closed ring and the ring having a circular, oval, elliptical, square or rectangular shape .
  • the various magnetic materials are selected from the materials Ni, NiFe, CoFe, CoP and CoZrTi.
  • the different magnetic materials of the magnetic core alternate over the length, the different magnetic materials each occupying the complete cross section of the magnetic core.
  • the different magnetic materials each extend over the entire length of the magnetic core and the magnetic core is formed by means of at least one inner ring made of a first magnetic material and an outer ring made of a second magnetic material and a cross section of the magnetic core is made of different magnetic materials Materials formed.
  • the saturation behavior of the magnetic core can be improved by using at least two different magnetic materials in the manufacture of a magnetic core using thin-film technology. Above all, it is possible to specifically influence the saturation behavior of the magnetic core so that it can be optimally adjusted to the intended application.
  • the different magnetic materials alternate over the length of the magnetic core.
  • the magnetic core thus consists of several sections which consist of different magnetic materials.
  • the various magnetic materials in the first embodiment each occupy the complete cross section of the magnetic core.
  • the various sections of the magnetic core thus consist entirely of a single magnetic material and, figuratively speaking, are placed one behind the other in order to then form the complete magnetic core.
  • the various magnetic materials each extend over the entire length of the magnetic core.
  • a plurality of sections made of different magnetic material are not provided in the longitudinal direction of the magnetic core, but rather in the transverse direction. For example, several layers of different magnetic materials are placed on top of one another in order to form the complete magnetic core.
  • a cross section of the magnetic core is formed from different magnetic materials.
  • the magnetic core forms a closed ring, the ring having a circular, oval, elliptical, square or rectangular shape.
  • a square or rectangular shape can have pointed or rounded corners.
  • the shape of the magnetic core influences the inductance of the finished inductive component and can therefore be selected according to the intended application.
  • the magnetic core is formed by means of at least one outer ring made of a first magnetic material and an inner ring made of a second magnetic material.
  • the desired saturation behavior of the magnetic core can be set, for example through the thickness of the outer and inner rings and also the selection of the first magnetic material and the second magnetic material.
  • the various magnetic materials are selected from the materials Ni, NiFe, CoFe, CoP and CoZrTi.
  • a coil surrounding the magnetic core in sections is produced using thin-film technology.
  • the complete inductive component can be manufactured using thin-film technology.
  • the problem on which the invention is based is also solved by a method for producing a magnetic core, in which the application of a first magnetic material by means of thin-film technology to a substrate and the application of a second magnetic material by means of thin-film technology to the substrate are provided, the first magnetic material at least sections directly adjacent to the second magnetic material.
  • a magnetic core can be manufactured using thin-film technology and at the same time the desired properties of the magnetic core, especially its saturation behavior, can be set by selecting different magnetic materials and also the dimensions of the sections of the magnetic core made from the different materials.
  • the first magnetic material is applied to the substrate in the form of a first closed ring and the second material is applied to the substrate in the form of a second closed ring, with one side of the second closed ring directly adjoining the first closed ring .
  • the first and the second material alternate.
  • a complete ring is formed from each of the two different magnetic materials, with at least one side of the rings resting directly against one another.
  • the application of a section of a coil winding using thin-film technology is provided on the substrate, followed by the application of the first and of the second material is provided for forming the magnetic core and, further below, the application of further sections of the coil winding is provided so that the finished coil winding surrounds the magnetic core in sections.
