EP2998126A1 - Procédé de manufacture d'un support pour plaques d'impression lithographique - Google Patents
Procédé de manufacture d'un support pour plaques d'impression lithographique Download PDFInfo
- Publication number
- EP2998126A1 EP2998126A1 EP15191870.3A EP15191870A EP2998126A1 EP 2998126 A1 EP2998126 A1 EP 2998126A1 EP 15191870 A EP15191870 A EP 15191870A EP 2998126 A1 EP2998126 A1 EP 2998126A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- surface layer
- lithographic printing
- microcrystalline
- strip
- bulk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12993—Surface feature [e.g., rough, mirror]
Definitions
- the invention relates to a belt for producing a support for lithographic printing plates consisting of aluminum or an aluminum alloy, wherein the strip at least partially has a microcrystalline surface layer due to hot and / or cold rolling passes. Moreover, the invention relates to a method for characterizing a surface of a belt for the production of lithographic printing plate supports.
- Tapes for making lithographic printing plate supports are produced after casting a corresponding aluminum alloy by rolling.
- the strip is produced by hot rolling a roll bar followed by cold rolling. After the tape has been made, it is degreased and wound onto a coil.
- the coil is pretreated by the lithographic printing plate manufacturer and then electrochemically roughened.
- the microcrystalline surface layer of the aluminum strip introduced by the rolling has largely been removed by the pretreatment, so that the microcrystalline surface layer no longer plays any role in terms of the subsequent electrochemical roughening.
- the object of the present invention is to provide a ribbon for the production of lithographic printing plate supports which has an improved microcrystalline surface layer, so that higher production speeds are possible in the production of lithographic printing plate supports.
- the invention has for its object to propose a method for characterizing the surface quality of the microcrystalline surface layer of strips of aluminum or an aluminum alloy.
- the above-derived object is achieved in that in a surface microprobe analysis after the mapping process of a surface region of the microcrystalline surface of the strip, the surface portion with an intensity ratio I / I bulk (avg) of greater than 3 in the spectral range the K ⁇ 1 line of the X-ray emission spectrum of oxygen of the measured microcrystalline surface layer is less than 10%, preferably less than 7%, wherein in the areal microprobe analysis an excitation voltage of 15 kV, a beam current of 50 nA and a beam cross section of 1 .mu.m, at a Increment of 16.75 microns is used for the electron beam.
- a belt for producing a support for lithographic printing plates having a certain frequency and size of oxide particles in the microcrystalline surface layer achieves very good roughening properties in the downstream production process for lithographic printing plate supports and overall production speeds can be increased.
- the usually the electrochemical roughening disturbing oxide particles are present in such a small number and size in the microcrystalline surface layer of the tape according to the invention, so that the microcrystalline surface layer can be roughened very well and thus with low material removal during electrochemical roughening due to high production speeds very good Aufraulinger the production of printing plate supports can be achieved.
- a surface portion of the band is examined via an electron beam with an excitation voltage of 15 kV, a beam current of 50 nA and a beam cross section of 1 ⁇ m with a pitch of 16.75 ⁇ m.
- the electrons incident on the surface of the band generate X-ray brake radiation and characteristic X-ray emission spectra whose wavelength identifies the element present in the sample and whose intensity gives information about the concentration or frequency of the corresponding element in the measuring region of the electron beam cross section impinging on the surface to be measured.
- the highest intensities are found in the K ⁇ 1 lines of the X-ray emission spectra.
- the penetration depth of the electrons is limited to 1 to 2 ⁇ m, so only near-surface layers of the tape are excited to emit the characteristic X-ray emission spectra.
- the penetration depth of the electrons coincides with the values known from the literature for the thickness of the microcrystalline surface layer which is produced during hot rolling of the rolling bar and after cold rolling at final strip thicknesses of 0.15 to 0.5 mm is typically 1 to 2 ⁇ m (see For this: Lindseth I., "Optical total reflectance, near surface microstructure, and topography of rolled aluminum materials", PhD thesis, NTNO, Trontheim, Norway, 1999 ).
- the K ⁇ 1 line of the X-ray emission spectrum of oxygen now indicates the content of oxygen of oxidic compounds in the microcrystalline surface layer at the corresponding measurement point.
- the strip according to the invention for the production of lithographic printing plate supports therefore has a distribution of relatively small oxide particles, so that the strip according to the invention has very good roughening properties having.
