EP3161318B1 - Verfahren zum pumpen in einem system aus vakuumpumpen und system aus vakuumpumpen - Google Patents
Verfahren zum pumpen in einem system aus vakuumpumpen und system aus vakuumpumpen Download PDFInfo
- Publication number
- EP3161318B1 EP3161318B1 EP14738765.8A EP14738765A EP3161318B1 EP 3161318 B1 EP3161318 B1 EP 3161318B1 EP 14738765 A EP14738765 A EP 14738765A EP 3161318 B1 EP3161318 B1 EP 3161318B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- vacuum pump
- rotary vane
- lubricated rotary
- auxiliary
- vane vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
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- 238000000034 method Methods 0.000 title claims description 25
- 239000007789 gas Substances 0.000 claims description 43
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- 238000005265 energy consumption Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- 238000005516 engineering process Methods 0.000 description 1
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- 238000005304 joining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
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- 238000004519 manufacturing process Methods 0.000 description 1
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- 239000012528 membrane Substances 0.000 description 1
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- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/24—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids characterised by using valves controlling pressure or flow rate, e.g. discharge valves or unloading valves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2/00—Rotary-piston machines or pumps
- F04C2/30—Rotary-piston machines or pumps having the characteristics covered by two or more groups F04C2/02, F04C2/08, F04C2/22, F04C2/24 or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
- F04C2/34—Rotary-piston machines or pumps having the characteristics covered by two or more groups F04C2/02, F04C2/08, F04C2/22, F04C2/24 or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in groups F04C2/08 or F04C2/22 and relative reciprocation between the co-operating members
- F04C2/344—Rotary-piston machines or pumps having the characteristics covered by two or more groups F04C2/02, F04C2/08, F04C2/22, F04C2/24 or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in groups F04C2/08 or F04C2/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
- F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
- F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
- F04C18/344—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/0042—Driving elements, brakes, couplings, transmissions specially adapted for pumps
- F04C29/0085—Prime movers
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/02—Lubrication; Lubricant separation
- F04C29/026—Lubricant separation
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/12—Arrangements for admission or discharge of the working fluid, e.g. constructional features of the inlet or outlet
- F04C29/124—Arrangements for admission or discharge of the working fluid, e.g. constructional features of the inlet or outlet with inlet and outlet valves specially adapted for rotary or oscillating piston pumps
- F04C29/126—Arrangements for admission or discharge of the working fluid, e.g. constructional features of the inlet or outlet with inlet and outlet valves specially adapted for rotary or oscillating piston pumps of the non-return type
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2240/00—Components
- F04C2240/30—Casings or housings
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2240/00—Components
- F04C2240/40—Electric motor
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2270/00—Control; Monitoring or safety arrangements
- F04C2270/18—Pressure
- F04C2270/185—Controlled or regulated
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
Definitions
- the present invention relates to a pumping method making it possible to reduce the consumption of electrical energy as well as to increase the performance in terms of final vacuum of a pumping system the main pump of which is a vacuum pump with lubricated vanes. Also, the present invention relates to a vacuum pump system which can be used to carry out the method according to the present invention.
- Roots type booster pumps arranged upstream of the main lubricated vane pumps.
- This type of system is bulky, works either with bypass valves with reliability problems, or by using means of measurement, control, adjustment or control.
- these means of control, adjustment or slaving must be actively controlled, which necessarily results in an increase in the number of system components, its complexity and its cost.
- the document US 2003/068233 A1 describes a pumping system for evacuating vacuum chambers from processes for the treatment of wafers in the semiconductor industry.
- This system includes two pumps, a main and an auxiliary, of dry types arranged in series as well as a non-return valve mounted in an exhaust duct arranged in parallel to the auxiliary pump.
- This system is characterized by a ratio of the volumes of the two pumps from 20 to 130.
- the document EP 1,243,795 A1 discloses the combination of a dry primary pump (roots or claw) multi-stage and an additional dry pump (membrane or piston) and a non-return valve.
- the effect obtained by this combination is to reduce the compression ratio in the last stage of the primary pump, when a certain level of vacuum is already reached in the enclosure to be evacuated, so that the temperature of the pump does not increase not too much and so does not lead to the destruction of it. This is a problem which can especially arise when gases with low thermal coefficient (Xenon, Argon, etc.) are used.
- the object of the present invention is to propose a pumping method in a vacuum pump system making it possible to reduce the electrical energy necessary for the evacuation of a vacuum enclosure and its maintenance, as well as the drop in temperature of the outlet gas.
- the present invention also aims to propose a pumping method in a vacuum pump system making it possible to obtain a higher flow rate at low pressure than that which can be obtained using a vacuum pump with lubricated vane alone. when pumping out a vacuum enclosure.