  • the complete inductive component including magnetic core and coils can be manufactured using thin-film technology.
  • the representation of the Fig. 1 shows a magnetic core 10 according to the invention, which was produced using thin-film technology on a substrate (not shown).
  • the magnetic core 10 has a ring shape.
  • the magnetic core 10 has the shape of a rectangular ring with rounded corners.
  • the magnetic core 10 consists of a total of four sections 12, 14, 16 and 18.
  • the sections 12, 14, 16, 18 thus form a continuous, uninterrupted ring.
  • the two sections 12, 16 consist of a first magnetic material, for example nickel-iron (NiFe).
  • Nickel-iron can be used in different alloys, for example NiFe 81/19, NiFe 45/55 etc.
  • Cobalt iron (CoFe) or other materials can be used here, for example.
  • the different magnetic materials for the sections 12, 14, 16, 18 can, for example, from the group with the materials nickel (Ni), nickel-iron (NiFe), cobalt-iron (CoFe), cobalt-phosphorus (CoP), cobalt-zirconium-titanium (CoZrTi).
  • the combination of two different magnetic materials in the magnetic core 10 allows the saturation of the magnetic core 10 to be set to a desired profile.
  • Fig. 2 shows an example of a diagram in which the inductance L is plotted as a function of the current I.
  • the inductance L is plotted on a standardized basis in order to show a typical curve independent of the coil surrounding the magnetic core.
  • dashed lines is in Fig. 1 for comparison, the inductance L of a magnetic core with the dimensions of Fig. 1 shown, whereby this magnetic core then consists exclusively of the material NiFe.
  • the inductance L of the magnetic core 10 is then the Fig. 1 applied, wherein the sections 12, 16 then consist of NiFe and the sections 14, 18 of CoFe.
  • the magnetic core has the Fig. 1 consistently higher saturation. This is achieved by combining the sections 12, 14, 16, 18 made of different magnetic materials, which then together form the segmented magnetic core 10.
  • the magnetic core 10 By dividing the magnetic core 10 into sections 12, 14, 16, 18 made of different materials, an improved saturation behavior can be achieved.
  • the desired properties can be set through the geometric dimensions of the sections 12, 14, 16, 18 and also through the selection of the magnetic materials.
  • the representation of the Fig. 3 shows a magnetic core 20 according to a further embodiment of the invention.
  • the magnetic core 20 like the magnetic core 10 of the Fig. 1 that has the shape of a rectangular ring with rounded corners.
  • the magnetic core 20 consists of an inner ring 22 made of a first magnetic material and an outer ring 24 made of a second magnetic material.
  • the outer side of the inner ring 22 adjoins the inner side of the outer ring 24.
  • sections made of different magnetic materials are combined with one another, the sections, namely the two rings 22, 24, each over the entire length Extend the length of the magnetic core 20.
  • the inner ring 22 is made of nickel-iron (NiFe)
  • the outer ring 24 is made of cobalt-iron (CoFe).
  • the representation of the Fig. 4 shows a diagram in which the normalized inductance L of the magnetic core 20 of Fig. 3 was plotted against the current consumption.
  • the dashed line represents the inductance of a magnetic core that consists exclusively of nickel-iron.
  • the inductance of the magnetic core 20 is the Fig. 3 applied.
  • the magnetic core 20 of the Fig. 3 has a significantly improved saturation behavior. This is achieved by combining the different magnetic materials in the inner ring 22 and in the outer ring 24.
  • the saturation behavior of the magnetic core 20 can be matched to the intended application by the geometric dimensions of the inner ring 22 and the outer ring 24 as well as the selection of the magnetic materials for the inner ring 22 and the outer ring 24.
  • the representation of the Fig. 5 shows schematically method steps for producing an inductive component with the magnetic core 10 of FIG Fig. 1 in thin-film technology or thin-film technology.
  • the manufacturing process for the magnetic core begins with a substrate 30.
  • the substrate 30 already contains sections 32 of a coil winding, which is also produced using thin-film technology.
  • the substrate 30 thus already contains the lower coil layer 32 and the magnetic core still to be produced is then located between the lower coil layer 32 and an upper coil layer (not shown).
  • a metallic starting layer 32 is applied to the substrate 30.
  • the lower coil layer 23 is no longer shown for the sake of clarity.