- the thickness of the tape is 0.15 to 0.5 mm and the thickness of the microcrystalline surface layer of the tape is about 0.5 to 2.5 ⁇ m.
- a further increase in the process speeds in the electrochemical roughening of the tape for lithographic printing plate support can be ensured by the tape according to the invention in that in area microprobe analysis by the mapping method of a surface portion of the tape, the area ratio with an intensity ratio I / I bulk (avg) of greater than 4 in the spectral range of the K ⁇ 1 line of the X-ray emission spectrum of oxygen of the measured microcrystalline surface layer is less than 3%, preferably less than 2%.
- the microcrystalline surface layer of the strip according to the invention has an even smaller number of larger oxide particles which can disturb the electrochemical roughening or the preceding pretreatments.
- the band is made of an aluminum alloy of the type AA1050, AA1100 or AA3103.
- Aluminum alloys have already found wide application in terms of their suitability for the production of lithographic printing plate supports.
- a further improved lithographic printing plate support ribbon for strength and roughening can be provided in that the aluminum strip is made of an aluminum alloy having the following proportions by weight of alloy components: 0.05% ⁇ Si ⁇ 0.1%, 0.4% ⁇ Fe ⁇ 1%, Cu ⁇ 0.04%, Mn ⁇ 0.3%, 0.05% ⁇ mg ⁇ 0.3%, Ti ⁇ 0.04%,
- the above-described object is achieved by a method for characterizing a surface of a belt, in particular a belt for the production of lithographic printing plate carriers by performing a surface microprobe analysis of the microcrystalline surface layer according to the mapping method and the quality the surface of the band is evaluated on the basis of the measured intensity distribution in the spectral range of the K ⁇ 1 line of the X-ray emission spectrum of oxygen.
- the areal microprobe analysis offers the possibility of investigating the composition of the microcrystalline surface layer and, in particular, of determining the distribution of oxide particles in the microcrystalline surface layer by the areal evaluation of the intensity distribution of the K ⁇ 1 line of the X-ray emission spectrum of oxygen.
- the influence of the aluminum oxide film on the microcrystalline surface layer can, according to a first embodiment of the method according to the invention, be reduced in the measurement result by ascertaining from the measured intensity distribution of the surface layer an area fraction having a specific value for the intensity ratio I / I bulk (avg) .
- the intensity ratio I / I bulk (avg) is a measure of the size of the oxide particles in the microcrystalline surface layer and over the surface portions with a determined value for the intensity ratio I / I bulk (avg) a measure of the frequency of oxide particles. From the intensity ratio mentioned, this results in a combined measure of the size and area occupancy of the microcrystalline surface layer with oxide particles of a certain size.
- the combination of size and number of oxide particles in the microcrystalline surface layer can adversely affect the subsequent electrochemical roughening process, provided that preceding pickling steps do not completely eliminate the microcrystalline surface layer or a surface consisting of bulk material is roughened.
- an excitation voltage of 5 to 20 kV, preferably 15 kV, a beam current of 10 to 100 nA, preferably 50 nA and a beam cross section of 0.2 to 1.5 .mu.m, preferably 1 .mu.m used for the electron beam not only the penetration depth are limited to the electrons, but on the beam current and the beam cross-section excitation densities and X-ray emission intensities are achieved, which reduce measurement errors in the determination of the surface portions.
- the measuring time per measuring point ensures that a sufficiently large strip surface section can be measured in an adequate time.
- a linear focusing spectrometer with a crystal with a lattice plane spacing 2d of 6 nm, preferably an LDE1H crystal.
- the crystal is arranged in linear focusing spectrometers on a Rowlandnik with a small diameter, for example 100 mm.
- the spectrometer on the one hand by the linear focusing that the X-ray emission spectrum, which is emitted from the sample spot, with sufficient intensity in the detector, preferably a designed as a counter tube detector for X-rays, is bundled.
- the crystal with a interplanar spacing 2d of 6 nm ensures that the K ⁇ 1 line of the X-ray emission spectrum of high-intensity oxygen is diffracted in a wavelength-selective manner in the direction of the optical detector via a Bragg reflection.
- This arrangement makes it possible in particular that even very small amounts of oxide particles deliver measurable K ⁇ 1 lines of the X-ray emission spectrum of oxygen.