- the present invention also aims to propose a pumping method in a vacuum pump system making it possible to obtain a better vacuum than that which can be obtained using a vacuum pump with vanes lubricated alone during pumping. of a vacuum enclosure.
- a pumping method which is carried out within the framework of a vacuum pump system whose configuration consists essentially of a main vacuum pump with lubricated vanes provided with a gas inlet orifice connected to a vacuum enclosure and a gas outlet orifice leading into a duct which is fitted with a non-return valve, before opening into the atmosphere or into other devices.
- the suction of an auxiliary vacuum pump with lubricated vanes is connected in parallel to this non-return valve, its outlet going to the atmosphere or joining the duct of the main pump after the non-return valve.
- the method according to the present invention therefore essentially consists in starting an auxiliary vacuum pump with lubricated vanes simultaneously with the main vacuum pump with lubricated vanes and in operating the auxiliary vacuum pump with lubricated vanes continuously all the time. that the main vacuum pump with lubricated vanes pumps the gases contained in the vacuum enclosure through the gas inlet, but also all the time that the main vacuum pump with lubricated vanes maintains a defined pressure (p. e.g. the final vacuum) in the enclosure by driving the gases rising through its outlet.
- the invention resides in the fact that the coupling of the main vacuum pump with lubricated vanes and the auxiliary vacuum pump with lubricated vanes does not require specific measurements and devices (e.g. pressure, temperature, current sensors, etc.), servos or data and calculation management. Consequently, the vacuum pump system suitable for implementing the pumping method according to the present invention comprises a minimum number of components, is very simple and costs considerably less than the existing systems.
- the start-up of the auxiliary vacuum pump with lubricated vanes is controlled in an "all or nothing" manner. Piloting consists in controlling one or more parameters and, according to certain rules, starting or stopping the auxiliary vacuum pump with lubricated vanes.
- the parameters, provided by suitable sensors, are p. ex. the motor current of the main vacuum pump with lubricated vanes, the temperature or pressure of the gases in the volume of the outlet pipe of the main vacuum pump with lubricated vanes, limited by the non-return valve, or a combination of these settings.
- the sizing of the auxiliary vacuum pump with lubricated vanes is conditioned by the minimum energy consumption of its motor. It is normally single-stage. Its nominal flow rate is chosen according to the flow rate of the main vacuum pump with lubricated vanes, but also taking into account the size of the volume of the outlet pipe of the main vacuum pump with lubricated vanes, limited by the non-return valve. . This flow can be from 1/500 to 1/5 of the nominal flow of the main vacuum pump with lubricated vanes, but can also be lower or higher than these values.
- the non-return valve, placed in the duct at the outlet of the main vacuum pump with lubricated vanes can be a standard element available commercially. It is sized according to the nominal flow rate of the main vacuum pump with lubricated vanes. In particular, provision is made for the non-return valve to close when the suction pressure of the main vacuum pump with lubricated vanes is between 500 mbar absolute and the final vacuum (eg 400 mbar).
- the main vacuum pump with lubricated vanes is multi-stage.
- the auxiliary vacuum pump with lubricated vanes is multi-stage.
- the auxiliary vacuum pump with lubricated vane is preferably small.
- the auxiliary vacuum pump with lubricated vanes discharges the gases into the oil separator of the main vacuum pump with lubricated vanes.
- the auxiliary vacuum pump with lubricated vanes is integrated in the oil separator of the main vacuum pump with lubricated vanes.
- the pressure is high, for example equal to atmospheric pressure. Due to the compression in the main vacuum pump with lubricated vanes, the pressure of the gases discharged at its outlet is higher than atmospheric pressure (if the gases at the outlet of the main pump are discharged directly to the atmosphere) or higher than the pressure at the inlet of another device connected downstream. This causes the non-return valve to open.
- the second variant of the pumping method which is not part of the framework, that is to say in the case of piloting the auxiliary vacuum pump with lubricated vanes, there is an initial position for starting the pumping system.
- the main vacuum pump with lubricated vanes pumps the gases from the vacuum chamber, parameters such as the current of its motor, the temperature and the pressure of the gases in the volume of the outlet duct begin to modify and reach threshold values detected by the sensors.
- these parameters return to the initial ranges (outside the setpoints) with a time delay, the auxiliary vacuum pump with lubricated vanes is stopped.
- Figure 1 shows a vacuum pump system SP suitable for implementing a pumping method according to an embodiment of the present invention.
- This vacuum pump system SP comprises an enclosure 1, which is connected to the suction port 2 of a main vacuum pump with lubricated vanes 3.