  • the metallic starting layer 32 is applied, for example, by cathode sputtering processes. Nickel (Ni), titanium (Ti), tantalum (Ta), nickel-iron (NiFe) or copper (Cu) can be used as the starting layer.
  • step B a photoresist masking 34 is carried out, the photoresist masking 34 then forming the shape for the subsequent electrodeposition of a first magnetic material.
  • step C the electrodeposition of the first magnetic material 36 is carried out and the associated illustration shows the state after the deposition has ended.
  • the first magnetic material 36 now fills the spaces between the photoresist masking 34.
  • the sections 12, 16 of the magnetic core 10 are now formed by the first magnetic material 36.
  • the first magnetic material is nickel-iron (NiFe).
  • step D the photoresist masking 34 is removed so that only the first magnetic material 36 in the form of the sections 12, 16, see FIG Fig. 1 , is arranged.
  • a second photoresist mask 38 is applied, which then forms a mold for the application of the second magnetic material. Based on the Fig. 1 leaves the second photoresist masking 38 exposed only the sections 14, 18, which are then to be filled with the second magnetic material.
  • the second magnetic material 40 is then deposited, which then directly adjoins the first magnetic material 36. Based on the Fig. 1 the two sections 12, 14 made of the first magnetic material 36 are now connected to one another by the two sections 14, 18 made of the second magnetic material 40.
  • the second magnetic material is cobalt-iron in the illustrated embodiment.
  • a production step G the second photoresist marking 38 is removed.
  • the magnetic core 10 is now arranged on the metallic starting layer 32, the sections 12, 16 being formed from the first magnetic material 36 and the sections 14, 18 being formed from the second magnetic material 40, as stated.
  • the starting layer 32 is removed in the areas in which it is not covered by the magnetic core 10.
  • the starting layer 32 is removed either by plasma etching, ion beam etching or also by a wet chemical process with acid.
  • the finished magnetic core 10 is thus located on substrate 30.
  • the inductive component can now be completely manufactured by combining the lower coil layer 32 with an upper coil layer and side coil sections.
  • the representation of the Fig. 6 shows schematically several manufacturing steps of the magnetic core 20 of FIG Fig. 3 .
  • the substrate 30 again contains a lower coil layer 32, which, after the magnetic core 20 has been produced, is completed with lateral coil sections and an upper coil layer to form a complete coil surrounding the magnetic core 20 in sections.
  • the metallic starter layer 32 is applied.
  • a first photoresist masking 34 is applied, the first photoresist masking 34 in this case being the shape for the inner ring 22 of the magnetic core 20 of FIG Fig. 3 forms.
  • the lower coil layer 32 is no longer shown in the illustration belonging to production step B and also in the subsequent illustrations.
  • the first magnetic material 36 is then electrodeposited, which then, see FIG Fig. 3 , the inner ring 22 forms.
  • step D the first photoresist masking 34 is removed.
  • step E the second photoresist masking 38 is applied, which then forms the shape for the outer ring 24 of the magnetic core 20 of the Fig. 3 forms.
  • the second magnetic material 40 is deposited, which then directly adjoins the first magnetic material 36 and then the outer ring 24 of the magnetic core 20 of the Fig. 3 forms. It should be noted that the representations of Fig. 6 are schematic and only a section through the magnetic core 20 is shown in order to illustrate the successive method steps.
  • step G the second photoresist masking 38 is removed.
  • the metallic starting layer 33 is then removed in the regions in which it is not covered by the first magnetic material 36 or the second magnetic material 40. Only the magnetic core 20 remains on the substrate 30, see FIG Fig. 3 , arranged.
  • the lower coil layer 32 can now be completed in the following process steps to form a coil that partially surrounds the magnetic core 20.
  • the invention is used for microtechnical inductive components, for example storage chokes and transformers for high switching frequencies, such as those used in particular in DC-DC converters.
  • storage chokes and transformers for high switching frequencies such as those used in particular in DC-DC converters.
  • the possibility of being able to adjust the saturation behavior of the magnetic cores 10, 20 used to a desired saturation behavior offers considerable advantages.