- Fig. 1 shows the typical structure of the spectrometer of a microprobe analysis, in the present case a JEOL JXA 8200 microprobe was used, in which an electron beam 1 is deflected onto a sample 2. The electrons are directed onto the sample 2 with an excitation voltage of 15 kV, a beam current of 50 nA and a beam cross section of 1 ⁇ m. In sample 2, the characteristic X-ray emission spectrum 3 is then generated, which is generated by electron transitions on the inner shells of the excited atoms. The wavelength of the emitted spectrum is therefore characteristic of each atom. This in Fig.
- the linearly focused spectrometer shown has a curved crystal 4 for wavelength analysis, which reflects the X-radiation emitted by the specimen 2 in a wavelength-selective manner into the slit of a detector 5.
- the acceptance angle of the characteristic X-radiation ⁇ is 40 °.
- the position of the crystal 4 on the Rowland circle 6, which here has a diameter of 100 mm, is adjusted so that only the K ⁇ 1 line of the characteristic X-ray spectrum of oxygen in the detector is diffracted by Bragg reflection. After the number of X-ray pulses has been counted in the detector over a measuring time of 0.6 s, the sample is transported further by the increment of 16.75 ⁇ m and a next measuring point is measured.
- the spectrometer has a crystal specially adapted for measuring the K ⁇ 1 line of the X-ray emission spectrum of oxygen and oriented for maximum intensity of the oxygen spectrum, a type LDE1H crystal having a lattice plane distance 2d of 6 nm.
- the penetration depth of the electrons into the sample 2 is about 1 to 2 ⁇ m at an excitation voltage of 15 kV.
- a square area with an edge length of 5.025 mm was measured, with a step size of 16.75 ⁇ m being selected, so that a total of 900 measuring points were measured in the square surface.
- FIG. 2 shows the measurement results of the surface microprobe analysis after the mapping process on a sample, each measuring point on the one hand a square area with an edge length of 16.75 microns and on the other hand the measured intensity ratio I / I bulk (avg) is assigned. It can be seen in Fig. 2 the measured measured surface area intensity values converted into color values, which show the microscopic streaking in the rolling direction typical of the rolled strip surfaces investigated. This streakiness is attributed to a distribution of rolled surface particles in the rolling direction during rolling. Corresponding mappings were then evaluated with regard to their area occupation with certain intensity ratios I / I bulk (avg) .
- each tape sample consisting of an AA1050 aluminum alloy.
- the experimental setup for determining the size and frequency of the oxide particles in the microcrystalline surface layer was chosen as described above.
- the sample was stored for about 1 week to form a typical alumina layer , also carried out a two-dimensional microprobe analysis and a mean intensity signal for the bulk material I bulk (avg) determined.
- 125 pulses were measured in 0.6 s at the above-mentioned excitation and detection conditions.
- the intensity values of the K ⁇ 1 line of the X-ray emission spectrum of oxygen measured on the samples were divided by the mean intensity value of the bulk material and assigned in a corresponding mapping to a quadratic measuring surface with an edge length of 16.75 ⁇ m. Subsequently, the areas in the 5.025 mm ⁇ 5.025 mm total measurement area were summed up, which have an intensity ratio of I / I bulk (avg) greater than 3 or greater than 4.
- the area proportions measured in samples Nos. 1 to 9 with an intensity ratio of I / I bulk (avg) greater than 3 or 4 are shown in Table 1 together with the averaged intensity values I avg measured on the samples. Table 1 Samples no.
- samples 1-9 or the associated bands were subjected to an electrochemical roughening and their behavior during the electrochemical roughening evaluated.
- Sample Nos. 1, 2 and 3 caused electrochemical roughening errors and did not allow for an increase in process speed during electrochemical roughening. While Sample Nos. 1 and 2 were considered to be very poor (-) in terms of electrochemical roughening, so that homogeneous roughening could be achieved only at very high charge carrier input, the roughening of Sample No. 3 improved. However, Sample No. 3 did not show satisfactory roughening. All samples were subjected to conventional degreasing prior to measurement.
- the intensity ratio I / I bulk (avg) is a measure of the size of the oxide particles in the microcrystalline surface layer and their surface area corresponds to the frequency of oxide particles above a certain size.