- the gas outlet port of the main vacuum pump with vanes lubricated 3 is connected to the duct 5.
- a discharge check valve 6 is placed in the duct 5, which after this non-return valve continues in the gas outlet duct 8. The non-return valve 6, when it is closed, allows the formation of a volume 4, between the gas outlet orifice of the main vacuum pump 3 and itself.
- the vacuum pump system SP also includes an auxiliary vacuum pump with lubricated vanes 7, connected in parallel to the non-return valve 6.
- the suction port 9 of the auxiliary vacuum pump with lubricated vanes 7 is connected to the volume. 4 of the duct 5 and its delivery orifice 10 is connected to the duct 8.
- the auxiliary vacuum pump with lubricated vanes 7 is also started.
- the main vacuum pump with lubricated vane 3 draws the gases into the enclosure 1 through the duct 2 connected to its inlet and compresses them to discharge them afterwards on its outlet in the duct 5 and subsequently by the check valve. return 6.
- the closing pressure of the non-return valve 6 is reached, it closes.
- the pumping of the auxiliary vacuum pump with lubricated vanes 7 causes the pressure in the volume 4 to gradually decrease to its limit pressure.
- the power consumed by the main vacuum pump with lubricated vanes 3 gradually decreases. This happens in a short period of time, for example for a certain cycle in 5-10 seconds.
- Figure 2 represents a system of vacuum pumps SPP suitable for the implementation of a pumping method according to an embodiment not forming part of the present invention.
- the system shown in figure 2 represents the “piloted” pumping system SPP, which also comprises suitable sensors 11, 12, 13 which control either the motor current (sensor 11) of the main vacuum pump with lubricated vanes 3, or the pressure (sensor 13 ) gases in the volume of the outlet pipe of the main vacuum pump with lubricated vanes, limited by the non-return valve 6, i.e. the temperature (sensor 12) of the gases in the volume of the pipe leaving the vacuum pump main with lubricated paddles, limited by the non-return valve 6, ie a combination of these parameters.
- the threshold value can be a percentage of the maximum value measured during a drain cycle without switching on the auxiliary vacuum pump (eg 75%).
- the threshold value can be a percentage (eg 80%) of the maximum value measured during an emptying cycle without setting the auxiliary vacuum pump.
- the threshold value (eg 100 mbar) is defined according to the ratio of the flow rates of the two pumps, the main and auxiliary.
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Claims (14)
- Verfahren zum Pumpen in einem System aus Vakuumpumpen (SP, SPP), umfassend:- eine geschmierte Hauptdrehschiebervakuumpumpe (3) mit einer Gaseinlassöffnung (2), welche mit einer Vakuumkammer (1) verbunden ist und einer Gasauslassöffnung (4), welche in eine Leitung (5) vor Austreten aus dem Gasauslass (8) des Systems aus Vakuumpumpen (SP, SPP) führt,- ein Rückschlagventil (6), angeordnet in der Leitung (5) zwischen der Gasauslassöffnung (4) und dem Gasauslass (8), und- eine geschmierte Hilfsdrehschiebervakuumpumpe (7), welche ihren Motor aufweist und welche parallel zu dem Rückschlagventil (6) verbunden ist,das Verfahren ist dadurch gekennzeichnet, dass
die geschmierte Hauptdrehschiebervakuumpumpe (3) aktiviert wird, um die in der Vakuumkammer (1) enthaltenen Gase durch die Gasauslassöffnung (4) zu pumpen;
gleichzeitig die geschmierte Hilfsdrehschiebervakuumpumpe (7) aktiviert wird; und
die geschmierte Hilfsdrehschiebervakuumpumpe (7) während der ganzen Zeit weiter arbeitet, während die geschmierte Hauptdrehschiebervakuumpumpe (3) die in der Vakuumkammer (1) enthaltenen Gase pumpt und/oder während der ganzen Zeit während die geschmierte Hauptdrehschiebervakuumpumpe (3) einen definierten Druck in der Vakuumkammer (1) aufrechterhält. - Verfahren zum Pumpen nach Anspruch 1, dadurch gekennzeichnet, dass der Auslass der geschmierten Hilfsdrehschiebervakuumpumpe (7) in den Gasauslass (8) nach dem Rückschlagventil (6) mündet.
- Verfahren zum Pumpen nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) dimensioniert ist, um einen minimalen Energieverbrauch ihres Motors aufzuweisen.
- Verfahren zum Pumpen nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) einstufig oder mehrstufig ist.
- Verfahren zum Pumpen nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, dass das Rückschlagventil (6) schliesst, wenn der Druck an der Saugseite der geschmierten Hauptdrehschiebervakuumpumpe (3) zwischen 500 mbar und dem Endvakuum ist.