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Coils Or Transformers For Communication (AREA)

Claims (6)

  1. Noyau magnétique destiné à un composant inductif et fabriqué selon la technologie des couches minces, le noyau magnétique (10, 20) comprenant au moins deux matériaux magnétiques différents (36, 40),
    le noyau magnétique (10, 20) formant un anneau fermé, l'anneau ayant une forme circulaire, ovale, elliptique, carrée ou rectangulaire,
    les différents matériaux magnétiques étant choisis parmi les matériaux Ni, NiFe, CoFe, CoP et CoZrTi,
    dans un premier mode de réalisation, les différents matériaux magnétiques (36, 40) alternant sur la longueur et occupant chacun la section transversale complète du noyau magnétique (10) ou
    dans un deuxième mode de réalisation, le noyau magnétique (20) étant formé au moyen d'au moins un anneau intérieur (22) fait d'un premier matériau magnétique (36) et d'un anneau extérieur (24) fait d'un deuxième matériau magnétique (40) et des matériaux magnétiques différents (36, 40) s'étendant chacun sur toute la longueur du noyau magnétique (20) et la section transversale du noyau magnétique (20) étant formée de différents matériaux magnétiques (36, 40).
  2. Composant inductif comprenant un noyau magnétique selon la revendication 1, une bobine qui entoure le noyau magnétique (10, 20) par portions étant réalisée au moyen de la technologie des couches minces.
  3. Procédé de fabrication d'un noyau magnétique (10, 20) selon l'une des revendications précédentes, caractérisé par l'application d'un premier matériau magnétique (36) sur un substrat (30) à l'aide de la technologie des couches minces et l'application d'un deuxième matériau magnétique (40) sur le substrat (30) à l'aide de la technologie des couches minces, le premier matériau magnétique (36) étant directement adjacent au deuxième matériau magnétique (40) au moins par portions.
  4. Procédé selon la revendication 3, caractérisé en ce qu'un anneau fermé fait du premier matériau magnétique (36) et du deuxième matériau magnétique (40) est formé par application du deuxième matériau magnétique (40).
  5. Procédé selon la revendication 3, caractérisé en ce que le premier matériau magnétique est appliqué sur le substrat (30) sous la forme d'un premier anneau fermé (22) et le deuxième matériau magnétique (40) est appliqué sur le substrat (30) sous la forme d'un deuxième anneau fermé (24), un côté du deuxième anneau fermé (24) étant directement adjacent au premier anneau fermé (22).
  6. Procédé selon l'une au moins des revendications 3 à 5, caractérisé par l'application d'une portion (32) d'un enroulement de bobine sur le substrat (30) à l'aide de la technologie des couches minces, puis par l'application des premier et deuxième matériaux magnétiques (36, 40) pour former le noyau magnétique (10, 20) puis appliquer d'autres portions de l'enroulement de bobine de telle sorte que l'enroulement de bobine terminé entoure le noyau magnétique (10, 20) par portions.
EP15749777.7A 2014-09-10 2015-08-06 Noyau magnétique, composant inductif et procédé de fabrication d'un noyau magnétique Active EP3192090B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014218043.0A DE102014218043A1 (de) 2014-09-10 2014-09-10 Magnetkern, induktives Bauteil und Verfahren zum Herstellen eines Magnetkerns
PCT/EP2015/068180 WO2016037776A1 (fr) 2014-09-10 2015-08-06 Noyau magnétique, composant inductif et procédé de fabrication d'un noyau magnétique

Publications (2)

Publication Number Publication Date
EP3192090A1 EP3192090A1 (fr) 2017-07-19
EP3192090B1 true EP3192090B1 (fr) 2021-01-20

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US (1) US20170278614A1 (fr)
EP (1) EP3192090B1 (fr)
CN (1) CN106605280B (fr)
DE (1) DE102014218043A1 (fr)
WO (1) WO2016037776A1 (fr)

Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
EP3961660A1 (fr) * 2020-08-28 2022-03-02 Siemens Aktiengesellschaft Composant inductif pour un onduleur et onduleur

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10111460A1 (de) * 2001-03-09 2002-09-19 Siemens Ag Magnetische Hochfrequenz-Einrichtung mit einem weichmagnetischen Schichtensystem
DE102012222224A1 (de) * 2012-12-04 2014-06-05 SUMIDA Components & Modules GmbH Magnetische Kerne und Verfahren zu deren Herstellung