- the sample No. 5 corresponds to the previously examined sample No. 2, which has additionally undergone a surface pickling selectively applied to the rolled-in particles.
- the surface of Sample No. 5 was pickled with a 10% H 3 PO 4 solution at 80 ° C for about 10 seconds. Since the phosphoric acid almost does not attack the aluminum matrix and selectively removes only the oxide particles, the area fraction with an intensity ratio I / I bulk (avg) greater than 4 could be reduced from 23.9% to 6.0%.
- the area fraction in the microprobe measurement with an intensity ratio I / I bulk (avg) greater than 4 could be reduced by applying the Phosphor yarnrebeize of 6.8% to 2, 0%. At the same time, it was possible to improve the properties with respect to an electrochemical roughening poorly from satisfactory to satisfactory.
- the measured values of the bulk sample 9 are shown in Table 1.
- the measured values for the area proportions of I / I bulk (avg) are consistently zero and the roughening was very good.
- the still measured intensity of the characteristic X-ray emission spectrum of the oxygen is attributed to the formation of a natural aluminum oxide layer on the surface.
- the sample 9 was stored after removal of the microcrystalline surface layer for about 1 week, so that could form a sufficiently thick aluminum oxide layer.
- an average intensity signal I bulk (avg) of 125 pulses was measured across the sample surface.
- the improved electrochemical Aufraueigenschaften the inventive samples Nos. 4 to 8 are noticeable in particular in a reduced charge carrier entry for complete roughening during the electrochemical roughening of the surface of the samples.
- a ribbon for lithographic printing plate supports can be provided, which allows higher process speeds in the electrochemical roughening or in the manufacture of lithographic printing plate supports.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15191870.3A EP2998126A1 (fr) | 2006-07-21 | 2006-07-21 | Procédé de manufacture d'un support pour plaques d'impression lithographique |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06117701.0A EP1880861B1 (fr) | 2006-07-21 | 2006-07-21 | Bande d'aluminium pour support de plaque lithographique |
EP15191870.3A EP2998126A1 (fr) | 2006-07-21 | 2006-07-21 | Procédé de manufacture d'un support pour plaques d'impression lithographique |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06117701.0A Division EP1880861B1 (fr) | 2006-07-21 | 2006-07-21 | Bande d'aluminium pour support de plaque lithographique |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2998126A1 true EP2998126A1 (fr) | 2016-03-23 |
Family
ID=37075678
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06117701.0A Active EP1880861B1 (fr) | 2006-07-21 | 2006-07-21 | Bande d'aluminium pour support de plaque lithographique |
EP15191870.3A Withdrawn EP2998126A1 (fr) | 2006-07-21 | 2006-07-21 | Procédé de manufacture d'un support pour plaques d'impression lithographique |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06117701.0A Active EP1880861B1 (fr) | 2006-07-21 | 2006-07-21 | Bande d'aluminium pour support de plaque lithographique |
Country Status (7)
Country | Link |
---|---|
US (1) | US9206494B2 (fr) |
EP (2) | EP1880861B1 (fr) |
JP (2) | JP5451386B2 (fr) |
CN (1) | CN101489798B (fr) |
BR (1) | BRPI0714809B8 (fr) |
ES (1) | ES2556166T3 (fr) |
WO (1) | WO2008009747A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101321882B (zh) | 2005-10-19 | 2011-09-21 | 海德鲁铝业德国有限责任公司 | 用于石版印刷板支持体的铝带 |
JP5487510B2 (ja) | 2008-07-30 | 2014-05-07 | 国立大学法人東北大学 | Al合金部材、電子装置製造装置、および陽極酸化膜付きAl合金部材の製造方法 |