- Verfahren zum Pumpen nach einem der Ansprüche 1 bis 5, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) die Gase in einen Ölabscheider der geschmierten Hauptdrehschiebervakuumpumpe (3) entlässt.
- Verfahren zum Pumpen nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) in dem Ölabscheider der geschmierten Hauptdrehschiebervakuumpumpe (3) integriert ist.
- System aus Vakuumpumpen (SP, SPP), umfassend:- eine geschmierte Hauptdrehschiebervakuumpumpe (3) mit einer Gaseinlassöffnung (2), welche mit einer Vakuumkammer (1) verbunden ist und einer Gasauslassöffnung (4), welche in eine Leitung (5) vor Austreten aus einem Gasauslass (8) des Systems von Pumpen (SP, SPP) führt,- ein Rückschlagventil (6), welches in der Leitung (5) zwischen der Gasauslassöffnung (4) und dem Gasauslass (8) positioniert ist, und- eine geschmierte Hilfsdrehschiebervakuumpumpe (7), welche ihren Motor hat und welche parallel zu dem Rückschlagventil (6) verbunden ist,das System von Vakuumpumpen (SP, SPP) ist dadurch gekennzeichnet, dass
die geschmierte Hilfsdrehschiebervakuumpumpe (7) ausgebildet ist, um gleichzeitig mit der geschmierten Hauptdrehschiebervakuumpumpe (3) in Betrieb zu gehen und während der ganzen Zeit in Betrieb zu bleiben, während die geschmierte Hauptdrehschiebervakuumpumpe (3) die in der Vakuumkammer (1) enthaltenen Gase pumpt und/oder während der ganzen Zeit während die geschmierte Hauptdrehschiebervakuumpumpe (3) einen definierten Druck in der Vakuumkammer (1) aufrechthält. - System von Vakuumpumpen nach Anspruch 8, dadurch gekennzeichnet, dass der Auslass der geschmierten Hilfsdrehschiebervakuumpumpe (7) in den Gasauslass (8) nach dem Rückschlagventil (6) mündet.
- System von Vakuumpumpen nach Anspruch 8 oder 9, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) dimensioniert ist, so dass ihr Motor einen minimalen Energieverbrauch aufweist.
- System von Vakuumpumpen nach einem der Ansprüche 8 bis 10, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) einstufig oder mehrstufig ist.
- System von Vakuumpumpen nach einem der Ansprüche 8 bis 11, dadurch gekennzeichnet, dass das Rückschlagventil (6) schliesst, wenn der Druck an der Saugseite der geschmierten Hauptdrehschiebervakuumpumpe (3) zwischen 500 mbar absolut und dem Endvakuum ist.
- System von Vakuumpumpen nach einem der Ansprüche 8 bis 12, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) die Gase in den Ölabscheider der geschmierten Hauptdrehschiebervakuumpumpe (3) entlässt.
- System von Vakuumpumpen nach einem der Ansprüche 8 bis 13, dadurch gekennzeichnet, dass die geschmierte Hilfsdrehschiebervakuumpumpe (7) in dem Ölabscheider der geschmierten Hauptdrehschiebervakuumpumpe (3) integriert ist.