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE549660C (de) * 1929-11-09 1932-04-29 Aeg Aus zwei oder mehreren in der Achsrichtung aufeinandergelegten Einzelkernen zusammengesetzter ringfoermiger Magnetkern
US3668589A (en) * 1970-12-08 1972-06-06 Pioneer Magnetics Inc Low frequency magnetic core inductor structure
US4205288A (en) * 1978-10-27 1980-05-27 Westinghouse Electric Corp. Transformer with parallel magnetic circuits of unequal mean lengths and loss characteristics
DE4018149A1 (de) * 1990-06-06 1991-12-12 Siemens Ag Einrichtung zur beruehrungslosen ermittlung des drehmomentes eines rotierenden, tordierten zylinderfoermigen koerpers
DE19816485C2 (de) * 1998-04-14 2000-05-25 Aloys Wobben Spule für Hochsetzsteller
US6885273B2 (en) * 2000-03-30 2005-04-26 Abb Ab Induction devices with distributed air gaps
US6660412B2 (en) * 2001-03-15 2003-12-09 Waseem A. Roshen Low loss, high frequency composite magnetic material and methods of making the same
US6768409B2 (en) * 2001-08-29 2004-07-27 Matsushita Electric Industrial Co., Ltd. Magnetic device, method for manufacturing the same, and power supply module equipped with the same
DE10302646B4 (de) * 2003-01-23 2010-05-20 Vacuumschmelze Gmbh & Co. Kg Antennenkern und Verfahren zum Herstellen eines Antennenkerns
JP2006032587A (ja) * 2004-07-15 2006-02-02 Matsushita Electric Ind Co Ltd インダクタンス部品およびその製造方法
JP2007128951A (ja) * 2005-11-01 2007-05-24 Hitachi Ferrite Electronics Ltd リアクトル
US7719084B2 (en) * 2006-06-30 2010-05-18 Intel Corporation Laminated magnetic material for inductors in integrated circuits
JP5120690B2 (ja) * 2007-07-30 2013-01-16 住友電気工業株式会社 リアクトル用コア
JP4998292B2 (ja) * 2008-01-31 2012-08-15 Ｔｄｋ株式会社 磁性薄膜および薄膜磁気デバイス
JP2010278322A (ja) 2009-05-29 2010-12-09 Fujitsu General Ltd チョークコイル
EP2453450A1 (fr) * 2010-11-12 2012-05-16 Falco Electronics Ltd. Noyau hybride pour inducteur de puissance
DE102011079633A1 (de) * 2011-07-22 2013-01-24 Robert Bosch Gmbh Magnetsensor zum Messen eines Magnetfelds eines magnetischen Multipols und zugehörige Vorrichtung zur Ermittlung von Bewegungsparametern
JP5375922B2 (ja) * 2011-10-18 2013-12-25 株式会社豊田自動織機 磁性コア、及び誘導機器
DE102011086403A1 (de) 2011-11-15 2013-05-16 Würth Elektronik eiSos Gmbh & Co. KG Induktionsbauteil
KR101911457B1 (ko) * 2012-04-30 2018-10-24 엘지이노텍 주식회사 무선충전 라디에이터 기능을 갖는 자성 필름, 그 제조방법 및 이를 이용한 무선충전 디바이스
US20140152410A1 (en) * 2012-12-03 2014-06-05 Arizona Board of Regents, a body corporate of the State of Arizona Acting for and on behalf of Arizo Integrated tunable inductors
US9337251B2 (en) * 2013-01-22 2016-05-10 Ferric, Inc. Integrated magnetic core inductors with interleaved windings
DE102013208058B4 (de) * 2013-05-02 2015-09-10 Sts Spezial-Transformatoren-Stockach Gmbh & Co. Kg Magnetisch vorgespannte Drossel
KR101462806B1 (ko) * 2013-10-11 2014-11-20 삼성전기주식회사 인덕터 및 그 제조 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10111460A1 (de) * 2001-03-09 2002-09-19 Siemens Ag Magnetische Hochfrequenz-Einrichtung mit einem weichmagnetischen Schichtensystem
DE102012222224A1 (de) * 2012-12-04 2014-06-05 SUMIDA Components & Modules GmbH Magnetische Kerne und Verfahren zu deren Herstellung

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DE102014218043A1 (de) 2016-03-10
CN106605280B (zh) 2018-09-18
EP3192090A1 (fr) 2017-07-19
US20170278614A1 (en) 2017-09-28
CN106605280A (zh) 2017-04-26

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