ES2587024T3 (es) * | 2008-11-21 | 2016-10-20 | Hydro Aluminium Rolled Products Gmbh | Banda de aluminio para soportes de plancha de impresión litográfica con alta resistencia a la flexión alternante |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0795048A1 (fr) * | 1994-12-19 | 1997-09-17 | Alcan International Limited | Nettoyage de pieces en aluminium |
EP0978573A2 (fr) * | 1998-07-30 | 2000-02-09 | Nippon Light Metal, Co. Ltd. | Support en alliage d'aluminium pour une plaque d'impression lithographique et procédé de fabrication d'un substrat pour le support |
EP1136280A2 (fr) * | 2000-03-09 | 2001-09-26 | Fuji Photo Film Co., Ltd. | Substrat pour plaque lithographique et procédé de fabrication |
EP1598138A1 (fr) * | 2004-05-21 | 2005-11-23 | Fuji Photo Film Co., Ltd. | Procédé de texturation de la surface d'une tôle d'aluminium, substrat pour plaque lithographique et plaque lithographique |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62230946A (ja) | 1986-04-01 | 1987-10-09 | Furukawa Alum Co Ltd | 平版印刷版用アルミニウム合金支持体 |
JP4016310B2 (ja) * | 1998-07-30 | 2007-12-05 | 日本軽金属株式会社 | 平版印刷版用アルミニウム合金支持体および該支持体用素板の製造方法 |
JP2001322362A (ja) * | 2000-03-09 | 2001-11-20 | Fuji Photo Film Co Ltd | 平版印刷版用支持体 |
JP4098462B2 (ja) * | 2000-03-24 | 2008-06-11 | 富士フイルム株式会社 | 平版印刷版用支持体の製造方法 |
JP3983611B2 (ja) * | 2002-07-05 | 2007-09-26 | 三菱アルミニウム株式会社 | 印刷版用アルミニウム合金板の製造方法 |
CN101321882B (zh) * | 2005-10-19 | 2011-09-21 | 海德鲁铝业德国有限责任公司 | 用于石版印刷板支持体的铝带 |
CN101484322A (zh) * | 2006-03-31 | 2009-07-15 | 美铝公司 | 生产平版印刷片材的制造方法 |
-
2006
- 2006-07-21 ES ES06117701.0T patent/ES2556166T3/es active Active
- 2006-07-21 EP EP06117701.0A patent/EP1880861B1/fr active Active
- 2006-07-21 EP EP15191870.3A patent/EP2998126A1/fr not_active Withdrawn
-
2007
- 2007-07-20 BR BRPI0714809A patent/BRPI0714809B8/pt active IP Right Grant
- 2007-07-20 WO PCT/EP2007/057532 patent/WO2008009747A1/fr active Application Filing
- 2007-07-20 US US12/374,022 patent/US9206494B2/en active Active
- 2007-07-20 CN CN2007800275229A patent/CN101489798B/zh active Active
- 2007-07-20 JP JP2009519993A patent/JP5451386B2/ja active Active
-
2013
- 2013-09-09 JP JP2013186601A patent/JP5684348B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0795048A1 (fr) * | 1994-12-19 | 1997-09-17 | Alcan International Limited | Nettoyage de pieces en aluminium |
EP0978573A2 (fr) * | 1998-07-30 | 2000-02-09 | Nippon Light Metal, Co. Ltd. | Support en alliage d'aluminium pour une plaque d'impression lithographique et procédé de fabrication d'un substrat pour le support |
EP1136280A2 (fr) * | 2000-03-09 | 2001-09-26 | Fuji Photo Film Co., Ltd. | Substrat pour plaque lithographique et procédé de fabrication |
EP1598138A1 (fr) * | 2004-05-21 | 2005-11-23 | Fuji Photo Film Co., Ltd. | Procédé de texturation de la surface d'une tôle d'aluminium, substrat pour plaque lithographique et plaque lithographique |
Non-Patent Citations (1)
Title |
---|
LINDSETH I.: "Optical total reflectance, near surface microstructure, and topography of rolled Aluminium materials", PHD THESIS, 1999 |
Also Published As
Publication number | Publication date |
---|---|
BRPI0714809B8 (pt) | 2023-01-10 |
BRPI0714809B1 (pt) | 2020-08-04 |
JP5684348B2 (ja) | 2015-03-11 |
EP1880861B1 (fr) | 2015-11-04 |
CN101489798B (zh) | 2011-03-16 |
EP1880861A1 (fr) | 2008-01-23 |
US20090324994A1 (en) | 2009-12-31 |
ES2556166T3 (es) | 2016-01-13 |
CN101489798A (zh) | 2009-07-22 |
JP2009544486A (ja) | 2009-12-17 |
JP5451386B2 (ja) | 2014-03-26 |
JP2014058156A (ja) | 2014-04-03 |
US9206494B2 (en) | 2015-12-08 |
WO2008009747A1 (fr) | 2008-01-24 |
BRPI0714809A2 (pt) | 2016-05-24 |
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