Priority Applications (2)
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PT147387658T PT3161318T (pt) | 2014-06-27 | 2014-06-27 | Método de bombagem num sistema de bombas de vácuo e sistema de bombas de vácuo |
PL14738765T PL3161318T3 (pl) | 2014-06-27 | 2014-06-27 | Sposób pompowania w układzie pomp próżniowych oraz układ pomp próżniowych |
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PCT/EP2014/063725 WO2015197138A1 (fr) | 2014-06-27 | 2014-06-27 | Méthode de pompage dans un système de pompes à vide et système de pompes à vide |
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EP3161318A1 EP3161318A1 (de) | 2017-05-03 |
EP3161318B1 true EP3161318B1 (de) | 2020-02-05 |
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EP14738765.8A Revoked EP3161318B1 (de) | 2014-06-27 | 2014-06-27 | Verfahren zum pumpen in einem system aus vakuumpumpen und system aus vakuumpumpen |
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US (2) | US10760573B2 (de) |
EP (1) | EP3161318B1 (de) |
JP (1) | JP6608394B2 (de) |
KR (1) | KR102223057B1 (de) |
CN (1) | CN106662108A (de) |
AU (3) | AU2014398770A1 (de) |
BR (1) | BR112016030498B1 (de) |
CA (1) | CA2953455C (de) |
DK (1) | DK3161318T3 (de) |
ES (1) | ES2774438T3 (de) |
PL (1) | PL3161318T3 (de) |
PT (1) | PT3161318T (de) |
RU (1) | RU2666720C2 (de) |
TW (2) | TWI734588B (de) |
WO (1) | WO2015197138A1 (de) |
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WO2015197138A1 (fr) * | 2014-06-27 | 2015-12-30 | Ateliers Busch Sa | Méthode de pompage dans un système de pompes à vide et système de pompes à vide |
JP6785695B2 (ja) * | 2016-06-08 | 2020-11-18 | 株式会社荏原製作所 | 除害機能付ドライ真空ポンプ |
KR102301459B1 (ko) * | 2017-05-30 | 2021-09-13 | 가부시키가이샤 아루박 | 진공 펌프 |
CN107559200B (zh) * | 2017-11-01 | 2024-06-14 | 广东肯富来泵业股份有限公司 | 平衡型罗茨真空泵系统及其控制方法 |
CN107701482A (zh) * | 2017-11-15 | 2018-02-16 | 益发施迈茨工业炉(上海)有限公司 | 真空炉电机的辅助启动系统及方法 |
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-
2014
- 2014-06-27 WO PCT/EP2014/063725 patent/WO2015197138A1/fr active Application Filing
- 2014-06-27 CA CA2953455A patent/CA2953455C/fr active Active
- 2014-06-27 EP EP14738765.8A patent/EP3161318B1/de not_active Revoked
- 2014-06-27 PL PL14738765T patent/PL3161318T3/pl unknown
- 2014-06-27 DK DK14738765.8T patent/DK3161318T3/da active
- 2014-06-27 JP JP2016574254A patent/JP6608394B2/ja active Active
- 2014-06-27 PT PT147387658T patent/PT3161318T/pt unknown
- 2014-06-27 BR BR112016030498-5A patent/BR112016030498B1/pt active IP Right Grant
- 2014-06-27 ES ES14738765T patent/ES2774438T3/es active Active
- 2014-06-27 KR KR1020177002586A patent/KR102223057B1/ko active IP Right Grant
- 2014-06-27 AU AU2014398770A patent/AU2014398770A1/en not_active Abandoned
- 2014-06-27 RU RU2017102492A patent/RU2666720C2/ru active
- 2014-06-27 CN CN201480080173.7A patent/CN106662108A/zh active Pending
- 2014-06-27 US US15/321,839 patent/US10760573B2/en active Active
-
2015
- 2015-06-25 TW TW109127956A patent/TWI734588B/zh active
- 2015-06-25 TW TW104120571A patent/TWI710702B/zh active
-
2017
- 2017-03-22 AU AU2017100332A patent/AU2017100332A4/en not_active Expired
-
2019
- 2019-06-28 AU AU2019204608A patent/AU2019204608B2/en active Active
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2020
- 2020-05-06 US US16/868,460 patent/US11725662B2/en active Active
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Also Published As
Publication number | Publication date |
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TW201608135A (zh) | 2016-03-01 |
JP6608394B2 (ja) | 2019-11-20 |
RU2666720C2 (ru) | 2018-09-11 |
PL3161318T3 (pl) | 2020-08-10 |
DK3161318T3 (da) | 2020-03-09 |
ES2774438T3 (es) | 2020-07-21 |
CN106662108A (zh) | 2017-05-10 |
AU2019204608B2 (en) | 2021-07-22 |
TWI734588B (zh) | 2021-07-21 |
TWI710702B (zh) | 2020-11-21 |
JP2017523339A (ja) | 2017-08-17 |
WO2015197138A1 (fr) | 2015-12-30 |
AU2014398770A1 (en) | 2017-01-19 |
US11725662B2 (en) | 2023-08-15 |
KR20170028381A (ko) | 2017-03-13 |
TW202043623A (zh) | 2020-12-01 |
BR112016030498A2 (de) | 2017-08-22 |
CA2953455A1 (fr) | 2015-12-30 |
KR102223057B1 (ko) | 2021-03-05 |
RU2017102492A (ru) | 2018-07-27 |
CA2953455C (fr) | 2022-03-29 |
US10760573B2 (en) | 2020-09-01 |
AU2019204608A1 (en) | 2019-07-18 |
BR112016030498B1 (pt) | 2022-06-28 |
AU2017100332A4 (en) | 2017-04-27 |
RU2017102492A3 (de) | 2018-07-27 |
PT3161318T (pt) | 2020-03-06 |
EP3161318A1 (de) | 2017-05-03 |
US20170122321A1 (en) | 2017-05-04 |
US20200318640A1 (en) | 2020-10-08 |
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